公开(公告)号：US09190239B2

公开(公告)日：2015-11-17

申请号：US13265051

申请日：2010-10-27

申请人： Sung Il Chung ,  Hyeon Seok Oh ,  S. A. Nikiforov ,  Pan Kyeom Kim ,  Hyeon Taeg Kim ,  Jeong Woo Jeon ,  Jong Moon Kim

发明人： Sung Il Chung ,  Hyeon Seok Oh ,  S. A. Nikiforov ,  Pan Kyeom Kim ,  Hyeon Taeg Kim ,  Jeong Woo Jeon ,  Jong Moon Kim

IPC分类号： C23C14/34 ,  H01J37/08 ,  C23C14/48 ,  H01J37/305 ,  H01J37/32

CPC分类号： H01J37/08 ,  C23C14/48 ,  H01J37/305 ,  H01J37/32009

摘要： Disclosed is an apparatus and method for low-temperature plasma immersion processing of a variety of workpieces using accelerated ions, wherein low-temperature plasma is distributed around a cylindrical workpiece placed in a chamber, the workpiece is enclosed with a housing including a multi-slot extracting electrode to isolate the workpiece from plasma, and a negative potential sufficient to induce sputtering is applied to the workpiece and the electrode, so that ions from plasma are accelerated within the sheath formed between the extracting electrode and plasma, pass through the slot part of the electrode and bombard the workpiece, thus polishing the surface of the workpiece. This apparatus and method is effective for surface smoothing to ones of nm of large cylindrical substrates particularly substrates for micro or nanopattern transfer. This method includes plasma cleaning, surface activating, surface smoothing, dry etching, deposition, plasma immersion ion implantation and deposition within a single or multi chamber.

摘要翻译： 公开了一种用于使用加速离子对各种工件进行低温等离子体浸没处理的装置和方法，其中低温等离子体分布在放置在腔室中的圆柱形工件周围，工件由包括多槽的壳体封闭 提取电极以将工件与等离子体隔离，并且对工件和电极施加足以引起溅射的负电位，使得来自等离子体的离子在形成在提取电极和等离子体之间的护套内被加速，通过 电极并轰击工件，从而抛光工件的表面。 该装置和方法对于大的圆柱形基底，特别是用于微或纳米图案转印的基底的表面平滑是有效的。 该方法包括等离子体清洗，表面活化，表面平滑化，干蚀刻，沉积，等离子体浸入离子注入和在单室或多室内的沉积。

公开(公告)号：US08354908B2

公开(公告)日：2013-01-15

申请号：US13001752

申请日：2008-09-29

申请人： Jeong Woo Jeon ,  Hyun Seok Oh ,  Sung Il Chung ,  Yeon Ho Jeong ,  Do Hyun Kang ,  S. A. Nikiforov ,  Mitica Caraiani

发明人： Jeong Woo Jeon ,  Hyun Seok Oh ,  Sung Il Chung ,  Yeon Ho Jeong ,  Do Hyun Kang ,  S. A. Nikiforov ,  Mitica Caraiani

IPC分类号： H01F7/00

CPC分类号： G03F7/70825 ,  G03F7/24 ,  G03F7/703 ,  G03F7/707 ,  G03F7/70725 ,  G03F7/70791 ,  G03F7/70816 ,  G03F7/70841 ,  G03F7/70858 ,  H02K7/09 ,  H02K16/00 ,  H02K21/12 ,  H02K41/031 ,  H02K2201/15 ,  H02K2201/18 ,  H02N15/00

摘要： The present invention provides a cylindrical magnetic levitation stage which includes a cylindrical substrate used to form micro-patterns of various arbitrary shapes on a large-area semiconductor substrate or display panel substrate, a cylindrical substrate, a combination of a first permanent magnet array and a first coil array and a combination of a first permanent magnet array and a first coil array, which are coupled to the cylindrical substrate, so that levitation, axial translation and rotation of the cylindrical substrate can be made finely through the control of a magnetic force generated by the interaction between a magnetic field generated by electric current applied to the coil arrays and a magnetic field generated from the permanent magnet arrays corresponding to the coil arrays.

摘要翻译： 本发明提供一种圆柱形磁悬浮台，其包括用于在大面积半导体基板或显示面板基板上形成各种任意形状的微图形的圆柱形基板，圆柱形基板，第一永久磁铁阵列和 第一线圈阵列和第一永磁体阵列和第一线圈阵列的组合，其耦合到圆柱形基板，从而可以通过控制产生的磁力来使得圆柱形基板的悬浮，轴向平移和旋转精细化 通过由施加到线圈阵列的电流产生的磁场与对应于线圈阵列的永磁体阵列产生的磁场之间的相互作用。