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    ALIGNMENT STRATEGY OPTIMIZATION METHOD
    3.
    发明申请
    ALIGNMENT STRATEGY OPTIMIZATION METHOD 有权
    对齐策略优化方法

    公开(公告)号：US20060103822A1

    公开(公告)日：2006-05-18

    申请号：US10990335

    申请日：2004-11-17

    申请人： Roy Werkman ,  Franciscus Van Bilsen ,  Bart Swinnen

    发明人： Roy Werkman ,  Franciscus Van Bilsen ,  Bart Swinnen

    IPC分类号： G03B27/52

    CPC分类号： G03F7/70633 ,  G03F9/7046

    摘要： The invention relates to a method of optimizing an alignment strategy for processing batches of substrates in a lithographic projection apparatus. First, all substrates in a plurality of batches of substrates in the lithographic projection apparatus are sequentially aligned and exposed using a predefined alignment strategy. Then, alignment data is determined for each substrate in the plurality of batches of substrates. Next, at least one substrate in each batch of substrates is selected to render a set of selected substrates comprising at least one substrate in each batch. In a metrology tool, overlay data for each of the selected substrates is determined. Then, overlay indicator values for a predefined overlay indicator are calculated for the predefined alignment strategy and for other possible alignment strategies. In this calculation, the alignment data and the overlay data of the selected substrates is used. Finally, an optimal alignment strategy is determined, the strategy being defined as alignment strategy among the predefined alignment strategy and the other possible alignment strategies with a lowest overlay indicator value.

    摘要翻译： 本发明涉及一种优化用于在光刻投影设备中处理批次的基板的对准策略的方法。 首先，光刻投影设备中的多批基板中的所有基板使用预定义的对准策略顺序对准和曝光。 然后，确定多批基板中的每个基板的对准数据。 接下来，选择每批衬底中的至少一个衬底，以在每批中提供包含至少一个衬底的一组选定衬底。 在计量工具中，确定每个所选择的基底的覆盖数据。 然后，为预定义的对齐策略和其他可能的对准策略计算预定义重叠指示符的覆盖指示符值。 在该计算中，使用所选择的基板的对准数据和覆盖数据。 最后，确定最佳对准策略，该策略被定义为预定义对准策略中的对准策略和具有最低覆盖指标值的其他可能的对准策略。

    Low-mass susceptor improvements
    4.
    发明申请
    Low-mass susceptor improvements 审中-公开
    低质量感受器改进

    公开(公告)号：US20050183829A1

    公开(公告)日：2005-08-25

    申请号：US11095335

    申请日：2005-03-21

    申请人： Matthew Goodman ,  Ivo Raaijmakers ,  Loren Jacobs ,  Franciscus van Bilsen ,  Michael Meyer ,  Eric Barrett

    发明人： Matthew Goodman ,  Ivo Raaijmakers ,  Loren Jacobs ,  Franciscus van Bilsen ,  Michael Meyer ,  Eric Barrett

    IPC分类号： H01L21/683 ,  C23C16/458 ,  C23C16/48 ,  H01L21/205 ,  H01L21/26 ,  H01L21/687 ,  C23F1/00

    CPC分类号： H01L21/68735 ,  C23C16/4581 ,  C23C16/4585 ,  C23C16/481 ,  H01L21/68721 ,  H01L21/68728 ,  H01L21/68785

    摘要： Improvements in the design of a low mass wafer holder are disclosed. The improvements include the use of peripherally located, integral lips to space a wafer or other substrate above the base plate of the wafer holder. A uniform gap is thus provided between the wafer and the base plate, such as will temper rapid heat exchanges, allow gas to flow between the wafer and wafer holder during wafer pick-up, and keep the wafer holder thermally coupled with the wafer. At the same time, thermal disturbance from lip contact with the wafer is reduced. Gas flow during pick-up can be provided through radial channels in a wafer holder upper surface, or through backside gas passages. A thicker ring is provided at the wafer holder perimeter, and is provided in some embodiments as an independent piece to accommodate stresses accompanying thermal gradients. Self-centering mechanisms are provided to keep the wafer holder centered relative to a spider which is subject to differential thermal expansion.

    摘要翻译： 公开了一种低质量晶片支架的设计改进。 这些改进包括使用外围定位的整体式唇缘以将晶片或其它基板放置在晶片保持器的基板之上。 因此，在晶片和基板之间提供均匀的间隙，例如将回火快速热交换，允许气体在晶片拾取期间在晶片和晶片保持器之间流动，并保持晶片保持器与晶片热耦合。 同时，与晶片的唇接触的热扰动减小。 拾取期间的气流可以通过晶片保持器上表面中的径向通道或通过背侧气体通道来提供。 在晶片保持器周边处提供较厚的环，并且在一些实施例中作为独立件提供以适应伴随热梯度的应力。 提供自对中机构以保持晶片保持架相对于经受不同热膨胀的蜘蛛座居中。