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40 条记录 (耗时 0.038 秒)

    Use of acid washing to provide purified silicon crystals
    2.
    发明授权
    Use of acid washing to provide purified silicon crystals 有权
    使用酸洗提供纯化的硅晶体

    公开(公告)号：US08480991B2

    公开(公告)日：2013-07-09

    申请号：US12670263

    申请日：2008-07-23

    申请人： Scott Nichol ,  Jian J. Chen

    发明人： Scott Nichol ,  Jian J. Chen

    IPC分类号： C01B33/02

    CPC分类号： C30B9/10 ,  C01B33/037 ,  C30B29/06

    摘要： A method for purifying silicon wherein silicon is crystallized from a solvent metal. The method comprises the steps of providing a molten liquid containing silicon, a solvent metal and impurities, cooling the molten liquid to form first silicon crystals and a first mother liquor, separating the first silicon crystals from the first mother liquor, contacting the first silicon crystals with compound which will dissolve the first mother liquor and separating the washed crystals from the wash solution.

    摘要翻译： 一种纯化硅的方法，其中硅从溶剂金属中结晶。 该方法包括以下步骤：提供含有硅，溶剂金属和杂质的熔融液体，冷却熔融液体以形成第一硅晶体和第一母液，将第一硅晶体与第一母液分离，使第一硅晶体 用化合物溶解第一母液并将洗涤的晶体与洗涤溶液分离。

    Tilted-translation variable optical attenuator
    6.
    发明授权
    Tilted-translation variable optical attenuator 失效
    倾斜变换光衰减器

    公开(公告)号：US06904223B1

    公开(公告)日：2005-06-07

    申请号：US10408073

    申请日：2003-04-04

    申请人： Zuyun Fang ,  Jianhua Wang ,  Jian J. Chen

    发明人： Zuyun Fang ,  Jianhua Wang ,  Jian J. Chen

    IPC分类号： G02B6/00 ,  G02B6/26

    CPC分类号： G02B6/266

    摘要： In a preferred embodiment, a motorized variable optical attenuator comprises an input fiber collimator; an output fiber collimator disposed substantially along the first collimator; and a right-angle reflector movable relative to the input collimator and the output collimator along a translation direction forming a non-zero angle with a direction of a light beam emitted by the input collimator. The reflector comprises two mutually-perpendicular reflective surfaces for sequentially reflecting the light beam emitted by the input collimator to the output collimator. A variable attenuation imparted by the attenuator on the light beam is determined by a position of the reflector relative to the input collimator and the output collimator, along the translation direction. The reflector preferably comprises a right-angle prism adhered to a nut mounted on a threaded axle driven by a stepper motor. The attenuator can achieve stable, ripple-free attenuation characteristics at insertion losses beyond −40 dB.

    摘要翻译： 在优选实施例中，电动可变光衰减器包括输入光纤准直器; 基本上沿着所述第一准直仪设置的输出光纤准直器; 以及直角反射体，其相对于输入准直器和输出准直器沿着与由输入准直仪发射的光束的方向成非零角度的平移方向移动。 反射器包括两个相互垂直的反射表面，用于将由输入准直仪发射的光束顺序反射到输出准直器。 由衰减器在光束上赋予的可变衰减由反射器相对于输入准直仪和输出准直器沿平移方向的位置确定。 反射器优选地包括附接到安装在由步进马达驱动的螺纹轴上的螺母的直角棱镜。 衰减器可以在插入损耗超过-40 dB时实现稳定的无纹波衰减特性。

    Chamber configuration for confining a plasma
    7.
    发明授权
    Chamber configuration for confining a plasma 有权

    公开(公告)号：US06872281B1

    公开(公告)日：2005-03-29

    申请号：US09676269

    申请日：2000-09-28

    申请人： Jian J. Chen ,  Mukund Srinivasan ,  Eric H. Lenz

    发明人： Jian J. Chen ,  Mukund Srinivasan ,  Eric H. Lenz

    IPC分类号： H05H1/46 ,  B01J19/08 ,  C23F4/00 ,  H01J37/32 ,  H01L21/205 ,  H01L21/3065 ,  C23C16/00 ,  C23F1/00

    CPC分类号： H01J37/32871 ,  H01J37/32082 ,  H01J37/32623

    摘要： A plasma confining assembly for minimizing unwanted plasma formations in regions outside of a process region in a process chamber is disclosed. The plasma confining assembly includes a first confining element and second confining element positioned proximate the periphery of the process region. The second confining element is spaced apart from the first confining element. The first confining element includes an exposed conductive surface that is electrically grounded and the second confining element includes an exposed insulating surface, which is configured for covering a conductive portion that is electrically grounded. The first confining element and the second confining element substantially reduce the effects of plasma forming components that pass therebetween. Additionally, the plasma confining assembly may include a third confining element, which is formed from an insulating material and disposed between the first confining element and the second confining element, and proximate the periphery of the process region. The third confining element further reduces the effects of plasma forming components that pass between the first confining element and the second confining element.

    Stacked RF excitation coil for inductive plasma processor
    8.
    发明授权
    Stacked RF excitation coil for inductive plasma processor 有权

    公开(公告)号：US06527912B2

    公开(公告)日：2003-03-04

    申请号：US09821752

    申请日：2001-03-30

    申请人： Jian J. Chen ,  Robert G. Veltrop ,  Thomas E. Wicker

    发明人： Jian J. Chen ,  Robert G. Veltrop ,  Thomas E. Wicker

    IPC分类号： H05H1100

    CPC分类号： H01J37/321

    摘要： A radio frequency excitation coil of an inductive plasma processor includes a planar turn connected in series with a segment of the coil stacked above a portion of the planar turn. The stacked segment is placed around a region having weak radio frequency coupling to plasma due to azimuthal asymmetries in the chamber and/or the excitation coil. In a single winding embodiment, the stacked segment is close to an interconnection gap between two adjacent planar turns and extends in both directions from the gap to compensate low radio frequency coupling to plasma in the gap region. In an embodiment including two electrically parallel spatially concentric windings, the stacked segment extends beyond one side of an interconnection gap of two adjacent turns, and is aligned with the planar turn such that one end of the stacked segment is directly connected to an end of the planar turn via a straight, short stub. Terminals of the coil are connected to RF excitation circuitry terminals in a housing above the coil by leads extending smoothly and gradually without sharp bends between the coil terminals and the excitation circuitry terminals. Ends of the planar turn and the stacked segment are connected by a lead extending smoothly and gradually without sharp bends between its ends.

    Multiple coil antenna for inductively-coupled plasma generation systems
    9.
    发明授权
    Multiple coil antenna for inductively-coupled plasma generation systems 失效

    公开(公告)号：US06164241A

    公开(公告)日：2000-12-26

    申请号：US106852

    申请日：1998-06-30

    申请人： Jian J. Chen ,  Robert G. Veltrop ,  Thomas E. Wicker

    发明人： Jian J. Chen ,  Robert G. Veltrop ,  Thomas E. Wicker

    IPC分类号： H05H1/46 ,  H01J37/32 ,  H01L21/205 ,  H01L21/302 ,  H01L21/3065 ,  C23C16/507

    CPC分类号： H01J37/321

    摘要： A radio frequency plasma multiple-coil antenna allows for controllable, uniform inductive coupling within a plasma reactor. According to exemplary embodiments, multiple coils are positioned on a dielectric window of a plasma chamber, and are powered by a single radio frequency generator and tuned by a single matching network. Each coil is either planar or a combination of a planar coil and a vertically stacked helical coil. The input end of each coil is connected to an input tuning capacitor and the output end is terminated to the ground through an output tuning capacitor. The location of the maximum inductive coupling of the radio frequency to the plasma is mainly determined by the output capacitor, while the input capacitor is mainly used to adjust current magnitude into each coil. By adjusting the current magnitude and the location of the maximum inductive coupling within each coil, the plasma density in different radial and azimuthal regions can be varied and controlled, and therefore, radially and azimuthally uniform plasma can be achieved.

    Parallel-antenna transformer-coupled plasma generation system
    10.
    发明授权
    Parallel-antenna transformer-coupled plasma generation system 失效
    并联天线变压器耦合等离子体发生系统

    公开(公告)号：US6155199A

    公开(公告)日：2000-12-05

    申请号：US52144

    申请日：1998-03-31

    申请人： Jian J. Chen ,  Robert G. Veltrop ,  Thomas E. Wicker

    发明人： Jian J. Chen ,  Robert G. Veltrop ,  Thomas E. Wicker

    IPC分类号： H05H1/46 ,  H01J37/32 ,  H01L21/302 ,  H01L21/3065 ,  C23C16/00

    CPC分类号： H01J37/32174 ,  H01J37/32082 ,  H01J37/32165

    摘要： Radio frequency plasma coupling systems allow for controllable, uniform inductive coupling within a plasma reactor, as well as separately controllable, uniform capacitive coupling within the reactor. According to exemplary embodiments, a set of parallel coupling elements are positioned on a dielectric window of a plasma chamber, and the positioning of the elements and/or a set of phase shifters situated between the elements are used to force the radio frequency current flowing within the elements to be oriented in a common direction. Consequently, the inductively coupled fields generated by the elements are reinforcing, and induce a highly uniform plasma in the reactor. Further, the electrical characteristics of the elements are such that independently controllable and highly uniform capacitive coupling can be provided in order to prevent polymer buildup on components within the reactor.

    摘要翻译： 射频等离子体耦合系统允许等离子体反应器内的可控的，均匀的电感耦合，以及反应器内单独可控的均匀的电容耦合。 根据示例性实施例，一组平行耦合元件位于等离子体室的电介质窗口上，并且位于元件之间的元件和/或一组移相器的定位被用于迫使射频电流在 元素要朝向共同的方向。 因此，由元件产生的电感耦合场是增强的，并且在反应器中引起高度均匀的等离子体。 此外，元件的电特性使得可以提供独立可控和高度均匀的电容耦合，以防止聚合物积聚在反应器内的组件上。