公开(公告)号：US5777068A

公开(公告)日：1998-07-07

申请号：US527057

申请日：1995-09-12

申请人： Akira Tanaka ,  Satoshi Tazaki ,  Kei Sakamoto ,  Yasuhiro Yoneda ,  Kishio Yokouchi ,  Daisuke Mizutani ,  Yoshikatsu Ishizuki

发明人： Akira Tanaka ,  Satoshi Tazaki ,  Kei Sakamoto ,  Yasuhiro Yoneda ,  Kishio Yokouchi ,  Daisuke Mizutani ,  Yoshikatsu Ishizuki

IPC分类号： G03F7/037 ,  C08G73/10 ,  C08G69/26

CPC分类号： G03F7/037

摘要： Provided are photosensitive resin compositions comprising a polyamic compound having, at each terminal thereof, a specific actinic ray-sensitive functional group which has substituent groups each having a photopolymerizable carbon-carbon double bond, a photosensitive auxiliary having a photopolymerizable functional group and a solvent. The photosensitive resin compositions of the invention are excellent in resist properties such as sensitivity and good in storage stability and can provide a film small in residual stress.

摘要翻译： 提供了含有聚酰胺化合物的光敏树脂组合物，其每个末端具有具有可光聚合碳 - 碳双键的取代基的特定光化射线敏感性官能团，具有光聚合官能团的光敏助剂和溶剂。 本发明的感光性树脂组合物的抗敏性优异，例如灵敏度好，保存稳定性好，能够提供残留应力小的膜。

公开(公告)号：US5757989A

公开(公告)日：1998-05-26

申请号：US240739

申请日：1994-08-15

申请人： Tetsuzo Yoshimura ,  Takeshi Ishitsuka ,  Katsusada Motoyoshi ,  Satoshi Tatsuura ,  Wataru Sotoyama ,  Koji Tsukamoto ,  Yasuhiro Yoneda ,  Tomoaki Hayano ,  Azuma Matsuura

发明人： Tetsuzo Yoshimura ,  Takeshi Ishitsuka ,  Katsusada Motoyoshi ,  Satoshi Tatsuura ,  Wataru Sotoyama ,  Koji Tsukamoto ,  Yasuhiro Yoneda ,  Tomoaki Hayano ,  Azuma Matsuura

IPC分类号： G02B6/43 ,  G02F1/313 ,  H01S5/02 ,  H01S5/022 ,  H01S5/026 ,  H01S5/04 ,  H01S5/10 ,  H01S5/42 ,  H04Q3/52 ,  G02B6/12

CPC分类号： H01S5/1032 ,  G02B6/43 ,  G02F1/313 ,  G02F1/3132 ,  G02F1/3137 ,  H01L2224/16145 ,  H01L2224/16225 ,  H01S5/02248 ,  H01S5/041 ,  H01S5/42

摘要： An optical circuit system which takes out at least a portion of the light of a light power source corresponding to at least one type of output voltage of an IC, board, multichip module, electronic element, or opto-electronic element and produces an optical signal, wherein the light power source is an optical waveguide into which light has been introduced, a waveguide laser, or a waveguide optical amplifier, light reflecting portions are provided at its ends and/or middle, a signal transmission waveguide is formed in contact with the side surface and/or top or bottom surface of the optical waveguide or in proximity to the same at a certain distance, and the optical signal corresponding to at least one type of output voltage of the IC, board, multichip module, electronic element, or opto-electronic element is made to propagate to the signal transmission waveguide, which optical circuit system is rich in flexibility and enables complicated optical interconnections to be handled, and components of the same.

摘要翻译： PCT No.PCT / JP93 / 01301 Sec。 371日期：1994年8月15日 102（e）日期1994年8月15日PCT提交1993年9月10日PCT公布。 公开号WO94 / 06052 日期1994年3月17日一种光电路系统，其取出对应于IC，板，多芯片模块，电子元件或光电子元件的至少一种类型的输出电压的光源的至少一部分光 并且产生光信号，其中光功率源是已经引入光的光波导，波导激光器或波导光放大器，在其端部和/或中间设置有光反射部分，信号传输波导是 形成为与光波导的侧表面和/或顶表面或底表面接触或者在一定距离处与其接近，并且所述光信号对应于IC，板，多芯片模块的至少一种类型的输出电压 ，电子元件或光电元件传播到信号传输波导，该光电路系统具有丰富的灵活性，并使复杂的光互连成为 处理和组件相同。

公开(公告)号：US4863833A

公开(公告)日：1989-09-05

申请号：US027089

申请日：1987-03-16

申请人： Shun-ichi Fukuyama ,  Yasuhiro Yoneda ,  Masashi Miyagawa ,  Kota Nishii

发明人： Shun-ichi Fukuyama ,  Yasuhiro Yoneda ,  Masashi Miyagawa ,  Kota Nishii

IPC分类号： G03F7/004 ,  G03F7/075

CPC分类号： G03F7/0757 ,  Y10S438/948

摘要： A high-energy radiation-sensitive pattern-forming resist material consisting of polysilsesquioxane having no hydroxyl group in its molecule. The pattern-forming material of this invention has an improved sensitivity to high-energy radiation exposure, a high resistance to dry etching, a high resolution capability, and an improved thermal stability.

公开(公告)号：US4670299A

公开(公告)日：1987-06-02

申请号：US790615

申请日：1985-10-23

申请人： Shun-ichi Fukuyama ,  Yasuhiro Yoneda ,  Masashi Miyagawa ,  Kota Nishii ,  Azuma Matsuura

发明人： Shun-ichi Fukuyama ,  Yasuhiro Yoneda ,  Masashi Miyagawa ,  Kota Nishii ,  Azuma Matsuura

IPC分类号： C08G77/06 ,  H01B3/46 ,  H01L21/312 ,  H01L21/48 ,  H01L23/498 ,  H05K1/00 ,  B05D5/12

CPC分类号： H01L21/02137 ,  C08G77/06 ,  H01B3/46 ,  H01L21/02282 ,  H01L21/3122 ,  H01L21/4803 ,  H01L21/481 ,  H01L23/49894 ,  H01L2924/0002 ,  H05K3/4676 ,  Y10S428/90 ,  Y10S428/901 ,  Y10T428/31663 ,  Y10T428/31678

摘要： A lower alkyl polysilsesquioxane having a general formula ##STR1## wherein R is CH.sub.3 or C.sub.2 H.sub.5, and n is an integer equal to about 50 to about 10,000, prepared by (a) dissolving a lower alkyl trifunctional silane in an organic solvent at a temperature of -20.degree. C. to -50.degree. C. to form an organic solution thereof; (b) hydrolyzing the lower alkyl trifunctional silane by dropping water into the organic solution at a temperature of -20.degree. C. to -50.degree. C. under an inert gas pressurized at 1,000 to 3,000 Pa; and (c) gradually heating the organic solution together with a water phase lying therebeneath up to a temperature of 60.degree. C. to 100.degree. C. under an inert gas pressurized at 1,000 to 3,000 Pa.Also, a flat surfaced insulating layer of a silylated organopolysilsesquioxane having a general formula ##STR2## wherein R is an alkyl or phenyl group, and n is an integer equal to about 50 to about 2,000, preferably about 50 to about 500, formed on a circuit board having stepwise differences in height thereon, by applying an organic solution of the polymer; evaporating the solvent; and melting the polymer to flatten the surface of the polymer and curing the polymer.

公开(公告)号：US4345020A

公开(公告)日：1982-08-17

申请号：US212609

申请日：1980-12-03

申请人： Yasuhiro Yoneda ,  Toshisuke Kitakohji ,  Kenro Kitamura

发明人： Yasuhiro Yoneda ,  Toshisuke Kitakohji ,  Kenro Kitamura

IPC分类号： G03F7/004 ,  C08F20/00 ,  C08F20/02 ,  C08F20/26 ,  C08F220/00 ,  C08F220/04 ,  C08F220/10 ,  G03F7/039 ,  H01L21/027

CPC分类号： G03F7/039 ,  Y10S430/143

摘要： A cross-linkable positive-working ionizing radiation-resist or ultraviolet ray-resist polymer composition including: in polymerized form,(a) units derived from a methacrylic acid ester of the formula:CH.sub.2 .dbd.C(CH.sub.3).COOR where R is an alkyl or haloalkyl group having from 1 to 6 carbon atoms, benzyl or cyclohexyl,(b) units derived from a monoolefinically unsaturated carboxylic acid having from 3 to 12 carbon atoms and from 1 to 3 carboxyl groups, and(c) units derived from methacrylic acid chloride.The amount of the units (c) in the polymer composition is such that the number of moles of the units (b), multiplied by the number of the carboxyl group or groups in each of the units (b), ranges from about 1 to about 20% based on the total number of moles of the units (a), (b) and (c); the amount of the units (c) ranges from about 0.05 to about 3.0% by mole based on the total number of moles of the units (a), (b) and (c); and the molar ratio of the units (b), multiplied by the number of the carboxyl groups in each of the units (b), to the units (c) is greater than 2/1 but less than 250/1. The polymer composition is preferably in the form of either a copolymer having the units (a), (b) and (c), or a polymer blend of a copolymer comprised of the units (b) and a portion of the units (a) and a copolymer comprised of the units (c) and the remainder of the units (a). The resist polymer composition exhibits enhanced sensitivity as well as good thermal resistance, contrast and resolution.

摘要翻译： 一种可交联正性电离辐射抗蚀剂或紫外线抗蚀剂聚合物组合物，包括：聚合形式，（a）衍生自下式的甲基丙烯酸酯的单元：CH 2 = C（CH 3）.COOR，其中R是 具有1至6个碳原子的烷基或卤代烷基，苄基或环己基，（b）衍生自具有3至12个碳原子和1至3个羧基的单烯属不饱和羧酸的单元，和（c）衍生自甲基丙烯酸 酰氯。

公开(公告)号：US4276365A

公开(公告)日：1981-06-30

申请号：US061291

申请日：1979-07-02

申请人： Yasuhiro Yoneda ,  Toshisuke Kitakohji ,  Kenro Kitamura

发明人： Yasuhiro Yoneda ,  Toshisuke Kitakohji ,  Kenro Kitamura

IPC分类号： G03F7/039 ,  G03C1/68

CPC分类号： G03F7/039 ,  Y10S430/143

摘要： PCT No. PCT/JP78/00022 Sec. 371 Date July 7, 1979 Sec. 102(e) Date July 2, 1979 PCT Filed Nov. 6, 1978 PCT Pub. No. WO79/00284 PCT Pub. Date May 31, 1979A cross-linkable positive-working ionizing radiation-resist or ultraviolet ray- resist polymer composition including: in polymerized form,(a) units derived from a methacrylic acid ester of the formula:CH.sub.2 .dbd.C(CH.sub.3).COOR where R is an alkyl or haloalkyl group having from 1 to 6 carbon atoms, benzyl or cyclohexyl,(b) units derived from a monoolefinically unsaturated carboxylic acid from 3 to 12 carbon atoms and having from 1 to 3 carboxyl groups, and(c) units derived from methacrylic acid chloride.The amount of the units (c) in the polymer composition is such that the number of moles of the units (b), multiplied by the number of the carboxyl group or groups in each of the units (b) ranges from about 1 to about 20% based on the total number of moles of the units (a), (b) and (c); the amount of the units (c) ranges from about 0.05 to about 3.0% by mole based on the total number of moles of the units (a), (b) and (c); and the molar ratio of the units (b), multiplied by the number of the carboxyl groups in each of the units (b), to the units (c) is greater than 2/1 but less than 250/1.

摘要翻译： PCT No.PCT / JP78 / 00022 Sec。 371日期1979年7月7日 102（e）日期1979年7月2日PCT申请日1978年11月6日PCT公布。 出版物WO79 / 00284 日期：1979年5月31日一种可交联正电离辐射抗蚀剂或紫外线抗蚀剂聚合物组合物，其包含：聚合形式，（a）衍生自下式的甲基丙烯酸酯的单元：CH 2 = C（CH 3）。 COOR，其中R是具有1至6个碳原子的烷基或卤代烷基，苄基或环己基，（b）衍生自3至12个碳原子并具有1至3个羧基的单烯属不饱和羧酸的单元和（c ）单元衍生自甲基丙烯酰氯。

公开(公告)号：US4273856A

公开(公告)日：1981-06-16

申请号：US112309

申请日：1979-07-02

申请人： Yasuhiro Yoneda ,  Toshisuke Kitakohji ,  Kenro Kitamura

发明人： Yasuhiro Yoneda ,  Toshisuke Kitakohji ,  Kenro Kitamura

IPC分类号： C08F220/00 ,  C08F20/52 ,  C08F220/04 ,  C08F220/10 ,  G03F7/039 ,  H01L21/027

CPC分类号： G03F7/039 ,  Y10S430/143

摘要： PCT No. PCT/JP78/00021 Sec. 371 Date July 2, 1979 Sec. 102(e) Date July 7, 1979 PCT Filed Nov. 6, 1978 PCT Pub. No. WO79/00283 PCT Pub. Date May 31, 1979A cross-linkable positive-working ionizing radiation-resist or ultraviolet ray-resist polymer composition comprising, in polymerized form,(a) from about 70 to about 99% by mole of units derived from a methacrylic acid ester of the formula:CH.sub.2 .dbd.C(CH.sub.3). COORwhere R is an alkyl or haloalkyl group having from 1 to 6 carbon atoms, a benzyl group or a cyclohexyl group,(b) from about 1 to about 20% by mole of units derived from methacrylamide, and(c) from about 0.05 to about 20% by mole of units derived from methacrylic acid chloride;each amount of the units (a), (b) and (c) being based on the total moles of the units (a), (b) and (c). The polymer composition is preferably in the form of either a copolymer comprised of the units (a), (b) and (c), or a blend of a copolymer comprised of the units (b) and a portion of the units (a) and a copolymer comprised of the units (c) and the remainder of the units (a). The resist polymer composition exhibits enhanced sensitivity as well as good thermal resistance, contrast and resolution.

摘要翻译： PCT No.PCT / JP78 / 00021 Sec。 371日期1979年7月2日 102（e）日期1979年7月7日PCT提交1978年11月6日PCT公布。 出版物WO79 / 00283 日期：1979年5月31日一种可交联的正电离辐射抗蚀剂或紫外线抗蚀剂聚合物组合物，其包含聚合形式的（a）约70-约99摩尔％的衍生自 式：CH 2 = C（CH 3）。 COOR，其中R是具有1至6个碳原子的烷基或卤代烷基，苄基或环己基，（b）约1至约20摩尔％来自甲基丙烯酰胺的单元，和（c）约0.05 至约20摩尔％的衍生自甲基丙烯酰氯的单元; 单位（a），（b）和（c）的单位为单位（a），（b）和（c）的总摩尔数。 聚合物组合物优选为由单元（a），（b）和（c）组成的共聚物的形式，或由单元（b）和单元（a）的一部分组成的共聚物的共混物， 和由单元（c）和单元（a）的其余部分组成的共聚物。 抗蚀剂聚合物组合物具有增强的灵敏度以及良好的耐热性，对比度和分辨率。

公开(公告)号：US09318425B2

公开(公告)日：2016-04-19

申请号：US13212467

申请日：2011-08-18

申请人： Teru Nakanishi ,  Nobuyuki Hayashi ,  Masaru Morita ,  Yasuhiro Yoneda

发明人： Teru Nakanishi ,  Nobuyuki Hayashi ,  Masaru Morita ,  Yasuhiro Yoneda

IPC分类号： H05K1/00 ,  H01L23/498 ,  H01L23/13 ,  H05K3/34 ,  H01L23/00

CPC分类号： H05K1/0296 ,  H01L23/13 ,  H01L23/49811 ,  H01L23/49822 ,  H01L23/49827 ,  H01L23/49833 ,  H01L23/4985 ,  H01L24/16 ,  H01L24/81 ,  H01L2224/0401 ,  H01L2224/05647 ,  H01L2224/1379 ,  H01L2224/13839 ,  H01L2224/13847 ,  H01L2224/16225 ,  H01L2224/16235 ,  H01L2224/81193 ,  H01L2224/81801 ,  H01L2924/01004 ,  H01L2924/01078 ,  H01L2924/01079 ,  H01L2924/12042 ,  H01L2924/15311 ,  H05K1/181 ,  H05K3/3436 ,  H05K2201/10287 ,  H05K2201/10378 ,  H05K2201/10424 ,  H05K2201/10719 ,  Y02P70/613 ,  H01L2924/00

摘要： A semiconductor device includes: a wiring board including a first electrode pad on a surface thereof; a circuit board disposed to stand on the wiring board, and including an interconnection connected to the first electrode pad; and a semiconductor package disposed to face the wiring board with the circuit board interposed therebetween, and including a second electrode pad on a surface thereof, the second electrode pad being connected to the interconnection.

摘要翻译： 半导体器件包括：布线板，其表面上包括第一电极焊盘; 电路板，被布置成站立在所述布线板上，并且包括连接到所述第一电极焊盘的互连; 以及半导体封装，其设置成与所述布线板面对所述电路板，并且在其表面上包括第二电极焊盘，所述第二电极焊盘连接到所述互连。

公开(公告)号：US09080080B2

公开(公告)日：2015-07-14

申请号：US13996976

申请日：2011-12-21

申请人： Yasuhiro Yoneda ,  Kanji Sato

发明人： Yasuhiro Yoneda ,  Kanji Sato

IPC分类号： C09G1/00 ,  C09G1/02 ,  C09K3/14 ,  G11B5/84 ,  B01D39/00

CPC分类号： C09G1/02 ,  C09K3/1463 ,  G11B5/8404

摘要： Provided is a method for producing a polishing composition capable of reducing scratches and particles of an object to be polished, after polishing. It is a method for producing a polishing composition including a step of filtering with a filtration filter a silica particle dispersion containing colloidal silica whose primary particles have an average particle diameter in a range of 1 to 100 nm, wherein the filtration filter includes diatomite cationized by use of a polyvalent amine compound having 9 to 200 cationic groups in the molecule.

摘要翻译： 本发明提供一种能够在研磨后能够减少被研磨物的划痕和微粒的抛光组合物的制造方法。 一种抛光组合物的制造方法，其特征在于，使用过滤器过滤含有一次粒子的平均粒径为1〜100nm的胶态二氧化硅的二氧化硅粒子分散体，其中，过滤器包括由硅藻土阳离子化的硅藻土 在分子中使用具有9至200个阳离子基团的多价胺化合物。

公开(公告)号：US08357311B2

公开(公告)日：2013-01-22

申请号：US12520747

申请日：2007-12-28

申请人： Mami Shirota ,  Yasuhiro Yoneda

发明人： Mami Shirota ,  Yasuhiro Yoneda

IPC分类号： C09K13/00 ,  C09K3/14

CPC分类号： C09G1/02 ,  B24B7/241 ,  B24B37/044 ,  C01F17/0043 ,  C01G25/00 ,  C01G25/02 ,  C01P2002/50 ,  C01P2002/54 ,  C01P2002/72 ,  C01P2004/62 ,  C01P2004/64 ,  C09K3/1436 ,  C09K3/1463 ,  H01L21/304 ,  H01L21/31053

摘要： A polishing liquid composition includes composite oxide particles containing cerium and zirconium, a dispersing agent, and an aqueous medium. A powder X-ray diffraction spectrum of the composite oxide particles obtained by CuKα1 ray (λ=0.154050 nm) irradiation includes a peak (first peak) having a peak top in a diffraction angle 2θ (θ is a Bragg angle) range of 28.61 to 29.67°, a peak (second peak) having a peak top in a diffraction angle 2θ range of 33.14 to 34.53°, a peak (third peak) having a peak top in a diffraction angle 2θ range of 47.57 to 49.63°, and a peak (fourth peak) having a peak top in a diffraction angle 2θ range of 56.45 to 58.91°. A half-width of the first peak is 0.8° or less.

摘要翻译： 抛光液组合物包括含有铈和锆的复合氧化物颗粒，分散剂和水性介质。 通过CuKα1射线（λ= 0.154050nm）照射获得的复合氧化物粒子的粉末X射线衍射光谱包括在衍射角2θ具有峰顶的峰（第一峰） （＆amp;布拉格角）范围为28.61至29.67°，峰值（第二峰值）在衍射角2θ处具有峰顶; 范围33.14〜34.53°，峰值（第三峰值）在衍射角2θ具有峰顶; 范围为47.57〜49.63°，峰值（第四峰值）为衍射角2θ的峰值顶点; 范围为56.45至58.91°。 第一峰的半宽度为0.8°以下。