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1.发明授权公开(公告)号：US08613807B2
公开(公告)日：2013-12-24
申请号：US12656459
申请日：2010-01-29
Applicant: Toshio Horie , Gaku Kitahara , Nobuaki Suzuki , Fumio Shimizu , Takao Kobayashi , Ken-ichi Suzuki , Shigeki Oshima
Inventor： Toshio Horie , Gaku Kitahara , Nobuaki Suzuki , Fumio Shimizu , Takao Kobayashi , Ken-ichi Suzuki , Shigeki Oshima
CPC classification number: H01B1/02 , C23C18/165 , C23C18/1689 , C23C18/1696 , C23C18/36 , C23C30/00
Abstract: A conductive film comprises a phosphide particle coated film formed by attaching raw material particles including phosphide particles comprising a compound of Ti and/or Fe, and P to a surface of a substrate material. This conductive film exhibits good corrosion resistant conductivity, and can be easily formed at low costs because of comprising the phosphide particle coated film. A corrosion-resistant conduction film comprises an iron-containing titanium phosphide layer containing Ti, Fe and P as essential basic elements. A corrosion-resistant conduction material having this corrosion-resistant conduction film on a surface of a substrate exhibits good corrosion resistance or conductivity. This corrosion-resistant conduction material can be obtained, for example, by a process comprising a plating step of forming an Ni plating layer on a surface of a Ti-based material substrate and a nitriding step of applying nitriding treatment to the Ti-based material substrate after the plating step at not more than 880 deg. C.
Abstract translation: 导电膜包括通过将包含Ti和/或Fe化合物的磷化物颗粒和P的原料颗粒附着到基材的表面而形成的磷化物颗粒涂布膜。 该导电膜表现出良好的耐腐蚀性导电性，并且由于包含磷化物粒子涂布膜，可以以低成本容易地形成。 耐腐蚀导电膜包括含有Ti，Fe和P作为必需碱性元素的含铁磷化钛层。 在基板表面具有这种耐腐蚀导电膜的耐腐蚀导电材料表现出良好的耐腐蚀性或导电性。 该耐腐蚀导电材料可以通过例如在Ti基材料基板的表面上形成Ni镀层的镀覆工序和对Ti系材料进行氮化处理的氮化工序 电镀步骤后的基板不大于880度。 C。
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Patent Agency Ranking
公开(公告)号：US20090202736A1
公开(公告)日：2009-08-13
申请号：US12299491
申请日：2007-05-18
Applicant: Toshio Horie , Gaku Kitahara , Nobuaki Suzuki , Hiroyuki Mori , Ken-ichi Suzuki , Isamu Ueda , Kazuaki Nishino
Inventor： Toshio Horie , Gaku Kitahara , Nobuaki Suzuki , Hiroyuki Mori , Ken-ichi Suzuki , Isamu Ueda , Kazuaki Nishino
CPC classification number: H01M8/0215 , C22C14/00 , C23C4/10 , C23C4/18 , C23C8/42 , C23C8/80 , H01M8/0206 , H01M8/0228 , Y02P70/56
Abstract: There is provided an electron conductive and corrosion-resistant material 3 containing titanium (Ti), boron (B) and nitrogen (N) in an atomic ratio satisfying 0.05≦[Ti]≦0.40, 0.20≦[B]≦0.40, and 0.35≦[N]≦0.55 (provided that [Ti]+[B]+[N]=1). Further, there is provided a method of manufacturing an electron conductive and corrosion-resistant material 3, wherein boron nitride powder adheres to the surface of a substrate 2 of which at least the surface is made of titanium or a titanium alloy, and is then heated. Furthermore, there is provided a method of manufacturing an electron conductive and corrosion-resistant material 3, wherein the surface of a substrate 2 of which at least the surface is made of titanium or a titanium alloy is borided and then heated. In addition, there is provided a method of manufacturing an electron conductive and corrosion-resistant material 3, wherein a TiB2 layer formed of TiB2 particles is formed by spraying TiB2 powder onto a metal substrate 2 and then nitriding the TiB2 layer.
Abstract translation: 提供了含有钛（Ti），硼（B）和氮（N）的电子导电耐腐蚀材料3，原子比满足0.05 <= [Ti] <= 0.40,0.20 [= [B] 0.40和0.35 <= [N] <= 0.55（条件是[Ti] + [B] + [N] = 1）。 此外，提供了一种制造电子传导和耐腐蚀材料3的方法，其中氮化硼粉末粘附到至少表面由钛或钛合金制成的基底2的表面，然后被加热 。 此外，提供一种制造电子传导和耐腐蚀材料3的方法，其中至少将表面由钛或钛合金制成的基板2的表面被硼化然后被加热。 此外，提供了一种制造电子传导和耐腐蚀材料3的方法，其中由TiB 2颗粒形成的TiB 2层通过将TiB 2粉末喷涂到金属基底2上然后氮化TiB 2层而形成。
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3.发明申请公开(公告)号：US20100200120A1
公开(公告)日：2010-08-12
申请号：US12656459
申请日：2010-01-29
Applicant: Toshio Horie , Gaku Kitahara , Nobuaki Suzuki , Fumio Shimizu , Takao Kobayashi , Ken-ichi Suzuki , Shigeki Oshima
Inventor： Toshio Horie , Gaku Kitahara , Nobuaki Suzuki , Fumio Shimizu , Takao Kobayashi , Ken-ichi Suzuki , Shigeki Oshima
CPC classification number: H01B1/02 , C23C18/165 , C23C18/1689 , C23C18/1696 , C23C18/36 , C23C30/00
Abstract: A conductive film comprises a phosphide particle coated film formed by attaching raw material particles including phosphide particles comprising a compound of Ti and/or Fe, and P to a surface of a substrate material. This conductive film exhibits good corrosion resistant conductivity, and can be easily formed at low costs because of comprising the phosphide particle coated film. A corrosion-resistant conduction film comprises an iron-containing titanium phosphide layer containing Ti, Fe and P as essential basic elements. A corrosion-resistant conduction material having this corrosion-resistant conduction film on a surface of a substrate exhibits good corrosion resistance or conductivity. This corrosion-resistant conduction material can be obtained, for example, by a process comprising a plating step of forming an Ni plating layer on a surface of a Ti-based material substrate and a nitriding step of applying nitriding treatment to the Ti-based material substrate after the plating step at not more than 880 deg. C.
Abstract translation: 导电膜包括通过将包含Ti和/或Fe化合物的磷化物颗粒和P的原料颗粒附着到基材的表面而形成的磷化物颗粒涂布膜。 该导电膜表现出良好的耐腐蚀性导电性，并且由于包含磷化物粒子涂布膜，可以以低成本容易地形成。 耐腐蚀导电膜包括含有Ti，Fe和P作为必需碱性元素的含铁磷化钛层。 在基板表面具有这种耐腐蚀导电膜的耐腐蚀导电材料表现出良好的耐腐蚀性或导电性。 该耐腐蚀导电材料可以通过例如在Ti基材料基板的表面上形成Ni镀层的镀覆工序和对Ti系材料进行氮化处理的氮化工序 电镀步骤后的基板不大于880度。 C。
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4.发明申请AMORPHOUS CARBON FILM, PROCESS FOR FORMING AMORPHOUS CARBON FILM, CONDUCTIVE MEMBER PROVIDED WITH AMORPHOUS CARBON FILM, AND FUEL CELL SEPARATOR 有权非晶碳膜，形成非晶碳膜的方法，用无定形碳膜提供的导电构件和燃料电池分离器公开(公告)号：US20090169968A1
公开(公告)日：2009-07-02
申请号：US12300179
申请日：2007-05-22
Applicant: Takashi Iseki , Yuka Yamada , Kazuyuki Nakanishi , Tadashi Oshima , Hiroyuki Mori , Toshio Horie , Ken-ichi Suzuki , Gaku Kitahara
Inventor： Takashi Iseki , Yuka Yamada , Kazuyuki Nakanishi , Tadashi Oshima , Hiroyuki Mori , Toshio Horie , Ken-ichi Suzuki , Gaku Kitahara
CPC classification number: C23C16/26 , H01M8/0206 , H01M8/0213 , H01M8/0228 , Y02P70/56 , Y10T428/30 , Y10T428/31504 , Y10T428/31678
Abstract: The amorphous carbon film of the present invention is an amorphous carbon film comprising carbon and hydrogen, wherein the amorphous carbon film contains not more than 30 atomic % (excluding 0%) of hydrogen and, when the entire amount of the carbon is taken as 100 atomic %, carbon having an sp2 hybrid orbital is present in an amount of not less than 70 atomic % and less than 100 atomic %. Conductivity is imparted to an amorphous carbon film by controlling the contents of hydrogen, Csp3 and the like to increase a structure comprising Csp2. This amorphous carbon film can be formed by plasma CVD using a reaction gas containing one or more gases selected from a carbocyclic compound gas containing carbon having an sp2 hybrid orbital, and a heterocyclic compound gas containing carbon having an sp2 hybrid orbital and silicon and/or nitrogen. By forming the amorphous carbon film on a surface of a substrate, a conductive member can be obtained.
Abstract translation: 本发明的无定形碳膜是含有碳和氢的无定形碳膜，其中无定形碳膜含有不超过30原子％（不包括0％）的氢，当碳的总量为100时 原子％，具有sp2混合轨道的碳以不小于70原子％且小于100原子％的量存在。 通过控制氢，Csp3等的含量来增加包含Csp2的结构，赋予无定形碳膜的电导率。 该无定形碳膜可以通过使用含有一种或多种气体的反应气体等离子体CVD形成，所述气体选自含有sp2混合轨道的碳的碳环化合物气体和含有sp2混合轨道和硅的碳的杂环化合物气体和/或 氮。 通过在基板的表面上形成非晶碳膜，可以获得导电部件。
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公开(公告)号：US08241530B2
公开(公告)日：2012-08-14
申请号：US12299491
申请日：2007-05-18
Applicant: Toshio Horie , Gaku Kitahara , Nobuaki Suzuki , Hiroyuki Mori , Ken-ichi Suzuki , Isamu Ueda , Kazuaki Nishino
Inventor： Toshio Horie , Gaku Kitahara , Nobuaki Suzuki , Hiroyuki Mori , Ken-ichi Suzuki , Isamu Ueda , Kazuaki Nishino
CPC classification number: H01M8/0215 , C22C14/00 , C23C4/10 , C23C4/18 , C23C8/42 , C23C8/80 , H01M8/0206 , H01M8/0228 , Y02P70/56
Abstract: There is provided an electron conductive and corrosion-resistant material 3 containing titanium (Ti), boron (B) and nitrogen (N) in an atomic ratio satisfying 0.05≦[Ti]≦0.40, 0.20≦[B]≦0.40, and 0.35≦[N]≦0.55 (provided that [Ti]+[B]+[N]=1). Further, there is provided a method of manufacturing an electron conductive and corrosion-resistant material 3, wherein boron nitride powder adheres to the surface of a substrate 2 of which at least the surface is made of titanium or a titanium alloy, and is then heated. Furthermore, there is provided a method of manufacturing an electron conductive and corrosion-resistant material 3, wherein the surface of a substrate 2 of which at least the surface is made of titanium or a titanium alloy is borided and then heated. In addition, there is provided a method of manufacturing an electron conductive and corrosion-resistant material 3, wherein a TiB2 layer formed of TiB2 particles is formed by spraying TiB2 powder onto a metal substrate 2 and then nitriding the TiB2 layer.
Abstract translation: 提供了含有钛（Ti），硼（B）和氮（N）的电子导电和耐腐蚀材料3，原子比满足0.05＆nlE; [Ti]＆nlE; 0.40,0.20＆lt; 1; [B]＆nlE; 0.40和0.35＆nlE; [N]＆nlE; 0.55（条件是[Ti] + [B] + [N] = 1）。 此外，提供了一种制造电子传导和耐腐蚀材料3的方法，其中氮化硼粉末粘附到至少表面由钛或钛合金制成的基底2的表面，然后被加热 。 此外，提供一种制造电子传导和耐腐蚀材料3的方法，其中至少将表面由钛或钛合金制成的基板2的表面被硼化然后被加热。 此外，提供了一种制造电子传导和耐腐蚀材料3的方法，其中由TiB 2颗粒形成的TiB 2层通过将TiB 2粉末喷涂到金属基底2上然后氮化TiB 2层而形成。
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6.发明授权Amorphous carbon film, process for forming amorphous carbon film, conductive member provided with amorphous carbon film, and fuel cell separator 有权无定形碳膜，无定形碳膜的形成方法，具有无定形碳膜的导电部件和燃料电池分离器公开(公告)号：US08119242B2
公开(公告)日：2012-02-21
申请号：US12300179
申请日：2007-05-22
Applicant: Takashi Iseki , Yuka Yamada , Kazuyuki Nakanishi , Tadashi Oshima , Hiroyuki Mori , Toshio Horie , Ken-ichi Suzuki , Gaku Kitahara
Inventor： Takashi Iseki , Yuka Yamada , Kazuyuki Nakanishi , Tadashi Oshima , Hiroyuki Mori , Toshio Horie , Ken-ichi Suzuki , Gaku Kitahara
IPC: B32B9/00
CPC classification number: C23C16/26 , H01M8/0206 , H01M8/0213 , H01M8/0228 , Y02P70/56 , Y10T428/30 , Y10T428/31504 , Y10T428/31678
Abstract: The amorphous carbon film of the present invention is an amorphous carbon film comprising carbon and hydrogen, wherein the amorphous carbon film contains not more than 30 atomic % (excluding 0%) of hydrogen and, when the entire amount of the carbon is taken as 100 atomic %, carbon having an sp2 hybrid orbital is present in an amount of not less than 70 atomic % and less than 100 atomic %. Conductivity is imparted to an amorphous carbon film by controlling the contents of hydrogen, Csp3 and the like to increase a structure comprising Csp2. This amorphous carbon film can be formed by plasma CVD using a reaction gas containing one or more gases selected from a carbocyclic compound gas containing carbon having an sp2 hybrid orbital, and a heterocyclic compound gas containing carbon having an sp2 hybrid orbital and silicon and/or nitrogen. By forming the amorphous carbon film on a surface of a substrate, a conductive member can be obtained.
Abstract translation: 本发明的无定形碳膜是含有碳和氢的无定形碳膜，其中无定形碳膜含有不超过30原子％（不包括0％）的氢，当碳的总量为100时 原子％，具有sp2混合轨道的碳以不小于70原子％且小于100原子％的量存在。 通过控制氢，Csp3等的含量来增加包含Csp2的结构，赋予无定形碳膜的电导率。 该无定形碳膜可以通过使用含有一种或多种气体的反应气体等离子体CVD形成，所述气体选自含有sp2混合轨道的碳的碳环化合物气体和含有sp2混合轨道和硅的碳的杂环化合物气体和/或 氮。 通过在基板的表面上形成非晶碳膜，可以获得导电部件。
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