公开(公告)号：US08048611B2

公开(公告)日：2011-11-01

申请号：US12429282

申请日：2009-04-24

Applicant: Hideto Kato ,  Tomoyoshi Furihata ,  Masahiro Furuya ,  Yoshinori Hirano

Inventor： Hideto Kato ,  Tomoyoshi Furihata ,  Masahiro Furuya ,  Yoshinori Hirano

IPC: G03F7/00 ,  G03F7/004

CPC classification number: C08G77/38 ,  C08G77/14 ,  C08G77/50 ,  C08L83/10 ,  C08L83/14 ,  G03F7/0392 ,  G03F7/0757 ,  G03F7/40 ,  H01L21/02126 ,  H01L21/02216 ,  H01L21/02282 ,  H01L21/3122 ,  H01L27/1248 ,  Y10S430/114 ,  C08L2666/28

Abstract: A polyorganosiloxane compound is modified such that some silicon-bonded hydroxyl groups are substituted with acid labile groups and/or intermolecular or intramolecular crosslinks form with a crosslinking group having a C—O—C linkage. Cured films of a composition comprising the polyorganosiloxane are useful as interlayer dielectric films on TFT substrates.

Abstract translation: 改性聚有机硅氧烷化合物，使得一些硅键合的羟基被酸不稳定基团取代，和/或分子间或分子内的交联与具有C-O-C键的交联基团形成。 包含聚有机硅氧烷的组合物的固化膜可用作TFT基板上的层间绝缘膜。

公开(公告)号：US20110143092A1

公开(公告)日：2011-06-16

申请号：US12967163

申请日：2010-12-14

Applicant: Satoshi ASAI ,  Takanobu Takeda ,  Hideto Kato

Inventor： Satoshi ASAI ,  Takanobu Takeda ,  Hideto Kato

IPC: G03F7/26 ,  G03F7/004 ,  G03F7/20 ,  B32B3/30

CPC classification number: C08L83/10 ,  C08G77/52 ,  C08J7/04 ,  C08J2323/06 ,  C08J2479/02 ,  C09D183/14 ,  H01L23/293 ,  H01L2924/0002 ,  Y10T428/24355 ,  Y10T428/31663 ,  H01L2924/00

Abstract: Disclosed herein is a photocurable dry film including a structure having a photocurable resin layer sandwiched between a support film and a protective film, the photocurable resin layer being formed of a photocurable resin composition including ingredients (A) to (D):(A) a silicone skeleton-containing polymer compound having the repeating units represented by the following general formula (1) wherein X and Y, respectively, a divalent organic group represented by the following general formula (2) or (3) (B) a crosslinking agent selected from formalin-modified or formalin-alcohol-modified amino condensates and phenolic compound having on average two or more methylol groups or alkoxymethylol groups in one molecule; (C) a photoacid generator capable of generating an acid by decomposition with light having a wavelength of 190 to 500 nm; and (D) a solvent.

Abstract translation: 本发明公开了一种可光固化的干膜，其具有夹在支撑膜和保护膜之间的光固化树脂层的结构，该光固化性树脂层由含有成分（A）〜（D）的光固化性树脂组合物形成：（A） 含有下述通式（1）表示的重复单元的含硅氧烷骨架的高分子化合物，其中X和Y分别为由以下通式（2）或（3）（B）表示的二价有机基团选择的交联剂 由福尔马林改性或福尔马林醇修饰的氨基缩合物和在一个分子中平均有两个或多个羟甲基或烷氧基羟甲基的酚类化合物; （C）能够通过用波长为190〜500nm的光分解而产生酸的光酸产生剂; 和（D）溶剂。

公开(公告)号：US20110082321A1

公开(公告)日：2011-04-07

申请号：US12898136

申请日：2010-10-05

Applicant: Takato SAKURAI ,  Michihiro Sugo ,  Takanobu Takeda ,  Hideto Kato

Inventor： Takato SAKURAI ,  Michihiro Sugo ,  Takanobu Takeda ,  Hideto Kato

IPC: C07C43/23 ,  C07C41/26

CPC classification number: C07C43/23 ,  C07C41/26 ,  C08K5/06 ,  C08K5/1515

Abstract: Bisphenol derivatives having both alcoholic hydroxyl and allyl groups are novel and useful as reagents for modifying organic resins and silicone resins.

Abstract translation: 具有醇羟基和烯丙基两者的双酚衍生物是新型的，可用作改性有机树脂和有机硅树脂的试剂。

公开(公告)号：US07785766B2

公开(公告)日：2010-08-31

申请号：US12022685

申请日：2008-01-30

Applicant: Hideto Kato ,  Satoshi Asai

Inventor： Hideto Kato ,  Satoshi Asai

IPC: G03F7/038 ,  G03F7/20 ,  G03F7/30 ,  G03F7/40 ,  C08G77/52

CPC classification number: H01L21/02126 ,  C08G77/52 ,  C08G77/60 ,  C09D183/14 ,  C09D183/16 ,  G03F7/0757 ,  H01L21/02282 ,  H01L21/312 ,  Y10S430/106 ,  Y10S430/115 ,  Y10T428/24802

Abstract: A photo-curable resin composition comprising a silphenylene-bearing polymer having a Mw of 3,000-500,000 can be processed to form patterned films having a widely varying thickness from submicron to more than 20 μm. The cured films have good adhesion to substrates, heat resistance, electrical insulation and chemical resistance.

Abstract translation: 可以加工包含Mw为3,000-500,000的含亚磷烯基的聚合物的光固化树脂组合物，以形成具有从亚微米到大于20μm的宽度变化的图案化膜。 固化膜对基材具有良好的粘合性，耐热性，电绝缘性和耐化学性。

公开(公告)号：US20090269697A1

公开(公告)日：2009-10-29

申请号：US12429282

申请日：2009-04-24

Applicant: Hideto KATO ,  Tomoyoshi FURIHATA ,  Masahiro FURUYA ,  Yoshinori HIRANO

Inventor： Hideto KATO ,  Tomoyoshi FURIHATA ,  Masahiro FURUYA ,  Yoshinori HIRANO

IPC: G03F7/20 ,  C08G77/04 ,  G03F7/004

CPC classification number: C08G77/38 ,  C08G77/14 ,  C08G77/50 ,  C08L83/10 ,  C08L83/14 ,  G03F7/0392 ,  G03F7/0757 ,  G03F7/40 ,  H01L21/02126 ,  H01L21/02216 ,  H01L21/02282 ,  H01L21/3122 ,  H01L27/1248 ,  Y10S430/114 ,  C08L2666/28

Abstract: A polyorganosiloxane compound is modified such that some silicon-bonded hydroxyl groups are substituted with acid labile groups and/or intermolecular or intramolecular crosslinks form with a crosslinking group having a C—O—C linkage. Cured films of a composition comprising the polyorganosiloxane are useful as interlayer dielectric films on TFT substrates.

Abstract translation: 改性聚有机硅氧烷化合物，使得一些硅键合的羟基被酸不稳定基团取代，和/或分子间或分子内的交联与具有C-O-C键的交联基团形成。 包含聚有机硅氧烷的组合物的固化膜可用作TFT基板上的层间绝缘膜。

公开(公告)号：US20080253724A1

公开(公告)日：2008-10-16

申请号：US10597216

申请日：2005-01-17

Applicant: Tamotsu Uchida ,  Hideto Kato

Inventor： Tamotsu Uchida ,  Hideto Kato

IPC: G02B6/06

CPC classification number: A61B1/07 ,  A61B1/00177 ,  A61B1/0615 ,  A61B1/24 ,  G02B23/2469 ,  G02B23/2484 ,  H04N5/2251 ,  H04N5/2252 ,  H04N2005/2255

Abstract: A camera (1) has a tubular housing (3) having an emission window (7). A unitized optical fiber bundle (9) is provided on the inner surface of the housing (3) by utilizing a bundle of light guiding optical fibers on the inner surface. The unitized optical fiber bundle (9) is placed on and bonded to the inner surface of the housing (3) with the fibers bonded together by a bonding agent. An end section of the unitized optical fiber bundle (9) reaches the emission window (7) of the housing (3) to be exposed. The camera (1) has sufficient waterproof capability and is easy to produce, and capable of avoiding a decrease in the amount of light.

Abstract translation: 相机（1）具有具有发射窗（7）的管状壳体（3）。 通过在内表面上利用一束导光光纤，在壳体（3）的内表面上设置单元化的光纤束（9）。 将单位化的光纤束（9）放置在壳体（3）的内表面上并且通过粘合剂将纤维粘合在一起。 单元化光纤束（9）的端部到达要暴露的壳体（3）的发射窗（7）。 相机（1）具有足够的防水能力并且易于制造，并且能够避免光量的减少。

公开(公告)号：US07175960B2

公开(公告)日：2007-02-13

申请号：US10936621

申请日：2004-09-09

Applicant: Tomoyoshi Furihata ,  Hideto Kato

Inventor： Tomoyoshi Furihata ,  Hideto Kato

IPC: G03F7/023 ,  G03F7/30

CPC classification number: G03F7/0236 ,  G03F7/022

Abstract: A positive resist composition comprising a mixture of an alkali-soluble novolak resin prepared using m-cresol, p-cresol and 2,5-xylenol as starting reactants and a phenolic compound, wherein the hydrogen atoms of all hydroxyl groups are substituted in a proportion of 0.03–0.05 mol per hydrogen atom with 1,2-naphthoquinonediazidosulfonyl ester groups, has uniformity, high sensitivity and high resolution, and is improved in heat resistance, film retention, substrate adhesion, and storage stability.

Abstract translation: 一种正性抗蚀剂组合物，其包含使用间甲酚，对甲酚和2,5-二甲苯酚作为起始反应物制备的碱溶性酚醛清漆树脂和酚类化合物的混合物，其中所有羟基的氢原子以一定比例被取代 每个氢原子为0.03-0.05mol与1,2-萘醌二叠氮磺酰酯基团，具有均匀性，高灵敏度和高分辨率，并且耐热性，保留膜，基材粘合性和储存稳定性都得到改善。

公开(公告)号：US20060183880A1

公开(公告)日：2006-08-17

申请号：US11352267

申请日：2006-02-13

Applicant: Yoshitaka Aoki ,  Michihiro Sugo ,  Hideto Kato

Inventor： Yoshitaka Aoki ,  Michihiro Sugo ,  Hideto Kato

IPC: C08G73/00 ,  C08G69/08

CPC classification number: G03F7/023 ,  C08G73/10 ,  C08G73/1025 ,  C08G73/1039 ,  C08G73/1042 ,  C08G73/106 ,  C08G73/1064 ,  C08G73/1067 ,  C08G73/1071

Abstract: A polyimide resin having a number average molecular weight of from 2,000 to 800,000 and a repeating unit represented by the following formula (1): wherein X is a tetravalent organic group, Y is a divalent organic group, 75 to 98 mole % of R1 is hydrogen atom, and 2 to 25 mole % of R1 is 1,2-naphthoquinonediazide sulfonyl group.

Abstract translation: 数均分子量为2,000〜800,000的聚酰亚胺树脂和由下式（1）表示的重复单元：其中X为四价有机基团，Y为二价有机基团，75〜98摩尔％ SUP> 1是氢原子，2〜25摩尔％的R 1是1,2-萘醌二叠氮化物磺酰基。

公开(公告)号：US06866982B2

公开(公告)日：2005-03-15

申请号：US10329456

申请日：2002-12-27

Applicant: Hideto Kato ,  Yoshinori Hirano ,  Toshihiko Fujii ,  Hiromasa Yamaguchi

Inventor： Hideto Kato ,  Yoshinori Hirano ,  Toshihiko Fujii ,  Hiromasa Yamaguchi

IPC: G03F7/004 ,  G03F7/023 ,  G03F7/039 ,  G03F7/075 ,  G03F7/30

CPC classification number: G03F7/0048 ,  G03F7/0046 ,  G03F7/0392 ,  G03F7/0755 ,  G03F7/0757

Abstract: A resist composition comprising (A) a substantially alkali-insoluble polymer having acidic functional groups protected with acid labile groups, which becomes alkali soluble upon elimination of the acid labile groups, (B) a photoacid generator, and (C) a nonionic fluorinated organosiloxane compound consisting of perfluoroalkyl-containing siloxane bonds and polyoxyethylene type polyether bonds is exposed to UV having a wavelength of at least 150 nm and developed with an alkaline solution to form a pattern without leaving scum.

Abstract translation: 一种抗蚀剂组合物，其包含（A）具有由酸不稳定基团保护的酸性官能团的基本上不溶于碱的聚合物，其在消除酸不稳定基团时变得碱溶性，（B）光酸产生剂，和（C）非离子氟化有机硅氧烷 由包含全氟烷基的硅氧烷键和聚氧乙烯型聚醚键组成的化合物暴露于波长为至少150nm的UV并用碱性溶液显影以形成图案而不留下浮渣。

公开(公告)号：US06773858B2

公开(公告)日：2004-08-10

申请号：US10635032

申请日：2003-08-06

Applicant: Hideto Kato ,  Kyoko Soga ,  Tomoyoshi Furihata

Inventor： Hideto Kato ,  Kyoko Soga ,  Tomoyoshi Furihata

IPC: G03F7023

CPC classification number: G03F7/0233 ,  G03F7/023

Abstract: A photoresist composition comprising a novolac resin in which 3-27 mol % of the hydroxyl group hydrogens are substituted with 1,2-naphthoquinonediazidosulfonyl groups and an alkali-soluble cellulose whose glucose ring substituent groups are substituted with organic groups at a specific rate is used in microprocessing as a positive photoresist and offers many advantages including uniformity, high sensitivity, high resolution, good pattern shape, heat resistance, film retention, substrate adhesion, shelf stability, and high throughput.