公开(公告)号：US20120269498A1

公开(公告)日：2012-10-25

申请号：US13452052

申请日：2012-04-20

申请人： Gonsu KANG ,  Sangbom KANG ,  Jaeyoung PARK ,  Sungho KANG ,  Taegon KIM ,  Hyunsub EARM ,  Jong-hoon KANG ,  Kang Hun MOON ,  Han Ki LEE

发明人： Gonsu KANG ,  Sangbom KANG ,  Jaeyoung PARK ,  Sungho KANG ,  Taegon KIM ,  Hyunsub EARM ,  Jong-hoon KANG ,  Kang Hun MOON ,  Han Ki LEE

IPC分类号： F27D5/00 ,  F26B3/30

CPC分类号： F27B17/0025 ,  H01L21/67115 ,  H01L21/6875

摘要： A substrate treatment apparatus and a supporting unit are provided. The substrate treatment apparatus includes a chamber in which a substrate is processed; a supporting unit that is disposed in the chamber and is configured to support the substrate; and a heating member that is configured to apply heat to the substrate supported by the supporting unit. The supporting unit includes a plate; a plurality of supporting pins upwardly protruding from the plate; and at least one auxiliary pin upwardly protruding from the plate. A distance between a central point of the plate and the at least one auxiliary pin is different from a distance between the central point of the plate and the supporting pins.

摘要翻译： 提供了基板处理装置和支撑单元。 基板处理装置包括：处理基板的室; 支撑单元，其设置在所述室中并且构造成支撑所述基板; 以及加热构件，其构造成对由所述支撑单元支撑的所述基板施加热量。 支撑单元包括板; 从所述板向上突出的多个支撑销; 以及从板向上突出的至少一个辅助销。 板的中心点和至少一个辅助销之间的距离不同于板的中心点和支撑销之间的距离。