PHOTOPOLYMER FORMULATION HAVING ESTER-BASED WRITING MONOMERS
    4.
    发明申请
    PHOTOPOLYMER FORMULATION HAVING ESTER-BASED WRITING MONOMERS 有权
    具有基于酯基的书写单体的光聚合物配方

    公开(公告)号:US20120302659A1

    公开(公告)日:2012-11-29

    申请号:US13576723

    申请日:2011-01-28

    IPC分类号: C08L75/04

    摘要: The invention relates to a photopolymer formulation comprising matrix polymers, writing monomers, and photoinitiators, wherein the writing monomers comprise compounds of formula (I), where at least one of the radicals R1, R2, R3, R4, R5, R6 is a radical bonded to the aromatic ring via X of formula (II), where, in formula (II), A is a linear or branched hydrocarbon, optionally comprising oxygen or nitrogen, the remaining radicals R1, R2, R3, R4, R5, R6 are, independent of each other, hydrogen or an organic radical, and R7 is hydrogen or methyl. The invention further relates to the use of the photopolymer formulation for producing holographic media.

    摘要翻译: 本发明涉及包含基质聚合物,书写单体和光引发剂的光聚合物制剂,其中书写单体包括式(I)化合物,其中基团R 1,R 2,R 3,R 4,R 5,R 6中的至少一个是基团 通过式(II)的X键合到芳香环,其中在式(II)中,A是任选地包含氧或氮的直链或支链烃,其余基团R 1,R 2,R 3,R 4,R 5,R 6是 ,彼此独立地为氢或有机基团,并且R 7为氢或甲基。 本发明还涉及光聚合物制剂用于生产全息介质的用途。

    METHOD FOR PRODUCING A HOLOGRAPHIC FILM
    7.
    发明申请
    METHOD FOR PRODUCING A HOLOGRAPHIC FILM 有权
    生产全息膜的方法

    公开(公告)号:US20120214089A1

    公开(公告)日:2012-08-23

    申请号:US13504563

    申请日:2010-11-02

    IPC分类号: G03H1/04 G03F7/004

    摘要: The invention relates to a method for producing holographic films, in which a photopolymer formulation is provided which comprises as constituents matrix polymers, writing monomers, a photoinitiatior system, optionally a non-photopolymerizable component and optionally catalysts, radical stabilizers, solvents, additives and other auxiliaries and/or additives. The photopolymer formulation is applied in a planar manner and in the form of a film on a support film and the photopolymer formulation is dried on the support film at a temperature 60 100 DEG C and are above the temperature T by at least 30 DEG C, and a photopolymer formulation having a plateau module of =0.030 MPa is used.

    摘要翻译: 本发明涉及一种生产全息膜的方法,其中提供了一种光聚合物配方,其包含基质聚合物,书写单体,光引发体系,任选的不可光聚合的组分和任选的催化剂,自由基稳定剂,溶剂,添加剂和其它组分 助剂和/或添加剂。 将光聚合物配方以平面方式并以薄膜的形式施加在支撑膜上,并将光聚合物配方在60℃<120℃的温度下在载体膜上干燥,其中仅选择化合物作为 光聚合物配方,其TGA 95值> 100℃,温度T高于至少30℃,并且使用具有= 0.030MPa的平台模块的光聚合物配方。