INTEGRATED SHADOW MASK/CARRIER FOR PATTERN ION IMPLANTATION
    1.
    发明申请
    INTEGRATED SHADOW MASK/CARRIER FOR PATTERN ION IMPLANTATION 审中-公开
    集成阴影掩模/载体为模式离子植入

    公开(公告)号:US20120244692A1

    公开(公告)日:2012-09-27

    申请号:US13489031

    申请日:2012-06-05

    IPC分类号: H01L21/266

    摘要: An improved, lower cost method of processing substrates, such as to create solar cells is disclosed. In addition, a modified substrate carrier is disclosed. The carriers typically used to carry the substrates are modified so as to serve as shadow masks for a patterned implant. In some embodiments, various patterns can be created using the carriers such that different process steps can be performed on the substrate by changing the carrier or the position with the carrier. In addition, since the alignment of the substrate to the carrier is critical, the carrier may contain alignment features to insure that the substrate is positioned properly on the carrier. In some embodiments, gravity is used to hold the substrate on the carrier, and therefore, the ions are directed so that the ion beam travels upward toward the bottom side of the carrier.

    摘要翻译: 公开了一种改进的,低成本的处理衬底的方法,例如制造太阳能电池。 此外,公开了改进的基板载体。 通常用于承载衬底的载体被修改为用作图案化植入物的荫罩。 在一些实施例中,可以使用载体创建各种图案,使得可以通过用载体改变载体或位置来在基板上执行不同的工艺步骤。 此外,由于基板与载体的对准是关键的,所以载体可以包含对准特征以确保基板正确地定位在载体上。 在一些实施例中,使用重力来将衬底保持在载体上,因此,引导离子使得离子束朝向载体的底侧向上移动。

    SUBSTRATE IDENTIFICATION AND TRACKING THROUGH SURFACE REFLECTANCE
    2.
    发明申请
    SUBSTRATE IDENTIFICATION AND TRACKING THROUGH SURFACE REFLECTANCE 有权
    通过表面反射识别和跟踪基板

    公开(公告)号:US20120183199A1

    公开(公告)日:2012-07-19

    申请号:US13006545

    申请日:2011-01-14

    IPC分类号: G06K9/00

    摘要: A method of identifying individual silicon substrates, and particularly solar cells, is disclosed. Every solar cell possesses a unique set of optical properties. The method identifies these properties and stores them in a database, where they can be associated to a particular solar cell. Unlike conventional tracking techniques, the present method requires no dedicated space on the surface of the silicon substrate. This method allows substrates to be tracked through the manufacturing process, as well as throughout the life of the substrate.

    摘要翻译: 公开了一种识别单个硅衬底,特别是太阳能电池的方法。 每个太阳能电池都具有独特的光学特性。 该方法识别这些属性并将其存储在数据库中,并将其与特定的太阳能电池相关联。 与传统跟踪技术不同,本方法不需要硅衬底表面上的专用空间。 该方法允许通过制造过程以及在基板的整个寿命期间跟踪基板。

    STRING CACHE FILE FOR OPTIMIZING MEMORY USAGE IN A JAVA VIRTUAL MACHINE
    3.
    发明申请
    STRING CACHE FILE FOR OPTIMIZING MEMORY USAGE IN A JAVA VIRTUAL MACHINE 有权
    用于优化JAVA虚拟机中的内存使用的STRING CACHE文件

    公开(公告)号:US20120017204A1

    公开(公告)日:2012-01-19

    申请号:US12839330

    申请日:2010-07-19

    IPC分类号: G06F9/45

    摘要: A method, system and computer program product for optimizing memory usage associated with duplicate string objects in a Java virtual machine. The method comprises scanning a heap of the Java virtual machine at the end of the start-up process of the virtual machine to identify duplicate strings associated with the virtual machine, storing the identified strings in a string cache file, and determining whether a new string that needs to be created during start-up already exists in the string cache file. The duplicate strings are added to an interned strings table. A reference to a duplicate string is returned if a string to be created is already in the string cache file.

    摘要翻译: 一种用于优化与Java虚拟机中的重复字符串对象相关联的内存使用的方法,系统和计算机程序产品。 该方法包括在虚拟机的启动过程结束时扫描Java虚拟机的堆,以识别与虚拟机相关联的重复字符串,将所识别的字符串存储在字符串高速缓存文件中,以及确定是否新的字符串 在启动过程中需要创建的字符串缓存文件中已经存在。 重复的字符串将添加到interned字符串表中。 如果要创建的字符串已经在字符串缓存文件中,则返回对重复字符串的引用。

    Ion beam contamination determination
    4.
    发明申请
    Ion beam contamination determination 有权
    离子束污染测定

    公开(公告)号:US20070241276A1

    公开(公告)日:2007-10-18

    申请号:US11289885

    申请日:2005-11-30

    IPC分类号: B01D59/44

    摘要: A system, method and program product for determining contamination of an ion beam are disclosed. In the event of an isobaric interference, or near isobaric interference between a contaminant ion and an expected ion of an ion beam, which is difficult to detect, it is possible to measure a third ion in the ion beam and estimate, based on the amount of the third ion measured, a relative amount of the contaminant ion compared to the expected ion. The estimated relative amount of the contaminant ion is used together with a measured mass resolution of the ion implantation system to determine whether an ion implantation process needs to be suspended.

    摘要翻译: 公开了一种用于确定离子束污染的系统,方法和程序产品。 在难以检测的等离子体干扰或离子束的预期离子之间的等压干扰或接近等压干扰的情况下,可以测量离子束中的第三离子并基于量 测量的第三离子,与预期离子相比的污染物离子的相对量。 污染物离子的估计相对量与离子注入系统的测量质量分辨率一起使用以确定离子注入过程是否需要暂停。

    Insulator system for a terminal structure of an ion implantation system
    5.
    发明申请
    Insulator system for a terminal structure of an ion implantation system 有权
    用于离子注入系统的端子结构的绝缘体系统

    公开(公告)号:US20070235663A1

    公开(公告)日:2007-10-11

    申请号:US11394824

    申请日:2006-03-31

    IPC分类号: G21G5/00

    摘要: An ion implantation system includes an ion source configured to provide an ion beam, a terminal structure defining a cavity, the ion source at least partially disposed within the cavity, and an insulator system. The insulator system is configured to electrically insulate the terminal structure and is configured to provide an effective dielectric strength greater than about 72 kilovolts (kV)/inch in a region proximate at least one exterior surface of the terminal structure. A gas box insulator system to electrically insulate a gas box of the ion implantation system is also provided.

    摘要翻译: 离子注入系统包括被配置为提供离子束的离子源,限定空腔的端子结构,至少部分地设置在空腔内的离子源和绝缘体系统。 绝缘体系统被配置为使端子结构电绝缘并且被配置为在靠近端子结构的至少一个外表面的区域中提供大于约72千伏(kV)/英寸的有效介电强度。 还提供了一种用于对离子注入系统的气体箱进行电绝缘的气体箱绝缘体系统。

    Technique for improving ion implanter productivity
    6.
    发明申请
    Technique for improving ion implanter productivity 有权
    提高离子注入机生产率的技术

    公开(公告)号:US20070045570A1

    公开(公告)日:2007-03-01

    申请号:US11394825

    申请日:2006-03-31

    IPC分类号: H01J37/317

    摘要: A technique for improving ion implanter productivity is disclosed. In one particular exemplary embodiment, the technique may be realized as a method for improving productivity of an ion implanter having an ion source chamber. The method may comprise supplying a gaseous substance to the ion source chamber, the gaseous substance comprising one or more reactive species for generating ions for the ion implanter. The method may also comprise stopping the supply of the gaseous substance to the ion source chamber. The method may further comprise supplying a hydrogen containing gas to the ion source chamber for a period of time after stopping the supply of the gaseous substance.

    摘要翻译: 公开了一种改善离子注入机生产率的技术。 在一个特定的示例性实施例中,该技术可以被实现为用于提高具有离子源室的离子注入机的生产率的方法。 该方法可以包括向离子源室供应气态物质,该气态物质包含用于产生用于离子注入机的离子的一种或多种反应性物质。 该方法还可以包括停止向离子源室供应气态物质。 该方法还可以包括在停止供应气态物质后的一段时间内向离子源室供应含氢气体。

    String cache file for optimizing memory usage in a java virtual machine
    7.
    发明授权
    String cache file for optimizing memory usage in a java virtual machine 有权
    用于优化Java虚拟机中内存使用情况的字符串缓存文件

    公开(公告)号:US08839215B2

    公开(公告)日:2014-09-16

    申请号:US12839330

    申请日:2010-07-19

    IPC分类号: G06F9/45 G06F9/455 G06F9/50

    摘要: A method, system and computer program product for optimizing memory usage associated with duplicate string objects in a Java virtual machine. The method comprises scanning a heap of the Java virtual machine at the end of the start-up process of the virtual machine to identify duplicate strings associated with the virtual machine, storing the identified strings in a string cache file, and determining whether a new string that needs to be created during start-up already exists in the string cache file. The duplicate strings are added to an interned strings table. A reference to a duplicate string is returned if a string to be created is already in the string cache file.

    摘要翻译: 一种用于优化与Java虚拟机中的重复字符串对象相关联的内存使用的方法,系统和计算机程序产品。 该方法包括在虚拟机的启动过程结束时扫描Java虚拟机的堆,以识别与虚拟机相关联的重复字符串,将所识别的字符串存储在字符串高速缓存文件中,以及确定是否新的字符串 在启动过程中需要创建的字符串缓存文件中已经存在。 重复的字符串将添加到interned字符串表中。 如果要创建的字符串已经在字符串缓存文件中,则返回对重复字符串的引用。

    Integrated Shadow Mask/Carrier for Pattern Ion Implantation
    8.
    发明申请
    Integrated Shadow Mask/Carrier for Pattern Ion Implantation 失效
    用于图案离子植入的集成阴影掩模/载体

    公开(公告)号:US20120083102A1

    公开(公告)日:2012-04-05

    申请号:US12895927

    申请日:2010-10-01

    IPC分类号: H01L21/71 H01J37/20

    摘要: An improved, lower cost method of processing substrates, such as to create solar cells is disclosed. In addition, a modified substrate carrier is disclosed. The carriers typically used to carry the substrates are modified so as to serve as shadow masks for a patterned implant. In some embodiments, various patterns can be created using the carriers such that different process steps can be performed on the substrate by changing the carrier or the position with the carrier. In addition, since the alignment of the substrate to the carrier is critical, the carrier may contain alignment features to insure that the substrate is positioned properly on the carrier. In some embodiments, gravity is used to hold the substrate on the carrier, and therefore, the ions are directed so that the ion beam travels upward toward the bottom side of the carrier.

    摘要翻译: 公开了一种改进的,低成本的处理衬底的方法,例如制造太阳能电池。 此外,公开了改进的基板载体。 通常用于承载衬底的载体被修改为用作图案化植入物的荫罩。 在一些实施例中,可以使用载体创建各种图案,使得可以通过用载体改变载体或位置来在基板上执行不同的工艺步骤。 此外,由于基板与载体的对准是关键的,所以载体可以包含对准特征以确保基板正确地定位在载体上。 在一些实施例中,使用重力来将衬底保持在载体上,因此,引导离子使得离子束朝向载体的底侧向上移动。

    Indirectly heated cathode clamp system and method
    10.
    发明授权
    Indirectly heated cathode clamp system and method 有权
    间接加热阴极夹系统及方法

    公开(公告)号:US07887034B2

    公开(公告)日:2011-02-15

    申请号:US11194260

    申请日:2005-08-01

    IPC分类号: B25B3/00

    摘要: A method and clamp system for use on an ion implanter system for aligning a cathode and filament relative to one another in-situ are disclosed. The invention includes a clamp system having a clamp including a first clamp member separably coupled to a second clamp member, and an opening to a mount portion of one of the cathode and the filament in at least one of the clamp members. Each clamp member includes a surface to engage a mount portion of one of the cathode and the filament. The opening is adapted to receive a positioning tool to position the cathode and the filament relative to one another by moving the mount portion when the clamp is released. The mount portion may include a tool receiving member to facilitate accurate positioning.

    摘要翻译: 公开了一种用于离子注入机系统的方法和夹紧系统,用于将阴极和细丝相对于彼此原位排列。 本发明包括具有夹具的夹具系统,该夹具包括可分离地联接到第二夹紧构件的第一夹紧构件以及至少一个夹紧构件中的阴极和细丝之一的安装部分的开口。 每个夹持构件包括与阴极和细丝之一的安装部分接合的表面。 开口适于接收定位工具以通过在夹具被释放时移动安装部分来相对于彼此定位阴极和灯丝。 安装部分可以包括工具接收构件以便于精确定位。