Thermal Measurements Using Multiple Frequency Atomic Force Microscopy
    41.
    发明申请
    Thermal Measurements Using Multiple Frequency Atomic Force Microscopy 审中-公开
    使用多频率原子力显微镜的热测量

    公开(公告)号:US20150013037A1

    公开(公告)日:2015-01-08

    申请号:US14224268

    申请日:2014-03-25

    IPC分类号: B82Y35/00 G01Q60/32 G01Q40/00

    CPC分类号: B82Y35/00 G01Q40/00 G01Q60/32

    摘要: Apparatus and techniques for extracting information carried in higher eigenmodes or harmonics of an oscillating cantilever or other oscillating sensors in atomic force microscopy and related MEMs work are described. Similar apparatus and techniques for extracting information from piezoelectric, polymer and other materials using contact resonance with multiple excitation signals are also described.

    摘要翻译: 描述了用于提取在原子力显微镜和有关MEMs工作中的振荡悬臂或其它振荡传感器的较高本征模或谐波中携带的信息的装置和技术。 还描述了使用与多个激励信号的接触谐振从压电,聚合物和其它材料提取信息的类似装置和技术。

    Probe calibration
    42.
    发明授权
    Probe calibration 有权
    探头校准

    公开(公告)号:US08914910B1

    公开(公告)日:2014-12-16

    申请号:US14374740

    申请日:2012-12-21

    IPC分类号: G01Q40/00

    CPC分类号: G01Q40/00

    摘要: The arrangement for calibrating probes comprises a source (10) of coherent photon radiation and at least one optically based strain sensor (12a) for measuring an amount of strain (ε). The at least one optically based strain sensor is optically coupled to said source of coherent photon radiation. The arrangement further comprises at least one calibration lever (14) having a surface for placement of a tip (21) of a probe (2) to be calibrated, and that is mechanically coupled to the at least one optically based strain sensor for converting a force (F) exerted by said tip at said surface into an amount of strain in the optically based strain sensor. The arrangement further comprises at least one probe holder (24) for holding the probe (2) to be calibrated, the at least one probe holder having a controllable position in at least a direction (y) transverse to the surface of the calibration lever (14). The arrangement further comprises a calibration control facility (46) for controlling said controllable position within a range of position values, and for determining a mechanical property of said probe from the measured amount of strain (ε) and a deflection (δC) of the tip (21) of the probe relative to the probe holder as a function of said position.The arrangement may be used as a stand-alone device or may be integrated in a device, such as an AFM-device. The arrangement may also be carried out as a batch-calibration device.

    摘要翻译: 用于校准探针的装置包括相干光子辐射源(10)和用于测量应变量(&egr))的至少一个基于光学的应变传感器(12a)。 所述至少一个基于光学的应变传感器光耦合到所述相干光子辐射源。 该装置还包括至少一个校准杆(14),其具有用于放置待校准的探针(2)的尖端(21)的表面,并且机械耦合到至少一个基于光学的应变传感器,用于转换 所述尖端在所述表面处施加的力(F)在光学应变传感器中的应变量。 该装置还包括用于保持待校准的探针(2)的至少一个探针保持器(24),所述至少一个探针保持器在至少横向于校准杆的表面的方向(y)上具有可控位置( 14)。 该装置还包括校准控制设备(46),用于在位置值的范围内控制所述可控位置,并且用于根据测量的应变量(&egr)和所测量的应变量(δC)来确定所述探针的机械性能 作为所述位置的函数的探针相对于探针支架的尖端(21)。 该装置可以用作独立装置,或者可以集成在诸如AFM装置的装置中。 该装置也可以作为批量校准装置进行。

    Nanomechanical testing system
    43.
    发明授权
    Nanomechanical testing system 有权
    纳米力学测试系统

    公开(公告)号:US08770036B2

    公开(公告)日:2014-07-08

    申请号:US13962865

    申请日:2013-08-08

    申请人: Hysitron, Inc.

    IPC分类号: G01N3/00

    摘要: An automated testing system includes systems and methods to facilitate inline production testing of samples at a micro (multiple microns) or less scale with a mechanical testing instrument. In an example, the system includes a probe changing assembly for coupling and decoupling a probe of the instrument. The probe changing assembly includes a probe change unit configured to grasp one of a plurality of probes in a probe magazine and couple one of the probes with an instrument probe receptacle. An actuator is coupled with the probe change unit, and the actuator is configured to move and align the probe change unit with the probe magazine and the instrument probe receptacle. In another example, the automated testing system includes a multiple degree of freedom stage for aligning a sample testing location with the instrument. The stage includes a sample stage and a stage actuator assembly including translational and rotational actuators.

    摘要翻译: 自动化测试系统包括用机械测试仪器,以微(多微米)或更小尺度促进样品在线生产测试的系统和方法。 在一个示例中,该系统包括用于耦合和去耦器械的探针的探针更换组件。 探针更换组件包括探针改变单元,其被配置为抓住探针盒中的多个探针中的一个探针并将一个探针与仪器探针插座相耦合。 致动器与探头更换单元联接,并且致动器构造成使探针更换单元与探针盒和仪器探针插座移动和对准。 在另一示例中,自动化测试系统包括用于使样本测试位置与仪器对准的多自由度级。 舞台包括样本台和包括平移和旋转致动器的舞台致动器组件。

    Characterization structure for an atomic force microscope tip
    44.
    发明授权
    Characterization structure for an atomic force microscope tip 有权
    原子力显微镜尖端的表征结构

    公开(公告)号:US08739310B2

    公开(公告)日:2014-05-27

    申请号:US13869430

    申请日:2013-04-24

    摘要: A structure for the characterization of a tip of an atomic force microscope, the structure being produced on a substrate and including a first support element located above the substrate; a first characterization element with a constant thickness, the first characterization element being located above the first support element and having an upper flat surface and a lower flat surface covering the upper surface of the first support element with two zones extending beyond the upper surface of the first support element, each zone having a characterization surface at one end which is capable of coming into contact with a tip to be characterized, the upper surface and the lower surface of said first characterization element being parallel to the upper surface of the substrate.

    摘要翻译: 一种用于表征原子力显微镜的尖端的结构,所述结构在基底上产生并且包括位于所述基底上方的第一支撑元件; 具有恒定厚度的第一表征元件,第一表征元件位于第一支撑元件上方,并且具有覆盖第一支撑元件的上表面的上平坦表面和下平坦表面,其中两个区域延伸超过第一支撑元件的上表面 第一支撑元件,每个区域在一端具有能够与待表征的尖端接触的表征表面,所述第一表征元件的上表面和下表面平行于基底的上表面。

    Method and structure for characterising an atomic force microscopy tip
    45.
    发明授权
    Method and structure for characterising an atomic force microscopy tip 有权
    表征原子力显微镜尖端的方法和结构

    公开(公告)号:US08443460B2

    公开(公告)日:2013-05-14

    申请号:US12906801

    申请日:2010-10-18

    IPC分类号: G01Q40/00 G01Q40/02

    CPC分类号: G01Q40/00 G01Q40/02

    摘要: A method for characterizing an atomic force microscopy tip using a characterization structure having two inclined sidewalls opposite one another and of which at least one actual lateral distance separating the two inclined sidewalls corresponding to a given height is known, the method including scanning the surfaces of the inclined sidewalls by the tip, the scanning being carried out while the tip oscillates solely vertically; measuring, for the given height, the lateral distance separating the two inclined sidewalls, the measurement incorporating the convolution of the shape of the tip with the shape of the characterization structure; and determining a characteristic dimension of the tip as a function of the measured lateral distance, and of the actual lateral distance.

    摘要翻译: 使用具有两个彼此相对的倾斜侧壁的表征结构来表征原子力显微镜尖端的方法,其中分离与给定高度相对应的两个倾斜侧壁的至少一个实际横向距离是已知的,该方法包括扫描 倾斜的侧壁由尖端,当尖端完全垂直摆动时进行扫描; 测量给定的高度,分离两个倾斜的侧壁的横向距离,该测量结合尖端的形状与表征结构的形状的卷积; 以及根据所测量的横向距离和实际横向距离来确定尖端的特征尺寸。

    Systems for assessing and enhancing the performance of scanning probe microscopes by quantifying and enforcing symmetries and periodicities in two dimensions
    46.
    发明授权
    Systems for assessing and enhancing the performance of scanning probe microscopes by quantifying and enforcing symmetries and periodicities in two dimensions 有权
    通过量化和实施二维对称性和周期性来评估和增强扫描探针显微镜性能的系统

    公开(公告)号:US08196216B2

    公开(公告)日:2012-06-05

    申请号:US12660422

    申请日:2010-02-25

    申请人: Peter Moeck

    发明人: Peter Moeck

    IPC分类号: G01Q40/00

    CPC分类号: G01Q40/00

    摘要: Scanning probe microscope (SPM) images are enhanced by enforcing one or more symmetries that can be selected based on suitable Fourier coefficient amplitude or phase angle residuals, and/or geometric Akaike information criteria, and/or cross correlation techniques. Alternatively, this selection can be based on prior knowledge of specimen characteristics. In addition, a scanning microscope point spread function is obtained based on the evaluation of a calibration image by enforcing at least one symmetry and can be applied to other image acquisitions.

    摘要翻译: 扫描探针显微镜(SPM)图像通过执行可以基于合适的傅立叶系数幅度或相位角残差和/或几何Akaike信息标准和/或互相关技术来选择的一个或多个对称性来增强。 或者,该选择可以基于样本特征的先验知识。 此外,基于通过强制至少一个对称性对校准图像的评估来获得扫描显微镜点扩散函数,并且可以应用于其他图像采集。

    Method and apparatus for aligning patterns on a substrate
    47.
    发明授权
    Method and apparatus for aligning patterns on a substrate 失效
    用于对准衬底上的图案的方法和装置

    公开(公告)号:US08043652B2

    公开(公告)日:2011-10-25

    申请号:US11852978

    申请日:2007-09-10

    IPC分类号: C23C16/52 B05D5/00

    CPC分类号: G01Q40/00 Y10S977/854

    摘要: A system and method for aligning prior patterning positions formed by a first SPM tip with a second SPM tip in combination with an SPM system includes identifying first location information that includes a location of the first SPM tip and a sample reference location on an SPM sample and storing the first location information in a storage area. After replacing the first SPM tip with the second SPM tip, second location information, which includes a location of the second SPM tip and the sample reference location on the SPM sample, is identified. Displacement is calculated between the location of the second SPM tip and the first SPM tip based on the first and second location information, and either the second SPM tip or a stage supporting the SPM sample is translated to align the second SPM tip with the location of the first SPM tip in accordance with the calculated displacement.

    摘要翻译: 用于将由第一SPM尖端形成的先前图案形成位置与第二SPM尖端对准的系统和方法与SPM系统组合包括识别包括第一SPM尖端的位置和SPM样本上的样本参考位置的第一位置信息,以及 将第一位置信息存储在存储区域中。 在用第二SPM尖端替换第一SPM尖端之后,识别包括第二SPM尖端的位置和SPM样本上的样本参考位置的第二位置信息。 基于第一和第二位置信息在第二SPM尖端的位置和第一SPM尖端之间计算位移,并且平移第二SPM尖端或支撑SPM样本的平台以使第二SPM尖端与 第一个SPM尖端按照计算出的位移。

    PROBE ALIGNMENT TOOL FOR THE SCANNING PROBE MICROSCOPE
    48.
    发明申请
    PROBE ALIGNMENT TOOL FOR THE SCANNING PROBE MICROSCOPE 有权
    扫描探针显微镜探针对准工具

    公开(公告)号:US20110173728A1

    公开(公告)日:2011-07-14

    申请号:US12998126

    申请日:2008-09-18

    申请人: Ali R. Afshari

    发明人: Ali R. Afshari

    IPC分类号: G01Q10/00

    摘要: A probe alignment tool (10) for scanning probe microscopes utilizes an attached relay optics to view the scanning probe microscope probe tip (40) and align its image in the center of the field of view of an optical microscope (36). Adjustments to optical microscope motorized stages (50) and (60) along with adjustments of scanning probe microscope stages (44), (46) and (58) allow determination of a path and distance from the center of the field of view to the probe tip (40). From such determination a target area to be examined by the scanning probe microscope may be positioned precisely and accurately under the probe tip (40). Replacement of a scanning probe microscope probe tip (40) in an atomic force microscope unit (42) may be accomplished without the loss of alignment measurements.

    摘要翻译: 用于扫描探针显微镜的探针对准工具(10)利用附接的中继光学器件来观察扫描探针显微镜探针尖端(40)并将其图像对准在光学显微镜(36)的视场的中心。 光学显微镜电动级(50)和(60)的调整以及扫描探针显微镜级(44),(46)和(58)的调整允许确定从视场中心到探头的路径和距离 尖端(40)。 从这样的判断可以精确而准确地将扫描探针显微镜检查的目标区域定位在探针尖端(40)的下方。 在原子力显微镜单元(42)中更换扫描探针显微镜探针尖端(40)可以在不损失对准测量的情况下实现。

    SCANNING PROBE EPITAXY
    49.
    发明申请
    SCANNING PROBE EPITAXY 审中-公开
    扫描探头外观

    公开(公告)号:US20100115672A1

    公开(公告)日:2010-05-06

    申请号:US12465615

    申请日:2009-05-13

    IPC分类号: G01Q60/24

    摘要: A dual tip probe for scanning probe epitaxy and a method of forming the dual tip probe are disclosed. The dual tip probe includes first and second tips disposed on a cantilever arm. The first and second tips can be a reader tip and a synthesis tip, respectively. The first tip can remain in contact with a substrate during writing and provide in situ characterization of the substrate and or structures written, while the second tip can perform in non-contact mode to write and synthesis nanostructures. This feature can allow the dual tip probe to detect errors in a printed pattern using the first tip and correct the errors using the second tip.

    摘要翻译: 公开了一种用于扫描探针外延的双尖端探针和形成双尖端探针的方法。 双尖头探针包括设置在悬臂上的第一和第二尖端。 第一和第二提示可以分别是读取器尖端和合成尖端。 第一尖端可以在书写期间保持与基底接触,并且提供衬底和/或结构的原位表征,而第二尖端可以以非接触模式执行以写入和合成纳米结构。 该功能可以允许双尖端探针使用第一个尖端检测印刷图案中的错误,并使用第二个尖端校正错误。

    NANOMANUFACTURING DEVICES AND METHODS
    50.
    发明申请
    NANOMANUFACTURING DEVICES AND METHODS 失效
    纳米制备装置和方法

    公开(公告)号:US20100089869A1

    公开(公告)日:2010-04-15

    申请号:US12465621

    申请日:2009-05-13

    摘要: Devices for performing nanofabrication are provided which provide small volume reaction space and high reaction versatility. A device may include a reaction chamber adapted for nanoscale modification of a substrate and vacuum conditions; a scanning probe tip assembly enclosed within the reaction chamber; a first port coupled to the reaction chamber for delivering a gas; a second port coupled to the reaction chamber for applying a vacuum; and a substrate assembly insertedly mounted to the reaction chamber. The reaction chamber may include a body having one or more flexible walls and one or more supports to prevent the reaction chamber from collapsing under a vacuum. The device may further include an electrical conduit for coupling the tips of the scanning probe tip assembly to electrical components outside the reaction chamber. Also provided are apparatuses incorporating the devices and methods of using the devices and apparatuses.

    摘要翻译: 提供用于进行纳米制造的装置,其提供小体积的反应空间和高反应多功能性。 装置可以包括适于对基底进行纳米尺寸改性的反应室和真空条件; 包围在反应室内的扫描探针头组件; 耦合到所述反应室的用于输送气体的第一端口; 耦合到所述反应室的第二端口,用于施加真空; 以及插入安装到反应室的基板组件。 反应室可以包括具有一个或多个柔性壁和一个或多个支撑物的主体,以防止反应室在真空下塌缩。 该装置还可以包括用于将扫描探针头组件的尖端耦合到反应室外部的电气部件的电导管。 还提供了结合装置的装置和使用装置和装置的方法。