公开(公告)号：US5905569A

公开(公告)日：1999-05-18

申请号：US824797

申请日：1997-03-26

申请人： Akiyoshi Suzuki

发明人： Akiyoshi Suzuki

IPC分类号： G01N21/01 ,  G01J1/02 ,  G03F7/20 ,  H01L21/027 ,  G01J1/00

CPC分类号： G03F7/70058

摘要： An illuminance measuring method and apparatus measures the illuminance on a wafer in an exposure apparatus for projecting a pattern formed on a mask onto a wafer. The illuminance of the mask causes the formation of ghost light on the mask. The apparatus and method use a first technique to measure the illuminance on the wafer while a mask used for actual exposure is mounted in the exposure apparatus and the mask is illuminated. The apparatus and method also use a second technique, different form the first technique, to measure the illuminance on the wafer while the mask used for actual exposure is mounted in the exposure apparatus and the mask is illuminated. The apparatus and method also find the distribution of the ghost light caused by the mask, based on the illuminance measured by these two techniques.

摘要翻译： 照度测量方法和装置测量用于将形成在掩模上的图案投影到晶片上的曝光设备中的晶片上的照度。 掩模的照度导致在掩模上形成重影。 该设备和方法使用第一技术来测量晶片上的照度，而用于实际曝光的掩模安装在曝光设备中并且掩模被照亮。 该设备和方法还使用第二种技术，不同于第一种技术来测量晶片上的照度，而用于实际曝光的掩模安装在曝光设备中并且掩模被照亮。 该装置和方法还基于通过这两种技术测量的照度，找到由掩模引起的重影光的分布。

公开(公告)号：US5754061A

公开(公告)日：1998-05-19

申请号：US718015

申请日：1996-09-03

申请人： Shinzou Satou ,  Kou Ebihara ,  Akiyoshi Suzuki ,  Keisuke Ishiwata ,  Kouji Miki ,  Hitoshi Ohmichi ,  Tamio Miyamura ,  Masamichi Kamiyama

发明人： Shinzou Satou ,  Kou Ebihara ,  Akiyoshi Suzuki ,  Keisuke Ishiwata ,  Kouji Miki ,  Hitoshi Ohmichi ,  Tamio Miyamura ,  Masamichi Kamiyama

IPC分类号： H03K19/08 ,  H03K19/00 ,  H03K19/003 ,  H03K19/013 ,  H03K19/02 ,  H03K17/04

CPC分类号： H03K19/00353 ,  H03K19/001 ,  H03K19/0136

摘要： A Bi-CMOS circuit includes a first bipolar, a second bipolar transistor and a CMOS control unit for performing switching controls of the first and second bipolar transistors on the basis of an input signal applied to an input terminal and for controlling an output signal output via the output terminal on the basis of the input signal. A turn-OFF unit temporality couples the base of the first bipolar transistor to a low-potential side power supply line on the basis of a current flowing in said control means when the first bipolar transistor is turned OFF, so that the first bipolar transistor can be rapidly turned OFF.

摘要翻译： 一种双CMOS电路包括第一双极型，第二双极晶体管和CMOS控制单元，用于根据施加到输入端的输入信号执行第一和第二双极晶体管的开关控制，并用于控制输出信号经由 输出端基于输入信号。 基于在第一双极晶体管截止时流过所述控制装置的电流，关断单元暂时性将第一双极晶体管的基极连接到低电位侧电源线，使得第一双极晶体管可 快速关闭。

公开(公告)号：US5686984A

公开(公告)日：1997-11-11

申请号：US711790

申请日：1996-09-10

申请人： Akiyoshi Suzuki

发明人： Akiyoshi Suzuki

IPC分类号： G03F1/00 ,  G03F7/20 ,  H01L21/027 ,  G03B27/42

CPC分类号： G03F1/32 ,  G03F7/70433

摘要： A projection exposure method wherein a semi-transparent material effective to partially transmit exposure light and also effective to change a phase of the exposure light is used to form a circuit pattern and a light blocking zone adjacent to the circuit pattern, on a transparent substrate to provide a reticle, the light blocking zone being constituted by a pattern not resolved by a projection optical system, and wherein the reticle is illuminated with the exposure light and is projected on a member to be exposed, through the projection optical system is disclosed. The method includes detecting light quantity of an image of the light blocking zone as formed through the projection optical system, comparing the result of the detection with a predetermined value, and discriminating appropriateness of performing an exposure process with the reticle, on the basis of the comparison.

摘要翻译： 一种投影曝光方法，其中使用有效地部分透射曝光的半透明材料并且也有效地改变曝光光的相位，以在透明基板上形成与电路图案相邻的电路图案和遮光区域 提供掩模版，遮光区由未被投影光学系统分辨的图案构成，并且其中通过投影光学系统公开了通过曝光光照射掩模版并将其投影在待曝光的构件上。 该方法包括检测通过投影光学系统形成的遮光区域的图像的光量，将检测结果与预定值进行比较，以及基于掩模区分判断进行曝光处理的适当性 比较。

公开(公告)号：US5608575A

公开(公告)日：1997-03-04

申请号：US479387

申请日：1995-06-07

申请人： Akiyoshi Suzuki

发明人： Akiyoshi Suzuki

IPC分类号： G02B27/42 ,  G02B27/46 ,  G02B27/52 ,  G03F7/20 ,  H01L21/027 ,  G02B5/18 ,  G03B27/42

CPC分类号： G03F7/70591 ,  G02B27/42 ,  G02B27/46 ,  G02B27/52 ,  G03F7/701 ,  G03F7/70108 ,  G03F7/70133 ,  G03F7/70283

摘要： An edge emphasis type phase shift reticle is illuminated obliquely, and zeroth order diffraction light and first order diffraction light caused by a fine pattern of the reticle and having substantially the same intensity are incident and distributed on a pupil of a projection optical system, symmetrically with respect to a predetermined axis, whereby the fine pattern is imaged with use of the zeroth order diffraction light and first order diffraction light.

摘要翻译： 边缘强调型相移掩模版被倾斜地照射，并且由光栅的精细图案引起的具有基本上相同强度的零级衍射光和一级衍射光入射并分布在投影光学系统的光瞳上，与投影光学系统的光瞳对称地分布 相对于预定轴，由此利用零级衍射光和一级衍射光对精细图案进行成像。

公开(公告)号：US5305054A

公开(公告)日：1994-04-19

申请号：US836509

申请日：1992-02-18

申请人： Akiyoshi Suzuki ,  Miyoko Noguchi

发明人： Akiyoshi Suzuki ,  Miyoko Noguchi

IPC分类号： G03F7/20 ,  G03B27/42

CPC分类号： G03F7/7005 ,  G03F7/70091 ,  G03F7/701 ,  G03F7/70108 ,  G03F7/70125 ,  G03F7/70133 ,  G03F7/70241 ,  G03F7/70558

摘要： An imaging method for imaging a fine pattern having linear features extending along orthogonal first and second directions is disclosed, which method is characterized by: providing a light source having decreased intensity portions at a center thereof and on first and second axes defined to intersect with each other at the center and defined along the first and second directions, respectively; and illuminating the pattern with light from the light source.

摘要翻译： 公开了一种用于对具有沿着正交的第一和第二方向延伸的线性特征的精细图案进行成像的成像方法，该方法的特征在于：在其中心处提供具有降低的强度部分的光源以及限定为与每个方向相交的第一和第二轴线 另一个在中心并分别沿着第一和第二方向限定; 并用来自光源的光照射图案。

公开(公告)号：US5137363A

公开(公告)日：1992-08-11

申请号：US532229

申请日：1990-06-05

申请人： Masao Kosugi ,  Akiyoshi Suzuki ,  Hideki Ina ,  Hitoshi Fukuda

发明人： Masao Kosugi ,  Akiyoshi Suzuki ,  Hideki Ina ,  Hitoshi Fukuda

IPC分类号： G03F9/00

CPC分类号： G03F9/70

摘要： A projection exposure apparatus for projecting a pattern formed on a first object such as a reticle upon a second object such as a semiconductor wafer by use of a projection lens system, is disclosed. In the apparatus, a light of a predetermined wavelength is used for the pattern projection, and a light having a different wavelength is used to align the first and second objects by way of the projection lens system. A dichroic mirror film is disposed inclinedly between the first object and the projection lens system so as to reflect one of the light of the predetermined wavelength and the light of the different wavelength, and also to transmit the other. By this dichroic mirror film, the light used for the alignment and reflected back from the second object is extracted out of a light path between the first and second objects. After correcting effects of chromatic aberrations of the projection lens system with respect to the different wavelength, the light for the alignment is passed through the first object. By this, accurate alignment using the light of a wavelength different from that to be used for the pattern projection, is made practically attainable. Also, use of lights of different wavelengths, other than the wavelength to be used for the pattern projection, is made practically attainable. Thus, accurate and stable alignment is attainable regardless of the configuration of the mark provided on the second object.

摘要翻译： 公开了一种投影曝光装置，用于通过使用投影透镜系统将形成在第一物体（例如掩模版）上的图案投射到诸如半导体晶片的第二物体上的投影曝光装置。 在该装置中，对于图案投影使用预定波长的光，并且使用具有不同波长的光来通过投影透镜系统对准第一和第二物体。 二分色镜膜倾斜地设置在第一物体和投影透镜系统之间，以便反射预定波长的光和不同波长的光之一，并且还传送另一个。 通过这种二向色镜膜，从第二物体的对准和反射回来的光从第一和第二物体之间的光路中提取出来。 在校正投影透镜系统的色差相对于不同波长的效果之后，用于对准的光通过第一物体。 由此，实际上可以实现使用与用于图案投影的波长不同的波长的光的精确对准。 此外，实际上可以使用除了用于图案投影的波长之外的不同波长的光。 因此，无论设置在第二物体上的标记的构造如何，均可实现准确和稳定的对准。

公开(公告)号：US5118957A

公开(公告)日：1992-06-02

申请号：US728318

申请日：1991-07-08

申请人： Haruna Kawashima ,  Akiyoshi Suzuki

发明人： Haruna Kawashima ,  Akiyoshi Suzuki

IPC分类号： G01B11/26 ,  G03F7/207 ,  G03F9/00 ,  H01L21/027 ,  H01L21/30

CPC分类号： G03F9/7026

摘要： A surface position detecting method, including the steps of: detecting a surface shape of a first wafer having a pattern formed thereon or a surface shape of a second wafer having a pattern which is substantially of the same structure as that of the pattern of the first wafer; detecting, on the basis of detection of the surface shape, an error which might be caused at the time of detection of a surface position of the first wafer in dependence upon the structure of the pattern thereof; and detecting the surface position of the first wafer while correcting the detected error.

摘要翻译： 一种表面位置检测方法，包括以下步骤：检测具有形成在其上的图案的第一晶片的表面形状或第二晶片的表面形状，该第二晶片具有与第一晶片的图案基本上相同结构的图案 晶圆 基于表面形状的检测，根据其图案的结构检测在检测第一晶片的表面位置时可能引起的误差; 并且在校正检测到的误差的同时检测第一晶片的表面位置。

公开(公告)号：US5105075A

公开(公告)日：1992-04-14

申请号：US728317

申请日：1991-07-08

申请人： Masakatu Ohta ,  Akiyoshi Suzuki

发明人： Masakatu Ohta ,  Akiyoshi Suzuki

IPC分类号： G03F7/20

CPC分类号： G03F7/70241 ,  G03F7/70258

摘要： A projection exposure apparatus includes a projection optical system for projecting an image of a pattern of a first object to a second object, and an adjusting system for adjusting projection magnification and distortion of the projected image of the pattern, the adjusting system being operable to displace the first object and a lens element of the projection optical system in a direction of an optical axis of the projection optical system.

摘要翻译： 投影曝光装置包括：投影光学系统，用于将第一物体的图案的图像投影到第二物体;以及调整系统，用于调整图案的投影图像的投影倍率和变形，所述调整系统可操作地移位 投影光学系统的第一物体和透镜元件在投影光学系统的光轴的方向上。

公开(公告)号：US4952970A

公开(公告)日：1990-08-28

申请号：US427891

申请日：1989-10-17

申请人： Akiyoshi Suzuki ,  Haruna Kawashima

发明人： Akiyoshi Suzuki ,  Haruna Kawashima

IPC分类号： G02B7/28 ,  G03B27/34 ,  G03F7/207 ,  G03F9/00 ,  H01L21/027 ,  H01L21/30

CPC分类号： G03F9/7049

摘要： An autofocusing system, usable with a projection optical system for projecting a pattern of a first object upon a second object, for positioning the surface of the second object with respect to an imaging plane of the projection optical system is disclosed, wherein the surface of the second object is illuminated; wherein an image of the second object is formed on a predetermined plane by use of the projection optical system; and wherein the interval between the imaging plane of the projection optical system and the surface of the second object with respect to the direction of an optical axis of the projection optical system is adjusted on the basis of the state of the image of the second object formed on the predetermined plane, such that the surface of the second object can be positioned on the imaging plane of the projection optical system.

摘要翻译： 公开了一种自动对焦系统，其可用于投影光学系统，用于将第一物体的图案投影到第二物体上，用于相对于投影光学系统的成像平面定位第二物体的表面，其中， 第二个物体被照亮; 其中通过使用所述投影光学系统在预定平面上形成所述第二物体的图像; 并且其中基于所形成的第二物体的图像的状态来调整投影光学系统的成像平面与第二物体的表面之间相对于投影光学系统的光轴方向的间隔 在预定平面上，使得第二物体的表面可以位于投影光学系统的成像平面上。

公开(公告)号：US4871257A

公开(公告)日：1989-10-03

申请号：US225826

申请日：1988-07-29

申请人： Akiyoshi Suzuki ,  Michio Kohno

发明人： Akiyoshi Suzuki ,  Michio Kohno

IPC分类号： G03F7/20 ,  G03F9/00

CPC分类号： G03F9/7069 ,  G03F7/70225 ,  G03F7/70591 ,  G03F7/70616 ,  G03F7/70633 ,  G03F7/7065 ,  G03F9/7049

摘要： In a detection optical apparatus for an object having an actual circuit pattern that diffracts an incident light and has an alignment pattern, an illumination device having a first aperture for controlling the beam of light, the illumination device adapted to effect a dark-field illumination to the object, and an imaging optical system for forming the image of the object. The imaging optical system has a second aperture located at a position optically conjugate with the first aperture by way of the object, the first and second apertures being not overlapped when the image of the first aperture is formed on the second aperture. The second aperture has such a light blocking area that blocks diffraction light produced when the beam of light passed through the light-transmitting area of the first aperture is incident on the actual circuit pattern. Also, an optical inspection apparatus for optically inspecting articles such as photomasks or wafers, having patterns each formed by linear pattern elements having a certain directional characteristic with respect to plural directions, is disclosed. Among the linear pattern elements, at least those extending in one direction are extracted out and observed in a dark field, and any faults of the pattern such as breaks or the like and any foreign particles adhered to the pattern are detected on the basis of a reduced amount of information as compared with the information concerning the whole pattern.

摘要翻译： 在具有衍射入射光并具有对准图案的实际电路图案的物体的检测光学装置中，具有用于控制光束的第一孔的照明装置，适于进行暗场照明 该物体和用于形成物体的图像的成像光学系统。 成像光学系统具有位于通过物体与第一孔光学共轭的位置处的第二孔，当第一孔的图像形成在第二孔上时，第一孔和第二孔不重叠。 第二孔具有这样的遮光区域，其阻挡当光束穿过第一孔的透光区域入射到实际电路图案时产生的衍射光。 此外，公开了一种用于光学检查诸如光掩模或晶片的物品的光学检查装置，其具有各自由相对于多个方向具有一定方向特性的线状图案形成的图案。 在线状图案元件中，至少在一个方向上延伸的那些方向被抽出并在暗场中观察，并且基于以下方式检测图案的任何故障，例如断裂等，以及附着到图案上的任何外来颗粒 与整个模式的信息相比，信息量减少。