公开(公告)号：US08556460B2

公开(公告)日：2013-10-15

申请号：US12473447

申请日：2009-05-28

Applicant: Takayoshi Moriyama ,  Kazunari Higuchi ,  Sumio Hashimoto ,  Shinichi Kumashiro

Inventor： Takayoshi Moriyama ,  Kazunari Higuchi ,  Sumio Hashimoto ,  Shinichi Kumashiro

IPC: F21V7/20 ,  F21V29/00

CPC classification number: F21V29/00 ,  F21S8/026 ,  F21V17/12 ,  F21V19/0035 ,  F21V19/0055 ,  F21V21/00 ,  F21V29/50 ,  F21V29/74 ,  F21Y2101/00 ,  F21Y2115/10 ,  H05K1/0206 ,  H05K1/0271 ,  H05K2201/09063 ,  H05K2201/10106 ,  H05K2201/10409 ,  H05K2201/10598

Abstract: A lighting apparatus includes a substrate having a plurality of light-emitting elements mounted thereto. The substrate includes a surface on which a plurality of light-emitting elements are mounted and stress absorbing elements arranged on imaginary straight lines connecting portions for mounting the substrate with each other. The lighting apparatus includes a main body in contact with and fixed to a back surface of the substrate. The lighting apparatus also includes a light directing member in contact with a front surface of the substrate, a plurality of openings into which the plurality of light-emitting elements of the substrate are inserted, and a plurality of reflective surfaces.

Abstract translation: 照明装置包括具有安装在其上的多个发光元件的基板。 基板包括其上安装有多个发光元件的表面，并且将应力吸收元件布置在连接用于将基板安装的部分的假想直线上。 照明装置包括与基板的背面接触并固定到基板的背面的主体。 照明装置还包括与基板的前表面接触的导光构件，插入有多个基板的发光元件的多个开口以及多个反射面。

公开(公告)号：US08545051B2

公开(公告)日：2013-10-01

申请号：US13590804

申请日：2012-08-21

Applicant: Takayoshi Moriyama ,  Kazunari Higuchi ,  Sumio Hashimoto ,  Shinichi Kumashiro

Inventor： Takayoshi Moriyama ,  Kazunari Higuchi ,  Sumio Hashimoto ,  Shinichi Kumashiro

IPC: F21S4/00 ,  H05K1/05

CPC classification number: F21V29/00 ,  F21S8/026 ,  F21V17/12 ,  F21V19/0035 ,  F21V19/0055 ,  F21V21/00 ,  F21V29/50 ,  F21V29/74 ,  F21Y2101/00 ,  F21Y2115/10 ,  H05K1/0206 ,  H05K1/0271 ,  H05K2201/09063 ,  H05K2201/10106 ,  H05K2201/10409 ,  H05K2201/10598

Abstract: A substrate for a lighting apparatus includes one or more light-emitting elements mounted thereon. The substrate includes a surface on which the plurality of light-emitting elements are mounted. Additionally, the substrate includes heat conductive elements for conducting heat from the one or more light-emitting elements, the heat conductive elements including heat conductive holes extending through a non-electrically conducting layer formed on a first surface of the substrate and an entirety of the substrate and a heat conductive layer formed on a surface of the substrate opposite the first surface.

Abstract translation: 用于照明装置的基板包括安装在其上的一个或多个发光元件。 基板包括其上安装有多个发光元件的表面。 另外，基板包括用于从一个或多个发光元件传导热的导热元件，导热元件包括延伸穿过形成在基板的第一表面上的非导电层的导热孔， 基板和形成在与第一表面相对的基板的表面上的导热层。

公开(公告)号：US08482014B2

公开(公告)日：2013-07-09

申请号：US12582721

申请日：2009-10-21

Applicant: Kazunari Higuchi ,  Takayoshi Moriyama ,  Sumio Hashimoto ,  Shinichi Kumashiro ,  Yutaka Honda ,  Kenji Nezu

Inventor： Kazunari Higuchi ,  Takayoshi Moriyama ,  Sumio Hashimoto ,  Shinichi Kumashiro ,  Yutaka Honda ,  Kenji Nezu

IPC: H01L33/00

CPC classification number: F21S8/02 ,  F21S8/026 ,  F21V7/0083 ,  F21V21/04 ,  F21V23/026 ,  F21V29/507 ,  F21V29/75 ,  F21V29/76 ,  F21V29/77 ,  F21Y2115/10

Abstract: A lighting apparatus is provided with a plurality of light-emitting devices, a substrate, a blind member, and a reflector. The reflector is formed with a plurality of reflective surfaces corresponding to the light-emitting devices, individually. The shielding angle at which light emitted from that one of the light-emitting devices which is located on the outermost periphery is intercepted by the reflective surface corresponding to the outermost light-emitting device is greater than shielding angles at which light emitted from the light-emitting devices located inside the outermost light-emitting device is intercepted by the reflective surfaces corresponding to the inside light-emitting devices.

Abstract translation: 照明装置设置有多个发光装置，基板，遮光部件和反射板。 反射器分别形成有与发光装置对应的多个反射面。 从位于最外侧的发光装置的一个发光装置发出的光被与最外侧的发光装置对应的反射面截取的遮蔽角度大于从发光装置发出的光的遮蔽角度， 位于最外侧的发光装置内的发光装置被对应于内部发光装置的反射面截取。

公开(公告)号：US20120314432A1

公开(公告)日：2012-12-13

申请号：US13590804

申请日：2012-08-21

Applicant: Takayoshi Moriyama ,  Kazunari Higuchi ,  Sumio Hashimoto ,  Shinichi Kumashiro

Inventor： Takayoshi Moriyama ,  Kazunari Higuchi ,  Sumio Hashimoto ,  Shinichi Kumashiro

IPC: F21V17/12 ,  F21V29/00

CPC classification number: F21V29/00 ,  F21S8/026 ,  F21V17/12 ,  F21V19/0035 ,  F21V19/0055 ,  F21V21/00 ,  F21V29/50 ,  F21V29/74 ,  F21Y2101/00 ,  F21Y2115/10 ,  H05K1/0206 ,  H05K1/0271 ,  H05K2201/09063 ,  H05K2201/10106 ,  H05K2201/10409 ,  H05K2201/10598

Abstract: A substrate for a lighting apparatus may include a plurality of light-emitting elements mounted thereon. The substrate may include a surface on which the plurality of light-emitting elements are mounted. Additionally or alternatively, the substrate may include stress absorbing element arranged on, in some examples, imaginary straight lines connecting portion for mounting the substrate with each other.

Abstract translation: 用于照明装置的基板可以包括安装在其上的多个发光元件。 基板可以包括其上安装有多个发光元件的表面。 附加地或替代地，衬底可以包括布置在一些示例中的用于将衬底彼此安装的假想直线连接部分的应力吸收元件。

公开(公告)号：USD618827S1

公开(公告)日：2010-06-29

申请号：US29281086

申请日：2007-06-14

Applicant: Jun Matsumoto ,  Keiichi Shimizu ,  Sumio Hashimoto ,  Masaru Inoue

Designer： Jun Matsumoto ,  Keiichi Shimizu ,  Sumio Hashimoto ,  Masaru Inoue

公开(公告)号：US5880817A

公开(公告)日：1999-03-09

申请号：US760871

申请日：1996-12-09

Applicant: Sumio Hashimoto

Inventor： Sumio Hashimoto

IPC: G03F7/20 ,  H01L21/027 ,  G03B27/42

CPC classification number: G03F7/70041 ,  G03F7/7005 ,  G03F7/70241

Abstract: Apparatus and methods for suppressing degradations in the transmissivity and refractive index of lenses used in an exposure unit of a projection-exposure apparatus in which a high-energy pulsed beam of light (such as an excimer laser) is used for the projection exposure. Pulsed-light beams from multiple pulsed-light sources are provided, the pulsed-light beams each having the same wavelength, pulse frequency P.sub.0, and fluence F.sub.0 but being phase-shifted relative to each other. The pulsed-light beams are each split by a beam splitter and integrated to produce at least one integrated light beam having a pulse frequency of P.sub.0 times the number of pulsed-light beams that are integrated but a fluence per pulse of F.sub.0 divided by the number of pulsed-light beams that are integrated. The integrated light beam is passed through the exposure unit. Multiple such integrated light beams can be produced, each propagating to a separate exposure unit.

Abstract translation: 用于抑制投影曝光中使用高能量脉冲光束（例如准分子激光）的投影曝光装置的曝光单元中使用的透镜的透射率和折射率的降低的装置和方法。 提供来自多个脉冲光源的脉冲光束，脉冲光束各自具有相同的波长，脉冲频率P0和注量F0，但相对于彼此相移。 脉冲光束每个被分束器分开，并被集成以产生至少一个积分光束，其具有的脉冲频率为整数的脉冲光束的数量P0，而每个脉冲F0的注量除以数字 的集成的脉冲光束。 集成光束通过曝光单元。 可以产生多个这样的集成光束，每个传播到单独的曝光单元。

公开(公告)号：US5844728A

公开(公告)日：1998-12-01

申请号：US670650

申请日：1996-06-26

Applicant: Sumio Hashimoto ,  Yutaka Suenaga ,  Yutaka Ichihara

Inventor： Sumio Hashimoto ,  Yutaka Suenaga ,  Yutaka Ichihara

IPC: G02B1/02 ,  G02B17/08 ,  G03F7/20 ,  G02B17/00

CPC classification number: G02B17/08 ,  G02B17/0892 ,  G03F7/70225 ,  G03F7/70358 ,  G03F7/70566

Abstract: A catadioptric reduction projection optical system having a first lens unit having negative refractive power and widening a light beam from a reticle, a prism type beam splitter for transmitting therethrough a light beam from the first lens unit, a concave reflecting mirror for returning the light beam emerging from the beam splitter to the beam splitter while converging it, and a second lens unit having positive refractive power and converging the light beam returned to the beam splitter and reflected by the beam splitter, and forming the reduced image of a pattern on the reticle on a wafer.

公开(公告)号：US5289312A

公开(公告)日：1994-02-22

申请号：US948327

申请日：1992-09-22

Applicant: Sumio Hashimoto ,  Yutaka Ichihara

Inventor： Sumio Hashimoto ,  Yutaka Ichihara

IPC: G02B1/02 ,  G02B17/08 ,  G03F7/20 ,  H01L21/027 ,  G02B27/28

CPC classification number: G02B17/0892 ,  G02B17/08 ,  G03F7/70225

Abstract: A catadioptric reduction projection optical system is of a construction in which an on-axis light beam is used in a catadioptric system, and is designed such that resolving power is not deteriorated and a stop can be disposed. The catadioptric reduction projection optical system has a first lens unit G1 having negative refractive power and diffusing a light beam from a reticle 1, a semi-transparent mirror 2 for transmitting therethrough or reflecting the light beam from the first lens unit G1, a second lens unit G2 having negative refractive power and widening the light beam reflected from the semi-transparent mirror 2, a concave reflecting mirror 4 for returning the light beam from the second lens unit G2 to the semi-transparent mirror 2 through the second lens unit G2 while converging that light beam, a third lens unit G3 having positive refractive power and converging the light beam returned to and transmitted through the semi-transmitted mirror 2 on a wafer 5, and a stop 6 disposed between the semi-transparent mirror 2 and the third lens unit G3.

Abstract translation: 折反射折射投影光学系统是在反射折射系统中使用轴上光束的结构，并且被设计成使分辨能力不劣化并且可以设置停止。 折反射折射投影光学系统具有第一透镜单元G1，该第一透镜单元G1具有负折光力并且扩散来自标线片1的光束，用于透射的半透明反射镜2或反射来自第一透镜单元G1的光束;第二透镜 具有负屈光力并扩大从半透明反射镜2反射的光束的单元G2，用于将来自第二透镜单元G2的光束通过第二透镜单元G2将光束返回到半透明反射镜2的凹面反射镜4， 会聚该光束，具有正折光力的第三透镜单元G3，并且使通过半透射反射镜2返回并透射到晶片5的光束会聚;以及设置在半透明反射镜2和第三透镜 镜头单元G3。

公开(公告)号：US08128263B2

公开(公告)日：2012-03-06

申请号：US12559520

申请日：2009-09-15

Applicant: Kazunari Higuchi ,  Sumio Hashimoto ,  Takayoshi Moriyama ,  Shinichi Kumashiro

Inventor： Kazunari Higuchi ,  Sumio Hashimoto ,  Takayoshi Moriyama ,  Shinichi Kumashiro

IPC: F21V29/00

CPC classification number: F21S8/02 ,  F21V29/75 ,  F21V29/86 ,  F21V29/89 ,  F21Y2115/10

Abstract: A light source unit is provided with a substrate and segments of a reflector. The substrate has a plurality of light-emitting devices mounted on its central and peripheral portions. The segments correspond to the light-emitting devices, individually. The segment corresponding to the light-emitting devices mounted on the central portion are higher in thermal radiation capacity than the segment corresponding to the light-emitting devices mounted on the peripheral portion.

Abstract translation: 光源单元设置有基板和反射器的段。 衬底具有安装在其中心部分和周边部分上的多个发光器件。 这些段分别对应于发光装置。 对应于安装在中心部分的发光装置的片段的热辐射能力高于与安装在周边部分上的发光装置相对应的片段。

公开(公告)号：US08079736B2

公开(公告)日：2011-12-20

申请号：US12757664

申请日：2010-04-09

Applicant: Masaru Inoue ,  Keiichi Shimizu ,  Sumio Hashimoto ,  Hirokazu Otake ,  Mitsuhiko Nishiie ,  Takuro Hiramatsu ,  Masatoshi Kumagai

Inventor： Masaru Inoue ,  Keiichi Shimizu ,  Sumio Hashimoto ,  Hirokazu Otake ,  Mitsuhiko Nishiie ,  Takuro Hiramatsu ,  Masatoshi Kumagai

IPC: F21V33/00

CPC classification number: F21S8/026 ,  F21V7/0083 ,  F21V17/12 ,  F21V23/02 ,  F21V29/763 ,  F21Y2115/10

Abstract: A lighting apparatus comprises a housing and a first reflector. The first reflector is mounted beneath the light source and includes a plurality of segmented reflectors, each having at its top, a installation hole and at its bottom, an opening wider than the installation hole. A second reflector is positioned beneath the first reflector. The height of the second reflector causes a first light shielding angle defined by a straight line passing through the installation hole and the bottom edge of the corresponding segmented reflector to be larger than a second light shielding angle defined by a straight line passing through the bottom edge of the segmented reflector and the bottom edge of the second reflector.