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37 条记录 (耗时 0.02 秒)

    OSCILLATION CIRCUIT AND ELECTRONIC DEVICE
    2.
    发明公开
    OSCILLATION CIRCUIT AND ELECTRONIC DEVICE 审中-公开

    公开(公告)号：US20230291355A1

    公开(公告)日：2023-09-14

    申请号：US18006122

    申请日：2021-05-07

    申请人： PIEZO STUDIO INC. ,  INTER-UNIVERSITY RESEARCH INSTITUTE CORPORATION HIGH ENERGY ACCELERATOR RESEARCH ORGANIZATION

    发明人： Masaya NOHARA ,  Noritoshi KIMURA

    IPC分类号： H03B5/36

    CPC分类号： H03B5/364 ,  H03B2200/0082 ,  H03B2200/0012

    摘要： An oscillation circuit includes an oscillator (X1), capacitors (C1, C2) connected between two terminals of the oscillator (X1), and an amplification circuit (A1) having an input terminal connected to a connecting point between the oscillator (X1) and the capacitor (C1) and an output terminal connected to a connecting point between the capacitor (C1) and the capacitor (C2). The amplification circuit (A1) includes an n-type transistor (M1) and a p-type transistor (M2) respectively having source terminals, the connecting point of which is connected to the output terminal of the amplification circuit (A1), a p-type transistor (M3) configured to connect a gate terminal of the n-type transistor (M1) to a power supply terminal at the time of an oscillation stop and disconnect the power supply terminal and the gate terminal of the n-type transistor (M1) at the time of an oscillation operation, and an n-type transistor (M4) configured to connect a gate terminal of the p-type transistor (M2) to ground at the time of the oscillation stop and disconnect a ground terminal and the gate terminal of the p-type transistor (M2) at the time of the oscillation operation. It is possible to implement low power consumption and high-speed oscillation activation of the oscillation circuit.

    Cell for X-ray analysis and X-ray analysis apparatus
    4.
    发明授权
    Cell for X-ray analysis and X-ray analysis apparatus 有权

    公开(公告)号：US10753889B2

    公开(公告)日：2020-08-25

    申请号：US16189004

    申请日：2018-11-13

    申请人： Inter-University Research Institute Corporation High Energy Accelerator Research Organization

    发明人： Ken'ichi Kimijima ,  Masao Kimura ,  Daiji Asahara ,  Yasuhiro Onishi

    IPC分类号： G01N23/20033 ,  G01N23/2055 ,  G01N23/085

    摘要： Provided are a cell for X-ray analysis and an X-ray analysis apparatus that enable simultaneous X-ray diffraction and X-ray absorption fine structure measurements of a material (sample) in the same field of view on the sample (same position on the sample). The cell for X-ray analysis of the present invention enables simultaneous X-ray diffraction and X-ray absorption fine structure measurements of a sample in the same field of view on the sample and includes a furnace including a space where the sample is held and a focused heater heating the sample, a first window provided to the furnace and through which X-rays directed at the sample is incident, a second window provided to the furnace and from which X-rays emerging from the sample exit, a third window provided to the furnace, and a holder that positions the sample in the space. The cell for X-ray analysis makes it possible to simultaneously measure X-ray diffraction of the sample at outside of the second window and X-ray absorption fine structure of the sample through the third window.

    METHOD AND APPARATUS FOR MEASURING SCATTERING INTENSITY DISTRIBUTION
    9.
    发明申请
    METHOD AND APPARATUS FOR MEASURING SCATTERING INTENSITY DISTRIBUTION 有权
    用于测量散射强度分布的方法和装置

    公开(公告)号：US20160069825A1

    公开(公告)日：2016-03-10

    申请号：US14651813

    申请日：2013-12-10

    申请人： inter-University Research Institute Corporation High Energy Accelerator Research Organization

    发明人： Tadashi Matsushita ,  Wolfgang Voegeli ,  Tetsuro Shirasawa ,  Toshio Takahashi ,  Etsuo Arakawa

    IPC分类号： G01N23/20

    CPC分类号： G01N23/20008 ,  G01N23/20 ,  G21K2201/062 ,  G21K2201/064

    摘要： It is an object of the present invention to provide a method and an apparatus for measuring a scattering intensity distribution capable of measuring a scattering intensity distribution in a reciprocal space in a short time. The method or apparatus for measuring a scattering intensity distribution causes X-rays emitted from an X-ray source (101) to be reflected by an X-ray optical element (102) so as to converge in the vicinity of a surface of a sample (SA), causes monochromatic X-rays condensed after passing through a plurality of optical paths to be incident on the sample at glancing angles (ω) that differ depending on the respective optical paths at a time in a state in which there is a correlation between an angle formed by each optical path of the monochromatic X-rays and a reference plane, and an angle formed by each optical path and a plane including the normal of the reference plane and an optical path located in the center of the respective optical paths, detects scattering intensities of the monochromatic X-rays scattered by the sample using a two-dimensional detector (103) and calculates a scattering intensity distribution in the reciprocal space based on the scattering intensity distribution detected by the two-dimensional detector and the correlation.

    摘要翻译： 本发明的目的是提供一种用于测量在短时间内能够测量往复空间中的散射强度分布的散射强度分布的方法和装置。 用于测量散射强度分布的方法或装置使得从X射线源（101）发射的X射线被X射线光学元件（102）反射，以便在样品表面附近会聚 （SA），使得在通过多个光路之后会聚的单色X射线以与扫描角（ω）不同的入射到样品的样品，所述扫描角（ω）在存在相关性的状态下的每个光路上不同 在由单色X射线的每个光路形成的角度和参考平面之间以及由每个光路形成的角度和包括基准平面的法线的平面和位于各个光路的中心的光路之间 使用二维检测器（103）检测由样本散射的单色X射线的散射强度，并且基于散射强度分布d计算往复空间中的散射强度分布 由二维检测器和相关性检测。