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公开(公告)号：US20060178094A1
公开(公告)日：2006-08-10
申请号：US11345406
申请日：2006-02-02
IPC分类号： B24B7/00
CPC分类号： B24B37/08 , F16H57/10 , Y10T74/19981
摘要： In polishing apparatus of the present invention, collars can be easily exchange. The polishing apparatus comprises: an outer pin gear having an inner gear section; an inner pin gear having an outer gear section; and a carrier having outer gear teeth, which are engaged with the inner gear section of the outer pin gear and the outer gear section of the inner pin gear so as to rotate and move the carrier around the inner pin gear. At least one of the inner gear section and the outer gear section includes gear teeth, each of which comprises: a pin proper being fixed to a pin ring and extended upward therefrom; a cylindrical collar rotatably covering and fitting the pin proper at a fitting section.
摘要翻译： 在本发明的抛光装置中，可以容易地更换套环。 抛光装置包括：具有内齿轮部分的外销齿轮; 具有外齿轮部分的内销齿轮; 以及具有外齿轮齿轮的载体，其与外销齿轮的内齿轮部分和内销齿轮的外齿轮部分接合，以使托架围绕内销齿轮旋转和移动。 内齿轮部分和外齿轮部分中的至少一个包括齿轮齿，每个齿轮齿包括：销固定到销环并从其向上延伸的销; 一个圆柱形轴环可旋转地覆盖并适配在适配部分处的销。
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公开(公告)号：US20110312254A1
公开(公告)日：2011-12-22
申请号：US13164081
申请日：2011-06-20
申请人： Harumichi KOYAMA
发明人： Harumichi KOYAMA
CPC分类号： B24B37/08 , B24B53/017
摘要： The method of the present invention are capable of stabilizing a polishing rate, reducing number of times of performing dressing operations, improving work efficiency and extending a span of life of the polishing pad. The method for dressing a polishing pad, which has been used to polish a surface of a work by pressing the work onto the polishing pad fixed on a polishing plate with supplying slurry thereto, by using a grind stone, comprises the steps of: cleaning the polishing pad by supplying high-pressure cleaning water to the polishing pad; and dressing the polishing pad by moving a dressing grind stone, in the radial direction of the polishing pad, along a surface profile thereof, while performing the cleaning step.
摘要翻译： 本发明的方法能够稳定抛光速度，减少进行修整操作的次数，提高工作效率并延长抛光垫的使用寿命。 通过使用磨石将已经用于将工件压在固定在研磨板上的抛光垫上的抛光垫上的用于抛光工件表面的抛光垫的方法包括以下步骤：清洁 抛光垫，通过向抛光垫提供高压清洗水; 并且在执行清洁步骤的同时沿着抛光垫的径向移动修整研磨石沿其表面轮廓来修整抛光垫。
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公开(公告)号：US07278907B2
公开(公告)日：2007-10-09
申请号：US11514180
申请日：2006-09-01
申请人： Yoshio Nakamura , Harumichi Koyama
发明人： Yoshio Nakamura , Harumichi Koyama
IPC分类号： B24B1/00
摘要： The method of adhering polishing pads is capable of easily adhering the polishing pads without damages. The method comprises the steps of: tentatively adhering the polishing pads to polishing plates; attaching a roller unit having a shaft and a roller member, which is capable of rotating about the shaft and which has a projected section having a prescribed width and spirally formed in an outer circumferential face, on the lower polishing plate in the radial direction; moving the upper polishing plate downward, by the holding unit, until the upper polishing plate contacts the roller member; and simultaneously adhering the polishing pads onto the upper and lower polishing plate by rotating the upper and polishing plates in the opposite directions at the same speed with pressing the roller member by the upper polishing plate.
摘要翻译： 粘附抛光垫的方法能够容易地粘附抛光垫而不损坏。 该方法包括以下步骤：暂时将抛光垫粘附到抛光板上; 将具有轴和滚子构件的滚子单元沿径向方向安装在下抛光板上，该滚子单元能够围绕轴线旋转并具有规定宽度的突出部分并在外周面上螺旋形成; 通过保持单元向下移动上抛光板，直到上抛光板接触辊构件; 并且通过用上部抛光板按压辊构件以相同的速度旋转上部抛光板和抛光板，同时将抛光垫粘附到上部和下部抛光板上。
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公开(公告)号：US07255635B2
公开(公告)日：2007-08-14
申请号：US11345406
申请日：2006-02-02
IPC分类号： B24B5/36
CPC分类号： B24B37/08 , F16H57/10 , Y10T74/19981
摘要： In polishing apparatus of the present invention, collars can be easily exchange. The polishing apparatus comprises: an outer pin gear having an inner gear section; an inner pin gear having an outer gear section; and a carrier having outer gear teeth, which are engaged with the inner gear section of the outer pin gear and the outer gear section of the inner pin gear so as to rotate and move the carrier around the inner pin gear. At least one of the inner gear section and the outer gear section includes gear teeth, each of which comprises: a pin proper being fixed to a pin ring and extended upward therefrom; a cylindrical collar rotatably covering and fitting the pin proper at a fitting section.
摘要翻译： 在本发明的抛光装置中，可以容易地更换套环。 抛光装置包括：具有内齿轮部分的外销齿轮; 具有外齿轮部分的内销齿轮; 以及具有外齿轮齿轮的载体，其与外销齿轮的内齿轮部分和内销齿轮的外齿轮部分接合，以使托架围绕内销齿轮旋转和移动。 内齿轮部分和外齿轮部分中的至少一个包括齿轮齿，每个齿轮齿包括：销固定到销环并从其向上延伸的销; 一个圆柱形轴环可旋转地覆盖并适配在适配部分处的销。
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公开(公告)号：US20070087671A1
公开(公告)日：2007-04-19
申请号：US11580889
申请日：2006-10-16
申请人： Yoshio Nakamura , Harumichi Koyama
发明人： Yoshio Nakamura , Harumichi Koyama
IPC分类号： B24B1/00
摘要： The method of adhering polishing pads is capable of easily exchanging polishing pads in a comfortable posture. The method comprises the steps of: setting a pad adhering carrier, which has a through-hole in which a roller unit for pressing polishing pads is fixed, in a holder with arranging a roller unit in a radial direction of a lower polishing plate and an upper polishing plate; relatively moving the upper polishing plate toward the lower polishing plate so as to clamp the roller unit between the lower polishing plate and the upper polishing plate with a prescribed force; rotating the lower polishing plate and the upper polishing plate, which clamp the roller unit, in the opposite directions at the same speed; and pressing the polishing pads onto polishing faces of the lower polishing plate and the upper polishing plate by the roller unit.
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公开(公告)号：US20070054606A1
公开(公告)日：2007-03-08
申请号：US11514180
申请日：2006-09-01
申请人： Yoshio Nakamura , Harumichi Koyama
发明人： Yoshio Nakamura , Harumichi Koyama
IPC分类号： B24B1/00
摘要： The method of adhering polishing pads is capable of easily adhering the polishing pads without damages. The method comprises the steps of: tentatively adhering the polishing pads to polishing plates; attaching a roller unit having a shaft and a roller member, which is capable of rotating about the shaft and which has a projected section having a prescribed width and spirally formed in an outer circumferential face, on the lower polishing plate in the radial direction; moving the upper polishing plate downward, by the holding unit, until the upper polishing plate contacts the roller member; and simultaneously adhering the polishing pads onto the upper and lower polishing plate by rotating the upper and polishing plates in the opposite directions at the same speed with pressing the roller member by the upper polishing plate.
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公开(公告)号：US07485029B2
公开(公告)日：2009-02-03
申请号：US11882999
申请日：2007-08-08
CPC分类号： B24B37/015 , B24B37/08 , B24B57/02
摘要： The double face polishing apparatus is capable of controlling an amount of supplying slurry to a lower polishing plate. The double face polishing apparatus comprises: a lower polishing plate and an upper polishing plate; a carrier provided between the polishing plates, the carrier having a through-hole for holding a workpiece; a plate driving unit for rotating the polishing plates; a carrier driving unit for rotating the carrier; ring-shaped ducts coaxially provided to the upper polishing plate; a slurry supply source supplying slurry to the ring-shaped ducts; and supply pipes for supplying the slurry to the lower polishing plate. The slurry is supplied to each of coaxial polishing zones of the lower polishing plate via the corresponding ring-shaped ducts and the supply pipes.
摘要翻译： 双面抛光装置能够控制向下抛光板供给浆料的量。 双面抛光装置包括：下抛光板和上抛光板; 设置在所述研磨板之间的载体，所述载体具有用于保持工件的通孔; 用于旋转抛光板的板驱动单元; 用于使所述载体旋转的载体驱动单元; 同轴地设置到上抛光板的环形导管; 浆料供应源将浆料供应到环形管道; 并供应用于将浆料供应到下抛光板的管道。 通过相应的环形管道和供应管道将浆料供应到下抛光板的每个同轴抛光区域。
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公开(公告)号：US20080057831A1
公开(公告)日：2008-03-06
申请号：US11882999
申请日：2007-08-08
IPC分类号： B24B49/14
CPC分类号： B24B37/015 , B24B37/08 , B24B57/02
摘要： The double face polishing apparatus is capable of controlling an amount of supplying slurry to a lower polishing plate. The double face polishing apparatus comprises: a lower polishing plate and an upper polishing plate; a carrier provided between the polishing plates, the carrier having a through-hole for holding a workpiece; a plate driving unit for rotating the polishing plates; a carrier driving unit for rotating the carrier; ring-shaped ducts coaxially provided to the upper polishing plate; a slurry supply source supplying slurry to the ring-shaped ducts; and supply pipes for supplying the slurry to the lower polishing plate. The slurry is supplied to each of coaxial polishing zones of the lower polishing plate via the corresponding ring-shaped ducts and the supply pipes.
摘要翻译： 双面抛光装置能够控制向下抛光板供给浆料的量。 双面抛光装置包括：下抛光板和上抛光板; 设置在所述研磨板之间的载体，所述载体具有用于保持工件的通孔; 用于旋转抛光板的板驱动单元; 用于使所述载体旋转的载体驱动单元; 同轴地设置到上抛光板的环形导管; 浆料供应源将浆料供应到环形管道; 并供应用于将浆料供应到下抛光板的管道。 通过相应的环形管道和供应管道将浆料供应到下抛光板的每个同轴抛光区域。
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公开(公告)号：US08808061B2
公开(公告)日：2014-08-19
申请号：US13164081
申请日：2011-06-20
申请人： Harumichi Koyama
发明人： Harumichi Koyama
IPC分类号： B24B33/00
CPC分类号： B24B37/08 , B24B53/017
摘要： The method of the present invention are capable of stabilizing a polishing rate, reducing number of times of performing dressing operations, improving work efficiency and extending a span of life of the polishing pad. The method for dressing a polishing pad, which has been used to polish a surface of a work by pressing the work onto the polishing pad fixed on a polishing plate with supplying slurry thereto, by using a grind stone, comprises the steps of: cleaning the polishing pad by supplying high-pressure cleaning water to the polishing pad; and dressing the polishing pad by moving a dressing grind stone, in the radial direction of the polishing pad, along a surface profile thereof, while performing the cleaning step.
摘要翻译： 本发明的方法能够稳定抛光速度，减少进行修整操作的次数，提高工作效率并延长抛光垫的使用寿命。 通过使用磨石将已经用于将工件压在固定在研磨板上的抛光垫上的抛光垫上的用于抛光工件表面的抛光垫的方法包括以下步骤：清洁 抛光垫，通过向抛光垫提供高压清洗水; 并且在执行清洁步骤的同时沿着抛光垫的径向移动修整研磨石沿其表面轮廓来修整抛光垫。
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公开(公告)号：US07306510B2
公开(公告)日：2007-12-11
申请号：US11580889
申请日：2006-10-16
申请人： Yoshio Nakamura , Harumichi Koyama
发明人： Yoshio Nakamura , Harumichi Koyama
IPC分类号： B24B1/00
摘要： The method of adhering polishing pads is capable of easily exchanging polishing pads in a comfortable posture. The method comprises the steps of: setting a pad adhering carrier, which has a through-hole in which a roller unit for pressing polishing pads is fixed, in a holder with arranging a roller unit in a radial direction of a lower polishing plate and an upper polishing plate; relatively moving the upper polishing plate toward the lower polishing plate so as to clamp the roller unit between the lower polishing plate and the upper polishing plate with a prescribed force; rotating the lower polishing plate and the upper polishing plate, which clamp the roller unit, in the opposite directions at the same speed; and pressing the polishing pads onto polishing faces of the lower polishing plate and the upper polishing plate by the roller unit.
摘要翻译： 粘附抛光垫的方法能够以舒适的姿势容易地更换抛光垫。 该方法包括以下步骤：将具有通孔的衬垫粘附载体设置在固定有用于将抛光垫压紧的辊单元的通孔中，在具有沿下抛光板的径向布置辊单元的保持器中， 上抛光板; 将上抛光板相对移动到下抛光板，以便以规定的力将辊单元夹紧在下抛光板和上抛光板之间; 以相同的速度在相反的方向旋转将所述辊单元夹紧的下抛光板和上抛光板; 并通过辊单元将抛光垫压在下抛光板和上抛光板的抛光面上。
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