公开(公告)号：US20100032565A1

公开(公告)日：2010-02-11

申请号：US12448038

申请日：2007-12-13

Applicant: Andreas Thust ,  Juri Barthel

Inventor： Andreas Thust ,  Juri Barthel

IPC: G21K7/00

CPC classification number: H01J37/263 ,  H01J2237/2823

Abstract: An electron microscope and a method for measuring the defocus spread or the limiting resolution of an electron microscope takes advantage of the fact that, in the case of tilted illumination, any aberration that may be present and the defocus spread of the electron microscope anisotropically change the intensity distribution in the diffractogram. In particular, the envelope of the diffractogram is anisotropically narrowed. If both the tilt of the electron beam and any aberration that may be present are known, and the focus distribution is assumed to be Gaussian-shaped, the defocus spread of the electron microscope is the only parameter still unknown that influences the anisotropic changes in intensity distribution. Quantitative conclusions as to the defocus spread can thus be drawn from the changes. However, the focus distribution can also be determined from the anisotropic narrowing without the use of a model, and without a priori assumptions about the shape thereof. In this way, the limiting resolution of the electron microscope can be determined.

Abstract translation: 电子显微镜和用于测量散焦扩散或电子显微镜的限制分辨率的方法的优点在于，在倾斜照明的情况下，可能存在的任何像差和电子显微镜的散焦展开各向异性地改变 衍射图中的强度分布。 特别地，衍射图的包络各向异性地变窄。 如果电子束的倾斜和可能存在的任何像差都是已知的，并且焦点分布被假设为高斯形，则电子显微镜的散焦展开是唯一仍然未知的参数，其影响强度的各向异性变化 分配。 因此，可以从变化中得出关于散焦扩散的定量结论。 然而，也可以从各向异性变窄来确定焦点分布，而不使用模型，并且没有关于其形状的先验假设。 以这种方式，可以确定电子显微镜的极限分辨率。

公开(公告)号：US20090050805A1

公开(公告)日：2009-02-26

申请号：US12250763

申请日：2008-10-14

Applicant: Hirohiko Kitsuki ,  Kazuo Aoki ,  Mitsugu Sato

Inventor： Hirohiko Kitsuki ,  Kazuo Aoki ,  Mitsugu Sato

IPC: G01N23/00

CPC classification number: H01J37/28 ,  H01J37/04 ,  H01J37/263 ,  H01J2237/21 ,  H01J2237/2487 ,  H01J2237/2809

Abstract: A scanning electron microscope for digitally processing an image signal to secure the largest focal depth and the best resolution in accordance with the magnification for observation is disclosed. The angle of aperture of an optical system having a plurality of convergence lenses is changed by changing the convergence lenses and the hole diameter of a diaphragm. The angle α of aperture of the electron beam is changed in accordance with the visual field range corresponding to a single pixel, i.e. what is called the pixel size.

Abstract translation: 公开了一种用于数字处理图像信号以确保最大焦深和根据观察放大率的最佳分辨率的扫描电子显微镜。 具有多个会聚透镜的光学系统的光圈角度通过改变会聚透镜和光阑的孔径而改变。 根据与单个像素对应的视场范围，即所谓的像素大小，改变电子束的孔径的角度α。

公开(公告)号：US07442929B2

公开(公告)日：2008-10-28

申请号：US11397812

申请日：2006-04-05

Applicant: Hirohiko Kitsuki ,  Kazuo Aoki ,  Mitsugu Sato

Inventor： Hirohiko Kitsuki ,  Kazuo Aoki ,  Mitsugu Sato

IPC: G01N23/00

CPC classification number: H01J37/28 ,  H01J37/04 ,  H01J37/263 ,  H01J2237/21 ,  H01J2237/2487 ,  H01J2237/2809

Abstract: A scanning electron microscope for digitally processing an image signal to secure the largest focal depth and the best resolution in accordance with the magnification for observation is disclosed. The angle of aperture of an optical system having a plurality of convergence lenses is changed by changing the convergence lenses and the hole diameter of a diaphragm. The angle α of aperture of the electron beam is changed in accordance with the visual field range corresponding to a single pixel, i.e. what is called the pixel size.

Abstract translation: 公开了一种用于数字处理图像信号以确保最大焦深和根据观察放大率的最佳分辨率的扫描电子显微镜。 具有多个会聚透镜的光学系统的光圈角度通过改变会聚透镜和光阑的孔径而改变。 根据与单个像素对应的视场范围，即所谓的像素大小，改变电子束的孔径的角度α。

公开(公告)号：US20080121791A1

公开(公告)日：2008-05-29

申请号：US11939596

申请日：2007-11-14

Applicant: Yoshinori Nakayama ,  Yasunari Sohda ,  Keiichiro Hitomi ,  Hajime Koyanagi

Inventor： Yoshinori Nakayama ,  Yasunari Sohda ,  Keiichiro Hitomi ,  Hajime Koyanagi

IPC: H01J37/26 ,  G01D18/00

CPC classification number: H01J37/28 ,  H01J37/244 ,  H01J37/263 ,  H01J2237/24578 ,  H01J2237/2816 ,  H01J2237/2823 ,  H01J2237/2826 ,  H01J2237/30433 ,  H01J2237/3142 ,  H01J2237/31732

Abstract: The present invention provides a standard reference component for calibration for performing magnification calibration used in the scanning electron microscope with high precision, and provides a scanning electron microscope technique using it. Provided is a standard reference component for calibration for calibrating a scanning electron microscope that measures a length of a pattern in an observation area from information on the intensity of secondary electrons or reflected electrons generated by scanning an incident electron beam in the observation area on a measuring sample, having: a first substrate on which a multiple-layer is laminated and a second substrate with a recess for holding the first substrate, wherein the first substrate is held in the recess of the second substrate so that a normal direction of the multiple-layer surface may be roughly perpendicular to a normal direction of the second substrate surface, and the multiple-layer has a multiple-layer structure of a film containing silicon and a film containing molybdenum.

Abstract translation: 本发明提供了一种用于校准的标准参考部件，用于以高精度执行扫描电子显微镜中使用的放大校准，并提供使用它的扫描电子显微镜技术。 提供了用于校准扫描电子显微镜的标准参考部件，该扫描电子显微镜从关于通过扫描观察区域中的入射电子束产生的二次电子或反射电子的强度的信息来测量观察区域中的图案的长度 具有：层叠有多层的第一基板和具有用于保持所述第一基板的凹部的第二基板，其中，所述第一基板保持在所述第二基板的所述凹部中， 层表面可以大致垂直于第二基板表面的法线方向，并且多层具有含硅的膜和含有钼的膜的多层结构。

公开(公告)号：US20050199811A1

公开(公告)日：2005-09-15

申请号：US11124252

申请日：2005-05-09

Applicant: Tohru Ishitani ,  Mitsugu Sato ,  Hideo Todokoro ,  Tadashi Otaka ,  Takashi Iizumi ,  Atsushi Takane

Inventor： Tohru Ishitani ,  Mitsugu Sato ,  Hideo Todokoro ,  Tadashi Otaka ,  Takashi Iizumi ,  Atsushi Takane

IPC: H01J37/04 ,  H01J37/22 ,  H01J37/26 ,  H01J37/28 ,  G21K7/00

CPC classification number: H01J37/28 ,  H01J37/222 ,  H01J37/263 ,  H01J2237/2823

Abstract: Image evaluation method capable of objectively evaluating the image resolution of a microscope image. An image resolution method is characterized in that resolution in partial regions of an image is obtained over an entire area of the image or a portion of the image, averaging is performed over the entire area of the image or the portion of the image, and the averaged value is established as the resolution evaluation value of the entire area of the image or the portion of the image. This method eliminates the subjective impressions of the evaluator from evaluation of microscope image resolution, so image resolution evaluation values of high accuracy and good repeatability can be obtained.

Abstract translation: 能够客观评价显微镜图像的图像分辨率的图像评价方法。 图像分辨方法的特征在于，在图像的整个区域或图像的一部分上获得图像的部分区域中的分辨率，在图像的整个区域或图像的整个区域上进行平均化， 建立平均值作为图像的整个区域或图像的部分的分辨率评估值。 该方法消除了评估者对显微镜图像分辨率评估的主观印象，因此可以获得高精度和良好重复性的图像分辨率评估值。

公开(公告)号：US20040173748A1

公开(公告)日：2004-09-09

申请号：US10482200

申请日：2003-12-22

Inventor： Peter Dirksen ,  Rene Johan Gerrit Elfrink ,  Casparus Antonius Henricus Juffermans

IPC: G01N023/00

CPC classification number: H01J37/28 ,  H01J37/263 ,  H01J2237/2823

Abstract: The performance of a scanning electron microscope (SEM) (10) is determined by scanning, with this SEM, porous silicon surface areas (PSF, PSC) each having a different average pore size, calculating the Fourier transform spectra (Fc) of the images of the surface areas and extrapolating the resolution (R) at a zero signal-to-noise ratio (SNR) from the width (W(1/e)), the signal amplitude (Sa) and the noise offset (NL) of the spectra. A test sample provided with the different surface areas is obtained by anodizing a silicon substrate (Su) at a constant electric current, while continuously decreasing the substrate area exposed to the etching electrolyte (El).

Abstract translation: 通过扫描测定扫描电子显微镜（SEM）（10）的性能，通过SEM扫描，各自具有不同平均孔径的多孔硅表面积（PSF，PSC），计算图像的傅立叶变换光谱（Fc） （W（1 / e）），信号幅度（Sa）和噪声偏移（NL）在零信噪比（SNR）下外推分辨率（R） 光谱。 通过以恒定的电流阳极氧化硅衬底（Su），同时连续地减小暴露于蚀刻电解质（E1）的衬底区域，获得具有不同表面积的测试样品。

公开(公告)号：US06674078B2

公开(公告)日：2004-01-06

申请号：US10255163

申请日：2002-09-25

Applicant: Kuniaki Nagayama ,  Radostin S. Danev

Inventor： Kuniaki Nagayama ,  Radostin S. Danev

IPC: H01J3726

CPC classification number: H01J37/263 ,  H01J37/26 ,  H01J2237/226 ,  H01J2237/2614

Abstract: Phase manipulation is used to produce a high contrast electron microscope image. A phase plate is placed at the back focal plane of an objective lens and used to form a differential contrast image.

Abstract translation: 相位操作用于产生高对比度电子显微镜图像。 将相位板放置在物镜的后焦平面上，并用于形成差分对比度图像。

公开(公告)号：US20030039386A1

公开(公告)日：2003-02-27

申请号：US10219765

申请日：2002-08-16

Inventor： Tohru Ishitani ,  Mitsugu Sato ,  Hideo Todokoro ,  Tadashi Otaka ,  Takashi Iizumi ,  Atsushi Takane

IPC: G06K009/00 ,  G06K009/36

CPC classification number: H01J37/28 ,  H01J37/222 ,  H01J37/263 ,  H01J2237/2823

Abstract: Image evaluation method capable of objectively evaluating the image resolution of a microscope image. An image resolution method is characterized in that resolution in partial regions of an image is obtained over an entire area of the image or a portion of the image, averaging is performed over the entire area of the image or the portion of the image, and the averaged value is established as the resolution evaluation value of the entire area of the image or the portion of the image. This method eliminates the subjective impressions of the evaluator from evaluation of microscope image resolution, so image resolution evaluation values of high accuracy and good repeatability can be obtained.

Abstract translation: 能够客观评价显微镜图像的图像分辨率的图像评价方法。 图像分辨方法的特征在于，在图像的整个区域或图像的一部分上获得图像的部分区域中的分辨率，在图像的整个区域或图像的整个区域上进行平均化， 建立平均值作为图像的整个区域或图像的部分的分辨率评估值。 该方法消除了评估者对显微镜图像分辨率评估的主观印象，因此可以获得高精度和良好重复性的图像分辨率评估值。

公开(公告)号：US06396059B1

公开(公告)日：2002-05-28

申请号：US09612807

申请日：2000-07-10

Applicant: Bhanwar Singh ,  Bryan K. Choo ,  Sanjay K. Yedur

Inventor： Bhanwar Singh ,  Bryan K. Choo ,  Sanjay K. Yedur

IPC: H01J3726

CPC classification number: H01J37/263

Abstract: A system and method is provided for measuring and determining the resolution of a SEM imaging system employing a crystallographic etched sample with a re-entrant cross-sectional profile. A re-entrant or negative profile is employed because the top-down view seen by the SEM is very sharp due to the fact the edge of the profile has zero width. Therefore, any apparent width seen in the signal is a function of the electron beam width alone. Scanning the beam across the profile provides a signal that moves from a first state to a second state. The time period or sloping portion of the signal from the first state to the second state provides a direct correlation to the electron beam width. Thus, scanning across the sample allows for a calculation of the electron beam width. By scanning across features of different orientations, the shape of the electron beam can be determined. Alternatively, by rotating the electron beam and scanning across the same feature, the shape of the electron beam can be determined. A system can utilize this information to adjust the resolution of the SEM or a display displaying the image.

Abstract translation: 提供了一种系统和方法，用于测量和确定使用具有重新插入截面轮廓的晶体蚀刻样品的SEM成像系统的分辨率。 采用重入或负曲线，因为SEM所看到的自上而下的观点非常尖锐，这是因为轮廓的边缘具有零宽度。 因此，信号中看到的任何视在宽度都是单独的电子束宽度的函数。 在横截面上扫描光束提供从第一状态移动到第二状态的信号。 从第一状态到第二状态的信号的时间段或倾斜部分提供与电子束宽度的直接相关。 因此，扫描样本允许计算电子束宽度。 通过扫描不同取向的特征，可以确定电子束的形状。 或者，通过旋转电子束并扫过相同的特征，可以确定电子束的形状。 系统可以利用该信息来调整SEM的分辨率或显示图像的显示。

公开(公告)号：US2448594A

公开(公告)日：1948-09-07

申请号：US74534047

申请日：1947-05-01

Applicant: RCA CORP

Inventor： JAMES HILLIER ,  HAKER RICHARD F

IPC: G01Q60/00 ,  H01J37/22 ,  H01J37/26

CPC classification number: H01J37/263 ,  H01J37/22