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公开(公告)号：US20230128713A1
公开(公告)日：2023-04-27
申请号：US17936602
申请日：2022-09-29
发明人： Jungin LEE , Kyuyoung HWANG , Soyeon KIM , Aram JEON , Hyeonho CHOI , Hyun KOO , Sangdong KIM , Yoonhyun KWAK , Ohyun KWON , Byoungki CHOI
摘要： An organometallic compound represented by Formula 1A: wherein, in Formula 1A, groups and variables are the same as described in the specification.
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公开(公告)号：US20210119153A1
公开(公告)日：2021-04-22
申请号：US17128400
申请日：2020-12-21
发明人： Jungin LEE , Kyuyoung HWANG , Soyeon KIM , Aram JEON , Hyeonho CHOI , Hyun KOO , Sangdong KIM , Yoonhyun KWAK , Ohyun KWON , Byoungki CHOI
摘要： An organometallic compound represented by Formula 1A: wherein, in Formula 1A, groups and variables are the same as described in the specification.
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公开(公告)号：US20170033300A1
公开(公告)日：2017-02-02
申请号：US15091603
申请日：2016-04-06
发明人： Aram JEON , Ohyun KWON , Yoonhyun KWAK , Kum Hee LEE , Kyuyoung HWANG , Sangdong KIM , Byoungki CHOI , Hyeonho CHOI
CPC分类号： H01L51/0085 , C07F15/004 , C09K11/06 , C09K2211/1029 , C09K2211/1044 , C09K2211/1088 , C09K2211/1092 , C09K2211/185 , H01L51/5016
摘要： An organometallic compound represented by Formula 1: wherein, in Formula 1, groups and variables are the same as described in the specification.
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公开(公告)号：US20220171284A1
公开(公告)日：2022-06-02
申请号：US17238355
申请日：2021-04-23
发明人： Eunkyung LEE , Sumin KIM , Hyunwoo KIM , Juhyeon PARK , Giyoung SONG , Sukkoo HONG , Yoonhyun KWAK , Youngmin NAM , Byunghee SOHN , Sunyoung LEE , Aram JEON , Sungwon CHOI
IPC分类号： G03F7/004 , G03F7/038 , G03F7/039 , C07C381/12 , C07C309/12 , C07D333/76
摘要： Disclosed are a photoacid generator, a photoresist composition including the same, and a method of preparing the photoacid generator. The photoacid generator may include a compound represented by Formula 1: wherein, in Formula 1, CY, A1, A2, and B are respectively described in the specification.
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公开(公告)号：US20220013734A1
公开(公告)日：2022-01-13
申请号：US17038319
申请日：2020-09-30
发明人： Kum Hee LEE , Seungyeon KWAK , Aram JEON , Whail CHOI , Kyuyoung HWANG , Yoonhyun KWAK , Sangdong KIM , Won-joon SON , Byoungki CHOI , Hyeonho CHOI , Wooyoun KIM
摘要： An organometallic compound represented by Formula 1: M(L1)n1(L2)n2 Formula 1 In Formula 1, M is a transition metal; L1 is a ligand represented by Formula 2 as disclosed herein; L2 is a monodentate ligand, a bidentate ligand, a tridentate ligand, or a tetradentate ligand; n1 is 1, 2, or 3, wherein, when n1 is 2 or greater, ligands L1 are identical to or different from each other; and n2 is 0, 1, 2, 3, or 4, wherein, when n2 is 2 or greater, ligands L2 are identical to or different from each other.
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公开(公告)号：US20210159431A1
公开(公告)日：2021-05-27
申请号：US17166385
申请日：2021-02-03
发明人： Jungin LEE , Kyuyoung HWANG , Soyeon KIM , Aram JEON , Hyeonho CHOI , Hyun KOO , Sangdong KIM , Yoonhyun KWAK , Ohyun KWON , Byoungki CHOI
摘要： An organometallic compound represented by Formula 1A: wherein, in Formula 1A, groups and variables are the same as described in the specification.
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公开(公告)号：US20210050533A1
公开(公告)日：2021-02-18
申请号：US17087925
申请日：2020-11-03
发明人： Whail CHOI , Byoungki CHOI , Yoonhyun KWAK , Ohyun KWON , Sangdong KIM , Banglin LEE , Aram JEON , Kyuyoung HWANG
摘要： An organometallic compound represented by Formula 1: M(L1)n1(L2)n2 Formula 1 wherein in Formula 1, M, L1, L2, n1, and n2 are the same as described in the specification.
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公开(公告)号：US20180090707A1
公开(公告)日：2018-03-29
申请号：US15487820
申请日：2017-04-14
发明人： Aram JEON , Chul BAIK , Jungin LEE , Hwayoung CHO , Seokhwan HONG , Kyuyoung HWANG , Ohyun KWON , Yoonhyun KWAK
CPC分类号： H01L51/5203 , C07F15/0086 , C09K11/025 , C09K11/06 , C09K2211/1007 , C09K2211/1011 , C09K2211/1014 , C09K2211/1022 , C09K2211/1029 , C09K2211/185 , H01L51/0072 , H01L51/0087 , H01L51/0094 , H01L51/5016 , H01L51/5056 , H01L51/5072 , H01L51/5088 , H01L51/5092 , H01L51/5096
摘要： An organometallic compound represented by Formula 1: wherein, in Formula 1, groups and variables are the same as described in the specification.
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公开(公告)号：US20180013078A1
公开(公告)日：2018-01-11
申请号：US15641299
申请日：2017-07-04
发明人： Jungin LEE , Kyuyoung HWANG , Soyeon KIM , Aram JEON , Hyeonho CHOI , Hyun KOO , Sangdong KIM , Yoonhyun KWAK , Ohyun KWON , Byoungki CHOI
CPC分类号： H01L51/0087 , C07F15/0086 , C09K11/06 , C09K2211/1044 , C09K2211/185 , H01L51/0094 , H01L51/5016
摘要： An organometallic compound represented by Formula 1A: wherein, in Formula 1A, groups and variables are the same as described in the specification.
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10.发明公开公开(公告)号：US20240327338A1
公开(公告)日：2024-10-03
申请号：US18483895
申请日：2023-10-10
发明人： Aram JEON , Hana KIM , Beomseok KIM , Hoyoon PARK , Kyuhyun IM , Jinwon JEON , Sungwon CHOI
IPC分类号： C07C309/58 , C07C309/42 , G03F7/004 , G03F7/029 , G03F7/20
CPC分类号： C07C309/58 , C07C309/42 , G03F7/0045 , G03F7/0048 , G03F7/029 , G03F7/2004
摘要： Provided are an organic salt represented by Formula 1, a resist composition including the same, and a method of forming a pattern by using the same:
A11+B11− Formula 1
wherein, in Formula 1,
A11+ is represented by Formula 1A, and B11− is represented by Formula 1B,
wherein descriptions of R11 to R13, L21, L22, a21, a22, R21, R22, Rf, b22, c11 and n11 in Formulae 1A and 1B are provided herein.
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