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1.发明授权
公开(公告)号：US5326675A
公开(公告)日：1994-07-05
申请号：US987821
申请日：1992-12-09
Applicant: Hirokazu Niki , Rumiko Hayase , Naohiko Oyasato , Yasunobu Onishi , Akitoshi Kumagae , Kazuo Sato , Masataka Miyamura , Yoshihito Kobayashi
Inventor： Hirokazu Niki , Rumiko Hayase , Naohiko Oyasato , Yasunobu Onishi , Akitoshi Kumagae , Kazuo Sato , Masataka Miyamura , Yoshihito Kobayashi
CPC classification number: G03F7/09 , G03F7/11 , G03F7/0045
Abstract: A radiation-sensitive layer comprising as a main component a radiation-sensitive composition containing a compound capable of generating an acid when exposed to a chemical radiation and a compound having at least one linkage decomposable by an acid is formed on a substrate. An acidic coating layer is formed on the radiation-sensitive layer. The radiation-sensitive layer and the acidic coating layer are pattern-exposed to a chemical radiation. The radiation-sensitive layer and the acidic coating layer are baked and developed by using an aqueous alkaline solution to obtain a pattern comprising lines and spaces, each having a predetermined width. A fine pattern of a rectangular sectional shape can be formed without producing eaves caused by a surface inhibition layer layer, which is produced on the film surface.
Abstract translation: 一种辐射敏感层，其包含作为主要成分的含有当暴露于化学辐射时能够产生酸的化合物的辐射敏感性组合物和具有至少一个可被酸分解的键的化合物。 在辐射敏感层上形成酸性涂层。 辐射敏感层和酸性涂层图案暴露于化学辐射。 通过使用碱性水溶液来烘烤和显影辐射敏感层和酸性涂层，以获得每个具有预定宽度的线和间隔的图案。 可以形成矩形截面形状的精细图案，而不会产生由在膜表面上产生的表面抑制层而引起的檐。
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公开(公告)号：US06680462B2
公开(公告)日：2004-01-20
申请号：US10282114
申请日：2002-10-29
Applicant: Hideaki Sakurai , Shinichi Ito , Iwao Higashikawa , Akitoshi Kumagae
Inventor： Hideaki Sakurai , Shinichi Ito , Iwao Higashikawa , Akitoshi Kumagae
IPC: H05B368
CPC classification number: H01L21/67115 , F26B3/28 , H05B3/0047
Abstract: Disclosed is an apparatus for heating a target substrate by means of light irradiation. The heating apparatus includes a substrate support section for supporting the target substrate, an irradiating light generating section for irradiating the light irradiating regions of the target substrate supported by the substrate support section, and a light irradiating region changing section for changing the light irradiating regions of the target substrate irradiated with the light generated from the irradiating light generation section.
Abstract translation: 公开了一种通过光照射加热目标基板的装置。 加热装置包括用于支撑目标基板的基板支撑部分，用于照射由基板支撑部分支撑的目标基板的光照射区域的照射光产生部分和用于改变基板支撑部分的光照射区域的光照射区域改变部分 所述目标基板用从所述照射光产生部产生的光照射。
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3.发明授权Heat treatment method and a heat treatment apparatus for controlling the temperature of a substrate surface 失效热处理方法和用于控制基板表面的温度的热处理装置公开(公告)号：US06483083B2
公开(公告)日：2002-11-19
申请号：US09877147
申请日：2001-06-11
Applicant: Hideaki Sakurai , Akitoshi Kumagae , Iwao Higashikawa , Shinichi Ito , Tsunetoshi Arikado , Katsuya Okumura
Inventor： Hideaki Sakurai , Akitoshi Kumagae , Iwao Higashikawa , Shinichi Ito , Tsunetoshi Arikado , Katsuya Okumura
IPC: F27D1100
CPC classification number: G01J5/06 , G01J5/0003 , G05D23/27
Abstract: A substrate to be processed on which a thin film is formed is supported by a support member. The substrate to be processed is heated by a heating section. The surface temperature is measured by a radiation thermometer, and the heating temperature of the heating section is controlled by a control section, in response to the temperature measured by the radiation thermometer. Further, a blackbody is provided at a position optically symmetrical to the radiation thermometer with respect to the surface of the thin film. The blackbody is set at a constant temperature. The blackbody cuts stray light (noise light) which enters into the radiation thermometer.
Abstract translation: 其上形成有薄膜的待处理基板由支撑部件支撑。 待加工的基板被加热部加热。 通过辐射温度计测量表面温度，并且响应于由辐射温度计测量的温度，加热部分的加热温度由控制部分控制。 此外，相对于薄膜的表面，在与辐射温度计光学对称的位置处设置黑体。 黑体被设定在恒温。 黑体切入进入辐射温度计的杂散光（噪声光）。
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4.发明授权
公开(公告)号：US5969428A
公开(公告)日：1999-10-19
申请号：US86609
申请日：1998-05-29
Applicant: Hiroshi Nomura , Iwao Higashikawa , Akitoshi Kumagae
Inventor： Hiroshi Nomura , Iwao Higashikawa , Akitoshi Kumagae
IPC: G03F9/00 , H01L21/027 , H01L23/544
CPC classification number: G03F9/7076 , H01L23/544 , H01L2223/54426 , H01L2223/54453 , H01L2924/0002
Abstract: An alignment mark formed on a surface of substrate for aligning with a mask through an irradiation of alignment light, which comprises a step formed with a concave portion and a convex portion and a metallic film deposited along the concave portion and the convex portion. A light absorption layer is formed over at least one of the concave portion and the convex portion reflecting the step, the light absorption layer lying over the concave portion having a different thickness from that of the light absorption layer lying over the convex portion when the light absorption layer is formed over both the concave portion and the convex portion, the light absorption layer comprising a material capable of absorbing at least a portion of wavelength region of the alignment light. The light absorption layer is desirably formed in a larger thickness on the convex portion of the step as compared with that on the concave portion. Desirably, the light absorption layer is a resist capable of absorbing a portion of wavelength region of the alignment light, or a resist containing a material capable of absorbing a portion of wavelength region of the alignment light.
Abstract translation: 在基板的表面上形成的对准标记，其通过对准光的照射与掩模对准，其包括形成有凹部和凸部的台阶和沿着凹部和凸部沉积的金属膜。 在反射该台阶的凹部和凸部中的至少一个上形成有光吸收层，该光吸收层位于凹部上方，该光吸收层的厚度与位于凸部上的光吸收层的厚度不同， 吸收层形成在凹部和凸部两者之上，光吸收层包括能够吸收对准光的波长区域的至少一部分的材料。 与步骤中的凹部相比，希望在台阶的凸部形成较大的厚度的光吸收层。 理想地，光吸收层是能够吸收对准光的波长区域的一部分的抗蚀剂，或含有能够吸收取向光的一部分波长区域的材料的抗蚀剂。
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公开(公告)号：US06333493B1
公开(公告)日：2001-12-25
申请号：US09666108
申请日：2000-09-20
Applicant: Hideaki Sakurai , Shinichi Ito , Iwao Higashikawa , Akitoshi Kumagae
Inventor： Hideaki Sakurai , Shinichi Ito , Iwao Higashikawa , Akitoshi Kumagae
IPC: H05B302
CPC classification number: H01L21/67115 , F26B3/28 , H05B3/0047
Abstract: Disclosed is a heat treating method for heating a target substrate by means of light irradiation, in which a light irradiation treatment is applied to the target substrate a plurality of times such that adjacent light irradiated regions on the target substrate partially overlap with each other and that the adjacent light irradiated regions do not overlap with each other in the light irradiating periods.
Abstract translation: 公开了一种用于通过光照射加热目标基板的热处理方法，其中对目标基板进行多次光照射处理，使得目标基板上的相邻光照射区域彼此部分重叠，并且这些相互之间的相邻光照射区域彼此部分重叠， 相邻的光照射区域在光照射期间不重叠。
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Patent Agency Ranking
6.发明授权Heat treatment method and a heat treatment apparatus for controlling the temperature of a substrate surface 失效热处理方法和用于控制基板表面的温度的热处理装置公开(公告)号：US06265696B1
公开(公告)日：2001-07-24
申请号：US09371845
申请日：1999-08-11
Applicant: Hideaki Sakurai , Akitoshi Kumagae , Iwao Higashikawa , Shinichi Ito , Tsunetoshi Arikado , Katsuya Okumura
Inventor： Hideaki Sakurai , Akitoshi Kumagae , Iwao Higashikawa , Shinichi Ito , Tsunetoshi Arikado , Katsuya Okumura
IPC: F27B514
CPC classification number: G01J5/06 , G01J5/0003 , G05D23/27
Abstract: A substrate to be processed on which a thin film is formed is supported by a support member. The substrate to be processed is heated by a heating section. The surface temperature is measured by a radiation thermometer, and the heating temperature of the heating section is controlled by a control section, in response to the temperature measured by the radiation thermometer. Further, a blackbody is provided at a position optically symmetrical to the radiation thermometer with respect to the surface of the thin film. The blackbody is set at a constant temperature. The blackbody cuts stray light (noise light) which enters into the radiation thermometer.
Abstract translation: 其上形成有薄膜的待处理基板由支撑部件支撑。 待加工的基板被加热部加热。 通过辐射温度计测量表面温度，并且响应于由辐射温度计测量的温度，加热部分的加热温度由控制部分控制。 此外，相对于薄膜的表面，在与辐射温度计光学对称的位置处设置黑体。 黑体被设定在恒温。 黑体切割进入辐射温度计的杂散光（噪声光）。
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公开(公告)号：US5847468A
公开(公告)日：1998-12-08
申请号：US873563
申请日：1997-06-12
Applicant: Hiroshi Nomura , Iwao Higashikawa , Akitoshi Kumagae
Inventor： Hiroshi Nomura , Iwao Higashikawa , Akitoshi Kumagae
IPC: G03F9/00 , H01L21/027 , H01L23/544
CPC classification number: G03F9/7076 , H01L23/544 , H01L2223/54426 , H01L2223/54453 , H01L2924/0002
Abstract: An alignment mark formed on a surface of substrate for aligning with a mask through an irradiation of alignment light, which comprises a step formed with a concave portion and a convex portion and a metallic film deposited along the concave portion and the convex portion. A light absorption layer is formed over at least one of the concave portion and the convex portion reflecting the step, the light absorption layer lying over the concave portion having a different thickness from that of the light absorption layer lying over the convex portion when the light absorption layer is formed over both the concave portion and the convex portion, the light absorption layer comprising a material capable of absorbing at least a portion of wavelength region of the alignment light. The light absorption layer is desirably formed in a larger thickness on the convex portion of the step as compared with that on the concave portion. Desirably, the light absorption layer is a resist capable of absorbing a portion of wavelength region of the alignment light, or a resist containing a material capable of absorbing a portion of wavelength region of the alignment light.
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8.发明授权Positive type and negative type ionization irradiation sensitive and/or deep U.V. sensitive resists comprising a halogenated resin binder 失效阳离子类型和负离子型离子化辐射敏感和/或深度紫外线 含敏感树脂粘合剂的敏感性粘合剂
公开(公告)号：US5169740A
公开(公告)日：1992-12-08
申请号：US500923
申请日：1990-03-29
Applicant: Toru Ushirogouchi , Tsukasa Tada , Akitoshi Kumagae
Inventor： Toru Ushirogouchi , Tsukasa Tada , Akitoshi Kumagae
IPC: G03F7/012 , G03F7/016 , G03F7/023 , H01L21/027
CPC classification number: G03F7/0125 , G03F7/0236 , Y10S430/108 , Y10S430/143 , Y10S430/146 , Y10S430/167
Abstract: Resist containing novolak prepared by condensating halogenated phenol represented by the following formula (III) and one or more phenol derivatives selected from the group consisting of cresol, xylenol, tet-butylphenol and propenylphenol, with a carbonyl compound ##STR1## wherein R.sub.3 is an halogen atom selected from the group consisting of F, Cl, and Br. If the resist is used as a positive-type one, it further contains a photo-sensitive agent, and R.sub.3 in the formula (III) is either F or Br. If the resist is used as a negative-type one, it further contains a photosensitive agent and/or a sensitizer, and R.sub.3 in the formula (III) is either Cl or Br.
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公开(公告)号：US06495807B2
公开(公告)日：2002-12-17
申请号：US09983667
申请日：2001-10-25
Applicant: Hideaki Sakurai , Shinichi Ito , Iwao Higashikawa , Akitoshi Kumagae
Inventor： Hideaki Sakurai , Shinichi Ito , Iwao Higashikawa , Akitoshi Kumagae
IPC: H05B302
CPC classification number: H01L21/67115 , F26B3/28 , H05B3/0047
Abstract: Disclosed is a heat treating method for heating a target substrate by means of light irradiation, in which light irradiation treatment is applied to the target substrate such that the light irradiation regions of the target substrate do not overlap with each other, the light irradiation treatment being performed by using an irradiating light adjusted such that the distribution of the light intensity within the light irradiation region of the target substrate is rendered uniform.
Abstract translation: 公开了一种通过光照射对目标基板进行加热的热处理方法，其中对目标基板施加光照射处理，使得目标基板的光照射区域彼此不重叠，光照射处理为 通过使用被调整为使得目标基板的光照射区域内的光强度分布变得均匀的照射光进行。
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10.再颁专利
公开(公告)号：USRE35821E
公开(公告)日：1998-06-09
申请号：US639973
申请日：1996-04-29
Applicant: Hirokazu Niki , Rumiko Hayase , Naohiko Oyasato , Yasunobu Onishi , Akitoshi Kumagae , Kazuo Sato , Masataka Miyamura , Yoshihito Kobayashi
Inventor： Hirokazu Niki , Rumiko Hayase , Naohiko Oyasato , Yasunobu Onishi , Akitoshi Kumagae , Kazuo Sato , Masataka Miyamura , Yoshihito Kobayashi
CPC classification number: G03F7/09 , G03F7/11 , G03F7/0045
Abstract: A radiation-sensitive layer comprising as a main component a radiation-sensitive composition containing a compound capable of generating an acid when exposed to a chemical radiation and a compound having at least one linkage decomposable by an acid is formed on a substrate. An acidic coating layer is formed on the radiation-sensitive layer. The radiation-sensitive layer and the acidic coating layer are pattern-exposed to a chemical radiation. The radiation-sensitive layer and the acidic coating layer are baked and developed by using an aqueous alkaline solution to obtain a pattern comprising lines and spaces, each having a predetermined width. A fine pattern of a rectangular sectional shape can be formed without producing eaves caused by a surface inhibition layer layer, which is produced on the film surface.
Abstract translation: 一种辐射敏感层，其包含作为主要成分的含有当暴露于化学辐射时能够产生酸的化合物的辐射敏感性组合物和具有至少一个可被酸分解的键的化合物。 在辐射敏感层上形成酸性涂层。 辐射敏感层和酸性涂层图案暴露于化学辐射。 通过使用碱性水溶液来烘烤和显影辐射敏感层和酸性涂层，以获得每个具有预定宽度的线和间隔的图案。 可以形成矩形截面形状的精细图案，而不会在膜表面上产生由表面抑制层形成的檐。
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