公开(公告)号：US07209339B2

公开(公告)日：2007-04-24

申请号：US10857068

申请日：2004-05-28

申请人： Tetsuo Kitabayashi ,  Hiroaki Hori ,  Takeshi Uchimura ,  Noriaki Tateno ,  Koh Fuwa ,  Ken Maehara

发明人： Tetsuo Kitabayashi ,  Hiroaki Hori ,  Takeshi Uchimura ,  Noriaki Tateno ,  Koh Fuwa ,  Ken Maehara

IPC分类号： H01H1/00

CPC分类号： B23Q3/15 ,  B23Q3/154 ,  H01L21/6833 ,  H02N13/00

摘要： An electrostatic chuck for attracting an insulative substrate to be processed, the electrostatic chuck comprising a dielectric layer having a first surface which attracts an insulative substrate, and a second surface on which are provided a plurality of electrodes, and an insulative support base plate fixing said dielectric layer. A distance between adjacent ones of the electrodes and the thickness of the dielectric layer are adjusted such that when a potential difference is established between the electrodes, a non-uniform electric field is formed in which the insulative substrate is partially polarized and attracted to the first surface by gradient force.

摘要翻译： 一种用于吸引待处理的绝缘基板的静电卡盘，所述静电卡盘包括具有吸引绝缘基板的第一表面的电介质层和设置有多个电极的第二表面，以及固定所述绝缘基板的绝缘支撑基板， 电介质层。 调整相邻的电极之间的距离和电介质层的厚度，使得当在电极之间建立电位差时，形成不均匀的电场，其中绝缘衬底被部分偏振并吸引到第一 由梯度力表示。

公开(公告)号：US06781812B2

公开(公告)日：2004-08-24

申请号：US09768173

申请日：2001-01-24

申请人： Koh Fuwa ,  Ken Maehira

发明人： Koh Fuwa ,  Ken Maehira

IPC分类号： H01T2300

CPC分类号： H01L21/6833 ,  C23C14/50

摘要： A chuck equipment which can hold insulating substrates is provided. First and second electrodes are provided to be exposed on the base the surface of which is insulated. The insulating substrate is placed in contact with or in close proximity to the surfaces of the first and second electrodes. Since an electric field having a high rate of spatial change is established between the first and second electrodes, the substrate is held against the surface of the chuck equipment by the gradient force. Since the magnitude of the gradient force depends on that of the rate of change of the electric field, a voltage may be applied between the first and second electrodes to establish an electric field of 1.0×106V/m or greater.

摘要翻译： 提供了可以容纳绝缘基板的卡盘设备。 提供第一和第二电极以暴露在其表面绝缘的基底上。 绝缘基板被放置成与第一和第二电极的表面接触或紧邻第一和第二电极的表面。 由于在第一和第二电极之间建立具有高空间变化率的电场，所以基板通过倾斜力抵靠在卡盘设备的表面上。 由于梯度力的大小取决于电场的变化率，所以可以在第一和第二电极之间施加电压以建立1.0×10 6 V / m以上的电场。

公开(公告)号：US20110089141A1

公开(公告)日：2011-04-21

申请号：US12999235

申请日：2009-06-15

申请人： Ai Tanaka ,  Atsushi Kira ,  Koh Fuwa

发明人： Ai Tanaka ,  Atsushi Kira ,  Koh Fuwa

IPC分类号： C23F1/04

CPC分类号： B81C1/00103 ,  B81B2203/033 ,  B81B2203/0392

摘要： A multi-stepped substrate having a plurality of steps is produced by forming, on the principal surface of a substrate, a plurality of masks which are put on top of each other, which differ from each other in the materials used for forming them and which are likewise different, from each other, in the means for peeling off the same; and that the substrate is subjected, in order, to dry-etching operations through the plurality of masks each having a desired shape such that the substrate has a plurality of steps each of which reflects the shape of each corresponding mask.

摘要翻译： 通过在基板的主表面上形成多个掩模，通过在用于形成它们的材料中彼此不同的多个掩模形成具有多个台阶的多阶基板，其中 在剥离它们的手段中彼此相同; 并且依次通过多个掩模对基板进行干蚀刻操作，每个掩模具有期望的形状，使得基板具有多个反映每个相应掩模的形状的步骤。

公开(公告)号：US06768627B1

公开(公告)日：2004-07-27

申请号：US09979627

申请日：2002-02-11

申请人： Tetsuo Kitabayashi ,  Hiroaki Hori ,  Takeshi Uchimura ,  Noriaki Tateno ,  Koh Fuwa ,  Ken Maehira

发明人： Tetsuo Kitabayashi ,  Hiroaki Hori ,  Takeshi Uchimura ,  Noriaki Tateno ,  Koh Fuwa ,  Ken Maehira

IPC分类号： H01T2300

CPC分类号： B23Q3/15 ,  B23Q3/154 ,  H01L21/6833 ,  H02N13/00

摘要： According to the present invention, there is provided an electrostatic chuck for electrostatically attracting an insulative substrate, an apparatus for heating/cooling an insulative substrate using the electrostatic chuck, and a method for controlling the temperature of an insulative substrate. The shape and the properties of the dielectric, and the shape of the electrodes, which form the electrostatic chuck, are disclosed. Also the apparatus for heating/cooling an insulative substrate comprising a plate, a gas supply conduit and a temperature controlling system, and the apparatus for processing an insulative substrate in which the apparatus for heating/cooling an insulative substrate is installed are disclosed.

摘要翻译： 一种用于吸引在真空气氛下使用的绝缘衬底的静电吸盘包括：具有吸引绝缘衬底的第一表面的介电层和在其上设有多个电极的第二表面; 绝缘支撑基板，其上固定所述电介质层; 设置在所述绝缘支撑基板上的多个导电端子; 以及电极和导电端子之间的电连接。