发明授权
US07825390B2 Apparatus with plasma radiation source and method of forming a beam of radiation and lithographic apparatus
有权
具有等离子体辐射源的装置和形成辐射束和光刻设备的方法
- 专利标题： Apparatus with plasma radiation source and method of forming a beam of radiation and lithographic apparatus
- 专利标题（中）： 具有等离子体辐射源的装置和形成辐射束和光刻设备的方法
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申请号： US11705822申请日： 2007-02-14
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公开(公告)号： US07825390B2公开(公告)日： 2010-11-02
- 发明人: Vladimir Mihallovitch Krivtsun , Vadim Yevgenyevich Banine , Vladimir Vitalevich Ivanov , Evgeny Dmitrievich Korop , Konstantin Nikolaevich Koshelev , Yurii Victorovitch Sidelnikov , Oleg Yakushev
- 申请人： Vladimir Mihallovitch Krivtsun , Vadim Yevgenyevich Banine , Vladimir Vitalevich Ivanov , Evgeny Dmitrievich Korop , Konstantin Nikolaevich Koshelev , Yurii Victorovitch Sidelnikov , Oleg Yakushev
- 申请人地址： NL Veldhoven
- 专利权人： ASML Netherlands B.V.
- 当前专利权人： ASML Netherlands B.V.
- 当前专利权人地址： NL Veldhoven
- 代理机构： Pillsbury Winthrop Shaw Pittman LLP
- 主分类号： G03B27/42
- IPC分类号： G03B27/42
摘要：
An apparatus for forming a beam of electromagnetic radiation includes a plasma radiation source, and a foil trap provided with a plurality of thin foils that extend substantially parallel to the direction of radiation from the plasma source. A grid is disposed between the plasma radiation source and the foil trap. A space is located between the grid and the foil trap. The apparatus also include an electrical potential application circuit that is constructed and arranged to apply an electrical potential to the grid so that the grid repels electrons emitted by the plasma radiation source and creates a positive space charge between the grid and the foil trap to deflect ions emitted by the plasma radiation source to the foil trap.
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