公开(公告)号：US5712735A

公开(公告)日：1998-01-27

申请号：US670660

申请日：1996-06-26

Applicant: Sumio Hashimoto ,  Yutaka Suenaga ,  Yutaka Ichihara

Inventor： Sumio Hashimoto ,  Yutaka Suenaga ,  Yutaka Ichihara

IPC: G02B1/02 ,  G02B17/08 ,  G03F7/20 ,  G02B17/00

CPC classification number: G02B17/08 ,  G02B17/0892 ,  G03F7/70225 ,  G03F7/70358 ,  G03F7/70566

Abstract: A catadioptric reduction projection optical system having a first lens unit having negative refractive power and widening a light beam from a reticle, a prism type beam splitter for transmitting therethrough a light beam from the first lens unit, a concave reflecting mirror for returning the light beam emerging from the beam splitter to the beam splitter while converging it, and a second lens unit having positive refractive power and converging the light beam returned to the beam splitter and reflected by the beam splitter, and forming the reduced image of a pattern on the reticle on a wafer.

Abstract translation: 一种反折射减小投影光学系统，具有具有负屈光力的第一透镜单元和来自光罩的光束，用于透射来自第一透镜单元的光束的棱镜型分束器，用于使光束返回的凹面反射镜 从分束器到分束器的同时会聚;以及第二透镜单元，其具有正折光力并且会聚返回到分束器并由分束器反射的光束，并且在分划板上形成图案的缩小图像 在晶圆上。

公开(公告)号：US5636000A

公开(公告)日：1997-06-03

申请号：US495726

申请日：1995-06-27

Applicant: Kazuo Ushida ,  Sumio Hashimoto

Inventor： Kazuo Ushida ,  Sumio Hashimoto

IPC: G02B5/18 ,  G02B7/02 ,  G02B13/24 ,  G02B27/00 ,  G03F7/20 ,  G03F7/207 ,  H01L21/027

CPC classification number: G03F7/70891 ,  G02B13/24 ,  G02B27/0043 ,  G02B27/4222 ,  G02B27/4272 ,  G02B27/4283 ,  G02B7/028 ,  G03F7/70241 ,  G03F7/70308 ,  G03F7/70883

Abstract: A projection exposure apparatus can correct focal point movement caused by an environmental change, such as a change in temperature or atmospheric pressure, during an operation, while minimizing occurrence of a new aberration such as a spherical aberration caused by focus correction. The projection exposure apparatus of this invention exposes a mask pattern on a photosensitive substrate via a projection optical system. The projection optical system includes a refraction or reflection type optical member, and a diffraction type correction optical member. The correction optical member has focal position movement with an environmental change during an operation in a direction opposite to the direction of focal position movement of the optical member with the environmental change during the operation.

Abstract translation: 投影曝光装置可以在操作期间校正由诸如温度变化或大气压力之类的环境变化引起的焦点运动，同时最小化由聚焦校正引起的球面像差等新像差的发生。 本发明的投影曝光装置通过投影光学系统在感光基板上曝光掩模图案。 投影光学系统包括折射或反射型光学构件和衍射型校正光学构件。 校正光学构件在操作期间在与操作期间的环境变化的光学构件的焦点位置移动的方向相反的方向上具有环境变化的焦点位置运动。

公开(公告)号：US5220454A

公开(公告)日：1993-06-15

申请号：US950765

申请日：1992-09-24

Applicant: Yutaka Ichihara ,  Hideo Mizutani ,  Sumio Hashimoto ,  Yutaka Suenaga

Inventor： Yutaka Ichihara ,  Hideo Mizutani ,  Sumio Hashimoto ,  Yutaka Suenaga

IPC: G02B17/08 ,  G02B27/00 ,  G02B27/28 ,  G03F7/20

CPC classification number: G02B17/0892 ,  G02B17/08 ,  G02B27/283 ,  G03F7/70225 ,  G02B27/0018

Abstract: In a cata-dioptric optical system having a combination of a reflection system and a refraction system for reduction-projecting an object on a first plane onto a second plane, a polarization beam splitter and a quarter wavelength plate are provided to split the incident light and the reflected light. The light beam directed to the polarization beam splitter is converted to a substantially collimated light beam by a first group of lenses. A second group of lenses are arranged between the polarization beam splitter and a concave reflection mirror to diverge the light beam. The light reflected by the concave reflection mirror is directed back to the polarization beam splitter with a substantially collimated state by the second group of lenses. The light beam from the second group of lenses transmitted through the polarization beam splitter is focused by a third group of lenses having a positive refraction power to form a reduced image.

Abstract translation: 在具有用于将第一平面上的物体还原投影到第二平面上的反射系统和折射系统的组合的数位屈光光学系统中，设置偏振分束器和四分之一波长板以分离入射光， 反射光。 被引导到偏振分束器的光束被第一组透镜转换成基本准直的光束。 第二组透镜被布置在偏振分束器和凹面反射镜之间以使光束发散。 由第二组透镜将由凹面反射镜反射的光引导回基本准直状态的偏振分束器。 通过偏振分束器透射的第二组透镜的光束被具有正折射光焦度的第三组透镜聚焦以形成缩小图像。

公开(公告)号：US4637691A

公开(公告)日：1987-01-20

申请号：US576477

申请日：1984-02-02

Applicant: Makoto Uehara ,  Sumio Hashimoto

Inventor： Makoto Uehara ,  Sumio Hashimoto

IPC: G03B27/54 ,  G02B5/00 ,  G02B17/08 ,  G02B19/00 ,  G02B21/06 ,  G02B27/09 ,  G02F1/19 ,  G03F7/20

CPC classification number: G03F7/70058 ,  G02B19/0028 ,  G02B19/0047 ,  G02B21/06 ,  G02B5/001

Abstract: A mirror converging-type illumination optical system for converging light rays from a light source into substantially parallel light rays using a concave reflecting mirror having a secondary curved surface comprises a conical refraction member having a convex conical refraction surface at an input or incident side thereof and another convex conical refraction surface at an output side thereof. The refraction member is arranged in a path of the parallel light rays with a vertex of the conical refraction member being substantially aligned with the optical axis of the illumination optical system. The refraction member inverts the inner and outer portions of the incident parallel light rays. The absence of incident parallel light around the optical axis thereof is corrected to achieve a uniform intensity of light rays.

Abstract translation: 使用具有次级曲面的凹面反射镜将来自光源的光线会聚到基本上平行的光线的镜面会聚式照明光学系统包括在输入或入射侧具有凸锥形折射面的锥形折射构件， 在其输出侧的另一个凸锥形折射表面。 折射构件布置在平行光线的路径中，其中锥形折射构件的顶点基本上与照明光学系统的光轴对准。 折射构件使入射的平行光线的内部和外部反转。 校正光轴周围没有入射平行光，以实现均匀的光线强度。