Abstract:
A plurality of electron-emitting devices arranged in a matrix, a row wiring that connects electron-emitting portions of electron-emitting devices arranged in the same line to one another, and a column wiring that connects gate connection members of electron-emitting devices arranged in the same column to one another are included. Each of the plurality of gates is positioned at one side of an electron-emitting portion in an arrangement direction in which the plurality of electron-emitting portions are arranged.
Abstract:
An electron beam apparatus in which a spacer having a high-resistance film coating a surface of a base material is inserted between a rear plate having electron emitting elements and row-direction wires, and a faceplate having a metal back. The row-direction wires and the metal back are electrically connected via the high-resistance film. An electric field near an electron emitting element near the spacer is maintained to substantially constant irrespective of the positional relationship between the spacer and the electron emitting element near the spacer. When a sheet resistance value of the high-resistance film on a first facing surface of the spacer that faces a row-direction wire is represented by R1, and a sheet resistance value of the high-resistance film on a side surface adjacent to the electron emitting element is represented by R2, R2/R1 is 10 to 200.
Abstract:
In order to prevent a spacer from being charged by using a plate shaped spacer covered with a high resistance film, the present invention is aimed at preventing irregular displacements of electron beams emitted from adjacent electron-emitting devices and suppressing displacements of impinging positions of the electron beams emitted from the adjacent electron-emitting devices even with a slight displacement of an installation position of the spacer. The spacer is disposed along a row directional wiring. The high resistance film is allowed to come into contact with a metal back and the row directional wiring to achieve electrical connection therebetween. Contact portions between the high resistance film of the spacer and the row directional wiring are provided at predetermined intervals.
Abstract:
An electron beam apparatus in which a spacer having a high-resistance film coating a surface of a base material is inserted between a rear plate having electron emitting elements and row-direction wires, and a faceplate having a metal back. The row-direction wires and the metal back are electrically connected via the high-resistance film. An electric field near an electron emitting element near the spacer is maintained to substantially constant irrespective of the positional relationship between the spacer and the electron emitting element near the spacer. When a sheet resistance value of the high-resistance film on a first facing surface of the spacer that faces a row-direction wire is represented by R1, and a sheet resistance value of the high-resistance film on a side surface adjacent to the electron emitting element is represented by R2, R2/R1 is 10 to 200.
Abstract:
An electron-emitting device according to the present invention, comprises: an insulating member having a top face, a side face and a recess portion formed between the top face and the side face; a cathode electrode which is disposed on the side face and has an electron emitting portion located in a boundary portion between the side face and the recess portion; and a gate electrode which is disposed on the top face and of which an edge faces the electron emitting portion, wherein the boundary portion in which the electron emitting portion is located has concavity and convexity in a direction parallel to the top face.
Abstract:
An electron beam apparatus of which the electron emission efficiency is high and in which capacitance between a gate and a cathode is small is provided. In the electron beam apparatus which is equipped with the gate and the cathode respectively formed on the side surface of an insulating member and an anode arranged on an elongation of a Z direction, the gate and the cathode are shifted from each other in a Y direction and then arranged so that orthogonal projection of the gate to the anode and orthogonal projection of the cathode to the anode do not overlap each other.
Abstract:
In order to prevent a spacer from being charged by using a plate shaped spacer covered with a high resistance film, the present invention is aimed at preventing irregular displacements of electron beams emitted from adjacent electron-emitting devices and suppressing displacements of impinging positions of the electron beams emitted from the adjacent electron-emitting devices even with a slight displacement of an installation position of the spacer. The spacer is disposed along a row directional wiring. The high resistance film is allowed to come into contact with a metal back and the row directional wiring to achieve electrical connection therebetween. Contact portions between the high resistance film of the spacer and the row directional wiring are provided at predetermined intervals.
Abstract:
In order to prevent a spacer from being charged by using a plate shaped spacer covered with a high resistance film, the present invention is aimed at preventing irregular displacements of electron beams emitted from adjacent electron-emitting devices and suppressing displacements of impinging positions of the electron beams emitted from the adjacent electron-emitting devices even with a slight displacement of an installation position of the spacer. The spacer is disposed along a row directional wiring. The high resistance film is allowed to come into contact with a metal back and the row directional wiring to achieve electrical connection therebetween. Contact portions between the high resistance film of the spacer and the row directional wiring are provided at predetermined intervals.
Abstract:
The present invention provides an image display apparatus which reduces electrical discharges produced by electron-emitting devices and prevents image degradation during discharge. The image display apparatus includes a rear plate equipped with information wirings, scan wirings, an insulating layer and electron-emitting devices; and a face plate placed opposite to the rear plate and equipped with an anode and light emitting members, wherein the electron-emitting devices are placed between first and second scan wirings adjacent to each other, and are electrically connected to the first scan wiring, the second scan wiring is electrically connected to a discharge induction electrode via a contact hole which penetrates the insulating layer, one end of the discharge induction electrode is covered with the insulating layer, and the other end extends out from the insulating layer in a direction toward the electron-emitting devices.
Abstract:
An image display apparatus is provided, in which spacers are interposed between a face plate and a rear plate without affecting an image quality, and an anti-atmospheric pressure measure is taken for the interior of a display panel. The image display apparatus has a spacer, which is disposed in the interior of a vacuum container so as to abut against a first substrate and a second substrate, and comprises base material and a film having a resistance higher than a first electrode or a second electrode coating the base material, wherein 0.3S1≦s1≦0.003A or 0.3 S2≦s2≦0.003A, where A is an inner cross sectional area of the container cut along a plane parallel with the first substrate of the vacuum container, S1 is a total area of the end portion adjacent and faced to the first substrate of the spacer, S2 is a total area of the end portion adjacent and faced to the second substrate of the spacer, S1 is an actual contact area with the spacer and the first electrode, and S2 is an actual contact area with the spacer and the second electrode.
Abstract translation:提供了一种图像显示装置,其中间隔件插入在面板和后板之间,而不影响图像质量,并且对于显示面板的内部采取抗大气压力测量。 图像显示装置具有间隔件,该间隔件设置在真空容器的内部,以抵靠第一基板和第二基板,并且包括基材和具有高于第一电极或第二电极的电阻的膜 涂覆基体材料,其中,0.3S1≤s1≤= 0.003A或0.3S 2 <= s 2 <= 0.003A,其中A是沿着平行于第一基底的平面切割的容器的内横截面面积 S 1是与间隔件的第一基板相邻并面对的端部的总面积,S 2是与间隔件的第二基板相邻并面向间隔件的第二基板的端部的总面积,S 1是 与间隔物和第一电极的实际接触面积,S 2是与间隔物和第二电极的实际接触面积。