发明申请
- 专利标题： MATERIAL DEPOSITION DEVICE AND METHOD OF USE
- 专利标题（中）： 材料沉积装置及其使用方法
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申请号： US14561978申请日： 2014-12-05
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公开(公告)号： US20160157978A1公开(公告)日： 2016-06-09
- 发明人: Wojtek Tutak
- 申请人： ADA FOUNDATION
- 主分类号： A61C19/06
- IPC分类号： A61C19/06 ; B05D1/02 ; B05B7/00
摘要：
A material deposition device includes a solution supply component, a gas supply component, and a co-axial discharge mechanism. The co-axial discharge mechanism includes a solution discharge mechanism, and a gas discharge mechanism co-axial with the solution discharge mechanism. The material deposition device further includes an alignment component that aligns the solution discharge mechanism in a center of the gas discharge mechanism; and an orifice plate with a number of turbulence inducing structures that induce turbulence in gas exiting the gas discharge mechanism.
公开/授权文献
- US09775694B2 Material deposition device and method of use 公开/授权日：2017-10-03
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