公开(公告)号：US20070096016A1

公开(公告)日：2007-05-03

申请号：US11641773

申请日：2006-12-20

Applicant: Jin Li ,  Jiutao Li ,  Ulrich Boettiger ,  Loriston Ford

Inventor： Jin Li ,  Jiutao Li ,  Ulrich Boettiger ,  Loriston Ford

IPC: H01J3/14 ,  H01J5/16 ,  H01J40/14

CPC classification number: H01L27/14627 ,  G02B3/0018 ,  G02B3/0037 ,  G02B3/0056

Abstract: A microlens structure includes lower lens layers on a substrate. A sputtered layer of glass, such as silicon oxide, is applied over the lower lens layers at an angle away from normal to form upper lens layers that increase the effective focal length of the microlens structure. The upper lens layers can be deposited in an aspherical shape with radii of curvature longer than the lower lens layers. As a result, small microlenses can be provided with longer focal lengths. The microlenses are arranged in arrays for use in imaging devices.

Abstract translation: 微透镜结构包括在基底上的较低透镜层。 将溅射的玻璃层（例如氧化硅）以与法线成一定角度施加在下透镜层上，以形成增加微透镜结构的有效焦距的上透镜层。 上透镜层可以沉积成具有比下透镜层更长的曲率半径的非球面形状。 结果，可以提供更小焦距的小微透镜。 微透镜被布置成阵列以用于成像装置。

公开(公告)号：US20070076299A1

公开(公告)日：2007-04-05

申请号：US11524509

申请日：2006-09-21

Applicant: Ulrich Boettiger ,  Jin Li

Inventor： Ulrich Boettiger ,  Jin Li

IPC: G02B27/10

CPC classification number: G02B27/10 ,  B29D11/00278 ,  B29D11/00365 ,  G02B3/0018 ,  G02B3/0056 ,  H01L27/14627 ,  H01L27/14685

Abstract: A variety of structures and methods used to adjust the shape, radius and/or height of a microlens for a pixel array. The structures affect volume and surface force parameters during microlens formation. Exemplary microlens structures include a microlens frame, base, material, protrusions or a combination thereof to affect the shape, height and/or radius of the microlens. The frame, base and/or protrusions alter the microlens flow resulting from the heating of the microlens during fabrication such that a height or radius of the microlens can be controlled. The radius can be adjusted by the height differences between the microlens and frame. The bigger the difference, the smaller the radius will be.

Abstract translation: 用于调整像素阵列的微透镜的形状，半径和/或高度的各种结构和方法。 在微透镜形成期间，该结构影响体积和表面力参数。 示例性微透镜结构包括微透镜框架，基底，材料，突起或其组合以影响微透镜的形状，高度和/或半径。 框架，底座和/或突起改变在制造期间由微透镜的加热产生的微透镜流，从而可以控制微透镜的高度或半径。 半径可以通过微透镜和框架之间的高度差进行调整。 差异越大，半径越小。

公开(公告)号：US20070035844A1

公开(公告)日：2007-02-15

申请号：US11201291

申请日：2005-08-11

Applicant: Jiutao Li ,  Jin Li ,  Ulrich Boettiger

Inventor： Jiutao Li ,  Jin Li ,  Ulrich Boettiger

IPC: G02B27/10

CPC classification number: G02B1/118 ,  G02B1/11 ,  G02B3/0006

Abstract: A microlens has a surface with an effective index of refraction close to the index of air to reduce reflection caused by change in indices of refraction from microlens to air. The microlens having an index of refraction approximately the same as that of air is obtained by providing a rough or bumpy lens-air surface on the microlens. Features protrude from the surface of a microlens to create the rough surface and preferably have a length of greater or equal to a wavelength of light and a width of less than a sub-wavelength of light, from about 1/10 to ¼ of the wavelength of light. The features may be of any suitable shape, including but not limited to triangular, cylindrical, rectangular, trapezoidal, or spherical and may be formed by a variety of suitable processes, including but not limited to mask and etching, lithography, spray-on beads, sputtering, and growing.

Abstract translation: 微透镜具有接近空气指数的有效折射率的表面，以减少由微透镜到空气的折射率变化引起的反射。 通过在微透镜上提供粗糙或颠簸的透镜空气表面，获得具有与空气大致相同的折射率的微透镜。 特征从微透镜的表面突出以产生粗糙表面，并且优选地具有大于或等于光的波长和小于亚波长的光的长度，大约为波长的1/10至1/4 的光。 特征可以是任何合适的形状，包括但不限于三角形，圆柱形，矩形，梯形或球形，并且可以通过各种合适的工艺形成，包括但不限于掩模和蚀刻，平版印刷，喷涂珠 ，溅射和生长。

公开(公告)号：US20070023799A1

公开(公告)日：2007-02-01

申请号：US11193450

申请日：2005-08-01

Applicant: Ulrich Boettiger

Inventor： Ulrich Boettiger

IPC: H01L31/113

CPC classification number: H01L27/14625 ,  G01N2201/0642 ,  G01N2201/08 ,  H01L27/14629 ,  H01L27/14632 ,  H01L27/14643 ,  H01L27/14685 ,  H01L27/14687

Abstract: A pixel cell and imager device, and method of forming the same, where the pixel cell has a plurality of metallization and via layers formed over a photosensitive region. The metallization and via layers form a step-like light tunnel structure that augments the photosensitive region's ability to capture light impinging on the photosensitive region.

Abstract translation: 像素单元和成像器件及其形成方法，其中像素单元具有形成在感光区域上的多个金属化层和通孔层。 金属化和通孔层形成阶梯状光通道结构，其增强了感光区域捕获入射到感光区域上的光的能力。

公开(公告)号：US20060292735A1

公开(公告)日：2006-12-28

申请号：US11510704

申请日：2006-08-28

Applicant: Ulrich Boettiger ,  Jin Li

Inventor： Ulrich Boettiger ,  Jin Li

IPC: H01L21/00

CPC classification number: H01L27/14627 ,  H01L27/14641

Abstract: Methods of fabricating a microlens and/or array of microlenses used to focus light on photosensors, by forming a protective coating over a microlenses precursor material, and etching the protective coating and microlens precursor material to obtain a predetermined shape.

公开(公告)号：US20060186492A1

公开(公告)日：2006-08-24

申请号：US11061034

申请日：2005-02-18

Applicant: Ulrich Boettiger ,  Jin Li ,  Steven Oliver

Inventor： Ulrich Boettiger ,  Jin Li ,  Steven Oliver

IPC: H01L21/00 ,  H01L29/82 ,  H01L27/14

CPC classification number: H01L27/14618 ,  H01L27/14601 ,  H01L27/14625 ,  H01L27/14634 ,  H01L27/14683 ,  H01L27/14685 ,  H01L2924/0002 ,  H01L2924/351 ,  H01L2924/00

Abstract: Microelectronic imagers with shaped image sensors and methods for manufacturing curved image sensors. In one embodiment, a microelectronic imager device comprises an imaging die having a substrate, a curved microelectronic image sensor having a face with a convex and/or concave portion at one side of the substrate, and integrated circuitry in the substrate operatively coupled to the image sensor. The imaging die can further include external contacts electrically coupled to the integrated circuitry and a cover over the curved image sensor.

Abstract translation: 具有形状图像传感器的微电子成像器和用于制造弯曲图像传感器的方法。 在一个实施例中，微电子成像器件包括具有衬底的成像管芯，具有在衬底的一侧具有凸部和/或凹部的面的弯曲微电子图像传感器，以及可操作地耦合到图像的衬底中的集成电路 传感器。 成像芯片还可以包括电耦合到集成电路的外部触点和弯曲图像传感器上的盖。

公开(公告)号：US20060176566A1

公开(公告)日：2006-08-10

申请号：US11384359

申请日：2006-03-21

Applicant: Ulrich Boettiger ,  Jin Li

Inventor： Ulrich Boettiger ,  Jin Li

IPC: G02B27/10

CPC classification number: G02B3/0018 ,  G02B3/0043 ,  G02B3/005 ,  G02B3/0056 ,  G02B27/1013 ,  G02B27/1073 ,  G02B27/123 ,  H01L27/14603 ,  H01L27/14625 ,  H01L27/14627 ,  H01L27/14685

Abstract: A semi-conductor based imager includes a microlens array having microlenses with modified focal characteristics. The microlenses are made of a microlens material, the melting properties of which are selectively modified to obtain different shapes after a reflow process. Selected microlenses, or portions of each microlens, are modified, by exposure to ultraviolet light, for example, to control the microlens shape produced by reflow melting. Controlling the microlens shape allows for modification of the focal characteristics of selected microlenses in the microlens array.

公开(公告)号：US20060175287A1

公开(公告)日：2006-08-10

申请号：US11385679

申请日：2006-03-22

Applicant: Ulrich Boettiger ,  Jin Li

Inventor： Ulrich Boettiger ,  Jin Li

IPC: B29D11/00

CPC classification number: G02B3/0031 ,  B29D11/00375 ,  G02B3/0043 ,  H01L27/14627 ,  H01L27/14685 ,  H01L31/02327

Abstract: A micro-lens and a method for forming the micro-lens is provided. A micro-lens includes a substrate and lens material located within the substrate, the substrate having a recessed area serving as a mold for the lens material. The recessed can be shaped such that the lens material corrects for optical aberrations. The micro-lens can be part of a micro-lens array. The recessed area can serve as a mold for lens material for the micro-lens array and can be shaped such that the micro-lens array includes arcuate, non-spherical, or non-symmetrical micro-lenses.

公开(公告)号：US20060158631A1

公开(公告)日：2006-07-20

申请号：US11378666

申请日：2006-03-17

Applicant: Ulrich Boettiger ,  Scott Light ,  William Rericha ,  Craig Hickman

Inventor： Ulrich Boettiger ,  Scott Light ,  William Rericha ,  Craig Hickman

IPC: G03B27/42

CPC classification number: G03F7/70333 ,  G03F7/70358

Abstract: A method and apparatus for exposing a radiation-sensitive material of a microlithographic substrate to a selected radiation. The method can include directing the radiation along a radiation path in a first direction toward a reticle, passing the radiation from the reticle and to the microlithographic substrate along the radiation path in a second direction, and moving the reticle relative to the radiation path along a reticle path generally normal to the first direction. The microlithographic substrate can move relative to the radiation path along a substrate path having a first component generally parallel to the second direction, and a second component generally perpendicular to the second direction. The microlithographic substrate can move generally parallel to and generally perpendicular to the second direction in a periodic manner while the reticle moves along the reticle path to change a relative position of a focal plane of the radiation.

公开(公告)号：US20050270651A1

公开(公告)日：2005-12-08

申请号：US10857948

申请日：2004-06-02

Applicant: Ulrich Boettiger ,  Jin Li

Inventor： Ulrich Boettiger ,  Jin Li

IPC: B29D11/00 ,  G02B3/00 ,  G02B27/10 ,  G02F1/1335 ,  H01L27/146

CPC classification number: G02B27/10 ,  B29D11/00278 ,  B29D11/00365 ,  G02B3/0018 ,  G02B3/0056 ,  H01L27/14627 ,  H01L27/14685

Abstract: A variety of structures and methods used to adjust the shape, radius and/or height of a microlens for a pixel array. The structures affect volume and surface force parameters during microlens formation. Exemplary microlens structures include a microlens frame, base, material, protrusions or a combination thereof to affect the shape, height and/or radius of the microlens. The frame, base and/or protrusions alter the microlens flow resulting from the heating of the microlens during fabrication such that a height or radius of the microlens can be controlled. The radius can be adjusted by the height differences between the microlens and frame. The bigger the difference, the smaller the radius will be.

Abstract translation: 用于调整像素阵列的微透镜的形状，半径和/或高度的各种结构和方法。 在微透镜形成期间，该结构影响体积和表面力参数。 示例性微透镜结构包括微透镜框架，基底，材料，突起或其组合以影响微透镜的形状，高度和/或半径。 框架，底座和/或突起改变在制造期间由微透镜的加热产生的微透镜流，从而可以控制微透镜的高度或半径。 半径可以通过微透镜和框架之间的高度差进行调整。 差异越大，半径越小。