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    Method for examining a wafer with regard to a contamination limit and EUV projection exposure system
    1.
    发明授权
    Method for examining a wafer with regard to a contamination limit and EUV projection exposure system 有权
    关于污染极限和EUV投影曝光系统检查晶片的方法

    公开(公告)号：US08288064B2

    公开(公告)日：2012-10-16

    申请号：US13153662

    申请日：2011-06-06

    申请人： Andreas Dorsel ,  Stefan Schmidt

    发明人： Andreas Dorsel ,  Stefan Schmidt

    IPC分类号： G03F9/00 ,  G03C5/00

    CPC分类号： G03F7/70916 ,  G03F7/70425 ,  G03F7/70608 ,  G03F7/7075 ,  G03F7/70808 ,  G03F7/70866 ,  G03F7/70925 ,  G03F7/70983

    摘要： A method for examining at least one wafer (13) with regard to a contamination limit, in which the contamination potential of the resist (13a) of the wafer (13), which resist (13a) outgasses contaminating substances, is examined with regard to a contamination limit before the wafer (13) is exposed in an EUV projection exposure system (1). The method preferably includes: arranging the wafer (13) and/or a test disc coated with the same resist (13a) as the resist (13a) of the wafer (13) in a vacuum chamber (19), evacuating the vacuum chamber (19), and measuring the contamination potential of the contaminating substances outgassed from the wafer (13) in the evacuated vacuum chamber (19), and also comparing the contamination potential of the wafer (13) with a contamination limit. An EUV projection exposure system (1) for carrying out the method is also disclosed. By heating wafers having a high contamination risk, the contamination of optical elements in the projection exposure system (1) on wafer exposure may be distinctly reduced.

    摘要翻译： 关于污染极限检查至少一个晶片（13）的方法，其中关于抗污染物质（13a）的晶片（13）的抗蚀剂（13a）的污染潜力被检测为污染物质 晶片（13）在EUV投影曝光系统（1）中曝光之前的污染极限。 该方法优选地包括：将晶片（13）和/或涂覆有与晶片（13）的抗蚀剂（13a）相同的抗蚀剂（13a）的测试盘放置在真空室（19）中，抽真空室 19），并且测量从真空室（19）中的晶片（13）脱气的污染物质的污染潜力，并且还将晶片（13）的污染电位与污染极限进行比较。 还公开了一种用于执行该方法的EUV投影曝光系统（1）。 通过加热具有高污染风险的晶片，可以明显减少投影曝光系统（1）中的晶片曝光的光学元件的污染。

    Method for examining a wafer with regard to a contamination limit and EUV projection exposure system
    2.
    发明授权
    Method for examining a wafer with regard to a contamination limit and EUV projection exposure system 有权
    关于污染极限和EUV投影曝光系统检查晶片的方法

    公开(公告)号：US07955767B2

    公开(公告)日：2011-06-07

    申请号：US12690571

    申请日：2010-01-20

    申请人： Andreas Dorsel ,  Stefan Schmidt

    发明人： Andreas Dorsel ,  Stefan Schmidt

    IPC分类号： G03F9/00 ,  G03C5/00

    CPC分类号： G03F7/70916 ,  G03F7/70425 ,  G03F7/70608 ,  G03F7/7075 ,  G03F7/70808 ,  G03F7/70866 ,  G03F7/70925 ,  G03F7/70983

    摘要： A method for examining at least one wafer (13) with regard to a contamination limit, in which the contamination potential of the resist (13a) of the wafer (13), which resist (13a) outgasses contaminating substances, is examined with regard to a contamination limit before the wafer (13) is exposed in an EUV projection exposure system (1). The method preferably includes: arranging the wafer (13) and/or a test disc coated with the same resist (13a) as the resist (13a) of the wafer (13) in a vacuum chamber (19), evacuating the vacuum chamber (19), and measuring the contamination potential of the contaminating substances outgassed from the wafer (13) in the evacuated vacuum chamber (19), and also comparing the contamination potential of the wafer (13) with a contamination limit. An EUV projection exposure system (1) for carrying out the method is also disclosed. By rejecting wafers having an especially high contamination risk, the contamination of optical elements in the projection exposure system (1) on wafer exposure may be distinctly reduced.

    摘要翻译： 关于污染极限检查至少一个晶片（13）的方法，其中关于抗污染物质（13a）的晶片（13）的抗蚀剂（13a）的污染潜力被检测为污染物质 晶片（13）在EUV投影曝光系统（1）中曝光之前的污染极限。 该方法优选地包括：将晶片（13）和/或涂覆有与晶片（13）的抗蚀剂（13a）相同的抗蚀剂（13a）的测试盘放置在真空室（19）中，抽真空室 19），并且测量从真空室（19）中的晶片（13）脱气的污染物质的污染潜力，并且还将晶片（13）的污染电位与污染极限进行比较。 还公开了一种用于执行该方法的EUV投影曝光系统（1）。 通过拒绝具有特别高的污染风险的晶片，可以明显减少投影曝光系统（1）中晶片曝光的光学元件的污染。

    CLEANING MODULE AND EUV LITHOGRAPHY DEVICE WITH CLEANING MODULE
    3.
    发明申请
    CLEANING MODULE AND EUV LITHOGRAPHY DEVICE WITH CLEANING MODULE 审中-公开
    清洁模块和具有清洁模块的EUV光刻设备

    公开(公告)号：US20110058147A1

    公开(公告)日：2011-03-10

    申请号：US12893762

    申请日：2010-09-29

    申请人： Dirk Heinrich Ehm ,  Julian Kaller ,  Stefan Schmidt ,  Dieter Kraus ,  Stefan Wiesner ,  Almut Czap ,  Hin-Yiu Anthony Chung ,  Stefan Koehler

    发明人： Dirk Heinrich Ehm ,  Julian Kaller ,  Stefan Schmidt ,  Dieter Kraus ,  Stefan Wiesner ,  Almut Czap ,  Hin-Yiu Anthony Chung ,  Stefan Koehler

    IPC分类号： G03B27/52 ,  C23F1/08

    CPC分类号： G03F7/70925 ,  B08B7/0035

    摘要： A cleaning module for an EUV lithography device with a supply (206) for molecular hydrogen, a heating filament (210) and a line (212) for atomic and/or molecular hydrogen. The line (212) has at least one bend with a bending angle of less than 120 degrees, and has a material on its inner surface which has a low recombination rate for atomic hydrogen. The supply (206) is of flared shape at its end, which faces the heating filament (210). A gentler cleaning of optical elements is achieved with such a cleaning module, or also by exciting a cleaning gas with a cold cathode or a plasma, or by filtering out charged particles via of electrical and/or magnetic fields.

    摘要翻译： 一种用于EUV光刻设备的清洁模块，其具有用于分子氢的供应（206），用于原子和/或分子氢的加热丝（210）和线（212）。 线（212）具有弯曲角度小于120度的至少一个弯曲部，并且在其内表面上具有原子氢复合率低的材料。 电源（206）在其端部处具有扩口形状，其面向加热丝（210）。 通过这种清洁模块或者通过用冷阴极或等离子体激发清洁气体，或者通过电场和/或磁场过滤掉带电粒子，实现对光学元件的温和清洁。

    Control unit for rotor blade adjustment
    5.
    发明授权
    Control unit for rotor blade adjustment 失效
    用于转子叶片调节的控制单元

    公开(公告)号：US07677154B2

    公开(公告)日：2010-03-16

    申请号：US11682432

    申请日：2007-03-06

    申请人： Stefan Schmidt

    发明人： Stefan Schmidt

    IPC分类号： F15B13/044 ,  F01L31/00 ,  F01B7/18 ,  F15B13/16

    CPC分类号： F03D7/0224 ,  F05B2260/76 ,  F05B2260/79 ,  F05B2270/506 ,  F15B2211/40592 ,  Y02E10/721 ,  Y02E10/723

    摘要： In an electrohydraulic control unit for rotor blade adjustment of a wind farm via a hydraulic cylinder, the hydraulic cylinder has one piston chamber and one piston rod chamber. Via an inflow valve assembly, a pressure fluid connection can be established between the pump and the piston chamber, while via an outflow valve assembly, a pressure fluid connection can be established between the piston rod chamber and the tank. Each valve assembly has at least two parallel-connected switch valves, which open and can be closed in various combinations in order to establish a desired position of the hydraulic cylinder. This control unit makes precise regulation of the rotor blade possible.

    摘要翻译： 在用于经由液压缸的风力农场的转子叶片调节的电动液压控制单元中，液压缸具有一个活塞室和一个活塞杆室。 通过流入阀组件，可以在泵和活塞室之间建立压力流体连接，同时经由流出阀组件，可以在活塞杆室和罐之间建立压力流体连接。 每个阀组件具有至少两个平行连接的切换阀，其可以以各种组合打开并且可以关闭，以便建立液压缸的期望位置。 该控制单元可以精确调节转子叶片。

    Irradiation Device
    6.
    发明申请
    Irradiation Device 有权
    照射装置

    公开(公告)号：US20090321665A1

    公开(公告)日：2009-12-31

    申请号：US12520506

    申请日：2007-04-05

    申请人： Jan Hein Timmer ,  Holger Goebel ,  Stefan Schmidt ,  Juergen Heese ,  Michael Schillo

    发明人： Jan Hein Timmer ,  Holger Goebel ,  Stefan Schmidt ,  Juergen Heese ,  Michael Schillo

    IPC分类号： G21K5/10 ,  A61N5/10

    CPC分类号： A61N5/10 ,  A61N5/1081 ,  A61N2005/1087

    摘要： The present invention relates to an irradiation device for irradiating an irradiation object with heavy charged particles at an irradiation station, comprising a particle accelerator for providing a particle beam and a swivelling device for swivelling the particle beam impinging on the irradiation object, wherein the swivelling device comprises a carrier pivotable about an axis. In accordance with the invention, the irradiation device is characterized in that the particle accelerator is mounted on the pivotable carrier.

    摘要翻译： 本发明涉及一种照射装置，用于在照射台处照射带有重粒子的照射物体，包括用于提供粒子束的粒子加速器和用于使照射物体上的粒子束旋转的旋转装置，其中，旋转装置 包括可绕轴线枢转的托架。 根据本发明，照射装置的特征在于，颗粒加速器安装在可枢转的载体上。

    Method for Producing an Exhaust-Carrying Device
    7.
    发明申请
    Method for Producing an Exhaust-Carrying Device 审中-公开
    排气装置的制造方法

    公开(公告)号：US20080196248A1

    公开(公告)日：2008-08-21

    申请号：US11813931

    申请日：2006-01-17

    申请人： Erich Forster ,  Peter Kroner ,  Stefan Schmidt

    发明人： Erich Forster ,  Peter Kroner ,  Stefan Schmidt

    IPC分类号： B23P11/00

    CPC分类号： F01N13/18 ,  F01N3/2853 ,  F01N2350/02 ,  F01N2450/02 ,  F01N2450/20 ,  F01N2470/26 ,  Y10T29/49398

    摘要： A method of producing an exhaust gas-carrying device in which the gas-carrying device includes at least one insert piece and a cylindrical outer housing is disclosed. The method includes the steps of introducing the insert piece into the outer housing and applying radial forces with clamping jaws which bear against the outer surface area of the outer housing and plastically deform the outer housing inwards in order to clamp the insert piece in the outer housing. The clamping jaws are configured to have edges such that marking lines are formed in the outer housing which do not continuously extend axially parallel to the outer housing along that portion of the outer housing in which the insert piece is arranged.

    摘要翻译： 公开了一种生产排气携带装置的方法，其中气体输送装置包括至少一个插入件和圆柱形外壳。 该方法包括以下步骤：将插入件引入外壳中并且通过夹紧爪施加径向力，所述夹钳夹住外壳的外表面区域并使外壳向内塑性变形，以将插入件夹紧在外壳中 。 夹爪被构造成具有边缘，使得标记线形成在外壳中，其不沿着外壳的沿插入件布置的部分沿轴向平行于外壳轴向延伸延伸。

    Method for setting a device for image reproduction on printing plates
    8.
    发明授权
    Method for setting a device for image reproduction on printing plates 失效
    在印版上设置图像再现装置的方法

    公开(公告)号：US07324131B2

    公开(公告)日：2008-01-29

    申请号：US11123488

    申请日：2005-05-05

    申请人： Norbert Liebig ,  Rainer Müllenhagen ,  Stefan Schmidt ,  Gerhard Vogler

    发明人： Norbert Liebig ,  Rainer Müllenhagen ,  Stefan Schmidt ,  Gerhard Vogler

    IPC分类号： B41J2/47

    CPC分类号： B41C1/1083

    摘要： A method sets up a device for image reproduction on printing plates. The fastening of image reproduction members, their orientation and tolerances, and also tolerances in the positioning of the image reproduction members on a guide or a spindle, lead to mis-positions of the image reproduction members in relation to one another. Offsets of two adjacent image parts may occur. In the method, the printing plate has reproduced on it in the X-direction at least one first pattern which overlaps with the first pattern of an adjacent image reproduction member and/or the printing plate, in each case with a right and a left column, has reproduced on it in the Y-direction in each case at least three spaced-apart second patterns, such that in each case the right column of an image part is at least contiguous to the left column of an adjacent image part.

    摘要翻译： 一种方法在印版上设置图像再现装置。 图像再现构件的紧固，其取向和公差以及图像再现构件在引导件或主轴上的定位的公差导致图像再现构件相对于彼此错位。 可能发生两个相邻图像部分的偏移。 在该方法中，印版在X方向上再现了与邻近的图像再现构件和/或印版的第一图案重叠的至少一个第一图案，在每种情况下都具有右列和左列 在每个情况下在Y方向上再现至少三个间隔开的第二图案，使得在每种情况下，图像部分的右列至少邻近相邻图像部分的左列。