公开(公告)号：US08475625B2

公开(公告)日：2013-07-02

申请号：US11381523

申请日：2006-05-03

申请人： Sharma Pamarthy ,  Huutri Dao ,  Xiaoping Zhou ,  Kelly A. McDonough ,  Jivko Dinev ,  Farid Abooameri ,  David E. Gutierrez ,  Jim Zhongyi He ,  Robert S. Clark ,  Dennis M. Koosau ,  Jeffrey William Dietz ,  Declan Scanlan ,  Subhash Deshmukh ,  John P. Holland ,  Alexander Paterson

发明人： Sharma Pamarthy ,  Huutri Dao ,  Xiaoping Zhou ,  Kelly A. McDonough ,  Jivko Dinev ,  Farid Abooameri ,  David E. Gutierrez ,  Jim Zhongyi He ,  Robert S. Clark ,  Dennis M. Koosau ,  Jeffrey William Dietz ,  Declan Scanlan ,  Subhash Deshmukh ,  John P. Holland ,  Alexander Paterson

IPC分类号： H01L21/3065

CPC分类号： H01J37/3266 ,  H01J37/3244 ,  H01J37/32706 ,  H01J2237/3347

摘要： Embodiments of the invention provide a method and apparatus, such as a processing chamber, suitable for etching high aspect ratio features. Other embodiments include a showerhead assembly for use in the processing chamber. In one embodiment, a processing chamber includes a chamber body having a showerhead assembly and substrate support disposed therein. The showerhead assembly includes at least two fluidly isolated plenums, a region transmissive to an optical metrology signal, and a plurality of gas passages formed through the showerhead assembly fluidly coupling the plenums to the interior volume of the chamber body.

公开(公告)号：US20130252518A1

公开(公告)日：2013-09-26

申请号：US13893030

申请日：2013-05-13

申请人： Hung Chih CHEN ,  Samuel Chu-Chiang HSU ,  Gautam Shashank DANDAVATE ,  Dennis M. KOOSAU

发明人： Hung Chih CHEN ,  Samuel Chu-Chiang HSU ,  Gautam Shashank DANDAVATE ,  Dennis M. KOOSAU

IPC分类号： B24B37/30

CPC分类号： B24B37/30 ,  B24B41/06

摘要： A method and apparatus for chemical mechanical polishing of substrates, and more particularly a method and apparatus related to a carrier had for use in chemical mechanical polishing is provided. in one embodiment the carrier head assembly comprises a base assembly for providing support to the substrate, a flexible membrane mounted on the base assembly haying a generally circular central portion with a lower surface that provides a substrate mounting surface, and a plurality of independently pressurizable chambers formed between the base assembly and the flexible membrane, comprising an annular outer chamber and a non-circular inner chamber, is provided.

摘要翻译： 提供了一种用于化学机械抛光的方法和装置，更具体地涉及一种用于化学机械抛光的载体的方法和装置。 在一个实施例中，承载头组件包括用于向衬底提供支撑的基座组件，安装在基座组件上的柔性膜，该基座组件具有大致圆形的中心部分，下表面提供衬底安装表面，以及多个可独立加压的腔室 形成在基部组件和柔性膜之间，包括环形外室和非圆形内腔。