摘要:
An organometallic compound represented by Formula 1: M(L1)n1(L2)n2(L3)n3 Formula 1 wherein in Formula 1, M, L1, L2, L3, n1, n2, and n3 are the same as defined in the specification.
摘要:
Disclosed are a photoacid generator, a photoresist composition including the same, and a method of preparing the photoacid generator. The photoacid generator may include a compound represented by Formula 1: wherein, in Formula 1, CY, A1, A2, and B are respectively described in the specification.
摘要:
An organometallic compound represented by Formula 1: M(L1)n1(L2)n2 Formula 1 wherein in Formula 1, M, L1, L2, n1, and n2 are the same as described in the specification.
摘要:
An organometallic compound represented by Formula 1: M(L1)n1(L2)n2 Formula 1 In Formula 1, M is a transition metal; L1 is a ligand represented by Formula 2 as disclosed herein; L2 is a monodentate ligand, a bidentate ligand, a tridentate ligand, or a tetradentate ligand; n1 is 1, 2, or 3, wherein, when n1 is 2 or greater, ligands L1 are identical to or different from each other; and n2 is 0, 1, 2, 3, or 4, wherein, when n2 is 2 or greater, ligands L2 are identical to or different from each other.
摘要:
An organometallic compound represented by Formula 1: M(L1)n1(L2)n2 Formula 1 wherein M, L1, L2, n1, and n2 are the same as described in the specification.