发明授权
- 专利标题： Lithographic apparatus and method
- 专利标题（中）： 平版印刷设备和方法
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申请号： US12741733申请日： 2008-11-03
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公开(公告)号： US09383195B2公开(公告)日： 2016-07-05
- 发明人: Wilhelmus Johannes Maria De Laat , Cheng-Qun Gui , Peter Theodorus Maria Giesen , Marcus Theodoor Wilhelmus Van Der Heijden , Erwin Rinaldo Meinders , Mária Péter
- 申请人： Wilhelmus Johannes Maria De Laat , Cheng-Qun Gui , Peter Theodorus Maria Giesen , Marcus Theodoor Wilhelmus Van Der Heijden , Erwin Rinaldo Meinders , Mária Péter
- 申请人地址： NL Veldhoven
- 专利权人： ASML NETHERLANDS B.V.
- 当前专利权人： ASML NETHERLANDS B.V.
- 当前专利权人地址： NL Veldhoven
- 代理机构： Pillsbury Winthrop Shaw Pittman LLP
- 国际申请： PCT/IB2008/002977 WO 20081103
- 国际公布： WO2009/060294 WO 20090514
- 主分类号： G03F7/20
- IPC分类号： G03F7/20 ; G01B11/30 ; G01N21/956
摘要：
A method of obtaining information indicative of the topography of a surface of a flexible substrate, the method including directing a beam of radiation at the surface of the flexible substrate; and detecting changes in intensity distribution, or angle of reflection, of the beam of radiation after the beam of radiation has been reflected from the surface of the substrate to obtain information indicative of the topography of the surface of the flexible substrate.
公开/授权文献
- US20120281192A1 LITHOGRAPHIC APPARATUS AND METHOD 公开/授权日：2012-11-08
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