公开(公告)号：US20230324786A1

公开(公告)日：2023-10-12

申请号：US18208188

申请日：2023-06-09

申请人： Pieter-Jan VAN ZWOL ,  Adrianus Johannes Maria GIESBERS ,  Johan Hendrik KLOOTWIJK ,  Evgenia KURGANOVA ,  Maxim Aleksandrovich NASALEVICH ,  Arnoud Willem NOTENBOOM ,  Mária PÉTER ,  Leonid Aizikovitsj SJMAENOK ,  Ties Wouter VAN DER WOORD ,  David Ferdinand VLES

发明人： Pieter-Jan VAN ZWOL ,  Adrianus Johannes Maria GIESBERS ,  Johan Hendrik KLOOTWIJK ,  Evgenia KURGANOVA ,  Maxim Aleksandrovich NASALEVICH ,  Arnoud Willem NOTENBOOM ,  Mária PÉTER ,  Leonid Aizikovitsj SJMAENOK ,  Ties Wouter VAN DER WOORD ,  David Ferdinand VLES

IPC分类号： G03F1/62

CPC分类号： G03F1/62

摘要： A pellicle for a lithographic apparatus, the pellicle including nitridated metal silicide or nitridated silicon as well as a method of manufacturing the same. Also disclosed is the use of a nitridated metal silicide or nitridated silicon pellicle in a lithographic apparatus. Also disclosed is a pellicle for a lithographic apparatus including at least one compensating layer selected and configured to counteract changes in transmissivity of the pellicle upon exposure to EUV radiation as well as a method of controlling the transmissivity of a pellicle and a method of designing a pellicle.

公开(公告)号：US20120281192A1

公开(公告)日：2012-11-08

申请号：US12741733

申请日：2008-11-03

申请人： Wilhelmus Johannes Maria De Laat ,  Cheng-Qun Gui ,  Peter Theodorus Maria Giesen ,  Marcus Theodoor Wilhelmus Van Der Heijden ,  Erwin Rinaldo Meinders ,  Mária Péter

发明人： Wilhelmus Johannes Maria De Laat ,  Cheng-Qun Gui ,  Peter Theodorus Maria Giesen ,  Marcus Theodoor Wilhelmus Van Der Heijden ,  Erwin Rinaldo Meinders ,  Mária Péter

IPC分类号： G03B27/52 ,  G01B11/24

CPC分类号： G01B11/306 ,  G01N2021/95676 ,  G03F7/703 ,  G03F7/70783 ,  G03F7/7085

摘要： A method of obtaining information indicative of the topography of a surface of a flexible substrate, the method including directing a beam of radiation at the surface of the flexible substrate; and detecting changes in intensity distribution, or angle of reflection, of the beam of radiation after the beam of radiation has been reflected from the surface of the substrate to obtain information indicative of the topography of the surface of the flexible substrate.

摘要翻译： 一种获得指示柔性基板的表面的形貌的信息的方法，所述方法包括在柔性基板的表面处引导辐射束; 并且检测在辐射束之后的辐射束的强度分布或反射角度的变化已经从衬底的表面反射，以获得指示柔性衬底的表面的形貌的信息。

公开(公告)号：US09383195B2

公开(公告)日：2016-07-05

申请号：US12741733

申请日：2008-11-03

申请人： Wilhelmus Johannes Maria De Laat ,  Cheng-Qun Gui ,  Peter Theodorus Maria Giesen ,  Marcus Theodoor Wilhelmus Van Der Heijden ,  Erwin Rinaldo Meinders ,  Mária Péter

发明人： Wilhelmus Johannes Maria De Laat ,  Cheng-Qun Gui ,  Peter Theodorus Maria Giesen ,  Marcus Theodoor Wilhelmus Van Der Heijden ,  Erwin Rinaldo Meinders ,  Mária Péter

IPC分类号： G03F7/20 ,  G01B11/30 ,  G01N21/956

CPC分类号： G01B11/306 ,  G01N2021/95676 ,  G03F7/703 ,  G03F7/70783 ,  G03F7/7085

摘要： A method of obtaining information indicative of the topography of a surface of a flexible substrate, the method including directing a beam of radiation at the surface of the flexible substrate; and detecting changes in intensity distribution, or angle of reflection, of the beam of radiation after the beam of radiation has been reflected from the surface of the substrate to obtain information indicative of the topography of the surface of the flexible substrate.

摘要翻译： 一种获得指示柔性基板的表面的形貌的信息的方法，所述方法包括在柔性基板的表面处引导辐射束; 并且检测在辐射束之后的辐射束的强度分布或反射角度的变化已经从衬底的表面反射，以获得指示柔性衬底的表面的形貌的信息。