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公开(公告)号：US4801241A
公开(公告)日：1989-01-31
申请号：US588029
申请日：1984-03-09
IPC分类号： H01L21/677 , B23Q41/02 , B23Q41/04 , B65G49/07 , H01L21/00 , H01L21/02 , H01L21/302 , H01L21/3065 , H01L21/67 , C23C14/00
CPC分类号： H01L21/67196 , H01L21/67276 , Y10S414/139
摘要： Automated article processing, particularly semiconductor wafer processing, is accomplished in a modular article processing machine. The design of the machine allows easy reconfiguration between single and multiple processing station systems. Articles are handled according to a method which easily accommodates the various configurations of the machine and which provides efficient throughput. The machine includes a number of electromechanical and pneumatic systems under the control of at least one microprocessor. Machine state knowledge necessary for startup in the midst of operation, such as following a power interruption, is provided by a mechanical counter indexed at the completion of each stage of operation by the microprocessor controller.
摘要翻译： 自动制品处理，特别是半导体晶片处理，在模块化制品处理机中完成。 机器的设计允许单个和多个处理站系统之间的简单重新配置。 根据容易适应机器的各种配置并且提供有效吞吐量的方法来处理物品。 该机器包括在至少一个微处理器的控制下的许多机电和气动系统。 通过由微处理器控制器在每个操作阶段完成时由索引的机械计数器提供在操作中所需的机器状态知识（例如电源中断之后）。
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公开(公告)号：US4619573A
公开(公告)日：1986-10-28
申请号：US588030
申请日：1984-03-09
IPC分类号： B65G47/90 , H01L21/67 , H01L21/677 , H01L21/687 , B65G25/00
CPC分类号： H01L21/68742 , H01L21/67745 , H01L21/67748 , H01L21/67778 , H01L21/68785 , H01L21/68792
摘要： Wafer transport in the vacuum portion of an automated wafer processing machine is accomplished by means of an improved transport mechanism. The primary transport device is a rail guided, magnetically driven shuttle plate. Baffles serve to isolate the particle producing portions of the mechanism from the wafers. The major drive components are located inside the rails and outside the vacuum containment system. A pin lift apparatus located on the reactor chucks serves to remove and replace wafers on the shuttle plate. The disclosed apparatus provides efficient and reliable wafer transport with a minimum amount of particulate generation and is easily reconfigurable to single or multiple head machines.
摘要翻译： 在自动化晶片加工机的真空部分中的晶片传送通过改进的输送机构实现。 主要运输装置是导轨导向的穿梭板。 挡板用于将晶片的产生颗粒的部分与晶片隔离。 主要的驱动部件位于导轨内部和真空容纳系统的外部。 位于反应器卡盘上的销钉提升装置用于移除和更换梭板上的晶片。 所公开的装置提供了具有最少量的颗粒产生的有效且可靠的晶片输送，并且可以容易地重新配置成单头或多头机。
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公开(公告)号：US06772825B2
公开(公告)日：2004-08-10
申请号：US10287317
申请日：2002-11-04
IPC分类号： F28F700
CPC分类号： A61F7/0053 , A61F7/0097 , A61F2007/0058 , A61F2007/0246 , F28D15/0241
摘要： A support surface for patient comfort, maintaining a cool skin temperature, or reducing the incidence and promoting the healing of bedsores, includes: (a) a central portion including a hollow, enclosed bladder containing a pre-determined amount of liquid refrigerant with a boiling point between about 23 and about 35 degrees Centigrade; (b) a flexible spacer mechanism contained in the bladder, the spacer mechanism separating an upper bladder wall from a lower bladder wall; and (c) conductive end portions attached to opposite ends of the bladder, the conductive end portions including a flexible heat conductive material layer.
摘要翻译： 用于患者舒适的保持表面，保持凉爽的皮肤温度或降低发生率并促进褥疮的愈合，包括：（a）中心部分，包括中空封闭的膀胱，其中含有预定量的液体制冷剂，其沸腾 点在约23度至约35摄氏度之间;（b）包含在囊中的柔性间隔器机构，间隔器机构将上囊壁与下囊壁分开; 和（c）导电端部，其连接到所述囊的相对端，所述导电端部包括柔性导热材料层。
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公开(公告)号：US4786359A
公开(公告)日：1988-11-22
申请号：US65746
申请日：1987-06-24
IPC分类号： C23F4/00 , H01J37/32 , H01L21/3065 , C03C15/00
CPC分类号： H01J37/32082 , H01J37/3255 , H01L21/3065 , H01J2237/3347
摘要： A plasma etch process and apparatus is disclosed in which a gas mixture comprises CF.sub.3 Br, xenon or krypton, and oxygen. The plasma reactor includes a sacrificial element, preferably in the form of a graphite ring, on the lower electrode of a parallel plate reactor.
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公开(公告)号：US4790258A
公开(公告)日：1988-12-13
申请号：US34121
申请日：1987-04-03
IPC分类号： H01L21/687 , B05C13/00
CPC分类号： H01L21/68742 , Y10S414/135
摘要： An improved pin lift mechanism for plasma processing of semiconductor wafers is disclosed in which the pins are each contained in a non-magnetic tube which is sealed to the wafer chuck. A magnetic slug in each tube couples external motion of a magnet to the pin.
摘要翻译： 公开了一种用于半导体晶片等离子体处理的改进的引脚提升机构，其中每个引脚均包含在密封于晶片卡盘的非磁性管中。 每个管中的磁芯将磁体的外部运动耦合到引脚。
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公开(公告)号：US4724510A
公开(公告)日：1988-02-09
申请号：US941234
申请日：1986-12-12
IPC分类号： H01L21/683 , H01H1/06
CPC分类号： H01L21/6833
摘要： A wafer clamp is disclosed in which a high voltage capacitor is formed on a semiconductor wafer, which rests on a conductive support. The plates of the capacitor comprise a plurality of concentric rings formed on the surface of the wafer with alternate rings connected together.
摘要翻译： 公开了一种晶片钳，其中在半导体晶片上形成高电压电容器，其位于导电支撑件上。 电容器的板包括形成在晶片表面上的多个同心环，其中交替的环连接在一起。
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公开(公告)号：US4547248A
公开(公告)日：1985-10-15
申请号：US588854
申请日：1984-03-12
IPC分类号： C23F4/00 , B01J12/00 , C23C16/455 , H01J37/32 , H01L21/00 , H01L21/302 , H01L21/3065 , B44C1/22 , C03C15/00
CPC分类号： H01L21/67011 , B01J12/002 , C23C16/455 , H01J37/3244
摘要： A plasma reactor system is described in which modularity is enhanced through automatic shutoff valves for gas lines, enabling components to be exchanged readily. Gas lines are routed through a connector at a predetermined location for all modules. The connector comprises a valve member for each line.
摘要翻译： 描述了一种等离子体反应器系统，其中通过用于气体管线的自动截止阀增强了模块化，使得能够容易地更换部件。 气体管线通过连接器在所有模块的预定位置布线。 连接器包括用于每条线的阀构件。
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