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    Method of production and method of quality control for glass ceramic
    1.
    发明申请
    Method of production and method of quality control for glass ceramic 审中-公开
    玻璃陶瓷的生产方法和质量控制方法

    公开(公告)号：US20050155386A1

    公开(公告)日：2005-07-21

    申请号：US10505762

    申请日：2003-02-20

    Applicant: Mariko Kataoka ,  Toshitaka Yagi ,  Yuichi Takamura ,  Naoyuki Goto

    Inventor： Mariko Kataoka ,  Toshitaka Yagi ,  Yuichi Takamura ,  Naoyuki Goto

    IPC: C03C10/00 ,  C03C10/14 ,  C03B32/02

    CPC classification number: C03C10/0027

    Abstract: Obtaining previously a relation between a crystallization temperature and a physical property and a relation between a physical property parameter and the physical property of a glass ceramic, measuring the physical property parameter with respect to the glass ceramic sampled from a manufacturing line of the glass ceramic and controlling an actual crystallization temperature based on the relations so that the manufactured glass ceramic has the desired physical property value.

    Abstract translation: 之前获得结晶温度和物理性质之间的关系以及物理性能参数与玻璃陶瓷的物理性质之间的关系，测量相对于从玻璃陶瓷的生产线获取的玻璃陶瓷的物理参数，以及 基于所述关系控制实际结晶温度，使得所制造的玻璃陶瓷具有期望的物理性质值。

    PRESSURE-SENSITIVE ADHESIVE TAPE FOR BATTERY
    2.
    发明申请
    PRESSURE-SENSITIVE ADHESIVE TAPE FOR BATTERY 审中-公开
    用于电池的压敏胶带

    公开(公告)号：US20130071740A1

    公开(公告)日：2013-03-21

    申请号：US13614036

    申请日：2012-09-13

    Applicant: Yuichi TAKAMURA ,  Hiroomi HANAI ,  Shigeki KAWABE ,  Jun IWATA

    Inventor： Yuichi TAKAMURA ,  Hiroomi HANAI ,  Shigeki KAWABE ,  Jun IWATA

    IPC: C09J7/02 ,  H01M2/30

    CPC classification number: C09J7/385 ,  C09J2203/33 ,  Y10T428/24752

    Abstract: The present invention relates to a pressure-sensitive adhesive tape for battery containing: a substrate and a pressure-sensitive adhesive layer laminated on at least one surface of a substrate, in which the pressure-sensitive adhesive layer is laminated on the substrate, 0.5 mm or more inside from both edges of the substrate, and in which the pressure-sensitive adhesive tape has a 180° peeling pressure-sensitive adhesive force at 23° C. being 0.1 N/10 mm or more, and has a slippage distance after a pressure-sensitive adhesive layer side of the pressure-sensitive adhesive tape is attached to a phenolic resin plate (attaching area: 10 mm×20 mm), followed by applying a load of 500 g thereto at 40° C. for 1 hour being 0.2 mm or less.

    Abstract translation: 本发明涉及一种电池用压敏粘合带，其特征在于，在基材的至少一面上层叠有基材和粘合剂层，其中粘合剂层被层压在基材上，其厚度为0.5mm 或更多的内侧，并且其中压敏粘合带在23℃下具有180°剥离压敏粘合力，为0.1N / 10mm以上，并且在a之后具有滑动距离 将粘合带的压敏粘合剂层侧安装在酚醛树脂板（附着区域：10mm×20mm）上，然后在40℃下加载500g负载1小时，为0.2 mm以下。

    Exposure system and exposure method
    4.
    发明授权
    Exposure system and exposure method 失效
    曝光系统和曝光方法

    公开(公告)号：US07705964B2

    公开(公告)日：2010-04-27

    申请号：US11396795

    申请日：2006-04-03

    Applicant: Kinya Yamaguchi ,  Yuichi Takamura

    Inventor： Kinya Yamaguchi ,  Yuichi Takamura

    IPC: G03B27/42 ,  G03B27/58 ,  G03B27/32

    CPC classification number: G03F9/7096 ,  G03F7/70808 ,  G03F9/7046

    Abstract: An exposure system for exposing a substrate to radiation is disclosed. The system comprises an exposure unit configured to expose the substrate to radiation, an exposure chamber configured to accommodate the exposure unit, an alignment measurement unit arranged outside the exposure chamber and configured to measure a position of an alignment mark on the substrate, and a load-lock chamber arranged between the exposure chamber and the alignment measurement unit.

    Abstract translation: 公开了一种用于将衬底暴露于辐射的曝光系统。 该系统包括被配置为将基板暴露于辐射的曝光单元，被配置为容纳曝光单元的曝光室，布置在曝光室外部并且被配置为测量基板上的对准标记的位置的对准测量单元， 锁定室布置在曝光室和对准测量单元之间。

    Exposure apparatus, exposure method, and device manufacturing method
    5.
    发明授权
    Exposure apparatus, exposure method, and device manufacturing method 失效
    曝光装置，曝光方法和装置制造方法

    公开(公告)号：US07365828B2

    公开(公告)日：2008-04-29

    申请号：US11215021

    申请日：2005-08-31

    Applicant: Yuichi Takamura

    Inventor： Yuichi Takamura

    IPC: G03B27/42 ,  G03B27/52

    CPC classification number: G03F7/70341

    Abstract: An exposure apparatus which exposes a pattern of an original onto a substrate through a projection optical system with a space between the projection optical system and the substrate filled with liquid. The apparatus includes a liquid supply nozzle configured to supply the liquid to the space through a liquid supply opening, a liquid supply unit configured to supply the liquid into the liquid supply nozzle, a liquid recovery unit configured to recover the liquid in the liquid supply nozzle by using a vacuum source, and a gas supply unit configured to supply a gas into the liquid supply nozzle through a pipe connected to the liquid supply opening of the liquid supply nozzle. A gas supply by the gas supply unit is started and a liquid recovery by the liquid recovery unit is started while a liquid supply by the liquid supply unit is stopped.

    Abstract translation: 一种曝光装置，其通过投影光学系统将原稿的图案曝光到基板上，在投影光学系统和填充有液体的基板之间具有空间。 该装置包括：液体供给喷嘴，其构造成通过液体供给口将液体供给到该空间;液体供给单元，其构造成将液体供给到液体供给喷嘴;液体回收单元，其构造成回收液体供给喷嘴 通过使用真空源，以及气体供给单元，被配置为通过与液体供给喷嘴的液体供给口连接的管道将气体供给到液体供给喷嘴。 开始由气体供给单元供给的气体，并且通过液体供给单元的液体供给停止而开始液体回收单元的液体回收。

    Exposure system and exposure method
    6.
    发明申请
    Exposure system and exposure method 失效
    曝光系统和曝光方法

    公开(公告)号：US20060221319A1

    公开(公告)日：2006-10-05

    申请号：US11396795

    申请日：2006-04-03

    Applicant: Kinya Yamaguchi ,  Yuichi Takamura

    Inventor： Kinya Yamaguchi ,  Yuichi Takamura

    IPC: G03B27/52 ,  G03B27/42

    CPC classification number: G03F9/7096 ,  G03F7/70808 ,  G03F9/7046

    Abstract: An exposure system for exposing a substrate to radiation is disclosed. The system comprises an exposure unit configured to expose the substrate to radiation, an exposure chamber configured to accommodate the exposure unit, an alignment measurement unit arranged outside the exposure chamber and configured to measure a position of an alignment mark on the substrate, and a load-lock chamber arranged between the exposure chamber and the alignment measurement unit.

    Abstract translation: 公开了一种用于将衬底暴露于辐射的曝光系统。 该系统包括被配置为将基板暴露于辐射的曝光单元，被配置为容纳曝光单元的曝光室，布置在曝光室外部并且被配置为测量基板上的对准标记的位置的对准测量单元， 锁定室布置在曝光室和对准测量单元之间。

    Device manufacturing apparatus and method of controlling same
    7.
    发明申请
    Device manufacturing apparatus and method of controlling same 审中-公开
    装置制造装置及其控制方法

    公开(公告)号：US20060207680A1

    公开(公告)日：2006-09-21

    申请号：US11376240

    申请日：2006-03-16

    Applicant: Yuichi Takamura

    Inventor： Yuichi Takamura

    IPC: B65B1/04

    CPC classification number: H01L21/67201

    Abstract: An apparatus for processing an article in order to manufacture a device includes a process chamber in which the article is processed; a relay chamber; a first load-lock chamber disposed between an outside of the apparatus and the relay chamber; a second load-lock chamber disposed between the relay chamber and the process chamber; a first adjusting mechanism configured to adjust atmosphere in the process chamber to a first atmosphere; and a second adjusting mechanism configured to adjust atmosphere in the relay chamber to a second atmosphere that is an intermediate atmosphere between the first atmosphere and atmosphere of the outside.

    Abstract translation: 一种用于处理制品以便制造装置的装置包括：处理室，其中处理物品; 中继室; 设置在所述装置的外部和所述中继室之间的第一装载锁定室; 设置在所述中继室和所述处理室之间的第二加载锁定室; 第一调节机构，被配置为将处理室中的气氛调节到第一气氛; 以及第二调节机构，被配置为将所述中继室中的气氛调节到作为所述第一大气和所述外部气氛之间的中间气氛的第二气氛。

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