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    Patterning a nanofiber forest
    43.
    发明授权
    Patterning a nanofiber forest 有权

    公开(公告)号：US11135827B2

    公开(公告)日：2021-10-05

    申请号：US16589269

    申请日：2019-10-01

    申请人： Lintec of America, Inc.

    发明人： Chi Huynh

    IPC分类号： B32B38/10 ,  B32B38/00 ,  B32B7/12 ,  B32B37/00 ,  B32B37/12 ,  C01B32/168

    摘要： A nanofiber forest that includes a pattern or shape can be transferred to a substrate. The nanofiber forest can be configured to have any perimeter and/or internal shape or pattern using a stencil technique and/or using an engraving technique. This pattern can be transferred as a “negative image” of a corresponding pattern in a stencil or as a “positive image” by engraving the pattern directly into the nanofiber forest. For either type of pattern formation, the patterned nanofiber forest is transferred by applying a substrate to the pattern or to a nanofiber forest covered by a patterned stencil. Pressure is then applied causing the exposed surface of the nanofiber forest or pattern of nanofiber forest to adhere to the substrate.

    Transferring nanofiber forests between substrates
    44.
    发明授权
    Transferring nanofiber forests between substrates 有权

    公开(公告)号：US11084724B2

    公开(公告)日：2021-08-10

    申请号：US16190329

    申请日：2018-11-14

    申请人： Lintec of America, Inc.

    发明人： Chi Huynh

    IPC分类号： C01B32/00 ,  C01B32/168 ,  B82Y30/00 ,  B82Y40/00 ,  B32B5/12 ,  B32B37/26 ,  B32B37/00

    摘要： Techniques are described for transferring nanofiber forests using transfer films that either lack a conventional adhesive at the substrate—nanofiber forest interface or that include a diffusion barrier that prevents diffusion of adhesive molecules (or other polymer molecules mobile at ambient temperatures) into the nanofiber forest. These techniques can be applied to single layer nanofiber forests or stacks of multiple nanofiber forest. By selecting the bond strength between the nanofiber forest and the transfer films, the nanofibers can be aligned in a common direction that includes, but is not limited to, perpendicular to a substrate or transfer film.

    ABRADED BUS BAR AREA OF CNT RESISTIVE ELEMENT
    45.
    发明申请
    ABRADED BUS BAR AREA OF CNT RESISTIVE ELEMENT 有权

    公开(公告)号：US20210227640A1

    公开(公告)日：2021-07-22

    申请号：US16748325

    申请日：2020-01-21

    申请人： Goodrich Corporation

    发明人： Nathaniel Ching ,  Casey Slane ,  Jin Hu

    IPC分类号： H05B3/14 ,  C01B32/168 ,  C01B32/21 ,  C01B32/194

    摘要： A carbon allotrope element includes a carbon allotrope layer formed from a carbon allotrope material impregnated with a dielectric resin and having a first surface. The carbon allotrope element further includes a first bus bar in communication with the first surface, and a second bus bar in communication with the first surface and non-adjacent to the first bus bar. The first surface includes a layer of the dielectric resin and a plurality of abraded regions, and each of the first and second bus bars is in communication with one of the plurality of abraded regions of the first surface.

    SUPERLUBRICITY COATING CONTAINING CARBON NANOTUBES
    46.
    发明申请
    SUPERLUBRICITY COATING CONTAINING CARBON NANOTUBES 有权

    公开(公告)号：US20210222290A1

    公开(公告)日：2021-07-22

    申请号：US17090216

    申请日：2020-11-05

    申请人： UT-Battelle, LLC

    发明人： Chanaka Kapila Kumara lhala Gamaralalage ,  Jun Qu ,  Paul A. Menchhofer

    IPC分类号： C23C16/02 ,  C01B32/168 ,  C23C16/52 ,  C23C16/56 ,  C21D8/02

    摘要： A method for producing a structure containing an array of MWCNTs on a metal substrate, comprising: (i) subjecting a metal substrate to a surface oxidation process at a first elevated temperature in an oxygen-containing atmosphere and under a first reduced pressure; (ii) subjecting the metal substrate to a surface reduction process at a second elevated temperature in a reducing atmosphere and under a second reduced pressure of at least 0.01 atm and less than 1 atm to result in reduction of the surface of said metal substrate, wherein the reducing atmosphere contains hydrogen gas; (iii) subjecting the metal substrate to a third reduced pressure of no more than 0.1 atm; and (iv) contacting the metal substrate, while at the third reduced pressure and under an inert or reducing atmosphere, with an organic substance at a third elevated temperature for suitable time to produce the MWCNTs on the metal substrate.

    CARBON NANOFIBER ADHESIVE FILM
    50.
    发明申请
    CARBON NANOFIBER ADHESIVE FILM 有权

    公开(公告)号：US20210017674A1

    公开(公告)日：2021-01-21

    申请号：US16929505

    申请日：2020-07-15

    申请人： Lintec Of America, Inc.

    发明人： Emmanuel Aykara ,  Nicklas Keller

    IPC分类号： D01F9/12 ,  C08K7/02 ,  C01G31/00 ,  C01G41/00 ,  C01G23/00 ,  D02G3/02 ,  B32B27/12 ,  B32B9/00 ,  B32B5/12 ,  C01B32/168

    摘要： A filtered nanofiber film can be used as an intervening layer between the nanofiber structure (e.g., a drawn nanofiber sheet and/or a nanofiber forest) and a final substrate. Filtered nanofiber films can adhere to other types of nanofiber structures (e.g., drawn nanofiber sheets and/or nanofiber forests) and also exhibit adhesion to non-nanofiber surfaces. Thus, when used as an intervening layer between another type of nanofiber structure and a final substrate, a filtered film can increase adhesion therebetween. Filtered nanofiber films can also be used as a releasable protective film to prevent contamination of a confronting major surface of the nanofiber structure.