摘要:
A first scanner unit and a second scanner unit simultaneously read the front surface and rear surface of a document, respectively, once stores the read image data in a first memory while adjusting the timing by a memory I/F, and then transfers the same to an ASIC. The image data is read out of the first memory and is inputted into an R channel and a B channel at an identical timing. The ASIC executes predetermined image processings and stores monochrome data on the front surface and rear surface of the document in a second memory through a PCI bus in parallel.
摘要:
1. A radiation-sensitive resin composition comprising: (A) a resin insoluble or scarcely soluble in alkali, but becomes alkali soluble by the action of an acid and (B) a photoacid generator. The resin comprises (a) at least one recurring unit of the following formula (1-1) or (1-2), and (b) at least one recurring unit for the following formula (2-1), (2-2), or (2-3).
摘要:
A radiation-sensitive resin composition exhibiting only extremely controlled change in the sensitivity after storage when used as a chemically-amplified resist possessing high transparency at a wavelength of 193 nm or less and particularly excellent depth of focus (DOF) is provided.The radiation-sensitive resin composition comprises (A) a siloxane resin having a structural unit (I) shown by the following formula (I) and/or a structural unit (II) shown by the following formula (II), (B) a photoacid generator, and (C) a solvent, the content of nitrogen-containing compounds in the composition being not more than 100 ppm, wherein A and B individually represent a substituted or unsubstituted divalent linear, branched, or cyclic hydrocarbon group, R1 represents a monovalent acid-dissociable group, and R2 represents a hydrogen atom or monovalent acid-dissociable group.
摘要:
The present invention is directed to the preparation of photoresist polymers via living free radical polymerization techniques. Sterically bulky ester monomers are utilized as the polymerization components. Use of chain transfer agents is included in polymerization processing conditions. Cleavage of polymer terminal end groups that include a heteroatom are described.
摘要:
A male terminal fitting and a method of manufacturing the same is disclosed as including a plate-shaped contact protrusion (11, 31, 41, 51) formed at one side for mating with a female terminal fitting, and a conductor clamping portion (12, 32, 42, 52) located at the other side for clamping a conductor of an electric wire. The plate-shaped contact protrusion includes a base plate component (14, 34, 44, 54) extending from the conductor clamping portion in a longitudinally elongated shape, and an overlapping fold plate component (15, 35, 36, 45, 46, 55) laterally extending from a side of the base plate component. The plate-shaped contact protrusion further includes a flatness securing plate component (16, 35, 44, 56) laterally extending from the base plate component and overlaps with the overlapping fold plate component to ensure flatness conditions of the base plate component and the overlapping fold plate component. In the method, a plurality of sequentially arrayed male terminal fittings are formed by stamping operation and a forming operation is implemented to form each of the terminal fittings into final shapes, respectively.
摘要:
A first scanner unit and a second scanner unit simultaneously read the front surface and rear surface of a document, respectively, once stores the read image data in a first memory while adjusting the timing by a memory I/F, and then transfers the same to an ASIC. The image data is read out of the first memory and is inputted into an R channel and a B channel at an identical timing. The ASIC executes predetermined image processings and stores monochrome data on the front surface and rear surface of the document in a second memory through a PCI bus in parallel.
摘要:
A radiation sensitive resin composition comprising (A) a fluorine-containing copolymer of hexafluoropropylene, at least one compound selected from the group consisting of unsaturated carboxylic acids and unsaturated carboxylic anhydrides, and an unsaturated compound (B) an acid generating compound which generates an acid upon exposure to radiation; (C) a cross-linkable compound; and (D) an organic solvent. The composition suitable is useful for a negative resist for forming a mask for the production of a circuit such as a semiconductor integrated circuit or a thin film transistor circuit for liquid crystal displays as well as a material for forming a permanent film such as an interlaminar insulating film or a color filter protective film.
摘要:
A plurality of laminated rubber or rubber-like elastoplastic ring-configured pads vertically stacked and secured together to provide seismic damping for a building structure. The laminated pads include ring-like steel plates or solid disk-like steel plates to form one laminated stage of a multi-stage seismic damping device. A plurality of damping devices are used to support a vibratable mass on a building structure. The combination of stacked ring-configured elastoplastic pads and steel plates provides a damping device having a high lateral deformation capacity with a long period and high resistance to buckling. The damping device is suitable for protecting building structures having long natural periods, such as multi-storied buildings.
摘要:
An elasto-plastic damper is adapted to be used in a structure, such as a building and other facilities, for absorbing vibration energy created by earthquake tremors and other ground vibrations. The damper is a centrally bulged and generally cone-shaped hollow body of revolution so that its section modulus changes substantially proportional to a bending moment created in the damper body due to horizontal stresses, thus permitting a maximum degree of deformability. This elasto-plastic damper is compact in size and demonstrates a high degree of vibrational energy absorbability.
摘要:
The invention provides novel acid generators which are unproblematic in combustibility and accumulation inside the human body and can generate acids having high acidities and high boiling points and exhibiting properly short diffusion lengths in resist coating films and which permit the formation of resist patterns excellent smoothness with little dependence on the denseness of a mask pattern; sulfonic acids generated from the acid generators; sulfonyl halides useful as raw material in the synthesis of the acid generators; and radiation-sensitive resin compositions containing the acid generators. The acid generators have structures represented by the general formula (I), wherein R1 is a monovalent substituent such as alkoxycarbonyl, alkylsulfonyl, or alkoxysulfonyl; R2 to R4 are each hydrogen or alkyl; k is an integer of 0 or above; and n is an integer of 0 to 5. Among the radiation-sensitive resin compositions, a positive one contains a resin having acid-dissociable groups in addition to the above acid generator, while a negative one contains an alkali-soluble resin and a crosslinking agent in addition to the acid generator.