公开(公告)号：US06942738B1

公开(公告)日：2005-09-13

申请号：US09612009

申请日：2000-07-07

申请人： Gordon Ray Nelson ,  Daniel P. Bexten ,  Jeffry A. Davis

发明人： Gordon Ray Nelson ,  Daniel P. Bexten ,  Jeffry A. Davis

IPC分类号： H01L21/677 ,  H01L21/687 ,  B08B3/02

CPC分类号： H01L21/68707 ,  H01L21/67754 ,  H01L21/67757 ,  H01L21/67769 ,  H01L21/67772 ,  H01L21/67775 ,  H01L21/67778 ,  H01L21/67781 ,  Y10S414/137

摘要： An automated semiconductor processing system has an indexer bay perpendicularly aligned with a process bay within a clean air enclosure. An indexer in the indexer bay provides stocking or storage for work in progress semiconductor wafers. Process chambers are located in the process bay. A process robot moves between the indexer bay and process bay to carry semi-conductor wafers to and from the process chambers. The process robot has a robot arm vertically moveable along a lift rail. Semiconductor wafers are carried offset from the robot arm, to better avoid contamination. The automated system is compact and requires less clean room floor space.

摘要翻译： 自动半导体处理系统具有与清洁空气封闭体内的工艺间隔垂直对准的分度器托架。 索引器托架中的索引器为进行中的半导体晶片提供放样或存储。 过程室位于过程托架中。 过程机器人在分度器托架和过程间隔之间移动，以将半导体晶片运送到处理室和从处理室运送。 过程机器人具有可沿着升降轨道垂直移动的机器人手臂。 半导体晶片从机器人手臂偏移，以更好地避免污染。 自动化系统紧凑，需要较少的洁净室空间。

公开(公告)号：US06736148B2

公开(公告)日：2004-05-18

申请号：US09862752

申请日：2001-05-22

申请人： Jeffry A. Davis ,  Kevin P. Meyer ,  Kert L. Dolechek

发明人： Jeffry A. Davis ,  Kevin P. Meyer ,  Kert L. Dolechek

IPC分类号： B08B704

CPC分类号： H01L21/68707 ,  A01G18/64 ,  H01L21/67742 ,  H01L21/67754 ,  H01L21/67769 ,  H01L21/67772 ,  H01L21/67775 ,  H01L21/67781 ,  Y10S134/902

摘要： An automated semiconductor processing system has an indexer bay perpendicularly aligned with a process bay within a clean air enclosure. An indexer in the indexer bay provides stocking or storage for work in progress semiconductor wafers. Process chambers are located in the process bay. A process robot moves between the indexer bay and process bay to carry semi-conductor wafers to and from the process chambers. The process robot has a robot arm vertically moveable along a lift rail. Semiconductor wafers are carried offset from the robot arm, to better avoid contamination. The automated system is compact and requires less clean room floor space.

摘要翻译： 自动半导体处理系统具有与清洁空气封闭体内的工艺间隔垂直对准的分度器托架。 索引器托架中的索引器为进行中的半导体晶片提供放样或存储。 过程室位于过程托架中。 过程机器人在分度器托架和过程间隔之间移动，以将半导体晶片运送到处理室和从处理室传送半导体晶片。 过程机器人具有可沿着升降轨道垂直移动的机器人手臂。 半导体晶片从机器人手臂偏移，以更好地避免污染。 自动化系统紧凑，需要较少的洁净室空间。

公开(公告)号：US06652219B2

公开(公告)日：2003-11-25

申请号：US10205158

申请日：2002-07-25

申请人： Jeffry A. Davis ,  Kert L. Dolechek ,  Gary L. Curtis

发明人： Jeffry A. Davis ,  Kert L. Dolechek ,  Gary L. Curtis

IPC分类号： B65G4907

CPC分类号： H01L21/67754 ,  H01L21/67126 ,  H01L21/67173 ,  H01L21/6719 ,  H01L21/67313 ,  H01L21/67326 ,  H01L21/67769 ,  H01L21/67772 ,  H01L21/67775 ,  H01L21/67778 ,  H01L21/67781 ,  H01L21/68707 ,  Y10S134/902 ,  Y10S414/139 ,  Y10S414/14

摘要： A processor for processing articles, such as semiconductor wafers, includes an enclosure defining a substantially enclosed clean processing chamber and at least one processing station disposed in the processing chamber. An interface section is disposed adjacent an interface end of the enclosure. The interface section includes at least one interface port through which a pod containing articles for processing are loaded or unloaded to or from the processor. An article extraction mechanism adapted to seal with the pod removes articles from the pod without exposing the articles to ambient atmospheric conditions in the interface section. The article processor also preferably includes an article insertion mechanism adapted to seal with a pod in the interface section. The article insertion mechanism allows insertion of the articles into the pod after processing by at least one processing station.

摘要翻译： 用于处理诸如半导体晶片的制品的处理器包括限定基本封闭的清洁处理室的外壳和设置在处理室中的至少一个处理站。 接口部分设置在外壳的接口端附近。 接口部分包括至少一个接口端口，通过该至少一个接口端口将包含用于处理的物品的容器装载或者从处理器卸载。 适于与容器密封的物品提取机构将物品从物料盒中取出，而不会使物品暴露在界面部分的环境大气条件下。 物品处理器还优选地包括适于与接口部分中的容器密封的物品插入机构。 物品插入机构允许在由至少一个处理站处理之后将物品插入到容器中。

公开(公告)号：US06599075B2

公开(公告)日：2003-07-29

申请号：US10180793

申请日：2002-06-25

申请人： Jeffry A. Davis ,  Kert L. Dolechek ,  Gary L. Curtis

发明人： Jeffry A. Davis ,  Kert L. Dolechek ,  Gary L. Curtis

IPC分类号： B65G4907

CPC分类号： H01L21/67754 ,  H01L21/67173 ,  H01L21/6719 ,  H01L21/67313 ,  H01L21/67769 ,  H01L21/67772 ,  H01L21/67775 ,  H01L21/67778 ,  H01L21/67781 ,  H01L21/68707 ,  Y10S414/137 ,  Y10S414/139

摘要： A processor for processing articles, such as semiconductor wafers, in a substantially clean atmosphere is set forth. The processor includes an enclosure defining a substantially enclosed clean processing chamber and at least one processing station disposed in the processing chamber. An interface section is disposed adjacent an interface end of the enclosure. The interface section includes at least one interface port through which a pod containing articles for processing are loaded or unloaded to or from the processor. The interface section is hygienically separated from the processing chamber since the interface section is generally not as clean as the highly hygienic processing chamber. An article extraction mechanism adapted to seal with the pod is employed. The mechanism is disposed to allow extraction of the articles contained within the pod into the processing chamber without exposing the articles to ambient atmospheric conditions in the interface section. The article processor also preferably includes an article insertion mechanism that is adapted to seal with a pod disposed in the interface section. The article insertion mechanism is disposed to allow insertion of the articles into the pod after processing by the at least one processing station. The article insertion mechanism allows the insertion of the articles without exposing the articles to ambient atmospheric conditions in the interface section.

公开(公告)号：US06279724B1

公开(公告)日：2001-08-28

申请号：US09274511

申请日：1999-03-23

申请人： Jeffry A. Davis

发明人： Jeffry A. Davis

IPC分类号： B65G2500

CPC分类号： H01L21/67754 ,  H01L21/67742 ,  H01L21/67769 ,  H01L21/67772 ,  H01L21/67775 ,  H01L21/67781 ,  H01L21/68707 ,  Y10S414/14

摘要： An automated semiconductor processing system has an indexer bay perpendicularly aligned with a process bay within a clean air enclosure. An indexer in the indexer bay provides stocking or storage for work in progress semiconductor wafers. Process chambers are located in the process bay. A process robot moves between the indexer bay and process bay to carry semi-conductor wafers to and from the process chambers. The process robot has a robot arm vertically moveable along a lift rail. Semiconductor wafers are carried offset from the robot arm, to better avoid contamination. The automated system is compact and requires less clean room floor space.

摘要翻译： 自动半导体处理系统具有与清洁空气封闭体内的工艺间隔垂直对准的分度器托架。 索引器托架中的索引器为进行中的半导体晶片提供放样或存储。 过程室位于过程托架中。 过程机器人在分度器托架和过程间隔之间移动，以将半导体晶片运送到处理室和从处理室传送半导体晶片。 过程机器人具有可沿着升降轨道垂直移动的机器人手臂。 半导体晶片从机器人手臂偏移，以更好地避免污染。 自动化系统紧凑，需要较少的洁净室空间。

公开(公告)号：US06273110B1

公开(公告)日：2001-08-14

申请号：US09112259

申请日：1998-07-08

申请人： Jeffry A. Davis ,  Kevin P. Meyer ,  Kert L. Dolechek

发明人： Jeffry A. Davis ,  Kevin P. Meyer ,  Kert L. Dolechek

IPC分类号： B08B700

CPC分类号： H01L21/67754 ,  H01L21/67126 ,  H01L21/67173 ,  H01L21/6719 ,  H01L21/67313 ,  H01L21/67326 ,  H01L21/67769 ,  H01L21/67772 ,  H01L21/67775 ,  H01L21/67778 ,  H01L21/67781 ,  H01L21/68707 ,  Y10S134/902 ,  Y10S414/139 ,  Y10S414/14

摘要： An automated semiconductor processing system has an indexer bay perpendicularly aligned with a process bay within a clean air enclosure. An indexer in the indexer bay provides stocking or storage for work in progress semiconductor wafers. Process chambers are located in the process bay. A process robot moves between the indexer bay and process bay to carry semi-conductor wafers to and from the process chambers. The process robot has a robot arm vertically movable along a lift rail. Semiconductor wafers are carried offset from the robot arm, to better avoid contamination. The automated system is compact and requires less clean room floor space.

摘要翻译： 自动半导体处理系统具有与清洁空气封闭体内的工艺间隔垂直对准的分度器托架。 索引器托架中的索引器为进行中的半导体晶片提供放样或存储。 过程室位于过程托架中。 过程机器人在分度器托架和过程间隔之间移动，以将半导体晶片运送到处理室和从处理室运送。 过程机器人具有可沿升降轨道垂直移动的机器人臂。 半导体晶片从机器人手臂偏移，以更好地避免污染。 自动化系统紧凑，需要较少的洁净室空间。

公开(公告)号：US08028978B2

公开(公告)日：2011-10-04

申请号：US10397946

申请日：2003-03-25

申请人： Gordon R. Nelson ,  Jeffry A. Davis ,  Raymon F. Thompson ,  Eric J. Bergman

发明人： Gordon R. Nelson ,  Jeffry A. Davis ,  Raymon F. Thompson ,  Eric J. Bergman

IPC分类号： B23P19/00

CPC分类号： H01L21/67754 ,  H01L21/67769 ,  H01L21/67772 ,  H01L21/67775 ,  H01L21/67778 ,  H01L21/67781 ,  H01L21/68707 ,  Y10S269/903

摘要： A semiconductor wafer processing system has a carrier including wafer slots. A process robot engages the carrier and installs the carrier into a rotor within a process chamber. The rotor has a tapered or stepped inside surface matching a tapered or stepped outside surface of the carrier. Wafer retainers on the carrier pivot to better secure wafers within the carrier.

摘要翻译： 半导体晶片处理系统具有包括晶片槽的载体。 过程机器人接合载体并将载体安装在处理室内的转子中。 转子具有与载体的锥形或阶梯状外表面匹配的锥形或阶梯状内表面。 载体上的晶片固定器枢转以更好地将晶片保护在载体内。

公开(公告)号：US06900132B2

公开(公告)日：2005-05-31

申请号：US10691688

申请日：2003-10-22

申请人： Raymon F. Thompson ,  Jeffry A. Davis ,  Randy Harris ,  Dana R. Scranton ,  Ryan Pfeifle ,  Steven A. Peace ,  Brian Aegerter

发明人： Raymon F. Thompson ,  Jeffry A. Davis ,  Randy Harris ,  Dana R. Scranton ,  Ryan Pfeifle ,  Steven A. Peace ,  Brian Aegerter

IPC分类号： H01L21/00 ,  H01L21/3213 ,  H01L21/311

CPC分类号： H01L21/6715 ,  H01L21/32134 ,  H01L21/67017 ,  H01L21/6708 ,  Y10S438/913

摘要： A system for processing semiconductor wafers has process units on a deck of a frame. The process units and the deck have precision locating features, such as tapered pins, for precisely positioning the process units on the deck. Process units can be removed and replacement process units installed on the deck, without the need for recalibrating the load/unload robot. This reduces the time needed to replace process units and restart processing operations. Liquid chemical consumption during processing is reduced by drawing unused liquid out of supply lines and pumping it back to storage.

摘要翻译： 用于处理半导体晶片的系统在框架的台面上具有处理单元。 过程单元和甲板具有精确的定位特征，例如锥形销，用于将处理单元精确地定位在甲板上。 可以拆卸加工单元并安装在甲板上的更换过程单元，而无需重新校准装载/卸载机器人。 这减少了更换过程单元并重新启动处理操作所需的时间。 通过将未使用的液体从供应管线中抽出并将其抽回储存器来减少加工过程中的液体化学品消耗。

公开(公告)号：US06799932B2

公开(公告)日：2004-10-05

申请号：US10457944

申请日：2003-06-09

申请人： Jeffry A. Davis ,  Kert L. Dolechek ,  Gary L. Curtis

发明人： Jeffry A. Davis ,  Kert L. Dolechek ,  Gary L. Curtis

IPC分类号： B65G49107

CPC分类号： H01L21/67754 ,  H01L21/67173 ,  H01L21/6732 ,  H01L21/67769 ,  H01L21/67772 ,  H01L21/67775 ,  H01L21/67778 ,  H01L21/67781 ,  H01L21/68707 ,  Y10S414/135 ,  Y10S414/137 ,  Y10S414/139 ,  Y10S414/14

摘要： A processor for processing articles, such as semiconductor wafers, in a substantially clean atmosphere is set forth. The processor includes an enclosure defining a substantially enclosed clean processing chamber and at least one processing station disposed in the processing chamber. An interface section is disposed adjacent an interface end of the enclosure. The interface section includes at least one interface port through which a pod containing articles for processing are loaded or unloaded to or from the processor. The interface section is hygienically separated from the processing chamber since the interface section is generally not as clean as the highly hygienic processing chamber. An article extraction mechanism adapted to seal with the pod is employed. The mechanism is disposed to allow extraction of the articles contained within the pod into the processing chamber without exposing the articles to ambient atmospheric conditions in the interface section. The article processor also preferably includes an article insertion mechanism that is adapted to seal with a pod disposed in the interface section. The article insertion mechanism is disposed to allow insertion of the articles into the pod after processing by the at least one processing station. The article insertion mechanism allows the insertion of the articles without exposing the articles to ambient atmospheric conditions in the interface section.

摘要翻译： 阐述了一种用于在基本上清洁的气氛中处理诸如半导体晶片的制品的处理器。 处理器包括限定基本封闭的清洁处理室的外壳和设置在处理室中的至少一个处理站。 接口部分设置在外壳的接口端附近。 接口部分包括至少一个接口端口，通过该至少一个接口端口将包含用于处理的物品的容器装载或者从处理器卸载。 接口部分与处理室卫生地分开，因为界面部分通常不像高度卫生的处理室那么干净。 采用适于与荚密封的物品提取机构。 该机构被设置为允许将容纳在容器内的物品提取到处理室中，而不会使物品暴露于接口部分中的环境大气条件。 物品处理器还优选地包括物品插入机构，其适于与设置在界面部分中的容器密封。 物品插入机构设置成允许在由至少一个处理站处理之后将物品插入容器中。 物品插入机构允许物品的插入，而不会使物品暴露在界面部分中的环境大气条件下。

公开(公告)号：US06454514B2

公开(公告)日：2002-09-24

申请号：US09372366

申请日：1999-08-11

申请人： Jeffry A. Davis

发明人： Jeffry A. Davis

IPC分类号： B25J1508

CPC分类号： B24B37/34 ,  B24B37/345 ,  B24B41/005 ,  H01L21/67769 ,  H01L21/67781 ,  H01L21/68707 ,  Y10S294/902

摘要： A workpiece support and an apparatus including such a workpiece support are set forth. The workpiece support includes a set of grooved members for supporting a series of workpieces. The workpieces may be similarly shaped, e.g. circular or rectangular, and similarly sized, each having a front face and a back face. An outer perimeter of each workpiece may be beveled at both faces, beveled at one face, unbeveled, convex, or concave. Each grooved member has a series of similar grooves. Being adapted to receive such a workpiece, each groove has a bearing wall and a wedging wall shaped and oriented so that a line normal to the wedging wall intersects but is not normal to the bearing wall. For many applications, two grooved members are employed, which are parallel to one another, spaced from one another, and oriented so that the grooves of the grooved members are generally aligned. To this end, a first grooved member is oriented so that the front faces of the received workpieces bear against the bearing walls of the grooves of the first grooved member and so that the received workpieces touch the wedging walls of the grooves of the first grooved member. A second grooved member is oriented so that the back faces of the received workpieces bear against the bearing walls of the grooves of the second grooved member and so that the received workpieces touch the wedging walls of the grooves of the second grooved member. Thus, the workpieces received by the grooves of the grooved members are wedged so as not to tip, shake, or wobble.

摘要翻译： 阐述了工件支撑件和包括这种工件支撑件的装置。 工件支撑件包括一组用于支撑一系列工件的开槽部件。 工件可以类似地成形，例如。 圆形或矩形，并且类似尺寸，每个具有前表面和后表面。 每个工件的外周边可以在两个表面上倾斜，在一个表面上倾斜，未凸出，凸出或凹入。 每个带槽构件具有一系列类似的凹槽。 为了接收这样的工件，每个凹槽具有一个轴承壁和楔形壁的形状和取向，使得垂直于楔形壁的线与轴承壁相交但不垂直。 对于许多应用，采用两个彼此平行的沟槽构件，彼此间隔开并定向成使得凹槽构件的凹槽大致对齐。 为此，第一凹槽构件被定向成使得所接收的工件的前表面抵靠第一凹槽构件的凹槽的轴承壁，并且使得所接收的工件接触第一凹槽构件的凹槽的楔形壁 。 第二槽构件被定向成使得所接收的工件的背面抵靠第二槽构件的槽的支承壁，并且使得所接收的工件接触第二槽构件的槽的楔形壁。 因此，由凹槽构件的凹槽容纳的工件楔入，以便不会尖，摇晃或摆动。