公开(公告)号：US20210238504A1

公开(公告)日：2021-08-05

申请号：US17052069

申请日：2019-04-29

申请人： BASF SE

发明人： Juergen Detering ,  Holger Tuerk ,  Keith E Gutowski ,  Heike Weber ,  Gazi Tuerkoglu

IPC分类号： C11D3/37 ,  C11D11/00 ,  C11D1/72 ,  C11D3/33 ,  C11D3/10 ,  C11D3/08 ,  C11D3/39 ,  C11D3/20 ,  C11D3/386 ,  C11D3/04 ,  C11D17/00

摘要： Described herein is a dishwashing detergent formulation, including (a) 1-15% by weight of the total composition of (a1) at least one of polyaspartic acid or modified polyaspartic acid or salts thereof, and (a2) at least one graft copolymer composed of wherein the weight ratio of (a1):(a2) is from 20:1 to 1:12; (b) 0-60% by weight of complexing agent; (c) 0.1-80% by weight of builders and/or cobuilders; (d) 0.1-20% by weight of nonionic surfactants; (e) 0-30% by weight of bleaches and bleach activators; (f) 0-10% by weight of enzymes and enzyme stabilizers; and (g) 0-50% by weight of additives.

公开(公告)号：US20210230509A1

公开(公告)日：2021-07-29

申请号：US16304766

申请日：2017-05-11

申请人： BASF SE

发明人： Claudia Brunn ,  Ansgar Behler

IPC分类号： C11D1/37 ,  C11D3/04 ,  C11D11/00 ,  C11D17/00 ,  A61Q5/02 ,  A61Q19/10 ,  A61K8/46 ,  A61K8/36 ,  A61K8/23 ,  A61K8/04 ,  A61Q9/02 ,  A61Q11/00

摘要： What are proposed are aqueous surfactant compositions comprising one or more of each of alpha-sulfo fatty acid disalts, sulfo ketones, alkyl (ether) sulfates, soaps, inorganic salts of sulfuric acid and water, where the structures of the compounds mentioned and boundary conditions that are to be observed can be found in the patent claims. These compositions have good foaming ability and pleasant sensory properties of the foam and good skin compatibility and they are suitable for cosmetic agents as well as detergents and cleaner.

公开(公告)号：US11034878B2

公开(公告)日：2021-06-15

申请号：US16308678

申请日：2017-06-02

申请人： BYK-Chemie GmbH

发明人： René Nagelsdiek ,  Sylvia Bühne ,  Jan von Haaren ,  Agnetha Klein ,  Christian Sauerländer

IPC分类号： C09K8/36 ,  C11D1/65 ,  C11D3/20 ,  C11D17/00 ,  C09K8/28 ,  B01F17/00 ,  E21B21/00 ,  C11D3/04 ,  C11D3/43 ,  C11D1/06 ,  C11D1/34 ,  C11D1/52

摘要： The invention relates to an emulsion containing or consisting of (A) 40.00 to 97.98 wt. % of at least one hydrocarbon, (B) 2.00 to 59.98 wt. % of water or an aqueous solution of a salt which does not fall under the following definition according to (C) and (C) 0.02 to 8.00 wt. % of a salt of an amino amide of a fatty acid, containing at least one primary, secondary or tertiary amino group, and an acid component of general formula (I) in which R1 is a linear or branched, saturated or mono-unsaturated or poly-unsaturated hydrocarbon radical with 1 to 40 C atoms, R2 is an alkylene radical or arylalkylene radical with 2 to 20 C atoms and X is a radical which contains at least one acid group, m=0 or 1, n=1 to 30, wherein the weight proportions of components (A), (B) and (C) relate to the sum of the masses of these components and this is 100 wt. %. The invention also relates to a method for the production of the emulsion, to an oil-based drilling mud and to a method for creating and stabilizing a drill hole.

公开(公告)号：US20210163850A1

公开(公告)日：2021-06-03

申请号：US17045615

申请日：2019-04-26

申请人： TOHOKU UNIVERSITY ,  NOMURA MICRO SCIENCE CO., LTD.

发明人： Yasuyuki SHIRAI ,  Ken SAKAI ,  Takayuki JIZAIMARU

IPC分类号： C11D3/04 ,  B01F3/04 ,  B01F3/22 ,  C02F1/68 ,  B08B3/08 ,  B08B3/10 ,  G03F7/42 ,  C11D11/00

摘要： Conventional ozone water is still insufficient in the removal rate and cleaning ability of resist required in today's semiconductor manufacturing field, and it does not fully meet the expectation of further improvement in the effects of sterilization, deodorization, and cleaning in the fields such as cleaning of foodstuffs, cleaning of process equipment and tools, and cleaning of fingers, as well as in the fields such as deodorization, sterilization, and preservation of freshness of foodstuffs. The above-problem can be solved by defining the values of a plurality of specific production parameters in the production of ozone water into specific ranges.

公开(公告)号：US20210163847A1

公开(公告)日：2021-06-03

申请号：US16967099

申请日：2019-02-05

申请人： EVONIK OPERATIONS GMBH

发明人： Eric THEINER ,  Buford Brian SMITH ,  Khalil YACOUB ,  Larry MEYERS

IPC分类号： C11D1/10 ,  C11D3/00 ,  C11D3/04 ,  C11D3/12 ,  C11D3/30 ,  C11D11/00 ,  C11D17/00

摘要： The present invention relates to new alkaline, preferably highly alkaline, cleaning solutions comprising surfactants with improved stability and cleaning performance under such conditions. It further relates to novel surfactants.

公开(公告)号：US20210130750A1

公开(公告)日：2021-05-06

申请号：US16488001

申请日：2017-12-15

申请人： SHANGHAI SINYANG SEMICONDUCTOR MATERIALS CO., LTD.

发明人： Su WANG ,  Chuang JIANG ,  Qiangqiang FENG

IPC分类号： C11D11/00 ,  C11D1/00 ,  C11D1/22 ,  C11D3/00 ,  C11D3/43 ,  C11D3/28 ,  C11D3/39 ,  C11D3/04 ,  C11D3/26 ,  C11D3/34 ,  H01L21/02 ,  B08B3/08 ,  B08B3/12 ,  G03F7/42

摘要： Provided are a cleaning agent and a preparation method and the use thereof. The cleaning agent is prepared from the following raw materials comprising the following mass fraction of components: 0.5%-20% of an oxidant containing iodine, 0.5%-20% of an etchant containing boron, 1%-50% of a pyrrolidinone solvent, 1%-20% of a corrosion inhibitor, 0.01%-5% of a metal ion-free surfactant, and water, with the sum of the mass fraction of each component being 100%, the pH of the cleaning agent is 7.5-13.5, and the corrosion inhibitor is one or more of a benzotriazole corrosion inhibitor, a hydrazone corrosion inhibitor, a carbazone corrosion inhibitor and a thiocarbohydrazone corrosion inhibitor. The cleaning agent can efficiently remove nitrides from hard mask residues with little effects on metals and low-K dielectric materials, and has a good selectivity.

公开(公告)号：US20210130741A1

公开(公告)日：2021-05-06

申请号：US17253071

申请日：2019-06-19

申请人： SUMITOMO SEIKA CHEMICALS CO., LTD.

发明人： Satomi Tanaka ,  Rie Kiyomoto ,  Ryosuke Murakami

IPC分类号： C11D3/37 ,  C11D1/72 ,  C11D3/395 ,  C11D3/00 ,  C11D3/04 ,  C11D11/00 ,  C11D17/00

摘要： There is provided a composition that contains a bleach component, and maintains a desired viscosity over a long period. A composition of the present invention comprises a carboxyl group-containing polymer composition (A) comprising a copolymer (a) of monomers including an α,β-unsaturated carboxylic acid (a-1) and a compound (a-2) having at least two ethylenically unsaturated groups per molecule; and a nonionic surfactant (b), the carboxyl group-containing polymer composition (A) having a bulk density of 0.20 g/mL or less; a bleach component (B); an alkalinity buffering agent (C); and water (D). The composition has a pH higher than 10.

公开(公告)号：US10988718B2

公开(公告)日：2021-04-27

申请号：US16308053

申请日：2017-03-09

申请人： ENTEGRIS, INC. ,  Thomas Parson ,  Shrane-Ning Jenq ,  Steven Medd ,  Daniela White ,  Michael White ,  Donald Frye

发明人： Thomas Parson ,  Shrane-Ning Jenq ,  Steven Medd ,  Daniela White ,  Michael White ,  Donald Frye

IPC分类号： C11D7/32 ,  C11D11/00 ,  C11D3/20 ,  C11D3/37 ,  H01L21/02 ,  C11D1/08 ,  C11D1/00 ,  C23F1/26 ,  C23F1/28 ,  B08B3/08 ,  C11D3/04 ,  C11D3/30 ,  C11D3/32 ,  C11D3/33

摘要： A removal composition and process for cleaning post-chemical mechanical polishing (CMP) contaminants and particles from a microelectronic device having said particles and contaminants thereon. The removal compositions include at least one at least one organic additive; at least one metal chelating agent; and at least one polyelectrolyte. The composition achieves highly efficacious removal of the particles and CMP contaminant material from the surface of the microelectronic device without compromising the low-k dielectric, silicon nitride, and metal containing layers such as tungsten-containing layers.

公开(公告)号：US10982129B2

公开(公告)日：2021-04-20

申请号：US15230110

申请日：2016-08-05

申请人： NuGeneration Technologies, LLC

发明人： Stephen Utschig-Samuels ,  Donato Polignone

IPC分类号： C09K8/528 ,  C11D3/36 ,  C11D1/14 ,  C11D3/04 ,  C11D3/10 ,  C11D3/30 ,  C11D3/33 ,  C11D11/00

摘要： A converter-dissolver composition in an aqueous solution of carbonate or bicarbonate, chelating agents, hydroxide base, and surfactant wetting agent. A mixture of the chelating agents and carbonate or bicarbonate is diluted with deionized water. The mixture reacts for five minutes. The hydroxide base is added to the mixture to form an in-situ reaction with the carbonate or bicarbonate and reacted for another five minutes. The solution pH is adjusted with the chelating agent. The surfactant wetting agent is added. The aqueous solution is heated to 70-230° C. and applied to a surface of oil or gas well and pipeline equipment with metal sulfate scales in a ratio of 3.78 liters of the aqueous solution per 0.45 kilograms of the metal sulfate scales. The aqueous solution reacts for 0.25-1.5 hours to dissolve the metal sulfate scales. The aqueous solution and dissolved metal sulfate scales are flushed from the surface.

公开(公告)号：US10975331B2

公开(公告)日：2021-04-13

申请号：US16272875

申请日：2019-02-11

申请人： ECOLAB USA INC.

发明人： Victor Fuk-Pong Man ,  Michael Charles Denoma ,  Yvonne Marie Killeen ,  Susan Maloney Viall

IPC分类号： C11D1/90 ,  C11D1/75 ,  C11D1/88 ,  C11D1/92 ,  C11D1/94 ,  C11D3/04 ,  C11D3/06 ,  C11D3/08 ,  C11D3/10 ,  C11D3/20 ,  C11D3/33 ,  C11D3/36 ,  C11D17/00

摘要： Alkaline or neutral viscoelastic cleaning compositions are disclosed which use non polymer thickening agents. According to the invention, cleaning compositions have been developed using viscoelastic surfactants in a neutral, acidic or alkaline cleaning formulations. These provide the dual benefit of thickening as well as an additional cleaning, thereby improving performance. Applicants have also identified several pseudo linking agents which when, used with viscoelastic surfactants provide viscoelasticity in alkaline cleaning compositions.