公开(公告)号：US12109983B2

公开(公告)日：2024-10-08

申请号：US18537525

申请日：2023-12-12

申请人： NUVINAIR, LLC

发明人： Kyle Bailey ,  Jason Bailey

IPC分类号： A61L2/00 ,  A61L2/22 ,  A61L9/14 ,  A62B7/08 ,  B08B3/02 ,  B08B3/04 ,  B08B9/00 ,  B60S3/00

CPC分类号： B60S3/008 ,  A61L2/22 ,  A61L9/14 ,  B08B3/02 ,  B08B3/04 ,  B08B9/00 ,  A61L2202/16 ,  A61L2202/17

摘要： There is provided a system and method of cleaning surfaces of an enclosable environment of a contamination comprising a microbial and viral load. The method includes the steps of sealing the enclosable environment and placing water, and a solid or gel pack, into a container and generating a vortex the container by rotating an impeller. The agitation causes the solid or gel pack to release a gaseous cleaning agent. An air-borne spray exiting from the container spreads throughout the enclosable environment to contact the surfaces to be cleaned within the enclosable environment. The enclosable environment is maintained closed for an effective time period while the air-borne spray dwells on the surfaces to eliminate or substantially reduce the load of the contamination.

公开(公告)号：US20240332038A1

公开(公告)日：2024-10-03

申请号：US18292787

申请日：2022-07-14

申请人： TOKUYAMA CORPORATION

发明人： Koki ICHITSUBO

IPC分类号： H01L21/67 ,  B08B3/08 ,  C01B33/037

CPC分类号： H01L21/67057 ,  B08B3/08 ,  C01B33/037

摘要： In order to prevent contamination of polycrystalline silicon in a cleaning step, a cleaning basket (1) is a cleaning basket (1) used for cleaning polycrystalline silicon in a state in which the polycrystalline silicon is accommodated in the cleaning basket and includes a plurality of component parts (10) each made of a resin, the plurality of component parts (10) being coupled to each other by screwing screws (N) each made of a resin.

公开(公告)号：US20240332037A1

公开(公告)日：2024-10-03

申请号：US18130407

申请日：2023-04-03

申请人： Applied Materials, Inc.

发明人： Brian J. BROWN

IPC分类号： H01L21/67 ,  B08B1/00 ,  B08B1/04 ,  B08B3/02 ,  B08B3/08 ,  B24B53/017 ,  H01L21/02

CPC分类号： H01L21/67046 ,  B08B1/12 ,  B08B1/32 ,  B08B1/50 ,  B08B3/02 ,  B08B3/08 ,  B24B53/017 ,  H01L21/02096

摘要： A chemical mechanical polishing (CMP) system include apparatus and methods to clean brushes used to scrub substrates, including brush cleaning using periodic chemical treatment. One or more embodiments include a method of operating the CMP system to rotate a first one or more scrubber brushes while the first one or more scrubber brushes are in contact with a first substrate, performing, concurrent with the rotating during the first time duration, a cleaning operation for a second one or more scrubber brushes, performing, during a second time duration of the cleaning cycle, the cleaning operation for the first one or more scrubber brushes, and rotating, concurrent with the performing the cleaning operation during the second time duration, the second one or more scrubber brushes while the second one or more scrubber brushes are in contact with a second substrate.

公开(公告)号：US20240329214A1

公开(公告)日：2024-10-03

申请号：US18611902

申请日：2024-03-21

申请人： Robert Bosch GmbH

发明人： Zoltan Gyonyoru ,  Akos Hegyi ,  Bence Balint ,  Gyorgy Szabo ,  Janos Simonovics ,  Mate Hornyak ,  Peter Deak

IPC分类号： G01S7/497 ,  B08B1/34 ,  G01S17/931

CPC分类号： G01S7/497 ,  B08B1/34 ,  G01S2007/4977 ,  G01S17/931

摘要： A LiDAR cleaning system includes a cleaning arm configured to clean a sensor surface of a LiDAR sensor by displacement of the cleaning arm. The system further includes a drive unit having at least two deflection elements and a belt element. The cleaning arm is detachably connected to the belt element. The drive unit is configured to displace the cleaning arm by rotation of the belt element about the at least two deflection elements to clean the sensor surface.

公开(公告)号：US20240326108A1

公开(公告)日：2024-10-03

申请号：US18127130

申请日：2023-03-28

申请人： SAMSUNG ELECTRONICS CO., LTD.

发明人： Jinuk PARK ,  Kwangjin KIM ,  Kihong PARK ,  Hoseok SONG ,  Shinsang LEE ,  Kyoyong JIN ,  Minwoong CHOI ,  Jihoon CHU ,  Sunyoung HAN ,  Jeongmin HWANG

IPC分类号： B08B9/087 ,  A46B13/00 ,  A46B13/02 ,  B08B9/46

CPC分类号： B08B9/087 ,  A46B13/001 ,  A46B13/02 ,  B08B9/46 ,  A46B2200/3006 ,  B08B2209/08 ,  H01L21/67011

摘要： An automatic chamber cleaning system includes a chamber including an opening in an upper portion, an inner space, and an inner wall, and an automatic chamber cleaning device on the chamber, the automatic chamber cleaning device including roller cleaning devices configured to clean the inner wall of the chamber, a vertical driver configured to move the roller cleaning devices in a vertical direction of the chamber through the opening of the chamber into the inner space of the chamber, a horizontal driver configured to move the roller cleaning devices inside the chamber in a radial direction, and a main rotation driver configured to rotate the roller cleaning devices inside the chamber about a center of the chamber along a rotation direction of the chamber.

公开(公告)号：US20240326102A1

公开(公告)日：2024-10-03

申请号：US18573461

申请日：2022-06-20

申请人： HYBRID REALITY GMBH

发明人： Ani MANERA DA SILVA ,  Cord LABUHN

IPC分类号： B08B3/08 ,  A61J11/00 ,  A61L2/07 ,  A61L2/08 ,  C08B15/00 ,  C11D7/06

CPC分类号： B08B3/08 ,  A61J11/0075 ,  A61L2/07 ,  A61L2/087 ,  C08B15/00 ,  C11D7/06 ,  A61L2202/17

摘要： The invention relates to a process for reprocessing a utensil made of a nonwoven made of bacterial nanocellulose loaded with an additive, comprising the process steps of washing the loaded utensil in an alkaline solution and subsequently rinsing and sterilizing the utensil, a rubber dam made of a dimensionally stable hydrogel made of bacterial nanocellulose and the use of a hydrogel made of bacterial nanocellulose as a rubber dam.

公开(公告)号：US20240326101A1

公开(公告)日：2024-10-03

申请号：US18609479

申请日：2024-03-19

申请人： Neturen Takuto Co., Ltd. ,  Neturen Co., Ltd.

发明人： Hisaaki Watanabe ,  Kazutoshi Asai ,  Kousuke Watanabe

IPC分类号： B08B3/04 ,  B08B3/02

CPC分类号： B08B3/041 ,  B08B3/024

摘要： Provided are method and apparatus for cleaning a carrier film such as a PET film, which are low in cost and environmental load, in cleaning of the carrier film for recycle.
The method for cleaning the carrier film includes spraying water containing microbubbles onto a surface of the carrier film having a remaining dielectric ceramic layer, thereby peeling the remaining dielectric ceramic layer from the surface. The apparatus for cleaning the carrier film includes a holder that holds the carrier film having a remaining dielectric ceramic layer, and a nozzle that sprays water containing microbubbles onto a surface of the held carrier film to peel the remaining dielectric ceramic layer from the surface.

公开(公告)号：US20240326100A1

公开(公告)日：2024-10-03

申请号：US18190744

申请日：2023-03-27

申请人： SAUDI ARABIAN OIL COMPANY

发明人： Kal M. Smiley ,  Farooq N. Jwesm ,  Abdullah A. Fuwaires ,  Turki A. Zahrani

IPC分类号： B08B3/02

CPC分类号： B08B3/024 ,  B08B2203/027

摘要： A system includes a spray head comprising a spray head inlet for hydraulic connection of a cleaning fluid, a spray head outlet for directing the cleaning fluid at a planar surface of a louver, and a movable mount for positioning the spray head proximate the planar surface of the louver. The system may include a carriage frame attached to the cooling tower proximate the louver. The system may include the movable mount being movably mounted on the carriage frame and movable in at least two orthogonal directions along the planar surface of the louver. The system may include a control system for controlling movement of the movable mount on the carriage frame and supply of the cleaning fluid to the spray head so as to cause the cleaning fluid to be sprayed at preselected portions of the louver at preselected times.

公开(公告)号：US12106958B2

公开(公告)日：2024-10-01

申请号：US18342296

申请日：2023-06-27

申请人： Applied Materials, Inc.

发明人： Anup Kumar Singh ,  Rick Kustra ,  Vinayak Vishwanath Hassan ,  Bhaskar Kumar ,  Krishna Nittala ,  Pramit Manna ,  Kaushik Alayavalli ,  Ganesh Balasubramanian

IPC分类号： H01L21/02 ,  B08B7/00 ,  C23C16/26 ,  C23C16/44 ,  C23C16/505 ,  H01J37/32 ,  H01L21/033

CPC分类号： H01L21/02274 ,  B08B7/0035 ,  C23C16/26 ,  C23C16/4405 ,  C23C16/505 ,  H01J37/32082 ,  H01J37/3244 ,  H01J37/32862 ,  H01L21/02115 ,  H01L21/0332

摘要： Embodiments of the present disclosure generally relate to methods for cleaning a chamber comprising introducing a gas to a processing volume of the chamber, providing a first radiofrequency (RF) power having a first frequency of about 40 MHz or greater to a lid of the chamber, providing a second RF power having a second frequency to an electrode disposed in a substrate support within the processing volume, and removing at least a portion of a film disposed on a surface of a chamber component of the chamber. The second frequency is about 10 MHz to about 20 MHz.

公开(公告)号：US12104464B2

公开(公告)日：2024-10-01

申请号：US18144243

申请日：2023-05-07

申请人： Michael W. Dennis

发明人： Michael W. Dennis ,  Gary W. Pankonien ,  Garry A. Wilson

IPC分类号： E21B37/00 ,  B05B3/06 ,  B05B15/658 ,  B08B9/043 ,  E21B37/06 ,  E21B41/00

CPC分类号： E21B37/00 ,  B08B9/0433 ,  E21B37/06 ,  B05B3/06 ,  B05B15/658 ,  E21B41/0078

摘要： Cleanout tools and related methods of operation. At least some of the example embodiments are cleanout tools including a tool body that defines an internal annular channel, a joiner coupled to the tool body, a sleeve telescoped within the joiner and tool body, and a ball disposed within the annular channel. The ball held within the annular channel by the sleeve, and the ball configured to move along the annular channel under force of fluid pumped into the cleanout tool. The ball creates a pulsing of fluid streams exiting the tool body. Moreover, in some example systems the fluid streams created by the tool body intersect the inside diameter of a casing at non-perpendicular angles.