Abstract:
The present disclosure provides for many different embodiments. An exemplary method can include providing a mask fabricated according to a design pattern; extracting a mask pattern from the mask; converting the mask pattern into a rendered mask pattern, wherein the simulated design pattern includes the design pattern and any defects in the mask; simulating a lithography process using the rendered mask pattern to create a virtual wafer pattern; and determining whether any defects in the mask are critical based on the virtual wafer pattern. The critical defects in the mask can be repaired.
Abstract:
A circuit of a scanner to perform a color space conversion on an RGB signal. The circuit has several sampling-amplified-offset devices to sample, amplify and compensate potential of an R charge signal, a G charge signal and a B charge signal to obtain an R analog signal, a G analog signal and a B analog signal. The circuit further has a gain adder to multiply the corresponding weighted gain with the R analog signal, the G analog signal and the B analog signal. The multiplication results are then summed up to obtain an addition analog signal. A multiplexer is also included to select between the R analog signal, the G analog signal, the B analog signal and the addition analog signal for output.
Abstract:
An image compensation method is provided. At least one light source and a plurality of reflecting elements each capable of reflecting light from the light source are provided. Each reflecting element reflects a beam of light from the light source to produce a beam of reflected light having a unique color content. The reflecting elements are shifted to a location where one of the reflecting elements is capable of reflecting light from the light source.
Abstract:
A semiconductor wafer structure includes a plurality of dies, a first scribe line extending along a first direction, a second scribe line extending along a second direction and intersecting the first scribe line, wherein the first and the second scribe lines have an intersection region. A test line is formed in the scribe line, wherein the test line crosses the intersection region. Test pads are formed in the test line and only outside a free region defined substantially in the intersection region.
Abstract:
A circuit of a scanner to perform a color space conversion on an RGB signal. The circuit has several sampling-amplified-offset devices to sample, amplify and compensate potential of an R charge signal, a G charge signal and a B charge signal to obtain an R analog signal, a G analog signal and a B analog signal. The circuit further has a gain adder to multiply the corresponding weighted gain with the R analog signal, the G analog signal and the B analog signal. The multiplication results are then summed up to obtain an addition analog signal. A multiplexer is also included to select between the R analog signal, the G analog signal, the B analog signal and the addition analog signal for output.
Abstract:
A system for automatically calculating parameters of an MOSFET is disclosed. The parameter calculating system runs in a computer. The parameter calculating system is used for receiving values input by the users, and for calculating parameters of the MOSFET according to the input values. The parameter calculating system includes a type selecting module (110), a value receiving module (120), a number determining module (130), a parameter calculating module (140), and a circuit netlist generating module (150). A related method is also disclosed.