公开(公告)号：US09540277B2

公开(公告)日：2017-01-10

申请号：US13426697

申请日：2012-03-22

申请人： Douglas M. Nelson ,  Ian R. Williams ,  Michel J. Soubeyrand ,  David A. Strickler ,  Kevin D. Sanderson ,  Yasunori Seto ,  Keiko Tsuri

发明人： Douglas M. Nelson ,  Ian R. Williams ,  Michel J. Soubeyrand ,  David A. Strickler ,  Kevin D. Sanderson ,  Yasunori Seto ,  Keiko Tsuri

IPC分类号： C23C16/455 ,  C23C16/54 ,  C03C17/00 ,  C03C17/245 ,  C23C16/458

CPC分类号： C03C17/002 ,  C03C17/245 ,  C03C2218/152 ,  C23C16/45514 ,  C23C16/45574 ,  C23C16/45578 ,  C23C16/458 ,  C23C16/545

摘要： The invention relates to an apparatus for depositing thin film coatings on a substrate. The deposition apparatus is designed to keep gaseous reactant materials to be deposited apart from one another in the deposition apparatus, by one or more separation devices and/or methods, but nevertheless, to allow the chemical reactants to mix and react at or near the substrate surface, rapidly enough to create a uniform film at commercially viable deposition rates.

摘要翻译： 本发明涉及一种用于在衬底上沉积薄膜涂层的装置。 沉积设备被设计成使气态反应物料通过一个或多个分离装置和/或方法在沉积设备中彼此分离沉积，但是仍然允许化学反应物在底物或附近混合和反应 表面，足够快地以商业上可行的沉积速率产生均匀的膜。

公开(公告)号：US20120000248A1

公开(公告)日：2012-01-05

申请号：US13138631

申请日：2010-03-25

申请人： Douglas M. Nelson

发明人： Douglas M. Nelson

IPC分类号： C03B18/20

CPC分类号： C03B18/18 ,  C03B18/20

摘要： A method for removing oxygen from molten tin in the float bath chamber of a float glass manufacturing process is provided. The method includes providing a chamber having within it molten metal and a gaseous atmosphere above the molten metal, providing at least one reducing gas container proximate the interface between the molten metal and the gaseous atmosphere, providing a source of a reducing gas, and directing the reducing gas to the at least one container. In the at least one container, the reducing gas reacts with the oxygen in the molten metal. The method may include removing a vapor/particulate stream from the float bath chamber. The method may also include removing the vapor and/or the particulate from the stream. An apparatus for removing oxygen from the molten tin is also provided.

摘要翻译： 提供了一种用于从浮法玻璃制造工艺的浮浴室中从熔融锡中除去氧的方法。 该方法包括提供在其内部具有熔融金属的气室和在熔融金属上方的气态气体，在熔融金属和气体气氛之间的界面处提供至少一个还原气体容器，提供还原气体源，并引导 将气体还原到所述至少一个容器。 在至少一个容器中，还原气体与熔融金属中的氧气反应。 该方法可以包括从浮浴室除去蒸汽/颗粒物流。 该方法还可以包括从流中除去蒸气和/或颗粒。 还提供了一种用于从熔融锡中除去氧的装置。

公开(公告)号：US07968201B2

公开(公告)日：2011-06-28

申请号：US11990475

申请日：2006-08-24

申请人： Douglas M. Nelson ,  Gary Nichol ,  Srikanth Varanasi

发明人： Douglas M. Nelson ,  Gary Nichol ,  Srikanth Varanasi

IPC分类号： B32B17/06 ,  B05D5/06 ,  C23C16/00 ,  C03C17/00

CPC分类号： H01L31/02168 ,  H01L31/03762 ,  Y02E10/548 ,  Y10T428/12604 ,  Y10T428/265

摘要： A multi-layer thin film stack, particularly suitable as a component of a solar cell, is deposited on a transparent dielectric substrate. The multi-layer film stack comprises a transparent electrically conductive metal oxide layer deposited over the dielectric substrate, the conductive metal oxide layer having a refractive index less than 2.0, a light transmittance optimizing interlayer having a refractive index between 2.3 and 3.5, deposited over the electrically conductive metal oxide layer, and a silicon layer having a refractive index of at least 4.5 deposited over the light transmittance optimizing interlayer. The film stack can be deposited by any suitable method, but deposition of each of these layers by atmospheric chemical vapor deposition is preferred.

摘要翻译： 特别适合作为太阳能电池组件的多层薄膜叠层淀积在透明电介质基片上。 多层膜堆叠包括沉积在电介质基底上的透明导电金属氧化物层，导电金属氧化物层具有小于2.0的折射率，折射率在2.3和3.5之间的透光率优选中间层沉积在 导电金属氧化物层，以及沉积在透光率优选中间层上的具有至少4.5的折射率的硅层。 可以通过任何合适的方法沉积膜堆叠，但是优选通过大气化学气相沉积沉积这些层。

公开(公告)号：US20110083472A1

公开(公告)日：2011-04-14

申请号：US12736730

申请日：2009-05-07

申请人： Kevin David Sanderson ,  Gerhard Lingl ,  Hans-Eckhard Leitl ,  Douglas M. Nelson ,  Franz Michael Josef Scharnagl

发明人： Kevin David Sanderson ,  Gerhard Lingl ,  Hans-Eckhard Leitl ,  Douglas M. Nelson ,  Franz Michael Josef Scharnagl

IPC分类号： C03C17/34

CPC分类号： C03C17/3655 ,  C03C17/002 ,  C03C17/36 ,  C03C17/366 ,  C03C2218/112 ,  C03C2218/152

摘要： A process for coating a ribbon of float glass is disclosed. It comprises the steps of forming a glass ribbon, depositing a first transparent conductive coating upon a major surface of the ribbon which does not extend to the edges of the ribbon whilst the ribbon is at an elevated temperature, cooling said coated ribbon under controlled conditions in an annealing lehr and cutting off the edges of the ribbon so as to produce a ribbon having a uniform coating extending across the full width of the cut ribbon which is characterised in that a second conductive coating is deposited upon the uncoated edges of the ribbon whilst that edge is at a temperature which is above the ambient temperature. The invention finds particular application in the production of coated glass products where the thickness of the glass ribbon is at least 8 mm and most particularly where the thickness of the glass is at least 10 mm.

摘要翻译： 公开了一种用于涂覆浮法玻璃带的方法。 它包括以下步骤：形成玻璃带，将第一透明导电涂层沉积在色带的主表面上，当色带处于升高的温度时，其不延伸到色带的边缘，在受控条件下将所述涂覆的色带冷却 退火玻璃钢，并切除带的边缘，以便产生具有延伸穿过切割带的整个宽度的均匀涂层的带，其特征在于，第二导电涂层沉积在带的未涂覆边缘上，同时 边缘处于高于环境温度的温度。 本发明特别适用于生产玻璃制品的玻璃制品的厚度至少为8毫米，特别是玻璃的厚度至少为10mm的玻璃制品。

公开(公告)号：US5714199A

公开(公告)日：1998-02-03

申请号：US475372

申请日：1995-06-07

申请人： Peter F. Gerhardinger ,  Douglas M. Nelson

发明人： Peter F. Gerhardinger ,  Douglas M. Nelson

IPC分类号： B05D5/00 ,  B05D7/00 ,  B32B17/10 ,  C03C17/32 ,  C03C17/42 ,  C09J127/06 ,  C09J163/00 ,  B05D3/10 ,  B05D3/02 ,  B32B27/38

CPC分类号： C03C17/32 ,  B32B17/10018 ,  B32B17/10944 ,  C03C17/42 ,  Y10S525/934 ,  Y10T428/31511 ,  Y10T428/31525

摘要： A method of forming a polymer backing on a glass substrate through the use of a pre-polymer powder applied onto the surface of the substrate. The backing is applied on-line in an existing substrate manufacturing or fabricating process while the substrate is at a high enough temperature to polymerize the powder. The resulting backed substrate is durable and abrasion resistant and exhibits excellent opacification and adhesion properties.

摘要翻译： 通过使用施加在基材表面上的预聚物粉末在玻璃基板上形成聚合物背衬的方法。 衬底在现有衬底制造或制造工艺中在线应用，同时衬底处于足够高的温度以使粉末聚合。 所得到的背衬基材是耐用且耐磨的并且具有优异的不透明度和粘合性能。

公开(公告)号：US08734903B2

公开(公告)日：2014-05-27

申请号：US13604095

申请日：2012-09-05

申请人： Douglas M. Nelson

发明人： Douglas M. Nelson

IPC分类号： C23C16/22

CPC分类号： C03C17/245 ,  C03C17/002 ,  C03C17/3417 ,  C03C2217/213 ,  C03C2218/1525 ,  C23C16/402 ,  C23C16/45512 ,  C23C16/545

摘要： A chemical vapor deposition process for the deposition of a silica layer on a glass substrate is provided. The process includes providing a glass substrate. The process also includes forming a gaseous precursor mixture comprising a silane compound, oxygen, water vapor, and a radical scavenger and directing the precursor mixture toward and along the glass substrate. The mixture reacts over the glass substrate to form a silica coating thereon.

摘要翻译： 提供了用于在玻璃基板上沉积二氧化硅层的化学气相沉积工艺。 该方法包括提供玻璃基底。 该方法还包括形成包含硅烷化合物，氧气，水蒸气和自由基清除剂的气态前体混合物，并将前体混合物导向和沿着玻璃基底引导。 混合物在玻璃基板上反应以在其上形成二氧化硅涂层。

公开(公告)号：US5364435A

公开(公告)日：1994-11-15

申请号：US979662

申请日：1992-11-20

申请人： Douglas M. Nelson

发明人： Douglas M. Nelson

IPC分类号： C03B18/20

CPC分类号： C03B18/20

摘要： A method of introducing a reducing gas and an inert gas into a glass forming chamber at a plurality of locations along the length of the chamber by means of a system which permits delivery of a mixture of the reducing and inert gases to all such locations, or delivery of only the inert gas at certain of the locations. A significantly greater proportion of the reducing gas is introduced into the service space above the bath proximate the inlet end thereof. Further, the total amount of reducing gas which must be introduced to maintain a reducing bath atmosphere is minimized as a result of the location of such introduction. The present invention provides for a more conservative use of reducing gases such as hydrogen.

摘要翻译： 一种通过允许将还原惰性气体和惰性气体的混合物输送到所有这些位置的系统将还原气体和惰性气体引入到沿着室的长度的多个位置处的玻璃形成室中的方法，或 在某些位置仅输送惰性气体。 还原气体的比例大大地被引入靠近其入口端的浴槽上方的使用空间。 此外，由于这种引入的位置，必须将引入的还原气体的总量保持在减少浴气氛中。 本发明提供了更保守地使用诸如氢的还原气体。

公开(公告)号：US20130071566A1

公开(公告)日：2013-03-21

申请号：US13604095

申请日：2012-09-05

申请人： Douglas M. Nelson

发明人： Douglas M. Nelson

IPC分类号： C23C16/22

CPC分类号： C03C17/245 ,  C03C17/002 ,  C03C17/3417 ,  C03C2217/213 ,  C03C2218/1525 ,  C23C16/402 ,  C23C16/45512 ,  C23C16/545

摘要： A chemical vapor deposition process for the deposition of a silica layer on a glass substrate is provided. The process includes providing a glass substrate. The process also includes forming a gaseous precursor mixture comprising a silane compound, oxygen, water vapor, and a radical scavenger and directing the precursor mixture toward and along the glass substrate. The mixture reacts over the glass substrate to form a silica coating thereon.

摘要翻译： 提供了用于在玻璃基板上沉积二氧化硅层的化学气相沉积工艺。 该方法包括提供玻璃基底。 该方法还包括形成包含硅烷化合物，氧气，水蒸气和自由基清除剂的气态前体混合物，并将前体混合物导向和沿着玻璃基底引导。 混合物在玻璃基板上反应以在其上形成二氧化硅涂层。

公开(公告)号：US08276403B2

公开(公告)日：2012-10-02

申请号：US13138631

申请日：2010-03-25

申请人： Douglas M. Nelson

发明人： Douglas M. Nelson

IPC分类号： C03B18/20 ,  C03B18/00 ,  C03B18/08

CPC分类号： C03B18/18 ,  C03B18/20

摘要： A method for removing oxygen from molten tin in the float bath chamber of a float glass manufacturing process is provided. The method includes providing a chamber having within it molten metal and a gaseous atmosphere above the molten metal, providing at least one reducing gas container proximate the interface between the molten metal and the gaseous atmosphere, providing a source of a reducing gas, and directing the reducing gas to the at least one container. In the at least one container, the reducing gas reacts with the oxygen in the molten metal. The method may include removing a vapor/particulate stream from the float bath chamber. The method may also include removing the vapor and/or the particulate from the stream. An apparatus for removing oxygen from the molten tin is also provided.

公开(公告)号：US20120240634A1

公开(公告)日：2012-09-27

申请号：US13426689

申请日：2012-03-22

申请人： Kevin D. Sanderson ,  Michel J. Soubeyrand ,  Douglas M. Nelson ,  Yasunori Seto ,  Keiko Tsuri

发明人： Kevin D. Sanderson ,  Michel J. Soubeyrand ,  Douglas M. Nelson ,  Yasunori Seto ,  Keiko Tsuri

IPC分类号： C03C17/245

CPC分类号： C03C17/002 ,  C03C17/245 ,  C03C2217/216 ,  C03C2218/1525 ,  C23C16/407 ,  C23C16/45574 ,  C23C16/4558 ,  C23C16/545

摘要： A chemical vapor deposition process for depositing zinc oxide coatings is provided. The process includes providing a glass substrate and a coating apparatus. The coating apparatus includes two or more separate flow pathways. Each flow pathway provides communication between an inlet opening and an outlet opening, and one or more flow conditioners disposed in each of the flow pathways. Gaseous precursor compounds are provided. The gaseous precursor compounds and the one or more inert gases are introduced as two or more streams into the inlet openings. The streams are directed through the two or more separate flow pathways and discharged from the outlet openings of the coating apparatus. The gaseous precursor compounds and one or more inert gases mix to form a zinc oxide coating on a surface of the glass substrate.

摘要翻译： 提供了用于沉积氧化锌涂层的化学气相沉积工艺。 该方法包括提供玻璃基底和涂覆装置。 涂覆装置包括两个或更多个单独的流动路径。 每个流动路径提供入口开口和出口开口之间的连通以及设置在每个流动路径中的一个或多个流动调节器。 提供气态前体化合物。 气态前体化合物和一种或多种惰性气体作为两个或更多个流引入入口。 流引导通过两个或更多个分离的流动路径并从涂覆装置的出口开口排出。 气态前体化合物和一种或多种惰性气体混合以在玻璃基底的表面上形成氧化锌涂层。