公开(公告)号：US20040033319A1

公开(公告)日：2004-02-19

申请号：US10642271

申请日：2003-08-18

申请人： FUJITSU LIMITED

发明人： Hitoshi Yamada ,  Akira Tokai ,  Manabu Ishimoto ,  Akira Nakazawa ,  Kenji Awamoto ,  Tsutae Shinoda

IPC分类号： B05D003/02 ,  B05D003/04 ,  B05D003/06

CPC分类号： H01J9/20 ,  C03C17/25 ,  C03C2217/21 ,  C03C2217/228 ,  C03C2218/113 ,  C03C2218/32 ,  C23C18/06 ,  C23C18/12 ,  C23C18/1216 ,  C23C18/1279 ,  C23C18/14 ,  H01J1/70 ,  H01J11/18 ,  H01J61/35 ,  H01J2209/012

摘要： According to the present invention, there is provided a method for forming a metal oxide film comprising, when a metal oxide film is formed by conducting a thermal treatment on a coating film containing an organic metal compound formed on an inner wall of a tube, performing an ultraviolet irradiation treatment or an ozone treatment on the coating film prior to or simultaneously with the thermal treatment.

摘要翻译： 根据本发明，提供一种金属氧化物膜的形成方法，其特征在于，在通过对形成在管内壁上的有机金属化合物的涂膜进行热处理而形成金属氧化物膜的情况下，进行 在热处理之前或同时在涂膜上进行紫外线照射处理或臭氧处理。

公开(公告)号：US20040001943A1

公开(公告)日：2004-01-01

申请号：US10607870

申请日：2003-06-27

发明人： Kentin L. Alford ,  Kevin L. Simmons ,  William D. Samuels ,  Thomas S. Zemanian ,  Jun Liu ,  Yongsoon Shin ,  Glen E. Fryxell

IPC分类号： B05D003/04

CPC分类号： B82Y30/00 ,  B01J29/0308 ,  B01J29/06 ,  B01J29/70 ,  B01J29/7007 ,  B01J29/80 ,  B01J31/0274 ,  B01J37/00 ,  B01J2229/32 ,  B05D1/185 ,  B05D1/60 ,  B82Y40/00 ,  Y10T428/249969 ,  Y10T428/254 ,  Y10T428/2995

摘要： The invention pertains to methods of forming monolayers on various surfaces. The surfaces can be selected from a wide array of materials, including, for example, aluminum dioxide, silicon dioxide, carbon and SiC. The substrates can be planar or porous. The monolayer is formed under enhanced pressure conditions. The monolayer contains functionalized molecules, and accordingly functionalizes a surface of the substrate. The properties of the functionalized substrate can enhance the substrate's applicability for numerous purposes including, for example, utilization in extracting contaminants, or incorporation into a polymeric matrix.

摘要翻译： 本发明涉及在各种表面上形成单层的方法。 表面可以从广泛的材料中选出，包括例如二氧化铝，二氧化硅，碳和SiC。 基底可以是平面的或多孔的。 单层在增强的压力条件下形成。 单层含有官能化分子，因此功能化了基材的表面。 功能化底物的性质可以增强底物适用于许多目的，包括例如在提取污染物中的利用或掺入聚合物基质中。

公开(公告)号：US20030143421A1

公开(公告)日：2003-07-31

申请号：US10221436

申请日：2002-12-03

发明人： David Elwyn Price ,  Thomas Aloysius O'Donnell

IPC分类号： B05D007/00 ,  B05D003/04

CPC分类号： C09C3/063 ,  C01P2004/61 ,  C01P2004/84 ,  C01P2004/86 ,  C09C1/024 ,  C09C1/407 ,  Y10T428/2991

摘要： A composition of matter comprises particles each having a substrate being an oxide or other suitable compound of a metal other than titanium or of certain non-metal elements, and a coating on said substrate being a layer of titanium dioxide. A method of forming particles of titania-coated substrate, includes contacting a bed of hydrated particles of an oxide or other suitable compound of a metal other than titanium or of certain non-metal elements with a fluid medium containing flowing titanium tetrachloride, under conditions in which a layer comprising one or more involatile oxychloride or oxide compounds is formed at and below the surface of each of a multiplicity of the particles of the oxide or other suitable compound which thereby provides a substrate for the layer. The oxychloride or oxide compound or compounds are treated to convert the layer to a titania coating on the particles.

摘要翻译： 物质组合物包含各自具有底物为氧化物或其它合适的钛以外的金属或某些非金属元素的化合物的颗粒，所述基材上的涂层为二氧化钛层。 一种形成二氧化钛涂覆的基材的颗粒的方法包括使除了钛或某些非金属元素之外的金属或其它合适的金属化合物的水合颗粒床与含有流动的四氯化钛的流体介质接触， 在氧化物或其它合适化合物的多个颗粒的每一个的表面上和下面形成包含一种或多种非挥发性氯氧化物或氧化物化合物的层，由此提供该层的基材。 处理三氯氧化物或氧化物化合物或将化合物转化为颗粒上的二氧化钛涂层。

公开(公告)号：US20030091870A1

公开(公告)日：2003-05-15

申请号：US09999285

申请日：2001-11-15

发明人： Siddhartha Bhowmik ,  Sailesh Mansinh Merchant ,  Minesh Amrat Patel ,  Darrell L. Simpson

IPC分类号： B32B009/00 ,  B05D003/04 ,  C23C016/00 ,  B05D003/02

CPC分类号： H01L21/76843 ,  H01L21/76856 ,  H01L21/76876 ,  Y10T428/265

摘要： A liner and method of forming a liner for a tungsten plug in a semiconductor device which reduces cost and improves reliability. In one aspect, it has been discovered that by depositing an initial film of titanium using any conventional process such as CVD, PVD or IMP (ion metal plasma) and then heating the device in a nitrogen atmosphere to a temperature of about 450 degrees C., a thin protective layer of titanium nitride can be form on the surface of the initial film. The protective layer has been found to be uniform in density and avoids the irregularities occurring in deposited titanium nitride. The thickness of the TiN layer can be controlled by controlling the time duration of the annealing process and by controlling the pressure of the nitrogen in the annealing tool. Using this two step method, the integrity of the titanium nitride layer is preserved and the formation of volcanoes is avoided.

摘要翻译： 一种在半导体器件中形成用于钨插塞的衬垫的衬垫和方法，其降低成本并提高可靠性。 在一方面，已经发现通过使用任何常规方法如CVD，PVD或IMP（离子金属等离子体）沉积钛的初始膜，然后在氮气气氛中将该装置加热到约450℃的温度。 可以在初始膜的表面上形成薄的氮化钛保护层。 已经发现保护层的密度是均匀的，并且避免了在沉积的氮化钛中发生的凹凸。 可以通过控制退火工艺的持续时间和控制退火工具中氮的压力来控制TiN层的厚度。 采用这种两步法，保护了氮化钛层的完整性，避免了火山形成。

公开(公告)号：US20030059621A1

公开(公告)日：2003-03-27

申请号：US10238909

申请日：2002-09-10

发明人： Toshihiro Tai ,  Ippei Tonosaki

IPC分类号： B05D003/04

CPC分类号： C23C18/30 ,  C23C18/208 ,  C23C18/2086 ,  C23C18/24 ,  Y10T428/31605 ,  Y10T428/31609 ,  Y10T428/31678 ,  Y10T428/31725

摘要： The present invention is a process of producing a plating resin molded article, wherein metal plating is carried out on the surface of a thermoplastic resin molded article and either of requirements (1), (2) and (3) described below is included: (1) the thermoplastic resin molded article contains a thermoplastic resin and a water-soluble substance, a step of carrying out the removal of fat of the resin molded article and a step of electroless plating are provided in combination, and a step of etching by an acid containing a heavy metal is not included; (2) the thermoplastic resin molded article contains a polyamide-based resin and a styrene-based resin, a step of carrying out the removal of fat of the resin molded article and a step of electroless plating are provided in combination, and a step of etching by an acid containing a heavy metal is not included; or (3) a step of contact-treating the thermoplastic resin molded article with an acid or base not containing a heavy metal as the pre-treatment of the metal plating step is included. The present invention provides further the plating resin molded article obtained by the above-mentioned step. Although an etching treatment by chromic acid is not carried out, the plating resin molded article having a high adhering strength of a plating layer is provided.

摘要翻译： 本发明是一种电镀树脂成型体的制造方法，其特征在于，在热塑性树脂成形体的表面进行金属镀覆，并且包括下述（1），（2）和（3）中任一项所述的电镀树脂成型体：（ 1）热塑性树脂成型体含有热塑性树脂和水溶性物质，组合进行树脂成型体的脂肪的除去和无电解电镀工序的步骤，以及通过 不含重金属的酸; （2）热塑性树脂成型体含有聚酰胺类树脂和苯乙烯类树脂，组合进行树脂成形品的脂肪的除去和无电解电镀工序的工序， 不含重金属的酸蚀刻; 或者（3）包括用不含重金属的酸或碱接触处理热塑性树脂成形体的步骤作为金属电镀步骤的预处理。 本发明还提供了通过上述步骤获得的电镀树脂模塑制品。 尽管不进行铬酸蚀刻处理，但是提供了镀层附着强度高的镀覆树脂模塑制品。

公开(公告)号：US20030054106A1

公开(公告)日：2003-03-20

申请号：US10225777

申请日：2002-08-22

发明人： Arthur Bourne

IPC分类号： B05D003/04 ,  B05D005/00

CPC分类号： C09D175/06 ,  B05D3/046 ,  B44C1/04 ,  B44C1/20 ,  B44C1/227 ,  C03C17/328 ,  C03C2218/328 ,  C09D9/00 ,  C09D175/16

摘要： A method of removing a polyethylene coating from a glass surface includes the steps of contacting the glass surface with a solution of ammonium bifluoride (NH4HF2), rinsing the contacted surface with one or more rinses; and drying the surface. The thickness of the polyethylene slip coating applied to most commercial glass bottles is in the range 75-100nullm. The coating is removed by the process outlined above sufficiently to allow the application of an adherent decorative coating to the surface.

摘要翻译： 从玻璃表面去除聚乙烯涂层的方法包括以下步骤：使玻璃表面与二氟化铵（NH 4 HF 2）的溶液接触，用一次或多次漂洗冲洗接触表面; 并干燥表面。 应用于大多数商业玻璃瓶的聚乙烯滑爽涂层的厚度在75-100μm的范围内。 通过上述过程去除涂层，足以允许将粘附的装饰涂层施加到表面。

公开(公告)号：US20030039745A1

公开(公告)日：2003-02-27

申请号：US10205749

申请日：2002-07-26

申请人： Matsushita Electric Industrial Co., Ltd.

发明人： Tetsuo Nanno ,  Yohei Hattori ,  Fumihiko Yoshii

IPC分类号： B05D005/12 ,  B05D003/04

CPC分类号： H01M4/0442 ,  H01M4/0416 ,  H01M4/28 ,  H01M4/32 ,  H01M4/661 ,  H01M10/30

摘要： The following steps are conducted: preparing a metal salt carried-substrate A by soaking a sintered nickel substrate in an acidic solution containing cobalt ions and at least one metal ions of magnesium ions, iron ions and manganese ions, and drying thus soaked substrate; preparing a hydroxide carried-substrate B by soaking the substrate A in an alkaline solution to deposit cobalt hydroxide and at least one metal hydroxide of magnesium hydroxide, iron hydroxide and manganese hydroxide in the pores and on the surface of the substrate A; obtaining an oxide carried-substrate C by oxidizing the cobalt hydroxide to produce cobalt oxide having a mean cobalt valence of over 2; and obtaining an active material carried-substrate D by soaking the substrate C in a solution containing nickel nitrate dissolved therein, drying thus soaked substrate C, and then soaking thus dried substrate C in an alkaline solution, to fill the active material in the substrate C.

摘要翻译： 进行以下步骤：通过将烧结的镍基底浸入含有钴离子和至少一种镁离子，铁离子和锰离子的金属离子的酸性溶液中并使其干燥而浸渍基底来制备金属盐载带基材A. 通过将碱性溶液浸渍在碱性溶液中，在孔中和基材A的表面上沉积氢氧化钴和至少一种氢氧化镁，氢氧化铁和氢氧化锰的金属氢氧化物，从而制备氢氧化物承载基板B. 通过氧化氢氧化钴得到平均钴价超过2的钴氧化物来获得氧化物承载衬底C; 通过将基板C浸渍在溶解有硝酸镍的溶液中而干燥，浸渍基板C，然后将干燥后的基板C浸渍在碱性溶液中，从而填充基板C中的活性物质 。

公开(公告)号：US20030012881A1

公开(公告)日：2003-01-16

申请号：US10228887

申请日：2002-08-27

发明人： Arno Schintlmeister ,  Peter Wilhartitz

IPC分类号： B05D003/04

CPC分类号： H01L21/76888 ,  H01L21/31683

摘要： The resistivity of an electrically conductive layer of molybdenum or a molybdenum alloy is reduced. For that purpose, a MoO2 layer is formed on the surface of the electrically conductive layer. The sheet resistivity can thereby be reduced in the order of magnitude of 10% to 15%.

摘要翻译： 钼或钼合金的导电层的电阻率降低。 为此，在导电层的表面上形成MoO 2层。 因此，薄层电阻率可以降低10％至15％的数量级。

公开(公告)号：US20030008224A1

公开(公告)日：2003-01-09

申请号：US10146464

申请日：2002-05-16

发明人： Yoshimasa Fujita ,  Kimitaka Ohhata

IPC分类号： G03F007/34 ,  G03F007/38 ,  G03F007/11 ,  H05H001/00 ,  B05D003/04 ,  B05D003/00 ,  B32B017/00

CPC分类号： H01L51/0013 ,  H01L51/0037 ,  H01L51/0038 ,  H01L51/0039 ,  H01L51/56 ,  Y10T428/31

摘要： A method of producing an organic LED display panel, which includes: a step of preparing a donor film by forming a transfer film on a base film comprising at least a foundation film and a light-to-heat conversion layer and a step of combining the donor film with a substrate and irradiating the donor film with one of a light beam and a heat radiation beam to pattern-transfer the transfer film from the donor film onto the substrate, wherein surfaces of the base film and the substrate which are to be brought into contact with the transfer film are hydrophilic or hydrophobic, and have water contact angles null1 and null2, respectively, which satisfy the following expression (I): null1nullnull2

摘要翻译： 一种制造有机LED显示面板的方法，其包括：通过在至少包括基膜和光热转换层的基膜上形成转印膜来制备供体膜的步骤，以及将 施加膜，并用光束和热辐射束中的一个照射供体膜，以将转印膜从供体膜图案转移到基底上，其中基膜和基底的表面将被带到 与转移膜接触是亲水的或疏水的，并且分别具有满足以下表达式（I）的水接触角θ1和θ2：在线公式>θ1-θ2< 50度（I）

公开(公告)号：US20020192365A1

公开(公告)日：2002-12-19

申请号：US10110642

申请日：2002-04-12

发明人： Toshiaki Kitazoe ,  Keisuke Tanaka ,  Kenji Murata

IPC分类号： B05D005/06 ,  B05D003/04 ,  B05D003/02 ,  B05D001/36

CPC分类号： G02B1/18 ,  C03C17/245 ,  C03C17/3417 ,  C03C2217/213 ,  C03C2218/151 ,  C03C2218/152 ,  C03C2218/32 ,  C23C14/10 ,  C23C14/5853 ,  C23C16/0272 ,  C23C16/402 ,  C23C16/56 ,  G02B1/10

摘要： The present invention relates to a method for imparting hydrophilicity to a substrate whereby high hydrophilic properties and water-holding properties can be maintained for a long period of time. According to the present invention, an SiO2 film is formed directly or through an undercoat layer on a substrate under a reduced pressure of 100 Pa or less and immediately after the SiO2 film is formed, the SiO2 film is treated with water. Before forming the SiO2 film, it is also desirable that an undercoat layer consisting of a TiO2 film, Al2O3 film, Nb2O5 film, a laminated film prepared by laminating the TiO2 film on the Al2O3 film, a laminated film prepared by laminating the TiO2 film on the Nb2O5 film, or a low emissivity film be formed on a substrate and the SiO2 film be then formed on the undercoat film to serve as an SiO2 composite film.

摘要翻译： 本发明涉及一种赋予基材亲水性的方法，由此能够长时间保持高的亲水性和保水性。 根据本发明，在100Pa以下的减压下，在基板上直接或通过底涂层形成SiO 2膜，在形成SiO 2膜之后立即用水处理SiO 2膜。 在形成SiO 2膜之前，还期望的是，由TiO 2膜，Al 2 O 3膜，Nb 2 O 5膜构成的底涂层，通过在Al 2 O 3膜上层压TiO 2膜制备的层压膜，通过将TiO 2膜层压 在基板上形成Nb 2 O 5膜或低发射率膜，然后在底涂膜上形成SiO 2膜作为SiO 2复合膜。