公开(公告)号：US20110013167A1

公开(公告)日：2011-01-20

申请号：US12890256

申请日：2010-09-24

申请人： Vladimir Mihailovitch KRIVTSUN ,  Vadim Yevgenyevich Banine ,  Vladimir Vitalevich Ivanov ,  Evgeny Dmitrievich Korop ,  Konstantin Nikolaevich Koshelev ,  Yurii Victorovitch Sidelnikov ,  Oleg Yakushev

发明人： Vladimir Mihailovitch KRIVTSUN ,  Vadim Yevgenyevich Banine ,  Vladimir Vitalevich Ivanov ,  Evgeny Dmitrievich Korop ,  Konstantin Nikolaevich Koshelev ,  Yurii Victorovitch Sidelnikov ,  Oleg Yakushev

IPC分类号： G03B27/54 ,  H01J3/14 ,  G03B27/42

CPC分类号： G03F7/70916 ,  B82Y10/00 ,  G03F7/70033 ,  G03F7/70858 ,  G03F7/70883 ,  G03F7/70983

摘要： An apparatus for forming a beam of electromagnetic radiation. The apparatus includes a plasma radiation source, a foil trap provided with a plurality of thin foils that extend substantially parallel to the direction of radiation from the plasma source, and a grid disposed between the plasma radiation source and the foil trap. A space is located between the grid and the foil trap. An electrical potential application circuit is constructed and arranged to apply an electrical potential to the grid so that the grid repels electrons emitted by the plasma radiation source and creates a positive space charge between the grid and the foil trap to deflect ions emitted by the plasma radiation source to the foil trap. A distance between the grid and the foil trap is at least equal to one-half of a radius of the foil trap.

摘要翻译： 一种用于形成电磁辐射束的装置。 该装置包括等离子体辐射源，设置有基本上平行于来自等离子体源的辐射方向延伸的多个薄箔的箔陷阱以及设置在等离子体辐射源和箔捕获器之间的栅格。 一个空间位于网格和箔陷阱之间。 构造并布置电位施加电路以向电网施加电势，使得电网排斥由等离子体辐射源发射的电子，并在栅格和箔陷阱之间产生正空间电荷，以偏转由等离子体辐射发射的离子 来源于箔陷阱。 栅格和箔阱之间的距离至少等于箔阱的半径的一半。

公开(公告)号：US06264802B1

公开(公告)日：2001-07-24

申请号：US09242415

申请日：1999-02-16

申请人： Alexandr Semenovich Kamrukov ,  Sergei Gennadievich Shashkovsky ,  Mikhail Stepanovich Yalovik ,  Evgeny Dmitrievich Korop ,  Vladimir Pavlovich Arkhipov ,  Nikolai Pavlovich Kozlov ,  Valery Anatolievich Kukanov

发明人： Alexandr Semenovich Kamrukov ,  Sergei Gennadievich Shashkovsky ,  Mikhail Stepanovich Yalovik ,  Evgeny Dmitrievich Korop ,  Vladimir Pavlovich Arkhipov ,  Nikolai Pavlovich Kozlov ,  Valery Anatolievich Kukanov

IPC分类号： C07C100

CPC分类号： C02F1/32 ,  A61L2/10 ,  C02F1/722 ,  C02F1/725 ,  C02F1/78

摘要： A method of treatment of liquid, air and surfaces using UV radiation with a pulse duration of 10−6 to 10−3 sec. and a radiation intensity of at least 100 kWt/m2, using a plasma radiation source with a pulsed storage element, wherein the energy stored in the storage element at the time of discharge, the pulse duration and the area of the radiating surface of the radiation source are interrelated as follows: W0/A Srad t ½>1, where W0, is the energy stored in the storage element, Joules; Srad is the area of the radiating surface of the radiation source, m2; t½ is the radiation pulse duration at mid-height of a peak, sec.; A=108 Wt/m2 is the constant coefficient. A device for the UV treatment of liquid, air and surfaces includes a secondary winding integrated in a series with a charged condenser, and a pulsed lamp to form a discharging circuit.

摘要翻译： 使用脉冲持续时间为10-6至10-3秒的UV辐射处理液体，空气和表面的方法。 以及使用具有脉冲存储元件的等离子体辐射源的至少100kWt / m 2的辐射强度，其中在放电时存储在存储元件中的能量，辐射的辐射表面的脉冲持续时间和面积 源是相互关联的，如下所示：W0 / A Srad t½> 1，其中W0是存储元件中的能量，焦耳; Srad是辐射源辐射面的面积，m2; t 1/2是峰值的中间高度处的辐射脉冲持续时间。 A = 108 Wt / m2是常数系数。 用于液体，空气和表面的UV处理的装置包括与充电的冷凝器串联集成的次级绕组和用于形成放电电路的脉冲灯。

公开(公告)号：US20080192218A1

公开(公告)日：2008-08-14

申请号：US11705822

申请日：2007-02-14

申请人： Vladimir Mihailovitch Krivtsun ,  Vadim Yevgenyevich Banine ,  Vladimir Vitalevich Ivanov ,  Evgeny Dmitrievich Korop ,  Konstantin Nikolaevich Koshelev ,  Yurii Victorovitch Sidelnikov ,  Oleg Yakushev

发明人： Vladimir Mihailovitch Krivtsun ,  Vadim Yevgenyevich Banine ,  Vladimir Vitalevich Ivanov ,  Evgeny Dmitrievich Korop ,  Konstantin Nikolaevich Koshelev ,  Yurii Victorovitch Sidelnikov ,  Oleg Yakushev

IPC分类号： G03B27/42 ,  G21K5/00

CPC分类号： G03F7/70916 ,  B82Y10/00 ,  G03F7/70033 ,  G03F7/70858 ,  G03F7/70883 ,  G03F7/70983

摘要： An apparatus for forming a beam of electromagnetic radiation includes a plasma radiation source, and a foil trap provided with a plurality of thin foils that extend substantially parallel to the direction of radiation from the plasma source. A grid is disposed between the plasma radiation source and the foil trap. A space is located between the grid and the foil trap. The apparatus also include an electrical potential application circuit that is constructed and arranged to apply an electrical potential to the grid so that the grid repels electrons emitted by the plasma radiation source and creates a positive space charge between the grid and the foil trap to deflect ions emitted by the plasma radiation source to the foil trap.

摘要翻译： 用于形成电磁辐射束的装置包括等离子体辐射源和设置有大致平行于来自等离子体源的辐射方向延伸的多个薄箔的箔阱。 栅格设置在等离子体辐射源和箔阱之间。 一个空间位于网格和箔陷阱之间。 该装置还包括电位施加电路，其构造和布置成向电网施加电势，使得电网排斥由等离子体辐射源发射的电子，并在栅格和箔陷阱之间产生正空间电荷以偏转离子 由等离子体辐射源发射到箔阱。

公开(公告)号：US08294128B2

公开(公告)日：2012-10-23

申请号：US12890256

申请日：2010-09-24

申请人： Vladimir Mihailovitch Krivtsun ,  Vadim Yevgenyevich Banine ,  Vladimir Vitalevich Ivanov ,  Evgeny Dmitrievich Korop ,  Konstantin Nikolaevich Koshelev ,  Yurii Victorovitch Sidelnikov ,  Oleg Yakushev

发明人： Vladimir Mihailovitch Krivtsun ,  Vadim Yevgenyevich Banine ,  Vladimir Vitalevich Ivanov ,  Evgeny Dmitrievich Korop ,  Konstantin Nikolaevich Koshelev ,  Yurii Victorovitch Sidelnikov ,  Oleg Yakushev

IPC分类号： G03B27/42

CPC分类号： G03F7/70916 ,  B82Y10/00 ,  G03F7/70033 ,  G03F7/70858 ,  G03F7/70883 ,  G03F7/70983

摘要： An apparatus for forming a beam of electromagnetic radiation. The apparatus includes a plasma radiation source, a foil trap provided with a plurality of thin foils that extend substantially parallel to the direction of radiation from the plasma source, and a grid disposed between the plasma radiation source and the foil trap. A space is located between the grid and the foil trap. An electrical potential application circuit is constructed and arranged to apply an electrical potential to the grid so that the grid repels electrons emitted by the plasma radiation source and creates a positive space charge between the grid and the foil trap to deflect ions emitted by the plasma radiation source to the foil trap. A distance between the grid and the foil trap is at least equal to one-half of a radius of the foil trap.

摘要翻译： 一种用于形成电磁辐射束的装置。 该装置包括等离子体辐射源，设置有基本上平行于来自等离子体源的辐射方向延伸的多个薄箔的箔陷阱以及设置在等离子体辐射源和箔捕获器之间的栅格。 一个空间位于网格和箔陷阱之间。 构造并布置电位施加电路以向电网施加电势，使得电网排斥由等离子体辐射源发射的电子，并在栅格和箔陷阱之间产生正空间电荷，以偏转由等离子体辐射发射的离子 来源于箔陷阱。 栅格和箔阱之间的距离至少等于箔阱的半径的一半。

公开(公告)号：US07825390B2

公开(公告)日：2010-11-02

申请号：US11705822

申请日：2007-02-14

申请人： Vladimir Mihallovitch Krivtsun ,  Vadim Yevgenyevich Banine ,  Vladimir Vitalevich Ivanov ,  Evgeny Dmitrievich Korop ,  Konstantin Nikolaevich Koshelev ,  Yurii Victorovitch Sidelnikov ,  Oleg Yakushev

发明人： Vladimir Mihallovitch Krivtsun ,  Vadim Yevgenyevich Banine ,  Vladimir Vitalevich Ivanov ,  Evgeny Dmitrievich Korop ,  Konstantin Nikolaevich Koshelev ,  Yurii Victorovitch Sidelnikov ,  Oleg Yakushev

IPC分类号： G03B27/42

CPC分类号： G03F7/70916 ,  B82Y10/00 ,  G03F7/70033 ,  G03F7/70858 ,  G03F7/70883 ,  G03F7/70983

摘要： An apparatus for forming a beam of electromagnetic radiation includes a plasma radiation source, and a foil trap provided with a plurality of thin foils that extend substantially parallel to the direction of radiation from the plasma source. A grid is disposed between the plasma radiation source and the foil trap. A space is located between the grid and the foil trap. The apparatus also include an electrical potential application circuit that is constructed and arranged to apply an electrical potential to the grid so that the grid repels electrons emitted by the plasma radiation source and creates a positive space charge between the grid and the foil trap to deflect ions emitted by the plasma radiation source to the foil trap.

摘要翻译： 用于形成电磁辐射束的装置包括等离子体辐射源和设置有大致平行于来自等离子体源的辐射方向延伸的多个薄箔的箔阱。 栅格设置在等离子体辐射源和箔阱之间。 一个空间位于网格和箔陷阱之间。 该装置还包括电位施加电路，其构造和布置成向电网施加电势，使得电网排斥由等离子体辐射源发射的电子，并在栅格和箔陷阱之间产生正空间电荷以偏转离子 由等离子体辐射源发射到箔阱。