Fabrication of integrated microcircuits utilizing dielectric p-n-junction isolation
    1.
    发明授权
    Fabrication of integrated microcircuits utilizing dielectric p-n-junction isolation 失效
    使用电介质P-N-JUNCTION隔离的集成微型计算机的制造

    公开(公告)号:US3725146A

    公开(公告)日:1973-04-03

    申请号:US3725146D

    申请日:1970-11-12

    发明人: RODER M

    摘要: A SEMICONDUCTOR DEVICE FOR INTEGRATED MICROCIRCUITS HAVING A NUMBER OF FUNCTIONAL ELEMENTS, INCLUDES A SEMICONDUCTOR SUBSTREAM, A DIELECTRIC INSULATION LAYER DISPOSED ON THE SUBSTRATUM, LOW-OHMIC HIGHLY DOPED SEMICONDUCTIVE LAYERS LOCATED IN THE REGIONS OF RESPECTIVE FUNCTIONAL ELEMENTS. A DIELECTRIC INSULATION LAYER COATS THE BOTTOM AND SIDE SURFACES OF THE LOW-OHMIC LAYERS, WITH THE THICKNESS OF THE DIELECTRIC INSULATION LAYER BEING GREATER IN THE REGIONS BETWEEN THE LOQ-OHMIC LAYER. SEMICONDUCTIVE BODY LAYERS ADJOIN THE OPEN UPPER SURFACE OF THE LOW-OHMIC LAYERS AND OVERLAP THE OPEN UPPER SURFACE OF TOP SURFACE OF THE SIDE PORTIONS OF THE DIELECTRIC INSULATION LAYER. THE SEMICONDUCTIVE BODY LAYERS HAVE THE SAME TYPE OF CONDUCTIVITY AS THE LOW-OHMIC LAYERS. P-N JUNCTIONS DISPOSED ON THE DIELECTRIC INSULATION LAYER FORM LATERAL INSULATION FRAMES AROUND RESPECTIVE SEMICONDUCTIVE BODY LAYERS. THIRD INSULATING LAYERS ARE PROVIDED ON THE UPPER SURFACE OF RESPECTIVE FUNCTIONAL ELEMENTS.

    Method and electronic circuit arrangement for producing photomasks
    2.
    发明授权
    Method and electronic circuit arrangement for producing photomasks 失效
    用于生产光电子的方法和电子电路布置

    公开(公告)号:US3716296A

    公开(公告)日:1973-02-13

    申请号:US3716296D

    申请日:1970-05-06

    IPC分类号: G03F7/20 G03B27/42

    CPC分类号: G03F7/70425 G03F7/70433

    摘要: A method and electronic circuit arrangement for producing photomasks comprising repetitive patterns of any desired size regardless of the size of the image field of an optical projection system. According to the present method an orthogonal mask field is displaced to initial coordinates Xi, Yi relative to a fixed column and row coordinate system, a plurality of such mask fields, each having different repetitive patterns, are arranged on a photographic plate displaced relative to each other, such mask fields are then assembled into a complex pattern mask field. The present circuit arrangement comprises control signal generating means for controlling a tool such as an optical projection system as well as positioning means for said tool or for said photographic plate. The signal generating means include a spacing counter connected to preselector units adjustable for selecting said initial coordinates, said units being connected to logic circuit channels which identify the signals produced at the outputs of said preselector units to provide control signals for the optical projection system and for the positioning means.

    摘要翻译: 一种用于生产光掩模的方法和电子电路装置,其包括任何所需尺寸的重复图案,而与光学投影系统的像场的大小无关。 根据本方法,相对于固定列和行坐标系,正交掩模场被移位到初始坐标Xi,Yi,每个具有不同重复图案的多个这样的掩模场被布置在相对于每个位置移动的照相板上 其他的,这样的掩模字段然后被组装成一个复杂的模式掩码字段。 本电路装置包括用于控制诸如光学投影系统的工具的控制信号产生装置以及用于所述工具或所述照相板的定位装置。 信号发生装置包括一个间隔计数器,连接到可选择所述初始坐标的预选器单元,所述单元连接到逻辑电路通道,逻辑电路通道识别在所述预选器单元的输出处产生的信号,以提供用于光学投影系统的控制信号 定位装置。

    Circuit arrangement with semiconductor elements
    3.
    发明授权
    Circuit arrangement with semiconductor elements 失效
    电路与半导体元件的布置

    公开(公告)号:US3562548A

    公开(公告)日:1971-02-09

    申请号:US3562548D

    申请日:1968-04-05

    发明人: ARMGARTH DIETRICH

    IPC分类号: H03K19/013 H03K19/40

    CPC分类号: H03K19/013

    摘要: A switching circuit for performing logic operations in which the collector electrodes of a plurality of input transistors are joined into a nodal point and the emitter electrodes are connected in parallel while the base electrodes serve as separate inputs. The nodal point is then connected to the collector electrode of an inversely operated multiemitter transistor, the base electrode of which is returned to a source of potential while the emitter electrodes thereof form output terminals.

    Method for the production of masks in the manufacture of semiconductor components
    4.
    发明授权
    Method for the production of masks in the manufacture of semiconductor components 失效
    半导体器件制造中掩模生产的方法

    公开(公告)号:US3723277A

    公开(公告)日:1973-03-27

    申请号:US3723277D

    申请日:1971-07-14

    发明人: SCHMIEDECKE W

    IPC分类号: H01L21/00 H01L23/29 C23C15/00

    摘要: IN A PROCESS FOR THE PRODUCTION OF MASKS IN THE MANUFACTURE OF SEMICONDUCTOR COMPONENTS, ONTO A COATED OR UNCOATED SEMICONDUCTOR SUBSTRATE IS SPUTTERED A COMPOSITION CONTAINING A SILICON OXIDE OR NITRIDE COMPOUND AT A POWER DENSITY NO GREATER THAN ABOUT 0.2 WATT PER CM.2 UNTIL A COATING THICKNESS OF AT LEAST 0.1 UM. IS ATTAINED AND THEN AT A POWER DENSITY NO GREATER THAN ABOUT 0.4 WATT PER CM.2 UNTIL THE COATING HAS ATTAINED A THICKNESS

    OF 0.3 TO 2.0 UM., THEN THE POWER DENSITY IS INCREASED TO 3 TO 5 WATTS PER CM2 TO PARTIALLY DECOMPOSE THE PHOTORESIST MASK AND TEAR OPEN THE COATING SUPERIMPOSED THEREON; THIS IS FOLLOWED BY SOLVENT AND ULTRASONIC TREATMENTS TO REMOVE THE REMAINING PHOTORESIST AND SUPERIMPOSED COATING.

    Electronic circuit arrangement for performing work steps in the production or testing of semiconductor means
    6.
    发明授权
    Electronic circuit arrangement for performing work steps in the production or testing of semiconductor means 失效
    用于在半导体器件的生产或测试中执行工作步骤的电子电路布置

    公开(公告)号:US3579071A

    公开(公告)日:1971-05-18

    申请号:US3579071D

    申请日:1969-12-23

    IPC分类号: G05B19/10 G11C29/00 G05B19/28

    CPC分类号: G11C29/006 G05B19/102

    摘要: The present invention relates to electronic circuit arrangements for performing predetermined work steps in the production or testing of semiconductor means arranged in rows and columns to form a matrix of said semiconductor means in a coordinate system with individual fields defined at intersections of said rows and columns, wherein row and column measuring and counting means generate coordinate signals which are compared with preselected coordinate digits to produce preselection signals which are channeled through logic circuits to drive means of a positioning apparatus which positions a workpiece support or a tool, for example, in a photorepeater or in a wafer prober, in accordance with the identification of the preselection signals by said logic circuits, whereby any desired extraneous structures may be arranged or tested in said matrix of semiconductor means.

    Semiconductor module and method of its production
    7.
    发明授权
    Semiconductor module and method of its production 失效
    半导体模块及其生产方法

    公开(公告)号:US3579058A

    公开(公告)日:1971-05-18

    申请号:US3579058D

    申请日:1968-02-02

    发明人: ARMGARTH DIETRICH

    摘要: A multilayer junction semiconductor device includes one semiconductive layer of a type of conductivity provided on its upper surface with a recess of a rectangular cross section. Vertical walls and corners of this recess are coated with a thin insulating layer, while the bottom thereof is open. Another semiconductive layer of an opposite type of conductivity is disposed within this recess, so that the critical PN junction area extends perpendicularly to the insulated vertical walls. The method of producing this device is based on the semiconductive layer inside said recess serving as an initial temporary substratum on which subsequent layers are precipitated.

    Semiconductor logic circuit
    9.
    发明授权

    公开(公告)号:US3562549A

    公开(公告)日:1971-02-09

    申请号:US3562549D

    申请日:1968-05-21

    发明人: TEICHMANN JUERGEN

    IPC分类号: H03K19/084 H03K19/36 H03K5/08

    CPC分类号: H03K19/084

    摘要: A plurality of diode inputs is connected through a Zener diode clipper and amplifier circuit with a subsequent output stage so that the Zener voltage determines the initial shifting voltage level. To change this initial level, a conventional negator controls a transistor connected in parallel with said clipper and amplifier circuits, and turns off the latter in dependence on the output condition.