摘要:
Disclosed is an attachment cap unit for shower. The attachment cap unit includes: a head fix unit surrounding the outside of a shower head which sprays water through a plurality of injection holes formed on one side of the shower head; a scalp contact unit which is made from an elastic soft material at the lower end of the head fix unit and which is formed to be in close contact with the scalp such that the end edge portion thereof extends downwardly below one side of the shower head on which the injection holes are formed; a drainpipe provided in the head fix unit; a hose which is connected to the drainpipe for guiding water sprayed from the injection holes of the shower head to the outside; and an elastic protrusion attached onto one side of the shower head on which the injection holes are formed.
摘要:
A small critical dimension element, such as a heater for an ovonic unified memory, may be formed within a pore by using successive sidewall spacers. The use of at least two successive spacers enables the limitations imposed by lithography and the limitations imposed by bread loafing to be overcome to provide reduced critical dimension elements.
摘要:
The inventive concept relates to a semiconductor device and a method for fabricating the same. The semiconductor device comprises active patterns protruding from a substrate, an interlayer dielectric layer disposed on the substrate and including grooves exposing the active patterns, and gate electrodes in the grooves. The grooves include a first groove having a first width and a second groove having a second width greater than the first width. The gate electrodes include a first gate electrode in the first groove, and a second gate electrode in the second groove. Each of the first and second gate electrodes includes a first work function conductive pattern on a bottom surface and sidewalls of corresponding one of the first and second grooves, and a second work function conductive pattern on the first work function conductive pattern.
摘要:
The inventive concept relates to a semiconductor device and a method for fabricating the same. The semiconductor device comprises active patterns protruding from a substrate, an interlayer dielectric layer disposed on the substrate and including grooves exposing the active patterns, and gate electrodes in the grooves. The grooves include a first groove having a first width and a second groove having a second width greater than the first width. The gate electrodes include a first gate electrode in the first groove, and a second gate electrode in the second groove. Each of the first and second gate electrodes includes a first work function conductive pattern on a bottom surface and sidewalls of corresponding one of the first and second grooves, and a second work function conductive pattern on the first work function conductive pattern.
摘要:
Provided are a home appliance and its system. The home appliance include: an input unit for inputting driving information; a data unit for storing a diagnosis logic; a control unit for diagnosing a state of the home appliance and whether a failure occurs according to the diagnosis logic on the basis of product information including the driving information inputted from the input unit, operation information detected during an operation, and failure information occurring during an operation, in order to generate a diagnosis result including the operation information and the failure information, and encoding transmission information including predetermined data for a diagnosis, which are selected from the driving operation, and the diagnosis result and outputting the encoded transmission information; a modulator for converting the encoded transmission information; and a sound output unit for outputting the transmission information converted by the modulator as a sound including a plurality of frequencies.
摘要:
A small critical dimension element, such as a heater for an ovonic unified memory, may be formed within a pore by using successive sidewall spacers. The use of at least two successive spacers enables the limitations imposed by lithography and the limitations imposed by bread loafing be overcome to provide reduced critical dimension elements.
摘要:
A phase change memory formed by a plurality of phase change memory devices having a chalcogenide memory region extending over an own heater. The heaters have all a relatively uniform height. The height uniformity is achieved by forming the heaters within pores in an insulator that includes an etch stop layer and a sacrificial layer. The sacrificial layer is removed through an etching process such as chemical mechanical planarization. Since the etch stop layer may be formed in a repeatable way and is common across all the devices on a wafer, considerable uniformity is achieved in heater height. Heater height uniformity results in more uniformity in programmed memory characteristics.
摘要:
A phase change memory formed by a plurality of phase change memory devices having a chalcogenide memory region extending over an own heater. The heaters have all a relatively uniform height. The height uniformity is achieved by forming the heaters within pores in an insulator that includes an etch stop layer and a sacrificial layer. The sacrificial layer is removed through an etching process such as chemical mechanical planarization. Since the etch stop layer may be formed in a repeatable way and is common across all the devices on a wafer, considerable uniformity is achieved in heater height. Heater height uniformity results in more uniformity in programmed memory characteristics.
摘要:
A small critical dimension element, such as a heater for an ovonic unified memory, may be formed within a pore by using successive sidewall spacers. The use of at least two successive spacers enables the limitations imposed by lithography and the limitations imposed by bread loafing to be overcome to provide reduced critical dimension elements.
摘要:
A storage device includes a nonvolatile memory device, a buffer memory, a controller and a neuromorphic chip. The neuromorphic chip is configured to generate an access classifier based on the access result information and the access environment information. The controller is configured to perform first accesses to the nonvolatile memory device using the buffer memory and to collects the access result information and the access environment information of the first accesses in the buffer memory. The controller is configured to perform a second access of the nonvolatile memory device using the buffer memory. The controller is configured to obtain a prediction result of access parameters associated with the second access by using access environment information associated with the second access and the access classifier.