公开(公告)号：US07649027B2

公开(公告)日：2010-01-19

申请号：US10596826

申请日：2004-12-24

申请人： Genji Imai

发明人： Genji Imai

IPC分类号： C08J3/28 ,  C08F2/48 ,  C08F2/00 ,  C08F2/06 ,  C08F22/38

CPC分类号： C08F2/48 ,  Y02P20/544 ,  Y10T428/265

摘要： A process for producing a polymer, characterized in that a polymer having juts is produced by carrying out photopolymerization of at least one photopolymerizable polymerization precursor containing a photocurable compound having two or more unsaturated bonds by irradiation with active energy ray, optionally in the presence of at least one additive component for adding a polymer function, in a supercritical fluid or subcritical fluid; and a polymer having juts of 10 nm or more height, which height is 0.1-fold or more of the diameter of the juts, produced by the above process.

摘要翻译： 一种制备聚合物的方法，其特征在于具有突出性的聚合物通过用活性能量射线照射进行至少一种含有具有两个以上不饱和键的光固化性化合物的光聚合前体的光聚合而制备，任选地在 在超临界流体或亚临界流体中加入聚合物功能的至少一种添加剂组分; 和具有10nm或更高高度的突起的聚合物，其高度是通过上述方法产生的突起的直径的0.1倍或更多。

公开(公告)号：US20080226245A1

公开(公告)日：2008-09-18

申请号：US10589723

申请日：2005-02-24

申请人： Takahiro Higuchi ,  Genji Imai

发明人： Takahiro Higuchi ,  Genji Imai

IPC分类号： G02B6/036 ,  C08L63/00 ,  C08L67/00

CPC分类号： C08L63/00 ,  C08G18/0823 ,  C08G18/12 ,  C08G59/306 ,  G02B6/1221 ,  C08G18/58

摘要： Disclosed is an optical waveguide-forming curable resin composition and optical waveguide-forming curable dry film which are capable of forming cured resin articles that have high heat resistance, excellent mechanical strength and high transparency, and possess properties required for forming optical waveguides, such as low thermal expansion, low transmission loss, etc.The present invention provides a curable resin composition for forming an optical waveguide, the composition comprising a hydrolyzable silyl-containing silane-modified epoxy resin (A) having an average of at least one hydrolyzable silyl group and an average of at least one epoxy group per molecule; and a resin (B) having, per molecule, an average of at least one functional group that is reactive with an epoxy group; and an optical waveguide-forming curable dry film formed using the resin composition.

摘要翻译： 公开了一种能够形成具有高耐热性，优异的机械强度和高透明度的固化树脂制品的光波导形成固化树脂组合物和光波导形成固化型干膜，并且具有形成光波导所需的性能，例如 低热膨胀，低透射率损失等。本发明提供一种用于形成光波导的固化性树脂组合物，该组合物包含平均具有至少一个可水解甲硅烷基的可水解甲硅烷基的硅烷改性环氧树脂（A） 平均每个分子至少有一个环氧基团; 和每分子具有平均至少一个与环氧基反应的官能团的树脂（B）; 以及使用该树脂组合物形成的光波导形成性固化型干膜。

公开(公告)号：US20070185300A1

公开(公告)日：2007-08-09

申请号：US10588717

申请日：2005-02-25

申请人： Daisuke Kojima ,  Takahiro Higuchi ,  Genji Imai

发明人： Daisuke Kojima ,  Takahiro Higuchi ,  Genji Imai

IPC分类号： C08G18/00

CPC分类号： G02B6/1221 ,  C08F299/065 ,  C08G18/0823 ,  C08G18/673 ,  C09D175/16

摘要： The present invention provides a photocurable resin composition for forming an optical waveguide, the composition comprising (A) a carboxy-containing unsaturated polyurethane resin obtained by reacting a polyisocyanate compound (a), a carboxy-containing polyol (b) and a hydroxy-containing unsaturated compound (c), and (B) a solvent; a photocurable dry film for forming an optical waveguide; and an optical waveguide.

摘要翻译： 本发明提供了一种用于形成光波导的光固化树脂组合物，该组合物包含（A）通过使多异氰酸酯化合物（a），含羧基的多元醇（b）和含羟基的多元醇 不饱和化合物（c）和（B）溶剂; 用于形成光波导的可光固化干膜; 和光波导。

公开(公告)号：US20070148600A1

公开(公告)日：2007-06-28

申请号：US11616705

申请日：2006-12-27

申请人： Takeya HASEGAWA ,  Daisuke KOJIMA ,  Genji IMAI

发明人： Takeya HASEGAWA ,  Daisuke KOJIMA ,  Genji IMAI

IPC分类号： G03C5/00

CPC分类号： G03F7/0388 ,  G03F7/031 ,  G03F7/091

摘要： Disclosed are an active energy ray-curable resin composition, wherein when the active energy ray-curable resin composition is coated onto a substrate and made into a resist film with a predetermined thickness, a ratio (Y/X) of a quantity of a transmitted active energy ray (Y) after transmission through the resist film to a quantity of an initial active energy ray (X) on the surface of the resist film is 10% or less in a spectral sensitivity wavelength range of the resist film; and a method for forming a resist pattern by using this composition.

摘要翻译： 公开了一种活性能量射线固化树脂组合物，其中当活性能量射线固化树脂组合物涂覆在基材上并制成具有预定厚度的抗蚀剂膜时，所传输的量的比例（Y / X） 在抗蚀剂膜的光谱灵敏度波长范围内，通过抗蚀剂膜透射后的活性能量射线（Y）在抗蚀剂膜表面上的初始活性能量射线（X）的量为10％以下; 以及通过使用该组合物形成抗蚀剂图案的方法。

公开(公告)号：US07078158B2

公开(公告)日：2006-07-18

申请号：US10488469

申请日：2002-09-10

申请人： Chiaki Iwashima ,  Genji Imai ,  Takeya Hasegawa

发明人： Chiaki Iwashima ,  Genji Imai ,  Takeya Hasegawa

IPC分类号： G03C1/73 ,  G03F7/038

CPC分类号： C08F290/062 ,  C08F290/06 ,  C08F291/00 ,  G03F7/027 ,  G03F7/032 ,  G03F7/033 ,  Y10S430/106

摘要： A composition for activation energy rays comprising a specific vinyl ether group-containing compound (A) in which a vinyl ether group is bonded to a secondary or tertiary carbon atom, a polymer (B) having a carboxyl group and/or a hydroxyphenyl group, and a photo-acid generator compound (C) can form a resist pattern having an excellent sensitivity without carrying out any heat treatment at a temperature of 60° C. or more after irradiation.

摘要翻译： 包含其中乙烯基醚基团与仲或叔碳原子键合的特定的含乙烯基醚基的化合物（A），具有羧基和/或羟基苯基的聚合物（B）的活化能射线的组合物， 并且光酸发生剂化合物（C）可以形成具有优异灵敏度的抗蚀剂图案，而不在照射后在60℃以上的温度下进行任何热处理。

公开(公告)号：US06630285B2

公开(公告)日：2003-10-07

申请号：US09418368

申请日：1999-10-14

申请人： Genji Imai ,  Ritsuko Fukuda ,  Toshiro Takao ,  Keiichi Ikeda ,  Yoshihiro Yamamoto

发明人： Genji Imai ,  Ritsuko Fukuda ,  Toshiro Takao ,  Keiichi Ikeda ,  Yoshihiro Yamamoto

IPC分类号： G03F7039

CPC分类号： G03F7/0392 ,  B41C1/1008 ,  B41C2210/02 ,  B41C2210/06 ,  B41C2210/12 ,  B41C2210/24 ,  B41C2210/266 ,  B41M5/368

摘要： A pattern can be precisely formed by irradiating, with an active energy beam, a positive sensitive resin composition according to this invention comprising a base polymer, an ether-bond-containing olefinic unsaturated compound and an acid-generating agent, where the base polymer is a copolymer comprising the structural units represented by formulas (1) to (3): where R1 and R3 are each independently hydrogen or methyl and R2 is C1-C6 straight or branched unsubstituted alkyl or C1-C6 straight or branched substituted alkyl, wherein a, b and c are 0.05 to 0.7, 0.15 to 0.8 and 0.01 to 0.5, respectively and a+b+c=1.

摘要翻译： 通过用活性能量束照射本发明的含有基础聚合物，含醚键的烯属不饱和化合物和酸产生剂的正敏树脂组合物可精确地形成图案，其中基础聚合物为 包含由式（1）至（3）表示的结构单元的共聚物：其中R 1和R 3各自独立地为氢或甲基，R 2为C 1 -C 6直链或支链未取代的烷基或C1- C6直链或支链取代的烷基，其中a，b和c分别为0.05至0.7,0.15至0.8和0.01至0.5，a + b + c = 1。

公开(公告)号：US06331376B1

公开(公告)日：2001-12-18

申请号：US09582846

申请日：2000-07-05

申请人： Daisuke Kojima ,  Genji Imai ,  Jun Akui ,  Hideo Kogure ,  Osamu Isozaki

发明人： Daisuke Kojima ,  Genji Imai ,  Jun Akui ,  Hideo Kogure ,  Osamu Isozaki

IPC分类号： G03F7029

CPC分类号： G03F7/027 ,  C08F290/067 ,  C08G18/672 ,  C08G18/7642 ,  G03F7/0388 ,  C08G18/48 ,  C08G18/0823

摘要： An organic solvent based photocurable resist composition containing a photopolymerizable polyurethane compound having a repeating unit represented by the following formula: B—[X]n[Y]m—B, where X is represented by the formula: and Y is represented by the formula: —OOCHN—A—NHCOO(R2)—, A is a structural unit derived from a polyisocyanate compound, B is same or different and a structural unit derived from a hydroxy compound having at least one photopolymerizable unsaturated group at molecular terminals respectively and optionally containing an ether linkage, R1 is a structural unit derived from a carboxyl group-containing polyol compound, R2 is a structural unit derived from a polyol compound, n is an integer of 1 to 10, m is an integer of 1 to 10, provided that one X and one Y are bonded to each other, or three or more of X and/or Y are bonded to each other.

摘要翻译： 含有具有下式表示的重复单元的光聚合性聚氨酯化合物的有机溶剂型光固化抗蚀剂组合物：B- [X] n [Y] mB，其中X由下式表示：Y由下式表示： - OOCHN-A-NHCOO（R2） - ，A是衍生自多异氰酸酯化合物的结构单元，B相同或不同，并且衍生自在分子末端具有至少一个光聚合性不饱和基团的羟基化合物的结构单元，并且任选地含有 醚键，R1是衍生自含羧基的多元醇化合物的结构单元，R2是衍生自多元醇化合物的结构单元，n是1〜10的整数，m是1〜10的整数，条件是一个 X和一个Y彼此键合，或者X和/或Y中的三个或更多个彼此键合。

公开(公告)号：US5650259A

公开(公告)日：1997-07-22

申请号：US553978

申请日：1995-11-06

申请人： Genji Imai ,  Naozumi Iwasawa ,  Tsuguo Yamaoka

发明人： Genji Imai ,  Naozumi Iwasawa ,  Tsuguo Yamaoka

IPC分类号： G03F7/004 ,  G03F7/027 ,  G03F7/30 ,  G03F7/38 ,  G03F7/40

CPC分类号： G03F7/0045 ,  G03F7/027

摘要： A photosensitive composition which comprises, as essential components:(A) a polymer having carboxyl group(s) and hydroxyphenyl group(s), or (A') a polymer having carboxy group(s) and (A") a polymer having hydroxyphenyl group(s),(B) a compound having at least two vinyl ether groups in the molecule, and(C) a compound which generates an acid when irradiated with am actinic ray, and which is useful as a positive type photoresist having high resolution and excellent formability of fine image pattern, a material for printing, etc.; and a process for pattern formation using said composition.

摘要翻译： 作为必要成分的感光性组合物：（A）具有羧基和羟基苯基的聚合物，或（A'）具有羧基的聚合物和（A“）具有 羟基苯基，（B）分子中具有至少两个乙烯基醚基的化合物，（C）当用光激光照射时产生酸的化合物，并且可用作具有高分子量的正型光致抗蚀剂 精细图像图案的分辨率和优异的成形性，印刷材料等; 以及使用所述组合物的图案形成方法。

公开(公告)号：US20070259279A1

公开(公告)日：2007-11-08

申请号：US11632834

申请日：2005-07-22

申请人： Genji Imai ,  Toshikazu Murayama ,  Katsuhiro Ito ,  Haruhumi Hagino

发明人： Genji Imai ,  Toshikazu Murayama ,  Katsuhiro Ito ,  Haruhumi Hagino

IPC分类号： G03C1/485

CPC分类号： C08F220/06 ,  B41C1/1008 ,  B41C2210/02 ,  B41C2210/06 ,  B41C2210/22 ,  B41C2210/24 ,  B41M5/368 ,  Y10S430/106 ,  Y10S430/146

摘要： A near infrared ray activation type positive resist composition comprising (A) a vinyl-based polymer having a monomer unit having an alkali-soluble group blocked by an ether having an alkenyl group next to an ether oxygen, (B) a photothermal converting substance generating heat by a light in the near infrared region, (C) a thermal acid generator generating an acid by heat, can provide a near infrared ray activation type positive resist composition which can be subjected to an exposure treatment in a complete bright room such as under a white light and the like, gives desired sensitivity and resolution, and of which baking treatment conditions can be relaxed or a baking treatment can be omitted, and a pattern formation method using the same.

摘要翻译： 一种近红外线活化型正型抗蚀剂组合物，其包含（A）具有单体单元的乙烯基类聚合物，所述单体单元具有被乙醚氧以外具有烯基的醚封端的碱溶性基团，（B）产生光热转换物质 通过在近红外区域的光进行加热，（C）通过加热产生酸的热酸发生器可以提供近红外线激活型正性抗蚀剂组合物，其可以在诸如下面的完整的明亮的房间中进行曝光处理 白光等，具有期望的灵敏度和分辨率，并且可以放松烘烤处理条件或者可以省略烘烤处理，以及使用其的图案形成方法。

公开(公告)号：US20050239990A1

公开(公告)日：2005-10-27

申请号：US11018085

申请日：2004-12-20

申请人： Takahiro Higuchi ,  Genji Imai

发明人： Takahiro Higuchi ,  Genji Imai

IPC分类号： G02B6/02 ,  C08G18/00 ,  C08G18/08 ,  G02B6/10 ,  G02B6/12 ,  G02B6/13

CPC分类号： G02B6/138 ,  C08G18/0823 ,  G02B6/1221 ,  H05K3/285 ,  H05K2203/124

摘要： A curable resin composition for optical waveguide comprising, as essential components, a carboxyl group-containing urethane compound (A), a polymerizable unsaturated compound (B), a compound (C) containing two or more ring-opening polymerizable functional groups in the molecule, and, a radiation polymerization initiator (D); and, a method for forming an optical waveguide comprising, laminating a dry film composed of a thermosetting resin composition on the surface of a lower clad layer (I) and a core part (II) by heating, and curing this to form an upper clad layer (III), wherein Tg of the dry film is lower by 10° C. or more than Tg of the cured resin forming the core part (II), and the laminating temperature of the dry film is higher by 10° C. or more than Tg of the dry film, are disclosed.

摘要翻译： 作为必要成分的含有羧基的氨基甲酸酯化合物（A），聚合性不饱和化合物（B），分子中含有两个以上的开环聚合性官能团的化合物（C）作为必要成分的光波导用固化性树脂组合物， ，和放射线聚合引发剂（D）; 以及形成光波导的方法，包括：通过加热将由热固性树脂组合物构成的干膜层叠在下包层（I）的表面和芯部（II）上，并固化，形成上覆层 层（III），其中干膜的Tg比形成芯部（II）的固化树脂的Tg低10℃或更高，干膜的层压温度高10℃，或 公开了超过干膜的Tg。