Adding test access to a back-drilled VIA

    公开(公告)号:US09894773B2

    公开(公告)日:2018-02-13

    申请号:US14109206

    申请日:2013-12-17

    IPC分类号: H05K3/00 H05K1/02 H05K3/42

    摘要: Embodiments of the invention relates to adding test access to a back-drilled vertical access interconnect (VIA) of a printed circuit board (PCB). A VIA is either formed or provided as an opening through layers of the PCB. The VIA is countersunk from one of the two openings to the PCB prior to plating to form a surface that can be used as a test target. The countersunk VIA is subject to plating so that the interior walls and surfaces of the VIA are covered with a conductive material. The plating is removed along the walls of the countersunk section of the VIA, so that the plating remains on the shoulders and the non-countersunk section of the VIA with the shoulder in communication with a trace internal to the PCB. The back-drilled VIA with the plating configuration provides an internal conducting surface for contact while mitigating interference associated with a VIA stub.