公开(公告)号：US06778272B2

公开(公告)日：2004-08-17

申请号：US09760704

申请日：2001-01-17

申请人： Hiroyuki Nakano ,  Toshihiko Nakata ,  Masayoshi Serizawa

发明人： Hiroyuki Nakano ,  Toshihiko Nakata ,  Masayoshi Serizawa

IPC分类号： H01L2100

CPC分类号： H01J37/32082 ,  H01J37/32935 ,  H01J2237/0225

摘要： A method of processing a semiconductor device is provided with several steps, including the step of generating plasma in a processing chamber to form or process a thin firm on a semiconductor device. The step of scanning, through a window, intensity modulated laser beam, which is modulated at a desired frequency inside the processing chamber where the semiconductor device is being processed. The step of receiving by a sensor through the window a back scattered light being scattered from fine particles suspended in the processing chamber by the scanning laser and detecting the desired frequency component from a signal outputted from the sensor. From the detected frequency component information relating to quantity, size, and distribution of the fine particles illuminated by the laser beam inside the processing chamber is obtained. This information is then outputted.

摘要翻译： 提供半导体器件的处理方法有几个步骤，包括在处理室中产生等离子体以在半导体器件上形成或处理薄的固体的步骤。 通过窗口扫描在被处理半导体器件的处理室内的所需频率下调制的强度调制激光束的步骤。 由传感器通过窗口接收由扫描激光从悬浮在处理室中的细颗粒散射的背散射光并从传感器输出的信号中检测所需频率分量的步骤。 从与处理室内的激光束照射的微粒子的数量，大小，分布有关的检测频率成分信息得到。 然后输出该信息。

公开(公告)号：US07355143B1

公开(公告)日：2008-04-08

申请号：US09763735

申请日：1999-12-27

申请人： Hiroyuki Nakano ,  Toshihiko Nakata ,  Masayoshi Serizawa ,  Hideaki Sasazawa

发明人： Hiroyuki Nakano ,  Toshihiko Nakata ,  Masayoshi Serizawa ,  Hideaki Sasazawa

IPC分类号： B23K10/00 ,  B23K26/00

CPC分类号： G01N15/0227 ,  G01N15/0211 ,  G01N2015/0216

摘要： Making it possible to execute the detection of the particles floating inside a processing chamber with the use of an optical system including one observing window and one unit (An object of the present invention is, by using an optical system including one observing window and one unit, to make it possible to execute the detection of the particles floating inside a processing chamber.) Also, in order to be able to detect exceedingly feeble particle scattered-lights with a high-accuracy, when performing a desired thin-film forming or thin-film processing treatment toward a to-be-processed target inside the processing chamber, the following method is employed: First, the irradiation with a beam is executed into the processing chamber through the observing window. Here, the beam is P-polarized and is intensity-modulated with a frequency differing from an exciting source's frequency and its integer-multiples, and the observing window has an inclination that forms Brewster angle toward the P-polarized incident beam. Next, backward scattered-lights scattered by the particles inside the processing chamber are received and image-photographed at a detecting optical system through the above-described one and the same observing window. Moreover, the above-described frequency component and a wavelength component of the above-described intensity-modulated beam are detected out of the received signals. Finally, the detected components and the image-photographed image information are used so as to judge the number, the size, and the distribution of the particles.

摘要翻译： 通过使用包括一个观察窗口和一个单元的光学系统，可以执行浮动在处理室内的颗粒的检测。本发明的目的是通过使用包括一个观察窗口和一个单元的光学系统 ，使得可以执行浮在处理室内的颗粒的检测。）此外，为了能够以高精度检测到极度​​微弱的粒子散射光，当进行所需的薄膜形成或薄 对处理室内的待处理靶材进行膜处理，采用以下方法：首先，通过观察窗口将光束照射进入处理室。 这里，光束是P偏振光并且以不同于激发光源的频率和其整数倍的频率进行强度调制，并且观察窗口具有朝向P偏振入射光束形成布鲁斯特角的倾斜度。 接下来，通过上述同一观察窗口，在检测光学系统中接收并处理由处理室内的颗粒散射的向后散射光并进行图像拍摄。 此外，从接收信号中检测出上述强度调制波束的上述频率分量和波长分量。 最后，使用检测到的分量和图像拍摄图像信息来判断粒子的数量，大小和分布。