公开(公告)号：US20090258625A1

公开(公告)日：2009-10-15

申请号：US12249269

申请日：2008-10-10

申请人： Curtis Ling ,  Madhukar Reddy ,  John Wetherell

发明人： Curtis Ling ,  Madhukar Reddy ,  John Wetherell

IPC分类号： H04B7/00

CPC分类号： H03G3/20 ,  H03G3/3068 ,  H04B1/16 ,  H04B17/318

摘要： An automatic gain control loop disposed in a receiver is adapted to compensate for varying levels of out of band interference sources by adaptively controlling the gain distribution throughout the receive signal path. One or more intermediate received signal strength indicator (RSSI) detectors are used to determine a corresponding intermediate signal level. The output of each RSSI detector is coupled to an associated comparator that compares the intermediate RSSI value against a corresponding threshold. The take over point (TOP) for gain stages is adjusted based in part on the comparator output values. The TOP for each of a plurality of gain stages may be adjusted in discrete steps or continuously.

摘要翻译： 设置在接收机中的自动增益控制回路适于通过自适应地控制整个接收信号路径上的增益分布来补偿不同级别的带外干扰源。 一个或多个中间接收信号强度指示器（RSSI）检测器用于确定相应的中间信号电平。 每个RSSI检测器的输出耦合到相关联的比较器，其将中间RSSI值与相应的阈值进行比较。 增益级的接收点（TOP）部分基于比较器输出值进行调整。 可以以离散步骤或连续地调整多个增益级中的每一个的TOP。

公开(公告)号：US08577319B2

公开(公告)日：2013-11-05

申请号：US12249269

申请日：2008-10-10

申请人： Curtis Ling ,  Madhukar Reddy ,  John Wetherell

发明人： Curtis Ling ,  Madhukar Reddy ,  John Wetherell

IPC分类号： H04B1/06 ,  H04K3/00

CPC分类号： H03G3/20 ,  H03G3/3068 ,  H04B1/16 ,  H04B17/318

摘要： An automatic gain control loop disposed in a receiver is adapted to compensate for varying levels of out of band interference sources by adaptively controlling the gain distribution throughout the receive signal path. One or more intermediate received signal strength indicator (RSSI) detectors are used to determine a corresponding intermediate signal level. The output of each RSSI detector is coupled to an associated comparator that compares the intermediate RSSI value against a corresponding threshold. The take over point (TOP) for gain stages is adjusted based in part on the comparator output values. The TOP for each of a plurality of gain stages may be adjusted in discrete steps or continuously.

公开(公告)号：US20050150839A1

公开(公告)日：2005-07-14

申请号：US11018170

申请日：2004-12-21

申请人： Dan Duke ,  John Kubis ,  John Wetherell

发明人： Dan Duke ,  John Kubis ,  John Wetherell

IPC分类号： C02F1/04 ,  C02F1/42 ,  C02F1/44 ,  C02F1/46 ,  C02F1/52 ,  C02F1/60 ,  C02F1/66 ,  C02F5/00 ,  C02F5/08 ,  C23F11/18 ,  C23F15/00

CPC分类号： C02F5/00 ,  C02F1/042 ,  C02F1/42 ,  C02F1/441 ,  C02F1/4602 ,  C02F1/52 ,  C02F1/66 ,  C02F2103/023 ,  C02F2209/05 ,  C02F2303/08 ,  C23F11/182 ,  C23F15/00

摘要： A methods of the present invention for inhibiting silica scale formation and corrosion in aqueous systems where soluble silica residuals (SiO2) are maintained in excess of 200 mg/L, and source water silica deposition is inhibited with silica accumulations as high as 4000 mg/L (cycled accumulation) from evaporation and concentration of source water. The methods of the present invention also provides inhibition of corrosion for carbon steel at corrosion rates of less than 0.3 mpy (mils per year), and less than 0.1 mpy for copper, copper alloy, and stainless steel alloys in highly concentrated (high dissolved solids) waters. The methods of the present invention comprise pretreatment removal of hardness ions from the makeup source water, maintenance of electrical conductivity, and elevating the pH level of the aqueous environment. Thereafter, specified water chemistry residual ranges are maintained in the aqueous system to achieve inhibition of scale and corrosion.

摘要翻译： 本发明抑制水溶性二氧化硅残留物（SiO 2 O 2）超过200mg / L的二氧化硅垢形成和腐蚀的方法以及源水二氧化硅沉积被二氧化硅抑制 从蒸发和浓缩源水中积聚高达4000 mg / L（循环积累）。 本发明的方法还提供了在低于0.3mpy（每年密度）的腐蚀速率下对碳钢的腐蚀的抑制，对于高浓度（高溶解固体）中的铜，铜合金和不锈钢合金，腐蚀速率小于0.1mpy ）水域。 本发明的方法包括从补充源水中预处理去除硬度离子，维持导电性和提高水性环境的pH值。 此后，在水系统中保持规定的水化学残留范围，以达到防垢和腐蚀。

公开(公告)号：US20050150834A1

公开(公告)日：2005-07-14

申请号：US10754797

申请日：2004-01-09

申请人： Dan Duke ,  John Kubis ,  John Wetherell

发明人： Dan Duke ,  John Kubis ,  John Wetherell

IPC分类号： C02F1/04 ,  C02F1/42 ,  C02F1/44 ,  C02F1/46 ,  C02F1/52 ,  C02F1/60 ,  C02F1/66 ,  C02F5/00 ,  C02F5/08 ,  C23F11/18 ,  C23F15/00

CPC分类号： C02F5/00 ,  C02F1/042 ,  C02F1/42 ,  C02F1/441 ,  C02F1/4602 ,  C02F1/52 ,  C02F1/66 ,  C02F2103/023 ,  C02F2209/05 ,  C02F2303/08 ,  C23F11/182 ,  C23F15/00

摘要： A methods of the present invention for inhibiting silica scale formation and corrosion in aqueous systems where soluble silica residuals (SiO2) are maintained in excess of 200 mg/L, and source water silica deposition is inhibited with silica accumulations as high as 4000 mg/L (cycled accumulation) from evaporation and concentration of source water. The methods of the present invention also provides inhibition of corrosion for carbon steel at corrosion rates of less than 0.3 mpy (mils per year), and less than 0.1 mpy for copper, copper alloy, and stainless steel alloys in highly concentrated (high dissolved solids) waters. The methods of the present invention comprise pretreatment removal of hardness ions from the makeup source water, maintenance of electrical conductivity, and elevating the pH level of the aqueous environment. Thereafter, specified water chemistry residual ranges are maintained in the aqueous system to achieve inhibition of scale and corrosion.

摘要翻译： 本发明抑制水溶性二氧化硅残留物（SiO 2 O 2）超过200mg / L的二氧化硅垢形成和腐蚀的方法以及源水二氧化硅沉积被二氧化硅抑制 从蒸发和浓缩源水中积聚高达4000 mg / L（循环积累）。 本发明的方法还提供了在低于0.3mpy（每年密度）的腐蚀速率下对碳钢的腐蚀的抑制，对于高浓度（高溶解固体）中的铜，铜合金和不锈钢合金，腐蚀速率小于0.1mpy ）水域。 本发明的方法包括从补充源水中预处理去除硬度离子，维持导电性和提高水性环境的pH值。 此后，在水系统中保持规定的水化学残留范围，以达到防垢和腐蚀。