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    Dental materials with improved hydrolysis stability based on phthalic acid monomers
    3.
    发明申请
    Dental materials with improved hydrolysis stability based on phthalic acid monomers 有权
    具有改善的基于邻苯二甲酸单体的水解稳定性的牙科材料

    公开(公告)号：US20130090404A1

    公开(公告)日：2013-04-11

    申请号：US13630491

    申请日：2012-09-28

    Applicant: Thorsten BOCK ,  Urs Karl FISCHER ,  Iris LAMPARTH ,  Norbert MOSZNER ,  Volker RHEINBERGER

    Inventor： Thorsten BOCK ,  Urs Karl FISCHER ,  Iris LAMPARTH ,  Norbert MOSZNER ,  Volker RHEINBERGER

    IPC: A61K6/083

    CPC classification number: A61K6/0023 ,  A61K6/083 ,  C08L33/24

    Abstract: Dental material which contains a polymerizable phthalic acid derivative of the general Formula I: with R1═H, methyl or a C1-C5 alkyl residue; R2═H, a phenyl, benzyl or C1-C8 alkyl residue; Q1=is absent or is a C1-C15 alkylene residue, wherein the carbon chain can be interrupted by O or S; Q2=is absent or a (n+1)-valent aliphatic C1-C20 residue, wherein the carbon chain can be interrupted by O or S and wherein Q1 and Q2 cannot be absent simultaneously; X=is absent, is O, S or (—CO—NR4—)—, wherein R4 is H, CH3 or C2H5; Y=is absent, is O, S or (—CO—NR5—)—, wherein R5 is H, CH3 or C2H5; n, m=independently of one another in each case mean 1, 2 or 3; R3═H, CH3, C2H5, Cl, Br or OCH3, and wherein the two carboxyl groups of the benzene ring can together form an anhydride group.

    Abstract translation: 含有通式I的可聚合邻苯二甲酸衍生物的牙科材料：其中R 1 = H，甲基或C 1 -C 5烷基残基; R2 = H，苯基，苄基或C1-C8烷基残基; Q1 =不存在或是C1-C15亚烷基残基，其中碳链可被O或S间隔; Q2 =不存在或（n + 1）价的脂族C1-C20残基，其中碳链可以被O或S中断，并且其中Q1和Q2不能同时存在; X =不存在，为O，S或（-CO-NR 4 - ） - ，其中R 4为H，CH 3或C 2 H 5; Y =不存在，是O，S或（-CO-NR 5 - ） - ，其中R 5是H，CH 3或C 2 H 5; 在每种情况下，n，m =彼此独立，意指1,2或3; R3 = H，CH3，C2H5，Cl，Br或OCH3，其中苯环的两个羧基可以一起形成酸酐基团。

    Polymerizable bicyclic cyclopropane derivatives and their use for the preparation of dental materials
    8.
    发明授权
    Polymerizable bicyclic cyclopropane derivatives and their use for the preparation of dental materials 有权
    可聚合双环环丙烷衍生物及其在牙科材料制备中的应用

    公开(公告)号：US07585901B2

    公开(公告)日：2009-09-08

    申请号：US11752652

    申请日：2007-05-23

    Applicant: Norbert Moszner ,  Armin de Meijere ,  Frank Zeuner ,  Urs Karl Fischer

    Inventor： Norbert Moszner ,  Armin de Meijere ,  Frank Zeuner ,  Urs Karl Fischer

    IPC: A61K6/083 ,  A61C5/00 ,  C08F232/08

    CPC classification number: A61K6/0023 ,  A61K6/0017 ,  A61K6/083 ,  A61K6/09 ,  C07C69/608 ,  C07C69/675 ,  C07C69/716 ,  C07C271/28 ,  C07C2602/18 ,  C07D307/93 ,  C07D311/94 ,  C07D335/04 ,  C08L33/00 ,  C08L75/16

    Abstract: Bicyclic cyclopropane derivatives of the general Formula (I) in which n+m is 0 to 8; r is 1 to 4; R1 is absent or is a C1-C20 alkylene radical which can be interrupted by O or S, a cycloaliphatic C4-C12 radical, a bicyclic C4-C12 radical, a C6-C14 arylene or C7-C20 alkylenearylene radical; R2 is for r=1 a C1-C20 alkyl radical which can be interrupted by O or S, a cycloaliphatic C4-C12 radical, a bicyclic C4-C12 radical, a C6-C14 aryl or a C7-C20 alkylaryl radical; is for r>1 an r-times substituted aliphatic C1 to C20 radical which can be interrupted by O or S, a cycloaliphatic C4-C12 radical, an aromatic C6-C14 radical or aliphatic-aromatic C7-C20 radical; X is absent or is —CO—O—, —CO—NH— or —O—CO—NH—, and Y is CH2, O or S which is suitable in particular for the preparation of dental materials.

    Abstract translation: 通式（I）的双环环丙​​烷衍生物，其中n + m为0至8; r为1〜4; R1不存在或是可被O或S间隔的C 1 -C 20亚烷基，脂环族C 4 -C 12基团，双环C 4 -C 12基团，C 6 -C 14亚芳基或C 7 -C 20亚烷基亚芳基基团; R2为r = 1，可被O或S间隔的C1-C20烷基，脂环族C 4 -C 12基，双环C 4 -C 12基，C 6 -C 14芳基或C 7 -C 20烷基芳基; 对于r> 1，可以被O或S间隔的r-次取代的脂族C1至C20基团，脂环族C 4 -C 12基团，芳族C 6 -C 14基团或脂族 - 芳族C 7 -C 20基团; X不存在或是-CO-O-，-CO-NH-或-O-CO-NH-，Y是CH2，O或S，其特别适用于制备牙科材料。

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