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    ATTACHMENT OF A DEVICE TO A SUBSTRATE FOR OPERATION UNDER VARIABLE CONDITIONS
    1.
    发明申请
    ATTACHMENT OF A DEVICE TO A SUBSTRATE FOR OPERATION UNDER VARIABLE CONDITIONS 有权
    将设备连接到基于不同条件下运行的基板

    公开(公告)号：US20130000098A1

    公开(公告)日：2013-01-03

    申请号：US13583744

    申请日：2011-03-09

    申请人： Scott Moulzolf ,  Alberto Canabal ,  Thomas Moonlight ,  Mauricio Pereira Da Cunha ,  George Harris

    发明人： Scott Moulzolf ,  Alberto Canabal ,  Thomas Moonlight ,  Mauricio Pereira Da Cunha ,  George Harris

    IPC分类号： B23P17/04

    CPC分类号： F16B11/006 ,  B81B7/0048 ,  H01L24/90 ,  H01L2924/1306 ,  H01L2924/14 ,  Y10T29/49826 ,  Y10T29/53961 ,  H01L2924/00

    摘要： Methods and systems for attaching a device to a substrate for operation of the device under variable conditions includes attaching a device to a substrate, disposing a removable material over a first portion of the device, positioning a second portion of the device adjacent to the substrate, operably attaching a retainer to the substrate adjacent to the device with a part of the retainer disposed over the removable material, and removing the removable material to form a gap between the device and the retainer so that the device is retained on the substrate, and wherein the gap allows the device to move freely relative to the retainer and the substrate in response to changes in temperature.

    摘要翻译： 用于将装置附接到基板以在可变条件下操作装置的方法和系统包括将装置附接到基板，将可移除材料设置在装置的第一部分上，将装置的第二部分定位成与基板相邻， 将保持器可操作地附接到邻近设备的基板，其中保持器的一部分设置在可移除材料上方，并且移除可移除材料以在装置和保持器之间形成间隙，使得装置保持在基板上，并且其中 间隙允许装置响应于温度变化而相对于保持器和衬底自由移动。

    REDUCTION IN STAGE MOVEMENT REACTION FORCE IN AN ELECTRON BEAM LITHOGRAPHY MACHINE
    2.
    发明申请
    REDUCTION IN STAGE MOVEMENT REACTION FORCE IN AN ELECTRON BEAM LITHOGRAPHY MACHINE 审中-公开
    电子束光刻机中阶段运动反应力的降低

    公开(公告)号：US20100096567A1

    公开(公告)日：2010-04-22

    申请号：US12445247

    申请日：2007-10-11

    申请人： Paul George Harris ,  John Melbourne Tingay

    发明人： Paul George Harris ,  John Melbourne Tingay

    IPC分类号： B41F1/18

    CPC分类号： H01J37/20 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/70716 ,  H01J37/3174 ,  H01J2237/0216 ,  H01J2237/20221 ,  H01L21/68785

    摘要： An electron beam lithography machine (10) comprises a base structure in the form of a plinth (14), a plurality of legs (22), which preferably include pneumatic damping elements (23), for supporting the plinth relative to a support surface (24), the legs defining a support plane (A) for the plinth, an electron beam column (11) carried by the plinth and a stage (17, 18) arranged in a vacuum chamber at the plinth to be movable substantially parallel to the support plane and to carry a workpiece (13) to be acted on by an electron beam generated by the column. The centre of gravity (25) of the stage, which can be movable along X and Y axes of a co-ordinate system of the machine, is disposed in or adjacent to the support plane so that a reaction force to the stage movement is oriented in the support plane or in an adjacent, parallel plane.

    摘要翻译： 电子束光刻机（10）包括底座（14）形式的基座结构，多个支腿（22），其优选地包括用于相对于支撑表面支撑底座的气动阻尼元件（23） 24），所述腿限定用于底座的支撑平面（A），由底座承载的电子束柱（11）和布置在基座上的真空室中的台架（17,18），以可基本平行于底座 并承载由柱产生的电子束作用的工件（13）。 台架的重心（25）能够沿着机器的坐标系的X轴和Y轴移动，设置在支撑平面中或邻近支撑平面，从而使台面运动的反作用力定向 在支撑平面中或在相邻的平行平面中。

    Apparatus support
    6.
    发明授权
    Apparatus support 失效
    仪器支持

    公开(公告)号：US08006950B2

    公开(公告)日：2011-08-30

    申请号：US12522860

    申请日：2008-01-08

    申请人： Paul George Harris

    发明人： Paul George Harris

    IPC分类号： F16M11/00

    CPC分类号： H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  F16F1/3732 ,  F16F15/08

    摘要： An apparatus support (11) with a damping characteristic comprises a rigid reinforcing component, in particular a steel plate (19), encapsulated by a body (16) of compliant material, particularly a composite of particulate mineral material and synthetic binder. The plate (19) defines an opening (19a) at spacing from the upper side of the body (16) and a mounting ring (21) is embedded in the body so as to be disposed at least partly above the opening. The ring (21) has a peripheral flange (21a) which is spaced from the plate (19) and from the upper side of the body and overlaps the plate in vertical projection. Material of the body is thus disposed above the flange (21a) and also sandwiched between the flange and the plate so that a damping zone is present around the ring both above and below the flange.

    摘要翻译： 具有阻尼特性的装置支撑件（11）包括由柔性材料的主体（16）封装的刚性增强部件，特别是钢板（19），特别是颗粒矿物材料和合成粘结剂的复合材料。 板（19）限定了与主体（16）的上侧间隔开的开口（19a），并且安装环（21）嵌入在主体中，以便至少部分地设置在开口的上方。 环（21）具有与板（19）和主体的上侧隔开并与垂直投影重叠的周边凸缘（21a）。 因此，本体的材料设置在凸缘（21a）上方并且也夹在凸缘和板之间，使得在凸缘上方和下方的环周围存在阻尼区。

    APPARATUS SUPPORT STRUCTURE
    7.
    发明申请
    APPARATUS SUPPORT STRUCTURE 审中-公开
    装置支撑结构

    公开(公告)号：US20100044546A1

    公开(公告)日：2010-02-25

    申请号：US12522868

    申请日：2008-01-08

    申请人： Paul George Harris

    发明人： Paul George Harris

    IPC分类号： F16M13/00 ,  B29C41/20

    CPC分类号： H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  F16F15/04

    摘要： An apparatus support structure (11) with a damping characteristic comprises a rigid steel frame resistant to loading in bending and tension, a cladding (16) encapsulating the frame, and an apparatus mounting ring (21). The cladding is formed by a solidified composite casting material which is based on particulate mineral or metallic material, for example, granite, and a synthetic binder, for example epoxy resin, and which has a compliance permitting damping of movement transmitted between the structure and apparatus mounted on the ring (21). The structure can be produced by encasing the frame and ring in a mould constructed in situ around the frame and filing the mould with the cladding material in fluid state.

    摘要翻译： 具有阻尼特性的装置支撑结构（11）包括抵抗弯曲和张力加载的刚性钢框架，封装框架的包层（16）和装置安装环（21）。 包层由基于颗粒状矿物或金属材料（例如花岗岩）和合成粘合剂（例如环氧树脂）的固化复合材料铸造材料形成，并且其具有柔性允许阻挡在结构和装置之间传递的运动 安装在环（21）上。 该结构可以通过将框架和环包围在围绕框架的原位构造的模具中并且将流体状态的包层材料模制到模具中来生产。

    MATERIALS FOR USE IN ELECTROPHORETIC DISPLAYS
    8.
    发明申请
    MATERIALS FOR USE IN ELECTROPHORETIC DISPLAYS 有权
    用于电泳显示的材料

    公开(公告)号：US20070146310A1

    公开(公告)日：2007-06-28

    申请号：US11625907

    申请日：2007-01-23

    申请人： Richard Paolini ,  George Harris ,  Charles Honeyman ,  Craig Herb ,  Richard Webber ,  Thomas Whitesides

    发明人： Richard Paolini ,  George Harris ,  Charles Honeyman ,  Craig Herb ,  Richard Webber ,  Thomas Whitesides

    IPC分类号： G09G3/34

    CPC分类号： G09G3/344 ,  E06B9/24 ,  E06B2009/2464 ,  G02F1/167 ,  G02F2001/1678 ,  G02F2203/11

    摘要： The image stability of electrophoretic media, comprising a plurality of particles disposed in a fluid and capable of moving through the fluid upon application of an electric field to the medium, can be improved by including in the fluid either a polystyrene or an aggregating diblock copolymer which forms micelle-like structures in the fluid, the diblock copolymer having a first block soluble in the fluid and a second block not swellable by the fluid. In variable transmission electrophoretic media, haze can be reduced by using as the fluid a mixture of a partially hydrogenated aromatic hydrocarbon and a terpene.

    摘要翻译： 可以通过在流体中包括聚苯乙烯或聚集二嵌段共聚物来改善电泳介质的图像稳定性，所述电泳介质包括设置在流体中并且能够通过向介质施加电场而流过流体的多个颗粒， 在流体中形成胶束状结构，二嵌段共聚物具有可溶于流体的第一嵌段和不能被流体膨胀的第二嵌段。 在可变透射电泳介质中，通过使用部分氢化的芳族烃和萜烯的混合物作为流体，可以降低雾度。

    I-beam curing system
    9.
    发明申请
    I-beam curing system 审中-公开
    工字梁固化系统

    公开(公告)号：US20060101755A1

    公开(公告)日：2006-05-18

    申请号：US11274559

    申请日：2005-11-15

    申请人： George Harris

    发明人： George Harris

    IPC分类号： E04B1/74

    CPC分类号： H05B6/708 ,  H05B6/78

    摘要： An I-beam curing device having microwave waveguides with slots on the broad side thereof. The flanges of the I-beam pass through the slots in the waveguides to be subject to the microwave fields therein so as to allow the treating of any material passed through the slots.

    摘要翻译： 一种光束固化装置，其具有在其宽侧上具有狭槽的微波波导。 I型光束的凸缘穿过波导管中的狭槽，以便在其中进行微波场，以便允许处理通过狭槽的任何材料。

    Cooling of a device for influencing an electron beam
    10.
    发明授权
    Cooling of a device for influencing an electron beam 失效
    用于影响电子束的装置的冷却

    公开(公告)号：US06998621B2

    公开(公告)日：2006-02-14

    申请号：US10760843

    申请日：2004-01-20

    申请人： Paul George Harris

    发明人： Paul George Harris

    IPC分类号： H01J37/26

    CPC分类号： H01J37/147 ,  H01J2237/002 ,  H01J2237/15

    摘要： A device for influencing an electron beam, in particular a beam deflector (10), comprises a cylindrical support body (11) with an axial passage (12) through which the beam can propagate and axially spaced sets of coils (14) supported by the body and operable by electrical energy to produce electromagnetic fields for deflection of the beam. The device includes a cooling system for counteracting temperature rise in the body (11) due to operation of the coils (14). The system comprises a pipe (15) of compliant material extending helically around and thermally conductively coupled, preferably adhesively bonded, to the support body (11) and serving to conduct liquid coolant for heat exchange with the body (11) over substantially all the external circumferential surface thereof. The cooling system further includes a pump (16) for conveying the coolant through the pipe (15) in a generally laminar flow so that, in conjunction with the flow path and pipe material, generation of vibrations is largely avoided and any vibrations that are generated are absorbed by the pipe (15) rather than transmitted to the body (11).

    摘要翻译： 用于影响电子束，特别是光束偏转器（10）的装置包括具有轴向通道（12）的圆柱形支撑体（11），梁可以通过该轴向通道传播并且轴向间隔开的一组线圈（14）由 身体并且通过电能可操作以产生用于梁的偏转的电磁场。 该装置包括用于抵消由于线圈（14）的操作而导致主体（11）中的温度上升的冷却系统。 该系统包括柔性材料管（15），该管道（15）螺旋地延伸并且热传导耦合，优选地粘合到支撑体（11）上，并且用于在基本上所有的外部上传导液体冷却剂以与身体（11）进行热交换 圆周表面。 冷却系统还包括用于以大致层流的方式通过管道（15）输送冷却剂的泵（16），使得与流动路径和管道材料一起，大大地避免产生振动并产生任何振动 被管道（15）吸收，而不是被传送到主体（11）。