公开(公告)号：US09357627B2

公开(公告)日：2016-05-31

申请号：US14782644

申请日：2014-04-08

申请人： Pavel Stanislavovich Antsiferov ,  Konstantin Nikolaevich Koshelev ,  Vladimir Mikhailovich Krivtsun ,  Aleksandr Andreevich Lash

发明人： Pavel Stanislavovich Antsiferov ,  Konstantin Nikolaevich Koshelev ,  Vladimir Mikhailovich Krivtsun ,  Aleksandr Andreevich Lash

IPC分类号： H01J17/04 ,  H05H1/24 ,  H01J65/04 ,  H01J61/02 ,  H01J61/52 ,  H01J61/54 ,  H01J61/76 ,  H05H1/48

CPC分类号： H05H1/24 ,  H01J61/025 ,  H01J61/523 ,  H01J61/54 ,  H01J61/545 ,  H01J61/76 ,  H01J65/04 ,  H05H1/48

摘要： Invention provides extending the functional possibilities of a light source with laser pumping due to increasing its spatial and energy stability brightness and the reliability under long-term operation whilst ensuring compactness of the device. The result is achieved due to the fact that a focused laser beam is directed into a region of radiating plasma from the bottom upwards: from the lower wall of a chamber to an upper wall of the chamber which is opposite said lower wall, and the region of radiating plasma is arranged close to the upper wall of the chamber. In embodiments of the invention, the focused laser beam is directed along a vertical axis of symmetry of the walls of the chamber, the region of radiating plasma is produced at an optimally small distance away from the upper wall of the chamber and determined radiation power is maintained via an automated control system.

摘要翻译： 本发明通过增加其空间和能量稳定性亮度以及在长期运行下的可靠性同时确保设备的紧凑性，从而延长了激光泵浦光源的功能可能性。 结果是由于聚焦的激光束被引导到从底部向上放射等离子体的区域：从腔室的下壁到与下壁相对的腔室的上壁，而区域 辐射等离子体的位置靠近腔室的上壁。 在本发明的实施例中，聚焦的激光束沿着腔的壁的垂直对称轴指向，辐射等离子体的区域产生在远离腔室的上壁的最小的距离处，并且确定的辐射功率是 通过自动化控制系统维护。