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公开(公告)号：US07378230B2
公开(公告)日：2008-05-27
申请号：US10750845
申请日：2004-01-05
Applicant: Sung-Chul Kang , Jin-Ho Ju , You-Kyoung Lee , Dong-Ki Lee , Hyo-Youl Kim , Hoon Kang , Seung-Uk Lee , Byung-Uk Kim
Inventor： Sung-Chul Kang , Jin-Ho Ju , You-Kyoung Lee , Dong-Ki Lee , Hyo-Youl Kim , Hoon Kang , Seung-Uk Lee , Byung-Uk Kim
CPC classification number: G03F7/0236 , G03F7/0048
Abstract: The present invention relates to a photoresist composition for an MMN (multi-micro nozzle) head coater, more particularly to a photoresist composition comprising a novolak resin with a molecular weight ranging from 2000 to 12,000, a diazide photoactive compound, an organic solvent, and a Si-based surfactant for use in liquid crystal display circuits.The photoresist composition for liquid crystal display circuits of the present invention solves the stain problem, which occurs in MMN head coaters used for large-scale substrate glass, and improves coating characteristics, so that it can be utilized industrially and is expected to significantly improve productivity.
Abstract translation: 本发明涉及一种用于MMN（多微喷嘴）喷涂机的光致抗蚀剂组合物，更具体地说涉及一种光致抗蚀剂组合物，其包含分子量范围为2000-12,000的酚醛清漆树脂，二叠氮光敏化合物，有机溶剂和 用于液晶显示电路的Si基表面活性剂。 本发明的液晶显示电路用光致抗蚀剂组合物解决了用于大规模基板玻璃的MMN头涂布机中发生的污渍问题，并且改善了涂布特性，从而可以在工业上得到利用并且预期显着提高生产率 。
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2.发明申请METHOD FOR FORMING PATTERN USING ANTI-REFLECTIVE COATING COMPOSITION COMPRISING PHOTOACID GENERATOR 审中-公开使用包含光纤发生器的抗反射涂层组合物形成图案的方法公开(公告)号：US20160187781A1
公开(公告)日：2016-06-30
申请号：US14586956
申请日：2014-12-31
Applicant: Jihoon Kang , Hye-Won Lee , Seung Uk Lee , Sook Lee , Jae-Bong Lim
Inventor： Jihoon Kang , Hye-Won Lee , Seung Uk Lee , Sook Lee , Jae-Bong Lim
CPC classification number: G03F7/325 , G03F7/0045 , G03F7/0382 , G03F7/0392 , G03F7/091 , G03F7/2041
Abstract: The present invention relates to a method for forming a pattern by negative tone development (NTD) which is prepared by forming an anti-reflective coating composition layer comprising a photoacid generator between the substrate and the photoresist composition layer, and thus exhibits improved line width (CD) in the pattern and prevents pattern collapse owing to thorough activation of de-blocking of the photoresist composition layer during the exposure process.
Abstract translation: 本发明涉及通过负色调显影（NTD）形成图案的方法，其通过在基板和光致抗蚀剂组合物层之间形成包含光致酸产生剂的抗反射涂层组合物层，从而显示出改善的线宽（ CD），并且防止由于在曝光过程期间光致抗蚀剂组合物层的去隔离的彻底激活导致图案塌陷。
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Patent Agency Ranking
公开(公告)号：US20100298560A1
公开(公告)日：2010-11-25
申请号：US12863569
申请日：2009-01-08
Applicant: Byoung Taek Choi , Yun Bum Ham , Yong Kyu Park , Sung Hun Bang , Jin Woong Kim , Seung Uk Lee , Hyun Jun Jung
Inventor： Byoung Taek Choi , Yun Bum Ham , Yong Kyu Park , Sung Hun Bang , Jin Woong Kim , Seung Uk Lee , Hyun Jun Jung
IPC: C07D413/12 , C07D307/88
CPC classification number: C07D307/88
Abstract: The present invention relates to an improved method of manufacturing mycophenolate mofetil. More particularly, the present invention relates to a method of manufacturing mycophenolate mofetil with high purity comprising : a) converting mycophenolate to an amine salt by reacting with an amine base; and b) reacting the resultant with a halogenating agent and 2-morpholinoethanol continuously.
Abstract translation: 本发明涉及一种制造霉酚酸酯的改进方法。 更具体地说，本发明涉及一种制备高纯度霉酚酸酯的方法，包括：a）通过与胺基反应将霉酚酸酯转化成胺盐; 和b）将所得物与卤化剂和2-吗啉代乙醇连续反应。
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公开(公告)号：US07195854B2
公开(公告)日：2007-03-27
申请号：US11174872
申请日：2005-07-05
Applicant: Hoon Kang , Seung-uk Lee , Woo-sik Jun , Dae-youn Park , Ju-hyuk Kim , Byung-uk Kim
Inventor： Hoon Kang , Seung-uk Lee , Woo-sik Jun , Dae-youn Park , Ju-hyuk Kim , Byung-uk Kim
IPC: G03F7/023
CPC classification number: G03F7/0048 , G03F7/0007 , G03F7/022
Abstract: The present invention provides a photoresist composition and more particularly, a photoresist composition comprising a) a novolak resin, b) a diazide compound, and c) a solvent containing propylene glycol methyl ether acetate (PGMEA) and 2,2,4-triemthyl-1,3-penthanediolmonoisobutylate (TMPMB). The photoresist composition according to the invention has excellent coating uniformity and stain inhibitory properties after coating so that it can be easily applied to real industrial fields and it can improve working environments due to the reduction of amounts to be consumed, the decrease of time to be required for manufacture, etc. when manufactured on a large scale.
Abstract translation: 本发明提供一种光致抗蚀剂组合物，更具体地说，涉及一种光致抗蚀剂组合物，其包含a）一种酚醛清漆树脂，b）一种重氮化合物，和c）含有丙二醇甲基醚乙酸酯（PGMEA）和2,2,4-三甲基 - 1,3-戊二醇单异丁酸酯（TMPMB）。 根据本发明的光致抗蚀剂组合物在涂布后具有优异的涂布均匀性和防污性，使得其可以容易地应用于实际工业领域，并且可以由于减少待消耗的量而减少工作环境，减少时间 制造时需要大规模制造。
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公开(公告)号：US06893791B2
公开(公告)日：2005-05-17
申请号：US10259152
申请日：2002-09-27
Applicant: You-Kyoung Lee , Sung-Chul Kang , Jin-Ho Ju , Dong-Ki Lee , Seung-Uk Lee , Hoon Kang
Inventor： You-Kyoung Lee , Sung-Chul Kang , Jin-Ho Ju , Dong-Ki Lee , Seung-Uk Lee , Hoon Kang
CPC classification number: G03F7/0236 , G03F7/0226 , G03F7/40
Abstract: Disclosed is a photoresist composition having a good sensitivity and residual layer characteristic and a method of forming a pattern using the same. The photoresist composition includes 5-30% by weight of a polymer resin, 2-10% by weight of a photosensitive compound, 0.1-10% by weight of a sensitivity enhancing agent, 0.1-10% by weight of a sensitivity restraining agent and 60-90% by weight of an organic solvent. A photoresist layer is formed by coating the photoresist composition on a substrate and then drying the coated photoresist composition. Then, thus obtained photoresist layer is exposed by using a mask having a predetermined pattern. Then, a photoresist pattern is formed by developing thus exposed photoresist layer. The photoresist pattern exhibits a uniform layer thickness and critical dimension.
Abstract translation: 公开了具有良好的灵敏度和残留层特性的光致抗蚀剂组合物和使用其形成图案的方法。 光致抗蚀剂组合物包含5-30重量％的聚合物树脂，2-10重量％的感光性化合物，0.1-10重量％的敏感性增强剂，0.1-10重量％的敏感性抑制剂和 60-90重量％的有机溶剂。 通过将光致抗蚀剂组合物涂覆在基材上，然后干燥涂覆的光致抗蚀剂组合物，形成光致抗蚀剂层 然后，通过使用具有预定图案的掩模曝光所得到的光致抗蚀剂层。 然后，通过显影这样曝光的光刻胶层形成光致抗蚀剂图案。 光致抗蚀剂图案具有均匀的层厚度和临界尺寸。
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公开(公告)号：US20050064321A1
公开(公告)日：2005-03-24
申请号：US10494486
申请日：2002-10-21
Applicant: Hoon Kang , Joon-Yeon Cho , Dong-Min Kim , Seung-Uk Lee
Inventor： Hoon Kang , Joon-Yeon Cho , Dong-Min Kim , Seung-Uk Lee
CPC classification number: G03F7/0236 , G03F7/0007
Abstract: The present invention relates to an LCD circuit photoresist composition for manufacturing fine circuit patterns on liquid crystal display circuits or semiconductor integrated circuits, and more particularly, and LCD circuit photoresist composition including (a) mixed polymer resins comprising a novolak resin with a molecular weight ranging from 3,000 to 9,000 and a fractionated novolak resin with a molecular weight ranging from 3,500 to 10,000; (b) a diazide-type photosensitive compound; (c) a photosensitizer; and (d) organic solvents. An LCD circuit photoresist composition of the present invention has excellent photosensitivity, retention ratio, resolution, contrast, heat resistance, adhesion, and stripper solubility, thus this photoresist composition can be easily applied to industrial work places for better working environments.
Abstract translation: 本发明涉及用于在液晶显示电路或半导体集成电路上制造精细电路图案的LCD电路光致抗蚀剂组合物，更具体地说，涉及包括（a）包含分子量范围的酚醛清漆树脂的混合聚合物树脂的LCD电路光致抗蚀剂组合物 3,000至9,000份，分子量为3,500至10,000份的分级酚醛清漆树脂; （b）二叠氮型光敏化合物; （c）光敏剂; 和（d）有机溶剂。 本发明的LCD电路光阻组合物具有优异的光敏性，保留率，分辨率，对比度，耐热性，粘合性和剥离剂溶解性，因此该光致抗蚀剂组合物可以容易地应用于工业工作场所，从而达到更好的工作环境。
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公开(公告)号：US20060008728A1
公开(公告)日：2006-01-12
申请号：US11174872
申请日：2005-07-05
Applicant: Hoon Kang , Seung-uk Lee , Woo-sik Jun , Dae-youn Park , Ju-hyuk Kim , Byung-uk Kim
Inventor： Hoon Kang , Seung-uk Lee , Woo-sik Jun , Dae-youn Park , Ju-hyuk Kim , Byung-uk Kim
IPC: G03C5/18
CPC classification number: G03F7/0048 , G03F7/0007 , G03F7/022
Abstract: The present invention provides a photoresist composition and more particularly, a photoresist composition comprising a) a novolak resin, b) a diazide compound, and c) a solvent containing propylene glycol methyl ether acetate (PGMEA) and 2,2,4-triemthyl-1,3-penthanediolmonoisobutylate (TMPMB). The photoresist composition according to the invention has excellent coating uniformity and stain inhibitory properties after coating so that it can be easily applied to real industrial fields and it can improve working environments due to the reduction of amounts to be consumed, the decrease of time to be required for manufacture, etc. when manufactured on a large scale.
Abstract translation: 本发明提供一种光致抗蚀剂组合物，更具体地说，涉及一种光致抗蚀剂组合物，其包含：a）酚醛清漆树脂，b）二叠氮化合物，和c）含有丙二醇甲基醚乙酸酯（PGMEA）和2,2,4-三甲基 - 1,3-戊二醇单异丁酸酯（TMPMB）。 根据本发明的光致抗蚀剂组合物在涂布后具有优异的涂布均匀性和防污性，使得其可以容易地应用于实际工业领域，并且可以由于减少待消耗的量而减少工作环境，减少时间 制造时需要大规模制造。
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