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    Fabricating magnetic read heads with a reduced scratch exposure region
    2.
    发明授权
    Fabricating magnetic read heads with a reduced scratch exposure region 有权
    制造具有减少的划痕曝光区域的磁读头

    公开(公告)号：US07882618B2

    公开(公告)日：2011-02-08

    申请号：US11957468

    申请日：2007-12-16

    Applicant: David P. Druist ,  Mohamad T. Krounbi ,  David J. Seagle

    Inventor： David P. Druist ,  Mohamad T. Krounbi ,  David J. Seagle

    IPC: G11B5/127 ,  H04R31/00

    CPC classification number: G11B5/3163 ,  G11B5/3106 ,  G11B5/3932 ,  G11B5/40 ,  Y10T29/49021 ,  Y10T29/49032 ,  Y10T29/49034 ,  Y10T29/49043 ,  Y10T29/49044 ,  Y10T29/49046 ,  Y10T29/49048 ,  Y10T29/49052

    Abstract: Methods of fabricating magnetic read heads are provided which reduce the width of the scratch exposure region of a read head. During normal fabrication processes, a read head is formed with a first shield, a read element formed on the first shield, and hard bias layers formed on either side of the read element. The width of the read elements and the hard bias layers define an initial scratch exposure region. According to embodiments herein, a mask structure is formed to protect the read element and first portions of the hard bias layers proximate to the read element. A removal process is then performed to remove second portions of the hard bias layers that are not protected by the mask structure, which defines a final scratch exposure region that is smaller than the initial scratch exposure region.

    Abstract translation: 提供制造磁读头的方法，其减小读头的划痕曝光区域的宽度。 在通常的制造过程中，读头形成有第一屏蔽，形成在第一屏蔽上的读取元件以及形成在读取元件两侧的硬偏置层。 读取元件和硬偏置层的宽度限定初始划痕曝光区域。 根据本文的实施例，形成掩模结构以保护读取元件和靠近读取元件的硬偏置层的第一部分。 然后执行去除处理以去除未被掩模结构保护的硬偏置层的第二部分，其限定小于初始划痕暴露区域的最终刮擦暴露区域。

    FABRICATING MAGNETIC READ HEADS WITH A REDUCED SCRATCH EXPOSURE REGION
    3.
    发明申请
    FABRICATING MAGNETIC READ HEADS WITH A REDUCED SCRATCH EXPOSURE REGION 有权
    用减少的刮刀暴露区域制造磁性读取头

    公开(公告)号：US20090151151A1

    公开(公告)日：2009-06-18

    申请号：US11957468

    申请日：2007-12-16

    Applicant: David P. Druist ,  Mohamad T. Krounbi ,  David J. Seagle

    Inventor： David P. Druist ,  Mohamad T. Krounbi ,  David J. Seagle

    IPC: G11B5/33 ,  G11B5/127

    CPC classification number: G11B5/3163 ,  G11B5/3106 ,  G11B5/3932 ,  G11B5/40 ,  Y10T29/49021 ,  Y10T29/49032 ,  Y10T29/49034 ,  Y10T29/49043 ,  Y10T29/49044 ,  Y10T29/49046 ,  Y10T29/49048 ,  Y10T29/49052

    Abstract: Methods of fabricating magnetic read heads are provided which reduce the width of the scratch exposure region of a read head. During normal fabrication processes, a read head is formed with a first shield, a read element formed on the first shield, and hard bias layers formed on either side of the read element. The width of the read elements and the hard bias layers define an initial scratch exposure region. According to embodiments herein, a mask structure is formed to protect the read element and first portions of the hard bias layers proximate to the read element. A removal process is then performed to remove second portions of the hard bias layers that are not protected by the mask structure, which defines a final scratch exposure region that is smaller than the initial scratch exposure region.

    Abstract translation: 提供制造磁读头的方法，其减小读头的划痕曝光区域的宽度。 在通常的制造过程中，读头形成有第一屏蔽，形成在第一屏蔽上的读取元件以及形成在读取元件两侧的硬偏置层。 读取元件和硬偏置层的宽度限定初始划痕曝光区域。 根据本文的实施例，形成掩模结构以保护读取元件和靠近读取元件的硬偏置层的第一部分。 然后执行去除处理以去除未被掩模结构保护的硬偏置层的第二部分，其限定小于初始划痕暴露区域的最终刮擦暴露区域。

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